JP2015535804A - 表面改質ガラス基板 - Google Patents
表面改質ガラス基板 Download PDFInfo
- Publication number
- JP2015535804A JP2015535804A JP2015535731A JP2015535731A JP2015535804A JP 2015535804 A JP2015535804 A JP 2015535804A JP 2015535731 A JP2015535731 A JP 2015535731A JP 2015535731 A JP2015535731 A JP 2015535731A JP 2015535804 A JP2015535804 A JP 2015535804A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- glass substrate
- glass
- mol
- substrate according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 183
- 239000000758 substrate Substances 0.000 title claims abstract description 123
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 239000013078 crystal Substances 0.000 claims description 11
- 239000005345 chemically strengthened glass Substances 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 230000009467 reduction Effects 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 230000007423 decrease Effects 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 230000003678 scratch resistant effect Effects 0.000 abstract description 9
- 230000005540 biological transmission Effects 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 141
- 239000011734 sodium Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 14
- 229910004298 SiO 2 Inorganic materials 0.000 description 13
- 239000000463 material Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 11
- 238000012546 transfer Methods 0.000 description 11
- 150000002500 ions Chemical class 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 7
- 229910018068 Li 2 O Inorganic materials 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000006060 molten glass Substances 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 239000005358 alkali aluminosilicate glass Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 238000003280 down draw process Methods 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 238000003286 fusion draw glass process Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910006404 SnO 2 Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910001413 alkali metal ion Inorganic materials 0.000 description 3
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005342 ion exchange Methods 0.000 description 3
- 239000003607 modifier Substances 0.000 description 3
- 239000000075 oxide glass Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- 238000003283 slot draw process Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- -1 alkali metal salts Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 238000004630 atomic force microscopy Methods 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000001429 visible spectrum Methods 0.000 description 2
- BXVSAYBZSGIURM-UHFFFAOYSA-N 2-phenoxy-4h-1,3,2$l^{5}-benzodioxaphosphinine 2-oxide Chemical compound O1CC2=CC=CC=C2OP1(=O)OC1=CC=CC=C1 BXVSAYBZSGIURM-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/10009—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets
- B32B17/10064—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets comprising at least two glass sheets, only one of which being an outer layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/10009—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets
- B32B17/10128—Treatment of at least one glass sheet
- B32B17/10137—Chemical strengthening
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K5/00—Casings, cabinets or drawers for electric apparatus
- H05K5/0004—Casings, cabinets or drawers for electric apparatus comprising several parts forming a closed casing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/536—Hardness
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/58—Cuttability
- B32B2307/581—Resistant to cut
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Surface Treatment Of Glass (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
スパッタ法は、反応性スパッタリングまたは非反応性スパッタリングを含んでもよい。そのような層を形成するための単槽スパッタ堆積装置200が図2に概略示されている。この装置200は、1つ以上のガラス基板212をその上に搭載できる基板ステージ210、およびマスクステージ220を有する真空室205を備えており、このマスクステージは、基板の規定領域上への層のパターン付き堆積のためのシャドーマスク222を搭載するために使用できる。真空室205には、内圧を制御するための真空ポート240、並びに水冷ポート250およびガス入口ポート260が設けられている。この真空室は、クライオポンプ(CTI−8200/Helix;米国、マサチューセッツ州)で操作することができ、蒸発プロセス(〜10-6トル)およびRFスパッタ堆積プロセス(〜10-3トル)の両方に適した圧力で作動することができる。
110 無機層
120,212 ガラス基板
200 単槽スパッタ装置
205 真空室
210 基板ステージ
220 マスクステージ
222 シャドーマスク
240 真空ポート
250 水冷ポート
260 ガス入口ポート
280 蒸発設備
290 電源
293 制御装置
295,395 制御ステーション
300 RFスパッタガン
310 スパッタ目標
390 RF電源
400 圧子
410 溝
420 小片またはかけら
430 破片
500 携帯電話
510 カバープレート
600 電子機器
620 外周部材
625 コネクタ開口
650 前面カバーアセンブリ
652 支持構造
654 ガラス基板
655 ディスプレイ
Claims (10)
- ガラス基板において、
反対の主面を有するガラス本体、および
第1の主面の大半を覆って設けられた、ある厚さを有する層であって、該層の厚さの少なくとも一部分が、少なくとも10GPaのバーコビッチ圧子硬度およびx線非晶構造を備え、該層が
少なくとも70%の光透過率、および
少なくとも10MPaの圧縮応力、
からなる群より選択される少なくとも1つの属性を有するものである層、
を備えたガラス基板。 - 前記層の厚さが約50nmから約2μmの範囲にある、請求項1記載のガラス基板。
- 前記層が、10MPaから500MPaに及ぶ圧縮応力を有する、請求項1または2記載のガラス基板。
- 前記層が、約20体積%以下の結晶分画を有する、請求項1または2記載のガラス基板。
- 前記層が、可視波長での約3未満の屈折率、可視波長での約40%未満の反射率、およびそれらの組合せの内の1つを示す、請求項1または2記載のガラス基板。
- 前記ガラス基板が化学強化ガラスから構成される、請求項1または2記載のガラス基板。
- 前記層が、金属酸化物、金属窒化物、金属炭化物、金属ホウ化物、ダイヤモンド状炭素またはそれらの組合せから構成され、前記金属が、B、Al、Si、Ti、V、Cr、Y、Zr、Nb、Mo、Sn、Hf、TaおよびWからなる群より選択される、請求項1または2記載のガラス基板。
- 前記ガラス基板が、バーコビッチ圧子および少なくとも60mNの荷重を使用して引っ掻かれた場合、第1の主面の大半を覆って前記層が設けられていないガラス本体と比べて、少なくとも35%の引っ掻き傷の幅の減少を示す、請求項1または2記載のガラス基板。
- 前記ガラス基板が、バーコビッチ圧子および約160mNまでの荷重を使用して引っ掻かれた場合、第1の主面の大半を覆って前記層が設けられていないガラス本体と比べて、少なくとも35%の引っ掻き傷の深さの減少を示す、請求項1または2記載のガラス基板。
- 電子機器のハウジングにおいて、
(a)該電子機器のハウジングの前面を提供するように配置され固定された前面ガラスカバーおよび(b)該電子機器のハウジングの背面を提供するように配置され固定された背面ガラスカバーの少なくとも一方、
を備え、前記前面ガラスカバーおよび前記背面ガラスカバーが、請求項1または2記載のガラス基板から構成された電子機器のハウジング。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261709339P | 2012-10-03 | 2012-10-03 | |
US61/709,339 | 2012-10-03 | ||
PCT/US2013/062828 WO2014055491A1 (en) | 2012-10-03 | 2013-10-01 | Surface-modified glass substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015535804A true JP2015535804A (ja) | 2015-12-17 |
JP6257103B2 JP6257103B2 (ja) | 2018-01-10 |
Family
ID=49354952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015535731A Active JP6257103B2 (ja) | 2012-10-03 | 2013-10-01 | 表面改質ガラス基板 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9328016B2 (ja) |
EP (1) | EP2903823B1 (ja) |
JP (1) | JP6257103B2 (ja) |
KR (2) | KR101964492B1 (ja) |
CN (2) | CN109081603A (ja) |
TW (1) | TWI585053B (ja) |
WO (1) | WO2014055491A1 (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019032511A (ja) * | 2017-06-20 | 2019-02-28 | アップル インコーポレイテッドApple Inc. | 電子デバイス内のガラス構造の内部コーティング |
JP2019508354A (ja) * | 2016-01-18 | 2019-03-28 | コーニング インコーポレイテッド | 改善された触覚表面を有する外囲器 |
JP2020504842A (ja) * | 2016-12-30 | 2020-02-13 | コーニング インコーポレイテッド | 残留圧縮応力を有する光学コーティングを備えた被覆物品 |
JP2020506156A (ja) * | 2017-01-31 | 2020-02-27 | コーニング インコーポレイテッド | 設計された応力プロファイルを有するコーティングされたガラス系物品 |
JP2020521709A (ja) * | 2017-05-26 | 2020-07-27 | コーニング インコーポレイテッド | 硬さと靭性を有する保護被膜付きガラス、ガラス‐セラミック、及びセラミック物品 |
JP2020525378A (ja) * | 2017-06-23 | 2020-08-27 | シンマット, インコーポレーテッドSinmat, Inc. | セラミック材料に圧縮応力を印加するための膜 |
US11714213B2 (en) | 2013-05-07 | 2023-08-01 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
US11906699B2 (en) | 2018-08-17 | 2024-02-20 | Corning Incorporated | Inorganic oxide articles with thin, durable anti reflective structures |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9359251B2 (en) | 2012-02-29 | 2016-06-07 | Corning Incorporated | Ion exchanged glasses via non-error function compressive stress profiles |
US20140272345A1 (en) * | 2013-03-15 | 2014-09-18 | Rubicon Technology, Inc. | Method of growing aluminum oxide onto substrates by use of an aluminum source in an environment containing partial pressure of oxygen to create transparent, scratch-resistant windows |
US9684097B2 (en) | 2013-05-07 | 2017-06-20 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
US9703011B2 (en) | 2013-05-07 | 2017-07-11 | Corning Incorporated | Scratch-resistant articles with a gradient layer |
US9359261B2 (en) | 2013-05-07 | 2016-06-07 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
US9110230B2 (en) | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
US11079309B2 (en) | 2013-07-26 | 2021-08-03 | Corning Incorporated | Strengthened glass articles having improved survivability |
WO2015017376A1 (en) | 2013-08-01 | 2015-02-05 | Corning Incorporated | Methods and apparatus providing a substrate having a coating with an elastic modulus gradient |
US10160688B2 (en) * | 2013-09-13 | 2018-12-25 | Corning Incorporated | Fracture-resistant layered-substrates and articles including the same |
JP6288499B2 (ja) * | 2013-10-03 | 2018-03-07 | 日本電気硝子株式会社 | 強化ガラス板及びこれを用いた携帯端末 |
KR102335197B1 (ko) * | 2014-02-07 | 2021-12-02 | 세람텍-에텍 게엠베하 | 기재 세라믹 라미네이트 |
US10118858B2 (en) | 2014-02-24 | 2018-11-06 | Corning Incorporated | Strengthened glass with deep depth of compression |
WO2015143206A1 (en) | 2014-03-19 | 2015-09-24 | Solar-Tectic, Llc | Method of making ceramic glass |
US9335444B2 (en) | 2014-05-12 | 2016-05-10 | Corning Incorporated | Durable and scratch-resistant anti-reflective articles |
US11267973B2 (en) | 2014-05-12 | 2022-03-08 | Corning Incorporated | Durable anti-reflective articles |
TWI705889B (zh) | 2014-06-19 | 2020-10-01 | 美商康寧公司 | 無易碎應力分布曲線的玻璃 |
US9790593B2 (en) * | 2014-08-01 | 2017-10-17 | Corning Incorporated | Scratch-resistant materials and articles including the same |
TWI701225B (zh) * | 2014-08-28 | 2020-08-11 | 美商康寧公司 | 用於經塗覆玻璃中之強度及/或應變損失減緩之方法及設備 |
TWI593651B (zh) * | 2014-09-30 | 2017-08-01 | 鴻海精密工業股份有限公司 | 鍍膜玻璃及其製造方法、應用該鍍膜玻璃之電子裝置 |
CN117623625A (zh) * | 2014-10-08 | 2024-03-01 | 康宁股份有限公司 | 包含金属氧化物浓度梯度的玻璃和玻璃陶瓷 |
US10150698B2 (en) | 2014-10-31 | 2018-12-11 | Corning Incorporated | Strengthened glass with ultra deep depth of compression |
TWI696595B (zh) | 2014-11-04 | 2020-06-21 | 美商康寧公司 | 深不易碎的應力分佈及其製造方法 |
JPWO2016152657A1 (ja) * | 2015-03-25 | 2018-01-11 | 日本電気硝子株式会社 | 強化ガラス板の製造方法、ならびに強化用ガラス板の製造方法 |
US10310642B2 (en) * | 2015-06-26 | 2019-06-04 | Corning Incorporated | Sapphire cover with increased survivability |
US11613103B2 (en) | 2015-07-21 | 2023-03-28 | Corning Incorporated | Glass articles exhibiting improved fracture performance |
US10579106B2 (en) | 2015-07-21 | 2020-03-03 | Corning Incorporated | Glass articles exhibiting improved fracture performance |
CN107735697B (zh) | 2015-09-14 | 2020-10-30 | 康宁股份有限公司 | 减反射制品以及包含其的显示器装置 |
TWI758263B (zh) | 2015-11-19 | 2022-03-21 | 美商康寧公司 | 顯示螢幕保護器 |
JP6839192B2 (ja) | 2015-12-11 | 2021-03-03 | コーニング インコーポレイテッド | 金属酸化物濃度勾配を含むフュージョン成形可能なガラス系物品 |
KR102018834B1 (ko) | 2016-04-08 | 2019-09-05 | 코닝 인코포레이티드 | 금속 산화물 농도 구배를 포함하는 유리-계 제품 |
US10271442B2 (en) | 2016-04-08 | 2019-04-23 | Corning Incorporated | Glass-based articles including a stress profile comprising two regions, and methods of making |
TWI733903B (zh) * | 2016-09-27 | 2021-07-21 | 美商康寧公司 | 具有工程設計的應力分佈的基於玻璃的製品及其製造方法 |
KR20180050452A (ko) | 2016-11-04 | 2018-05-15 | 코닝 인코포레이티드 | 코팅 과정에서의 글래스 기반 제품의 마스킹 및 고정, 및 이에 의해 제조된 제품 |
KR20180050457A (ko) | 2016-11-04 | 2018-05-15 | 코닝 인코포레이티드 | 코팅 과정 동안에 글래스 기반 제품의 주변 에지를 마스킹하는 장치 및 방법, 그리고 이에 의해 제조된 제품 |
CN110325663B (zh) | 2017-02-13 | 2022-08-02 | 康宁股份有限公司 | 用于喷溅装置的基材支撑体 |
JP6822219B2 (ja) * | 2017-03-01 | 2021-01-27 | Agc株式会社 | ディスプレイ用ガラス基板 |
US10287673B2 (en) * | 2017-03-07 | 2019-05-14 | Guardian Glass, LLC | Coated article having low-E coating with IR reflecting layer(S) and yttrium inclusive high index nitrided dielectric layer |
US10266937B2 (en) * | 2017-03-09 | 2019-04-23 | Guardian Glass, LLC | Coated article having low-E coating with IR reflecting layer(s) and hafnium inclusive high index nitrided dielectric layer |
US20200147932A1 (en) | 2017-06-09 | 2020-05-14 | Corning Incorporated | Bendable laminated article including anisotropic layer |
TW201906798A (zh) | 2017-06-23 | 2019-02-16 | 美商康寧公司 | 包括結構化島狀層的可折曲疊層製品及其製造方法 |
US10969526B2 (en) | 2017-09-08 | 2021-04-06 | Apple Inc. | Coatings for transparent substrates in electronic devices |
KR102490522B1 (ko) * | 2017-11-14 | 2023-01-19 | 삼성전자주식회사 | 커버 글래스 및 이를 포함하는 전자 장치, 및 커버 글래스 제조 방법 |
TWI821234B (zh) | 2018-01-09 | 2023-11-11 | 美商康寧公司 | 具光改變特徵之塗覆製品及用於製造彼等之方法 |
TW201935039A (zh) | 2018-01-25 | 2019-09-01 | 美商康寧公司 | 用於可折疊電子顯示器的纖維玻璃複合蓋及其製作方法 |
MX2019000869A (es) * | 2018-01-30 | 2019-12-19 | Viavi Solutions Inc | Dispositivo óptico que tiene partes ópticas y mecánicas. |
WO2019199791A1 (en) | 2018-04-09 | 2019-10-17 | Corning Incorporated | Locally strengthened glass-ceramics and methods of making the same |
US11037550B2 (en) | 2018-11-30 | 2021-06-15 | Dish Network L.L.C. | Audio-based link generation |
CN113795468B (zh) * | 2019-04-04 | 2023-10-10 | 康宁公司 | 具有印刷墨水层的装饰玻璃 |
US20220011478A1 (en) | 2020-07-09 | 2022-01-13 | Corning Incorporated | Textured region of a substrate to reduce specular reflectance incorporating surface features with an elliptical perimeter or segments thereof, and method of making the same |
WO2024123720A1 (en) | 2022-12-08 | 2024-06-13 | Corning Incorporated | Coated articles with an anti-fingerprint coating or surface-modifying layer and methods of making the same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003527278A (ja) * | 1999-12-30 | 2003-09-16 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 硬さおよび耐磨耗性の付加のための非金属製品上のダイヤモンド様炭素コーティング |
JP2005114649A (ja) * | 2003-10-10 | 2005-04-28 | Citizen Watch Co Ltd | 時計用カバーガラス |
JP2011510904A (ja) * | 2008-02-05 | 2011-04-07 | コーニング インコーポレイテッド | 電子装置のカバープレートとして使用するための耐損傷性ガラス物品 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4504519A (en) * | 1981-10-21 | 1985-03-12 | Rca Corporation | Diamond-like film and process for producing same |
JP2815245B2 (ja) * | 1991-04-25 | 1998-10-27 | 京セラ株式会社 | 光記録素子 |
JP2875945B2 (ja) * | 1993-01-28 | 1999-03-31 | アプライド マテリアルズ インコーポレイテッド | Cvdにより大面積のガラス基板上に高堆積速度でシリコン窒化薄膜を堆積する方法 |
US6338901B1 (en) * | 1999-05-03 | 2002-01-15 | Guardian Industries Corporation | Hydrophobic coating including DLC on substrate |
US7229533B2 (en) * | 2004-06-25 | 2007-06-12 | Guardian Industries Corp. | Method of making coated article having low-E coating with ion beam treated and/or formed IR reflecting layer |
US7550067B2 (en) * | 2004-06-25 | 2009-06-23 | Guardian Industries Corp. | Coated article with ion treated underlayer and corresponding method |
US7311975B2 (en) * | 2004-06-25 | 2007-12-25 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) | Coated article having low-E coating with ion beam treated IR reflecting layer and corresponding method |
DE102007033338B4 (de) * | 2007-07-16 | 2010-06-02 | Schott Ag | Hartstoffbeschichteter Glas- oder Glaskeramik-Artikel und Verfahren zu dessen Herstellung sowie Verwendung des Glas- oder Glaskeramik-Artikels |
JP5223540B2 (ja) | 2007-08-24 | 2013-06-26 | 大日本印刷株式会社 | ガスバリア性シート、ガスバリア性シートの製造方法 |
JP2009083223A (ja) * | 2007-09-28 | 2009-04-23 | Jgc Catalysts & Chemicals Ltd | ハードコート膜付基材、ハードコート膜形成用塗布液および該ハードコート膜に用いるポリマーシランカップリング剤被覆金属酸化物粒子の製造方法 |
US8491718B2 (en) | 2008-05-28 | 2013-07-23 | Karin Chaudhari | Methods of growing heteroepitaxial single crystal or large grained semiconductor films and devices thereon |
CN101321443A (zh) * | 2008-07-04 | 2008-12-10 | 福州高意通讯有限公司 | 异型玻璃作为外壳的制造方法及其在电子产品中的应用 |
DE102008054139B4 (de) * | 2008-10-31 | 2010-11-11 | Schott Ag | Glas- oder Glaskeramik-Substrat mit Kratzschutzbeschichtung, dessen Verwendung und Verfahren zu dessen Herstellung |
EP2363383A4 (en) * | 2008-11-07 | 2014-06-25 | Nitto Denko Corp | TRANSPARENT SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME |
JP5406615B2 (ja) * | 2009-07-15 | 2014-02-05 | 日東電工株式会社 | 透明フィルムおよび該フィルムを用いた表面保護フィルム |
CN101602273A (zh) * | 2009-07-22 | 2009-12-16 | 天津南玻节能玻璃有限公司 | 一种类金刚石镀膜玻璃及其制备方法 |
JP5433372B2 (ja) * | 2009-10-20 | 2014-03-05 | フクビ化学工業株式会社 | 反射防止強化ガラスの製造方法 |
US8911869B2 (en) * | 2009-10-22 | 2014-12-16 | Nitto Denko Corporation | Transparent substrate |
BR112012028564A2 (pt) * | 2010-05-07 | 2016-08-02 | Nippon Kogaku Kk | película condutora deslizante, membro formado de película condutora deslizante e método para produzir a mesma |
US8693097B2 (en) * | 2010-09-03 | 2014-04-08 | Guardian Industries Corp. | Temperable three layer antireflective coating, coated article including temperable three layer antireflective coating, and/or method of making the same |
US9796619B2 (en) * | 2010-09-03 | 2017-10-24 | Guardian Glass, LLC | Temperable three layer antirefrlective coating, coated article including temperable three layer antirefrlective coating, and/or method of making the same |
JP5531892B2 (ja) | 2010-10-04 | 2014-06-25 | コニカミノルタ株式会社 | ガスバリア性フィルム、ガスバリア性フィルムの製造方法、及び該ガスバリア性フィルムを有する有機電子デバイス |
US9499436B2 (en) * | 2011-04-01 | 2016-11-22 | Guardian Industries Corp. | Light scattering coating for greenhouse applications, and/or coated article including the same |
-
2013
- 2013-10-01 US US14/043,282 patent/US9328016B2/en active Active
- 2013-10-01 CN CN201810878040.4A patent/CN109081603A/zh active Pending
- 2013-10-01 EP EP13776668.9A patent/EP2903823B1/en active Active
- 2013-10-01 JP JP2015535731A patent/JP6257103B2/ja active Active
- 2013-10-01 KR KR1020157011553A patent/KR101964492B1/ko active IP Right Grant
- 2013-10-01 CN CN201380051529.XA patent/CN104718071B/zh active Active
- 2013-10-01 KR KR1020197008620A patent/KR102047017B1/ko active IP Right Grant
- 2013-10-01 WO PCT/US2013/062828 patent/WO2014055491A1/en active Application Filing
- 2013-10-02 TW TW102135691A patent/TWI585053B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003527278A (ja) * | 1999-12-30 | 2003-09-16 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 硬さおよび耐磨耗性の付加のための非金属製品上のダイヤモンド様炭素コーティング |
JP2005114649A (ja) * | 2003-10-10 | 2005-04-28 | Citizen Watch Co Ltd | 時計用カバーガラス |
JP2011510904A (ja) * | 2008-02-05 | 2011-04-07 | コーニング インコーポレイテッド | 電子装置のカバープレートとして使用するための耐損傷性ガラス物品 |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11714213B2 (en) | 2013-05-07 | 2023-08-01 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
JP2019508354A (ja) * | 2016-01-18 | 2019-03-28 | コーニング インコーポレイテッド | 改善された触覚表面を有する外囲器 |
JP7291481B2 (ja) | 2016-01-18 | 2023-06-15 | コーニング インコーポレイテッド | 改善された触覚表面を有する外囲器 |
JP2020504842A (ja) * | 2016-12-30 | 2020-02-13 | コーニング インコーポレイテッド | 残留圧縮応力を有する光学コーティングを備えた被覆物品 |
JP7142648B2 (ja) | 2017-01-31 | 2022-09-27 | コーニング インコーポレイテッド | 設計された応力プロファイルを有するコーティングされたガラス系物品 |
JP2020506156A (ja) * | 2017-01-31 | 2020-02-27 | コーニング インコーポレイテッド | 設計された応力プロファイルを有するコーティングされたガラス系物品 |
US11028014B2 (en) | 2017-01-31 | 2021-06-08 | Corning Incorporated | Coated glass-based articles with engineered stress profiles |
JP7324714B2 (ja) | 2017-05-26 | 2023-08-10 | コーニング インコーポレイテッド | 硬さと靭性を有する保護被膜付きガラス、ガラス‐セラミック、及びセラミック物品 |
JP2020521709A (ja) * | 2017-05-26 | 2020-07-27 | コーニング インコーポレイテッド | 硬さと靭性を有する保護被膜付きガラス、ガラス‐セラミック、及びセラミック物品 |
US11230493B2 (en) | 2017-06-20 | 2022-01-25 | Apple Inc. | Interior coatings for glass structures in electronic devices |
JP2022174103A (ja) * | 2017-06-20 | 2022-11-22 | アップル インコーポレイテッド | 電子デバイス内のガラス構造の内部コーティング |
JP2019032511A (ja) * | 2017-06-20 | 2019-02-28 | アップル インコーポレイテッドApple Inc. | 電子デバイス内のガラス構造の内部コーティング |
US11697615B2 (en) | 2017-06-20 | 2023-07-11 | Apple Inc. | Interior coatings for glass structures in electronic devices |
US10556823B2 (en) | 2017-06-20 | 2020-02-11 | Apple Inc. | Interior coatings for glass structures in electronic devices |
JP2020525378A (ja) * | 2017-06-23 | 2020-08-27 | シンマット, インコーポレーテッドSinmat, Inc. | セラミック材料に圧縮応力を印加するための膜 |
JP7401308B2 (ja) | 2017-06-23 | 2023-12-19 | インテグリス・インコーポレーテッド | セラミック材料に圧縮応力を印加するための膜 |
US11906699B2 (en) | 2018-08-17 | 2024-02-20 | Corning Incorporated | Inorganic oxide articles with thin, durable anti reflective structures |
Also Published As
Publication number | Publication date |
---|---|
WO2014055491A1 (en) | 2014-04-10 |
EP2903823A1 (en) | 2015-08-12 |
US9328016B2 (en) | 2016-05-03 |
KR20150067278A (ko) | 2015-06-17 |
KR101964492B1 (ko) | 2019-04-01 |
CN104718071A (zh) | 2015-06-17 |
CN109081603A (zh) | 2018-12-25 |
US20140090864A1 (en) | 2014-04-03 |
TWI585053B (zh) | 2017-06-01 |
KR102047017B1 (ko) | 2019-11-20 |
CN104718071B (zh) | 2018-09-04 |
WO2014055491A9 (en) | 2015-06-18 |
JP6257103B2 (ja) | 2018-01-10 |
EP2903823B1 (en) | 2021-09-22 |
TW201420530A (zh) | 2014-06-01 |
KR20190034708A (ko) | 2019-04-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6257103B2 (ja) | 表面改質ガラス基板 | |
JP6771607B2 (ja) | ガラス表面を保護するための物理蒸着層 | |
JP6815356B2 (ja) | 耐破壊性を有する多層基体、および耐破壊性を有する多層基体を含む物品 | |
CN104955783B (zh) | 带防污膜的透明基体 | |
EP3142979B1 (en) | Durable anti-reflective articles | |
US9703011B2 (en) | Scratch-resistant articles with a gradient layer | |
KR102378656B1 (ko) | 방오막 형성 기체 | |
JP6639101B2 (ja) | 耐引掻性膜、耐引掻性膜を有する基材及びその製造法 | |
US11028471B2 (en) | Sapphire thin film coated substrate | |
US20140131091A1 (en) | Phase transformation coating for improved scratch resistance | |
KR20210091222A (ko) | 광학 필름 구조물, 광학 필름 구조물을 갖는 무기 산화물 물품, 및 이를 제조하는 방법 | |
US11713503B2 (en) | Sapphire coated substrate with a flexible, anti-scratch and multi-layer coating |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160923 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170718 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170720 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20171018 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20171107 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20171204 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6257103 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |