JP2014515787A - 透明なバリア層系を析出する方法 - Google Patents
透明なバリア層系を析出する方法 Download PDFInfo
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- JP2014515787A JP2014515787A JP2014505545A JP2014505545A JP2014515787A JP 2014515787 A JP2014515787 A JP 2014515787A JP 2014505545 A JP2014505545 A JP 2014505545A JP 2014505545 A JP2014505545 A JP 2014505545A JP 2014515787 A JP2014515787 A JP 2014515787A
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- Prior art keywords
- layer
- barrier
- barrier layer
- vacuum chamber
- transparent
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
種々の電子構造群において使用される電気活性材料はしばしば、湿気および空気中の酸素に対して高い感度を有する。これらの材料を保護するために、このような構造群をカプセル封入することが公知である。これは一つには、保護層を、保護されるべき材料上に直接的に析出することによって、ないしは、構造群を付加的な構成部分によって覆うことによって行われる。従って、例えば太陽電池はしばしばガラスによって湿気および別の外部影響から保護される。軽量化のためおよび設計に関する付加的な自由度も実現するために、カプセル封入にプラスチックフィルムも使用される。このようなプラスチックフィルムは、充分な保護作用のためにコーティングされなければならない。従ってプラスチックフィルムの上に、少なくとも1つのいわゆる浸透阻止層(以降で、バリア層とも称される)が析出される。
plasma enhanced chemical vapor deposition)が用いられる。これは、種々の基板のコーティング時に、種々の層材料に使用可能である。例えば、13μmのPET基板上に20〜30nmの厚さのSiO2層およびSi3N4層を析出することが公知である(A.S. da Silva Sobrinho等著、「J.Vac.Sci.Technol. (A16(6), Nov/Dec 1998 第3190〜3198頁)」を参照)。このようにして、10Paの動作圧力のもとで、WVTR=0.3g/m2dおよびOTR=0.5cm3/m2dの浸透率が実現される。
従って本発明の技術的な課題は、従来技術のこれらの欠点を克服する方法を実現することである。殊にこの方法を用いて、酸素および水蒸気に対する高い遮断効果と高いコーティング速度を有する透明なバリア層系を製造することが可能になるべきである。
Claims (7)
- 透明なバリア層系を製造する方法であって、
真空チャンバ内で、透明なプラスチックフィルム上に、少なくとも2つの透明なバリア層と、前記2つのバリア層の間に配置される1つの透明な中間層とを析出する方法において、
前記バリア層を析出するためにアルミニウムを気化させ、同時に、少なくとも1つの第1の反応性ガスを前記真空チャンバ内に供給し、
前記中間層を析出するためにアルミニウムを気化させ、同時に、少なくとも1つの第2の反応性ガスとガス状または蒸気状の有機成分を前記真空チャンバ内に供給する、
ことを特徴とする方法。 - 前記バリア層と前記第2の層を繰り返し交互に析出する、請求項1記載の方法。
- 酸素および/または窒素を第1の反応性ガスおよび/または第2の反応性ガスとして使用する、請求項1または2記載の方法。
- プラズマの存在下で、前記バリア層の析出および/または前記第2の層の析出を前記真空チャンバ内で行う、請求項1から3までのいずれか1項記載の方法。
- ホロー陰極プラズマまたはマイクロ波プラズマをプラズマとして使用する、請求項4記載の方法。
- シリコン含有先駆物質をガス状または蒸気状の有機成分として前記真空チャンバ内に供給する、請求項1から5までのいずれか1項記載の方法。
- HMDSO、HMDSNまたはTEOSを先駆物質として使用する、請求項6記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011017404A DE102011017404A1 (de) | 2011-04-18 | 2011-04-18 | Verfahren zum Abscheiden eines transparenten Barriereschichtsystems |
DE102011017404.4 | 2011-04-18 | ||
PCT/EP2012/052537 WO2012143149A1 (de) | 2011-04-18 | 2012-02-15 | Verfahren zum abscheiden eines transparenten barriereschichtsystems |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014515787A true JP2014515787A (ja) | 2014-07-03 |
JP5930340B2 JP5930340B2 (ja) | 2016-06-08 |
Family
ID=45774166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014505545A Expired - Fee Related JP5930340B2 (ja) | 2011-04-18 | 2012-02-15 | 透明なバリア層系を析出する方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20130302536A1 (ja) |
EP (1) | EP2699705B1 (ja) |
JP (1) | JP5930340B2 (ja) |
DE (1) | DE102011017404A1 (ja) |
MX (1) | MX2013008814A (ja) |
RU (1) | RU2590745C2 (ja) |
WO (1) | WO2012143149A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011017403A1 (de) * | 2011-04-18 | 2012-10-18 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Abscheiden eines transparenten Barriereschichtsystems |
JP6349812B2 (ja) * | 2014-03-17 | 2018-07-04 | 凸版印刷株式会社 | セラミック層蒸着フィルムの製造方法、及びセラミック層蒸着フィルム |
EP3658697A1 (de) * | 2017-07-26 | 2020-06-03 | Saint-Gobain Glass France | Beschichtung mit diamantähnlichem kohlenstoff über ein pecvd-magnetron-verfahren |
Citations (10)
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JP2006297730A (ja) * | 2005-04-20 | 2006-11-02 | Dainippon Printing Co Ltd | ガスバリア性積層体 |
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US5916685A (en) * | 1996-07-09 | 1999-06-29 | Tetra Laval Holdings & Finance, Sa | Transparent high barrier multilayer structure |
DE19849205A1 (de) * | 1998-10-26 | 2000-04-27 | Leybold Systems Gmbh | Transparentes Barriereschichtensystem |
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2011
- 2011-04-18 DE DE102011017404A patent/DE102011017404A1/de not_active Withdrawn
-
2012
- 2012-02-15 EP EP12706510.0A patent/EP2699705B1/de active Active
- 2012-02-15 RU RU2013136554/02A patent/RU2590745C2/ru not_active IP Right Cessation
- 2012-02-15 MX MX2013008814A patent/MX2013008814A/es not_active Application Discontinuation
- 2012-02-15 US US13/980,257 patent/US20130302536A1/en not_active Abandoned
- 2012-02-15 WO PCT/EP2012/052537 patent/WO2012143149A1/de active Application Filing
- 2012-02-15 JP JP2014505545A patent/JP5930340B2/ja not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
---|---|
DE102011017404A1 (de) | 2012-10-18 |
EP2699705B1 (de) | 2019-04-10 |
MX2013008814A (es) | 2013-11-01 |
US20130302536A1 (en) | 2013-11-14 |
WO2012143149A1 (de) | 2012-10-26 |
RU2013136554A (ru) | 2015-02-10 |
EP2699705A1 (de) | 2014-02-26 |
RU2590745C2 (ru) | 2016-07-10 |
JP5930340B2 (ja) | 2016-06-08 |
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