JP2016504482A5 - - Google Patents
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- Publication number
- JP2016504482A5 JP2016504482A5 JP2015555178A JP2015555178A JP2016504482A5 JP 2016504482 A5 JP2016504482 A5 JP 2016504482A5 JP 2015555178 A JP2015555178 A JP 2015555178A JP 2015555178 A JP2015555178 A JP 2015555178A JP 2016504482 A5 JP2016504482 A5 JP 2016504482A5
- Authority
- JP
- Japan
- Prior art keywords
- integer
- surfactant
- carbon atoms
- formula
- neutral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004094 surface-active agent Substances 0.000 claims 6
- 125000004432 carbon atoms Chemical group C* 0.000 claims 4
- 230000001264 neutralization Effects 0.000 claims 4
- 239000003945 anionic surfactant Substances 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000003709 fluoroalkyl group Chemical group 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 150000003456 sulfonamides Chemical class 0.000 claims 2
Claims (2)
- 式:
RfSO2N[CH2CH(CH3)OH]2、
RfSO2N[CH2CH(CH3)OH][(CH2CH2O)nH](式中、nは1〜6の整数である)、
RfSO2N(R)[(CH2CH2O)pH](式中、pは2〜6の整数であり、Rは1〜4個の炭素原子を有するアルキル基である)、又は
RfSO2N[(CH2CH2O)qH][(CH2CH2O)mH](式中、qは1〜6の整数であり、mは1〜6の整数であり、(q+m)≧3である)
で表される中性界面活性剤と、
溶媒と、
を含み、R f が3〜8個の炭素原子を有するフルオロアルキル基である、フッ素化スルホンアミド界面活性剤組成物。 - 式:
RfSO2N(H)−CH2CH(CH3)OH、
RfSO2N(H)−(CH2CH2O)xH(式中、xは2〜6の整数である)、又は
RfSO2N(H)−CH2CH2OH
で表されるアニオン性界面活性剤と、
式:
RfSO2N[CH2CH(CH3)OH]2、
RfSO2N[CH2CH(CH3)OH][(CH2CH2O)nH](式中、nは1〜6の整数である)、
RfSO2N(R)[(CH2CH2O)pH](式中、pは2〜6の整数であり、Rは1〜4個の炭素原子を有するアルキル基である)、
RfSO2N[(CH2CH2O)qH][(CH2CH2O)mH](式中、qは1〜6の整数であり、mは1〜6の整数であり、q+m≧3である)、又は
RfSO2N[CH2CH2OH]2
で表される中性界面活性剤と、
溶媒と、
を含み、R f が3〜8個の炭素原子を有するフルオロアルキル基である、フッ素化スルホンアミド界面活性剤組成物、
但し、該組成物は、多量の唯一のアニオン性界面活性剤及び唯一の中性界面活性剤を含み、かつ該アニオン性界面活性剤が、RfSO2N(H)−CH2CH2OHである場合、該中性界面活性剤は、RfSO2N[CH2CH2OH]2ではない。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361757790P | 2013-01-29 | 2013-01-29 | |
US61/757,790 | 2013-01-29 | ||
PCT/US2014/010769 WO2014120405A1 (en) | 2013-01-29 | 2014-01-09 | Surfactants and methods of making and using same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016504482A JP2016504482A (ja) | 2016-02-12 |
JP2016504482A5 true JP2016504482A5 (ja) | 2017-03-02 |
JP6444316B2 JP6444316B2 (ja) | 2018-12-26 |
Family
ID=51262838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015555178A Active JP6444316B2 (ja) | 2013-01-29 | 2014-01-09 | 界面活性剤並びにその製造及び使用方法 |
Country Status (7)
Country | Link |
---|---|
US (3) | US9454082B2 (ja) |
EP (2) | EP2951217B1 (ja) |
JP (1) | JP6444316B2 (ja) |
KR (1) | KR102171621B1 (ja) |
CN (1) | CN104955854B (ja) |
TW (1) | TWI604044B (ja) |
WO (1) | WO2014120405A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017528568A (ja) * | 2014-09-11 | 2017-09-28 | スリーエム イノベイティブ プロパティズ カンパニー | フッ素化界面活性剤含有組成物 |
CN106715549B (zh) * | 2014-09-23 | 2019-12-17 | 3M创新有限公司 | 含氮的氢氟醚及其使用方法 |
EP3807355B1 (en) * | 2018-06-13 | 2022-04-27 | 3M Innovative Properties Company | Curable fluoroelastomer composition |
US20210263414A1 (en) * | 2018-06-22 | 2021-08-26 | Merck Patent Gmbh | A photoresist composition, a method for manufacturing a photoresist coating, etched photoresist coating, and etched si containing layer(s), and manufacturing a device using thereof |
US20210292533A1 (en) | 2018-08-13 | 2021-09-23 | 3M Innovative Properties Company | Curable fluoroelastomer composition |
TW202035361A (zh) * | 2018-12-12 | 2020-10-01 | 美商3M新設資產公司 | 氟化胺氧化物界面活性劑 |
KR102080780B1 (ko) * | 2019-07-18 | 2020-02-24 | 영창케미칼 주식회사 | 리소그래피용 공정액 조성물 및 이를 사용한 패턴 형성 방법 |
KR102100432B1 (ko) * | 2019-09-26 | 2020-05-15 | 영창케미칼 주식회사 | 포토 리소그래피용 공정액 조성물 및 이를 이용한 패턴 형성 방법 |
KR20210069352A (ko) * | 2019-12-03 | 2021-06-11 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 세정액 조성물 및 이를 이용한 포토레지스트 재료의 표면처리 방법 |
USD1016192S1 (en) | 2022-04-26 | 2024-02-27 | Make Ideas, LLC | Ball launcher |
Family Cites Families (24)
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US2915554A (en) * | 1957-07-23 | 1959-12-01 | Minnesota Mining & Mfg | Non-ionic surfactant derivatives of perfluoro alkane-sulfonamides |
DE2024909B2 (de) | 1970-05-22 | 1977-09-29 | Bayer Ag, 5090 Leverkusen | Verfahren zur herstellung von n-hydroxyalkyl-perfluoralkansulfonamiden und einige n,n-bis-(hydroxyalkyl)-perfluor-alkansulfonamide |
US4089804A (en) | 1976-12-30 | 1978-05-16 | Ciba-Geigy Corporation | Method of improving fluorinated surfactants |
DE2921142A1 (de) * | 1979-05-25 | 1980-12-11 | Bayer Ag | Verwendung von perfluoralkansulfonamid- salzen als tenside |
JPS626255A (ja) * | 1985-07-02 | 1987-01-13 | Fuji Photo Film Co Ltd | ハロゲン化銀写真感光材料 |
US5043195A (en) * | 1988-10-28 | 1991-08-27 | Minnesota Mining & Manufacturing Company | Static shielding film |
US5217767A (en) * | 1988-10-28 | 1993-06-08 | Minnesota Mining And Manufacturing Company | Static shielding film |
JPH02285081A (ja) * | 1989-04-25 | 1990-11-22 | Sanyo Chem Ind Ltd | エッチング液 |
JP3217116B2 (ja) * | 1992-03-06 | 2001-10-09 | 日産化学工業株式会社 | 低表面張力洗浄用組成物 |
US6380289B1 (en) * | 1993-06-28 | 2002-04-30 | 3M Innovative Properties Company | Thermoplastic composition comprising fluoroaliphatic radical-containing surface-modifying additive |
US5688884A (en) | 1995-08-31 | 1997-11-18 | E. I. Du Pont De Nemours And Company | Polymerization process |
US6476114B2 (en) * | 1997-11-19 | 2002-11-05 | 3M Innovative Properties Company | Thermoplastic polymer film comprising a fluorochemical compound |
WO2001030873A1 (en) | 1999-10-27 | 2001-05-03 | 3M Innovative Properties Company | Fluorochemical sulfonamide surfactants |
KR100446659B1 (ko) * | 2001-05-09 | 2004-09-04 | 주식회사 엘지화학 | 비이온성 계면활성제를 포함하는 전해액과 이를 이용하는리튬이온 전지 |
US6582759B1 (en) * | 2002-02-15 | 2003-06-24 | 3M Innovative Properties Company | Optical elements comprising a fluorinated surface treatment comprising urethane, ester or phosphate linkages |
US7169323B2 (en) | 2002-11-08 | 2007-01-30 | 3M Innovative Properties Company | Fluorinated surfactants for buffered acid etch solutions |
US7294610B2 (en) * | 2004-03-03 | 2007-11-13 | 3M Innovative Properties Company | Fluorinated sulfonamide surfactants for aqueous cleaning solutions |
JP4493393B2 (ja) | 2004-04-23 | 2010-06-30 | 東京応化工業株式会社 | リソグラフィー用リンス液 |
US7572848B2 (en) | 2005-12-21 | 2009-08-11 | 3M Innovative Properties Company | Coatable composition |
US20080299487A1 (en) | 2007-05-31 | 2008-12-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography material and lithography process |
US20080280230A1 (en) | 2007-05-10 | 2008-11-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photolithography process including a chemical rinse |
US20100160458A1 (en) | 2008-12-23 | 2010-06-24 | 3M Innovative Properties Company | Method of making a composition and aqueous composition preparable thereby |
WO2010074878A1 (en) * | 2008-12-23 | 2010-07-01 | 3M Innovative Properties Company | Aqueous composition containing fluorinated sulfonamide and sulfonamidate compounds |
EP2742523B1 (en) * | 2011-08-10 | 2020-09-23 | 3M Innovative Properties Company | Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions |
-
2014
- 2014-01-09 US US14/763,841 patent/US9454082B2/en active Active
- 2014-01-09 KR KR1020157022995A patent/KR102171621B1/ko active IP Right Grant
- 2014-01-09 CN CN201480006221.8A patent/CN104955854B/zh active Active
- 2014-01-09 EP EP14745983.8A patent/EP2951217B1/en active Active
- 2014-01-09 EP EP17183850.1A patent/EP3263611B1/en active Active
- 2014-01-09 WO PCT/US2014/010769 patent/WO2014120405A1/en active Application Filing
- 2014-01-09 JP JP2015555178A patent/JP6444316B2/ja active Active
- 2014-01-23 TW TW103102534A patent/TWI604044B/zh active
-
2016
- 2016-09-12 US US15/262,678 patent/US9562212B2/en active Active
-
2017
- 2017-01-05 US US15/398,804 patent/US9725683B2/en active Active
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