JP2015501296A - メルカプト基を含有する多官能基の多面体オリゴマーシルセスキオキサン化合物及びその組成物、並びにインプリント用ソフトテンプレート - Google Patents
メルカプト基を含有する多官能基の多面体オリゴマーシルセスキオキサン化合物及びその組成物、並びにインプリント用ソフトテンプレート Download PDFInfo
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- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
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CN201110332455.XA CN103087087B (zh) | 2011-10-27 | 2011-10-27 | 含巯基多官能团的低倍多聚硅氧烷化合物及其组合物和压印的软模板 |
CN201110332455.X | 2011-10-27 | ||
PCT/CN2012/000319 WO2013060087A1 (zh) | 2011-10-27 | 2012-03-15 | 含巯基多官能团的低倍多聚硅氧烷化合物及其组合物和压印的软模板 |
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Cited By (2)
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WO2023074312A1 (ja) * | 2021-11-01 | 2023-05-04 | Nok株式会社 | ゴム製品、シール材用の試験治具及び試験装置並びに漏れ検知部材 |
WO2023088803A1 (de) * | 2021-11-22 | 2023-05-25 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Strahlungshärtbare stempelmasse, verwendung der masse und verfahren zur herstellung von gemusterten erzeugnissen |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103279009B (zh) * | 2013-06-14 | 2015-09-30 | 中国科学院光电技术研究所 | 一种柔性紫外光压印复合模板及其制备方法 |
EP3324236B1 (de) | 2013-06-19 | 2024-01-03 | EV Group E. Thallner GmbH | Prägemasse für die prägelithographie |
JP2015071741A (ja) * | 2013-09-04 | 2015-04-16 | Jsr株式会社 | 硬化性組成物、ナノインプリント材料、硬化膜、積層体、硬化膜の製造方法、パターン形成方法及び半導体発光素子用基板 |
JP2017501568A (ja) * | 2013-11-29 | 2017-01-12 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | スタンパ構造を備えたスタンパ並びにその製造方法 |
AT516559B1 (de) * | 2014-12-10 | 2017-12-15 | Joanneum Res Forschungsgmbh | Poly- bzw. Präpolymerzusammensetzung bzw. Prägelack, umfassend eine derartige Zusammensetzung sowie Verwendung derselben |
KR102395936B1 (ko) | 2016-06-16 | 2022-05-11 | 다우 실리콘즈 코포레이션 | 규소-풍부 실세스퀴옥산 수지 |
US20210163802A1 (en) * | 2017-12-14 | 2021-06-03 | 3M Innovative Properties Company | Siloxane-based dual-cure transparent transfer film |
JP2018166222A (ja) * | 2018-07-13 | 2018-10-25 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | スタンパ構造を備えたスタンパ並びにその製造方法 |
CN111944149A (zh) * | 2019-12-10 | 2020-11-17 | 上海函泰电子科技有限公司 | 笼型聚倍半硅氧烷低聚物、压印型光刻胶及其制备方法 |
CN116333317A (zh) * | 2023-02-22 | 2023-06-27 | 安徽中烟工业有限责任公司 | 一种poss基疏水材料及其制备方法 |
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US7433118B2 (en) * | 2003-06-26 | 2008-10-07 | Lucent Technologies Inc. | Bridged polysesquioxane host matrices containing lanthanides chelated by organic guest ligands, and methods of making such matrices |
CN101348385B (zh) * | 2008-08-22 | 2010-09-08 | 东华大学 | 均匀纳米孔SiO2低介电薄膜的制备方法 |
US8535761B2 (en) * | 2009-02-13 | 2013-09-17 | Mayaterials, Inc. | Silsesquioxane derived hard, hydrophobic and thermally stable thin films and coatings for tailorable protective and multi-structured surfaces and interfaces |
CN102174059B (zh) * | 2011-02-23 | 2013-05-01 | 上海交通大学 | 含巯基的低倍多聚硅氧烷化合物及其紫外光刻胶组合物以及压印工艺 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023074312A1 (ja) * | 2021-11-01 | 2023-05-04 | Nok株式会社 | ゴム製品、シール材用の試験治具及び試験装置並びに漏れ検知部材 |
JP7512538B2 (ja) | 2021-11-01 | 2024-07-08 | Nok株式会社 | ゴム製品、シール材用の試験治具及び試験装置並びに漏れ検知部材 |
WO2023088803A1 (de) * | 2021-11-22 | 2023-05-25 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Strahlungshärtbare stempelmasse, verwendung der masse und verfahren zur herstellung von gemusterten erzeugnissen |
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Publication number | Publication date |
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WO2013060087A1 (zh) | 2013-05-02 |
CN103087087A (zh) | 2013-05-08 |
CN103087087B (zh) | 2015-11-25 |
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