JP2016504482A5 - - Google Patents

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Publication number
JP2016504482A5
JP2016504482A5 JP2015555178A JP2015555178A JP2016504482A5 JP 2016504482 A5 JP2016504482 A5 JP 2016504482A5 JP 2015555178 A JP2015555178 A JP 2015555178A JP 2015555178 A JP2015555178 A JP 2015555178A JP 2016504482 A5 JP2016504482 A5 JP 2016504482A5
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Japan
Prior art keywords
integer
surfactant
carbon atoms
formula
neutral
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JP2015555178A
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JP2016504482A (ja
JP6444316B2 (ja
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Priority claimed from PCT/US2014/010769 external-priority patent/WO2014120405A1/en
Publication of JP2016504482A publication Critical patent/JP2016504482A/ja
Publication of JP2016504482A5 publication Critical patent/JP2016504482A5/ja
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Claims (2)


  1. SON[CHCH(CH)OH]
    SON[CHCH(CH)OH][(CHCHO)H](式中、nは1〜6の整数である)
    SON(R)[(CHCHO)H](式中、pは2〜6の整数であり、Rは1〜4個の炭素原子を有するアルキル基である)又は
    SON[(CHCHO)H][(CHCHO)H](式中、qは1〜6の整数であり、mは1〜6の整数であり、(q+m)≧3である)
    で表される中性界面活性剤と、
    溶媒と、
    を含み、R が3〜8個の炭素原子を有するフルオロアルキル基である、フッ素化スルホンアミド界面活性剤組成物。

  2. SON(H)−CHCH(CH)OH、
    SON(H)−(CHCHO)(式中、xは2〜6の整数である)又は
    SON(H)−CHCHOH
    で表されるアニオン性界面活性剤と、
    式:
    SON[CHCH(CH)OH]
    SON[CHCH(CH)OH][(CHCHO)H](式中、nは1〜6の整数である)
    SON(R)[(CHCHO)H](式中、pは2〜6の整数であり、Rは1〜4個の炭素原子を有するアルキル基である)
    SON[(CHCHO)H][(CHCHO)H](式中、qは1〜6の整数であり、mは1〜6の整数であり、q+m≧3である)又は
    SON[CHCHOH]
    で表される中性界面活性剤と、
    溶媒と、
    を含み、 が3〜8個の炭素原子を有するフルオロアルキル基である、フッ素化スルホンアミド界面活性剤組成物、
    但し、該組成物は、多量の唯一のアニオン性界面活性剤及び唯一の中性界面活性剤を含み、かつ該アニオン性界面活性剤が、RSON(H)−CHCHOHである場合、該中性界面活性剤は、RSON[CHCHOH]ではない。
JP2015555178A 2013-01-29 2014-01-09 界面活性剤並びにその製造及び使用方法 Active JP6444316B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361757790P 2013-01-29 2013-01-29
US61/757,790 2013-01-29
PCT/US2014/010769 WO2014120405A1 (en) 2013-01-29 2014-01-09 Surfactants and methods of making and using same

Publications (3)

Publication Number Publication Date
JP2016504482A JP2016504482A (ja) 2016-02-12
JP2016504482A5 true JP2016504482A5 (ja) 2017-03-02
JP6444316B2 JP6444316B2 (ja) 2018-12-26

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ID=51262838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015555178A Active JP6444316B2 (ja) 2013-01-29 2014-01-09 界面活性剤並びにその製造及び使用方法

Country Status (7)

Country Link
US (3) US9454082B2 (ja)
EP (2) EP2951217B1 (ja)
JP (1) JP6444316B2 (ja)
KR (1) KR102171621B1 (ja)
CN (1) CN104955854B (ja)
TW (1) TWI604044B (ja)
WO (1) WO2014120405A1 (ja)

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US20210263414A1 (en) * 2018-06-22 2021-08-26 Merck Patent Gmbh A photoresist composition, a method for manufacturing a photoresist coating, etched photoresist coating, and etched si containing layer(s), and manufacturing a device using thereof
US20210292533A1 (en) 2018-08-13 2021-09-23 3M Innovative Properties Company Curable fluoroelastomer composition
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KR102080780B1 (ko) * 2019-07-18 2020-02-24 영창케미칼 주식회사 리소그래피용 공정액 조성물 및 이를 사용한 패턴 형성 방법
KR102100432B1 (ko) * 2019-09-26 2020-05-15 영창케미칼 주식회사 포토 리소그래피용 공정액 조성물 및 이를 이용한 패턴 형성 방법
KR20210069352A (ko) * 2019-12-03 2021-06-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 세정액 조성물 및 이를 이용한 포토레지스트 재료의 표면처리 방법
USD1016192S1 (en) 2022-04-26 2024-02-27 Make Ideas, LLC Ball launcher

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