JP2015059238A - 成膜装置及び成膜方法 - Google Patents
成膜装置及び成膜方法 Download PDFInfo
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- 238000000151 deposition Methods 0.000 title claims abstract description 10
- 230000008021 deposition Effects 0.000 title abstract description 5
- 238000012545 processing Methods 0.000 claims abstract description 49
- 150000002500 ions Chemical class 0.000 claims abstract description 15
- 239000011810 insulating material Substances 0.000 claims description 55
- 238000000034 method Methods 0.000 claims description 19
- 238000009826 distribution Methods 0.000 abstract description 23
- 238000009413 insulation Methods 0.000 abstract 1
- 239000012774 insulation material Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 238000007789 sealing Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000003028 elevating effect Effects 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- 239000000395 magnesium oxide Substances 0.000 description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 239000011553 magnetic fluid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3417—Arrangements
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- H01J37/32—Gas-filled discharge tubes
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- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02266—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by physical ablation of a target, e.g. sputtering, reactive sputtering, physical vapour deposition or pulsed laser deposition
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- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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Abstract
Description
まず、マッチングボックス25a及び25bから第1高周波電力P1及び第2高周波電力P2の位相をそれぞれ読み取る。次に、所望の位相差φaになるように、読み取った第1高周波電力P1及び第2高周波電力P2の位相の一方を固定しつつ他方をシフトする。次に、第1高周波電源24a及び第2高周波電源24bのうち少なくとも一方に、位相をシフトするように命令を送る。制御装置50によって、位相差φaが、第1絶縁材料の種類に応じて予め定められた値φ1になるように、位相調整器40を制御してもよい。
まず、ウエハWが処理容器12内に搬送され、載置台16上に載置される。次に、排気装置14によって空間Sが所定の圧力に設定される。さらに、駆動機構18によって載置台16が回転される。第1のガス供給部30から処理容器12内にガスが供給され、第1高周波電源24a及び第2高周波電源24bからターゲット20及び22にそれぞれ第1高周波電力P1及び第2高周波電力P2が印加される。さらに、マグネット26a及び26bによって磁界が生成される。そして、生成されたプラズマ中の正イオンがターゲット20及び22に衝突することにより、ターゲット20及び22の表面から第1絶縁材料が放出され、放出された第1絶縁材料がウエハW上に堆積する。成膜の際に、シャッタ32は領域R2に配置される(図2参照)。
Claims (5)
- 処理容器と、
前記処理容器内を減圧するための排気装置と、
被処理体を載置するための載置台であり、前記処理容器内に設けられた前記載置台と、
前記載置台の上方に設けられ、第1絶縁材料製の第1及び第2ターゲットと、
前記処理容器内にガスを供給するガス供給部と、
前記ガス供給部から供給されるガス中の正イオンを前記第1ターゲットに衝突させるための第1高周波電力を発生する第1高周波電源と、
前記ガス供給部から供給されるガス中の正イオンを前記第2ターゲットに衝突させるための第2高周波電力を発生する第2高周波電源と、
前記第1高周波電力と前記第2高周波電力との間の位相差を調整する位相調整器と、
を備える、成膜装置。 - 前記載置台の上方に設けられ、前記第1絶縁材料とは異なる第2絶縁材料製の第3及び第4ターゲットと、
前記ガス供給部から供給されるガス中の正イオンを前記第3ターゲットに衝突させるための第3高周波電力を発生する第3高周波電源と、
前記ガス供給部から供給されるガス中の正イオンを前記第4ターゲットに衝突させるための第4高周波電力を発生する第4高周波電源と、
を更に備え、
前記位相調整器が、前記第3高周波電力と前記第4高周波電力との間の位相差を調整する、請求項1に記載の成膜装置。 - 前記第1高周波電力と前記第2高周波電力との間の位相差が、前記第1絶縁材料の種類に応じて予め定められた値になるように、前記位相調整器を制御する制御装置を更に備える、請求項1又は2に記載の成膜装置。
- 請求項1に記載された成膜装置を用いた成膜方法であって、
前記位相調整器によって、前記第1高周波電力と前記第2高周波電力との間の位相差を調整する工程と、
前記位相差を調整した後、前記被処理体上に、前記第1及び第2ターゲットから放出される前記第1絶縁材料を堆積させる工程と、
を含む、成膜方法。 - 前記位相差を調整する工程では、前記第1高周波電力と前記第2高周波電力との間の位相差が、前記第1絶縁材料の種類に応じて予め定められた値になるように、前記位相調整器を制御する、請求項4に記載の成膜方法。
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JP2013193310A JP6163064B2 (ja) | 2013-09-18 | 2013-09-18 | 成膜装置及び成膜方法 |
KR1020140123660A KR101716547B1 (ko) | 2013-09-18 | 2014-09-17 | 성막 장치 및 성막 방법 |
US14/490,410 US9567667B2 (en) | 2013-09-18 | 2014-09-18 | Dual-target sputter deposition with controlled phase difference between target powers |
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JP2016211063A (ja) * | 2015-05-13 | 2016-12-15 | 株式会社アルバック | スパッタ方法、および、スパッタ装置 |
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US9564348B2 (en) * | 2013-03-15 | 2017-02-07 | Applied Materials, Inc. | Shutter blade and robot blade with CTE compensation |
US9660187B1 (en) * | 2015-10-29 | 2017-05-23 | Samsung Electronics Co., Ltd. | Methods of forming a layer and methods of manufacturing magnetic memory devices using the same |
CN108060406B (zh) * | 2018-01-29 | 2023-09-08 | 北京北方华创微电子装备有限公司 | 遮挡压盘组件、半导体加工装置和方法 |
KR102500219B1 (ko) * | 2018-05-12 | 2023-02-14 | 어플라이드 머티어리얼스, 인코포레이티드 | 통합된 셔터 개라지를 갖는 사전-세정 챔버 |
CN116940705B (zh) * | 2021-07-16 | 2024-03-08 | 株式会社爱发科 | 成膜方法和成膜装置 |
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JP2016211063A (ja) * | 2015-05-13 | 2016-12-15 | 株式会社アルバック | スパッタ方法、および、スパッタ装置 |
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US20150075971A1 (en) | 2015-03-19 |
JP6163064B2 (ja) | 2017-07-12 |
US9567667B2 (en) | 2017-02-14 |
KR20150032498A (ko) | 2015-03-26 |
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