JP2016183097A - オゾン発生器 - Google Patents
オゾン発生器 Download PDFInfo
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- JP2016183097A JP2016183097A JP2016079053A JP2016079053A JP2016183097A JP 2016183097 A JP2016183097 A JP 2016183097A JP 2016079053 A JP2016079053 A JP 2016079053A JP 2016079053 A JP2016079053 A JP 2016079053A JP 2016183097 A JP2016183097 A JP 2016183097A
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- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 title claims abstract description 139
- 239000011230 binding agent Substances 0.000 claims abstract description 19
- 238000003825 pressing Methods 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 12
- 238000009413 insulation Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000010008 shearing Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 243
- 125000006850 spacer group Chemical group 0.000 description 25
- 239000007789 gas Substances 0.000 description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 239000012530 fluid Substances 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 7
- 229910001930 tungsten oxide Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000002826 coolant Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010574 gas phase reaction Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- 239000012809 cooling fluid Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000001699 photocatalysis Effects 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 239000011941 photocatalyst Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/10—Preparation of ozone
- C01B13/11—Preparation of ozone by electric discharge
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/10—Dischargers used for production of ozone
- C01B2201/12—Plate-type dischargers
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/20—Electrodes used for obtaining electrical discharge
- C01B2201/22—Constructional details of the electrodes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/20—Electrodes used for obtaining electrical discharge
- C01B2201/24—Composition of the electrodes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/30—Dielectrics used in the electrical dischargers
- C01B2201/32—Constructional details of the dielectrics
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/30—Dielectrics used in the electrical dischargers
- C01B2201/34—Composition of the dielectrics
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/60—Feed streams for electrical dischargers
- C01B2201/64—Oxygen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/70—Cooling of the discharger; Means for making cooling unnecessary
- C01B2201/74—Cooling of the discharger; Means for making cooling unnecessary by liquid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
Description
104a、104b、104c、104d、104e(104) オゾン発生器セル
108 高電圧電極層
112a、112b(112) 絶縁層
116a、116b(116) 低電圧電極層
120a、120b(120) 熱伝導板
Claims (10)
- オゾン発生器であって、
オゾン発生器セルを備え、
オゾン発生器セルは、
高電圧電極層と、
第1絶縁層及び第2絶縁層にして、前記高電圧電極層が第1絶縁層と第2絶縁層との間に配置される第1絶縁層及び第2絶縁層と、
第1低電圧電極層及び第2低電圧電極層にして、前記高電圧電極層、第1絶縁層及び第2絶縁層が第1低電圧電極層と第2低電圧電極層との間に配置される第1低電圧電極層及び第2低電圧電極層と、
第1放電領域及び第2放電領域にして、前記高電圧電極層が第1放電領域と第2放電領域との間に配置される第1放電領域及び第2放電領域と、
第1熱伝導板及び第2熱伝導板にして、前記高電圧電極層、第1絶縁層、第2絶縁層、第1低電圧電極層、第2低電圧電極層、第1放電領域、及び第2放電領域が第1熱伝導板と第2熱伝導板との間に配置される第1熱伝導板及び第2熱伝導板と、
オゾン発生器セルが配置されるベース板と、
ベース板に連結されたばね荷重クランプ板にして、オゾン発生器セルがベース板とばね荷重クランプ板との間に配置され、連結されたベース板とばね荷重クランプ板が、オゾン発生器セルに圧力を適用し、オゾン発生器セルの前記高電圧電極層、第1絶縁層、第2絶縁層、第1低電圧電極層、及び第2低電圧電極層を共に保つ荷重クランプ板とを備えるオゾン発生器。 - 前記連結されたベース板とばね荷重クランプ板は、オゾン発生器セルに圧力を適用し、オゾン発生器セルの前記高電圧電極層、第1絶縁層、第2絶縁層、第1低電圧電極層、及び第2低電圧電極層を結合剤の無い状態で共に保つ請求項1のオゾン発生器。
- 前記結合剤の無い状態は、低減した厚さを有するオゾン発生器セルをもたらす請求項2のオゾン発生器。
- 前記低減した厚さは、第1及び第2低電圧電極層と高電圧電極層との間の静電容量の増長を作り出す請求項3のオゾン発生器。
- 前記第1及び第2絶縁層、第1及び第2低電圧電極層、及び高電圧電極層はすべて、アルミニウム無含有材料を用いて製造される請求項1のオゾン発生器。
- オゾン発生器を製造する方法であって、
第1絶縁層と第2絶縁層との間に高電圧電極層を配置する工程と、
第1低電圧電極層と第2低電圧電極層との間に前記高電圧電極層、第1絶縁層及び第2絶縁層を配置する工程と、
第1放電領域と第2放電領域との間に前記高電圧電極層を配置する工程と、
第1熱伝導板と第2熱伝導板との間に、前記高電圧電極層、第1絶縁層、第2絶縁層、第1低電圧電極層、第2低電圧電極層、第1放電領域、及び第2放電領域を配置し、
ベース板上にオゾン発生器セルを配置する工程と、
ばね荷重クランプ板を前記ベース板に連結する工程にして、オゾン発生器セルがベース板とばね荷重クランプ板との間に配置され、連結されたベース板とばね荷重クランプ板が、オゾン発生器セルに圧力を適用し、オゾン発生器セルの前記高電圧電極層、第1絶縁層、第2絶縁層、第1低電圧電極層、及び第2低電圧電極層を共に保つ工程とを含む方法。 - 前記連結されたベース板とばね荷重クランプ板は、オゾン発生器セルに圧力を適用し、オゾン発生器セルの前記高電圧電極層、第1絶縁層、第2絶縁層、第1低電圧電極層、及び第2低電圧電極層を結合剤の無い状態で共に保つ請求項6の方法。
- 前記結合剤の無い状態は、低減した厚さを有するオゾン発生器セルをもたらす請求項7の方法。
- 前記低減した厚さは、第1及び第2低電圧電極層と高電圧電極層との間の静電容量の増長を作り出す請求項8の方法。
- 前記第1及び第2絶縁層、第1及び第2低電圧電極層、及び高電圧電極層はすべて、アルミニウム無含有材料を用いて製造される請求項6の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/153,649 | 2011-06-06 | ||
US13/153,649 US9039985B2 (en) | 2011-06-06 | 2011-06-06 | Ozone generator |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2014514506A Division JP6131246B2 (ja) | 2011-06-06 | 2012-05-31 | オゾン発生器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016183097A true JP2016183097A (ja) | 2016-10-20 |
JP6465831B2 JP6465831B2 (ja) | 2019-02-06 |
Family
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014514506A Active JP6131246B2 (ja) | 2011-06-06 | 2012-05-31 | オゾン発生器 |
JP2016079053A Active JP6465831B2 (ja) | 2011-06-06 | 2016-04-11 | オゾン発生器 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
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JP2014514506A Active JP6131246B2 (ja) | 2011-06-06 | 2012-05-31 | オゾン発生器 |
Country Status (7)
Country | Link |
---|---|
US (2) | US9039985B2 (ja) |
EP (1) | EP2718227B1 (ja) |
JP (2) | JP6131246B2 (ja) |
KR (1) | KR101533184B1 (ja) |
CN (2) | CN105314604A (ja) |
TW (1) | TWI555701B (ja) |
WO (1) | WO2012170276A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5677344B2 (ja) * | 2012-03-16 | 2015-02-25 | 株式会社東芝 | オゾン発生装置 |
CN105883726A (zh) * | 2014-12-24 | 2016-08-24 | 苏州超等环保科技有限公司 | 一种不发热臭氧发生器高压电极 |
DE112016000283T5 (de) * | 2015-01-30 | 2017-10-12 | Murata Manufacturing Co., Ltd. | Ozon-erzeugungsvorrichtung |
DE112016000405T5 (de) * | 2015-02-13 | 2017-10-26 | Murata Manufacturing Co., Ltd. | Ozonerzeugungsvorrichtung |
JP6714018B2 (ja) * | 2015-12-08 | 2020-06-24 | 東芝三菱電機産業システム株式会社 | オゾン発生方法 |
EP3421417A1 (en) * | 2017-06-30 | 2019-01-02 | SUEZ Groupe | Method for controlling an ozone generating machine |
CN108638542A (zh) * | 2018-05-10 | 2018-10-12 | 重庆新康意安得达尔新材料有限公司 | 预涂膜生产用氧化装置 |
US11875974B2 (en) | 2020-05-30 | 2024-01-16 | Preservation Tech, LLC | Multi-channel plasma reaction cell |
US20220009777A1 (en) * | 2020-07-07 | 2022-01-13 | Preservation Tech LLC | Systems and methods for generating ozone |
KR102621206B1 (ko) | 2023-05-15 | 2024-01-08 | 주식회사 위크론 | 오존발생기의 방전공간 간극유지장치 |
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2012
- 2012-05-31 JP JP2014514506A patent/JP6131246B2/ja active Active
- 2012-05-31 CN CN201510909944.5A patent/CN105314604A/zh active Pending
- 2012-05-31 CN CN201280038562.4A patent/CN103702932B/zh active Active
- 2012-05-31 KR KR1020137032516A patent/KR101533184B1/ko active IP Right Grant
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Also Published As
Publication number | Publication date |
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US20150232335A1 (en) | 2015-08-20 |
KR20140012166A (ko) | 2014-01-29 |
WO2012170276A1 (en) | 2012-12-13 |
US9580318B2 (en) | 2017-02-28 |
EP2718227B1 (en) | 2020-07-08 |
US9039985B2 (en) | 2015-05-26 |
KR101533184B1 (ko) | 2015-07-01 |
JP2014520060A (ja) | 2014-08-21 |
CN105314604A (zh) | 2016-02-10 |
TW201302603A (zh) | 2013-01-16 |
US20120308440A1 (en) | 2012-12-06 |
EP2718227A1 (en) | 2014-04-16 |
CN103702932B (zh) | 2016-01-20 |
TWI555701B (zh) | 2016-11-01 |
JP6131246B2 (ja) | 2017-05-17 |
JP6465831B2 (ja) | 2019-02-06 |
CN103702932A (zh) | 2014-04-02 |
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