JP2011128173A - Mems actuator - Google Patents

Mems actuator Download PDF

Info

Publication number
JP2011128173A
JP2011128173A JP2008105333A JP2008105333A JP2011128173A JP 2011128173 A JP2011128173 A JP 2011128173A JP 2008105333 A JP2008105333 A JP 2008105333A JP 2008105333 A JP2008105333 A JP 2008105333A JP 2011128173 A JP2011128173 A JP 2011128173A
Authority
JP
Japan
Prior art keywords
axis
movable part
coil
movable
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2008105333A
Other languages
Japanese (ja)
Inventor
Masataka Yamaguchi
征隆 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Precision Products Co Ltd
Original Assignee
Sumitomo Precision Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Precision Products Co Ltd filed Critical Sumitomo Precision Products Co Ltd
Priority to JP2008105333A priority Critical patent/JP2011128173A/en
Priority to PCT/JP2009/057578 priority patent/WO2009128473A1/en
Publication of JP2011128173A publication Critical patent/JP2011128173A/en
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K33/00—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system
    • H02K33/16—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system with polarised armatures moving in alternate directions by reversal or energisation of a single coil system
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K33/00—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system
    • H02K33/18—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system with coil systems moving upon intermittent or reversed energisation thereof by interaction with a fixed field system, e.g. permanent magnets

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Micromachines (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Reciprocating, Oscillating Or Vibrating Motors (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an MEMS actuator which can be reduced size at least in one direction and can perform two-dimensional scanning of laser light or the like. <P>SOLUTION: The size of the MEMS actuator 1 viewing from the normal line direction of the first movable part 21 can be reduced by arranging second fixed parts 32, 33 which support a second movable part 31 which rocks around a second axis line Y wherein first fixed parts 22, 23 which support a first movable part 21 which rocks around a first axis line X, are laminated, inside the second movable part 31, or in linkage with a narrowed part 312A of the second movable part 31. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、ＭＥＭＳ（Micro Electro Mechanical Systems）技術を用いて作製される、レーザ光等の２次元走査が可能なＭＥＭＳアクチュエータに関する。   The present invention relates to a MEMS actuator capable of two-dimensional scanning of laser light or the like, which is manufactured using MEMS (Micro Electro Mechanical Systems) technology.

２次元走査が可能なＭＥＭＳアクチュエータとして、特許文献１及び２に記載のように、半導体基板から構成されたジンバル構造の基材部を備えたものが知られている。   2. Description of the Related Art As a MEMS actuator capable of two-dimensional scanning, one having a base part having a gimbal structure composed of a semiconductor substrate is known as described in Patent Documents 1 and 2.

図１１は、特許文献１に記載のＭＥＭＳアクチュエータ１００の構成を示す図である。図１１に示すように、特許文献１のジンバル構造の基材部１１０は、第１可動部１１１と、第２可動部１１２と、固定部１１３（以下、「第２固定部１１３」という）と、第１支持部１１４と、第２支持部１１５とを備えている。第１可動部１１１は、レーザ光等の反射面として機能する。第２可動部１１２は、第１可動部１１１を囲うように第１可動部１１１の外側に配置されている。第２固定部１１３は、第２可動部１１２を囲うように第２可動部１１２の外側に配置されている。第１支持部１１４は、第２可動部１１２に対して第１可動部１１１を、基材部１１０が存在する平面内に含まれた第１軸線（図１１の一点鎖線Ｒで示す軸線）周りに揺動可能に支持している。第２支持部１１５は、第２固定部１１３に対して第２可動部１１２を、基材部１１０が存在する平面内に含まれ、且つ、第１軸線Ｒと直交する第２軸線（図１１の一点鎖線Ｓで示す軸線）周りに揺動可能に支持している。   FIG. 11 is a diagram illustrating a configuration of the MEMS actuator 100 described in Patent Document 1. As illustrated in FIG. As shown in FIG. 11, the base part 110 having a gimbal structure in Patent Document 1 includes a first movable part 111, a second movable part 112, and a fixed part 113 (hereinafter referred to as “second fixed part 113”). The 1st support part 114 and the 2nd support part 115 are provided. The first movable portion 111 functions as a reflection surface for laser light or the like. The second movable part 112 is disposed outside the first movable part 111 so as to surround the first movable part 111. The second fixed portion 113 is disposed outside the second movable portion 112 so as to surround the second movable portion 112. The first support portion 114 has the first movable portion 111 around the first axis included in the plane in which the base material portion 110 exists (the axis indicated by the one-dot chain line R in FIG. 11) with respect to the second movable portion 112. It is supported so that it can swing. The second support part 115 includes the second movable part 112 with respect to the second fixed part 113 in a plane in which the base part 110 exists, and a second axis perpendicular to the first axis R (FIG. 11). Is supported so as to be swingable around the axis indicated by the alternate long and short dash line S).

以上に説明した特許文献１に記載のＭＥＭＳアクチュエータ１００において、第１可動部１１１を第１軸線Ｒ周りに揺動させ、第２可動部１１２を第２軸線Ｓ周りに揺動させると、第１可動部１１１は、第１軸線Ｒと第２軸線Ｓとの２つの軸線周りに揺動する。従って、特許文献１に記載のＭＥＭＳアクチュエータ１００は、レーザ光等の２次元走査をすることができる。   In the MEMS actuator 100 described in Patent Document 1 described above, when the first movable part 111 is swung around the first axis R and the second movable part 112 is swung around the second axis S, the first The movable portion 111 swings around two axes, the first axis R and the second axis S. Therefore, the MEMS actuator 100 described in Patent Document 1 can perform two-dimensional scanning with a laser beam or the like.

一方、図１２は、特許文献２に記載のＭＥＭＳアクチュエータ２００の構成を示す図である。図１２に示すように、特許文献２のジンバル構造の基材部２１０においては、第２可動部２１２の破線Ｐで示した部位に第１固定部２１６が積層され、第１可動部２１１が、第１支持部２１４によって、第１固定部２１６に対して第１軸線周りに揺動可能に支持されている。この点が、特許文献１のジンバル構造の基材部１１０と異なっている。特許文献２に記載のＭＥＭＳアクチュエータ２００においても、第１可動部２１１を第１軸線周りに揺動させ、第２可動部２１２を第２軸線周りに揺動させると、第１可動部２１１は、第１軸線と第２軸線との２つの軸線周りに揺動する。従って、特許文献２に記載のＭＥＭＳアクチュエータ２００も、レーザ光等の２次元走査をすることができる。   On the other hand, FIG. 12 is a diagram showing a configuration of the MEMS actuator 200 described in Patent Document 2. As shown in FIG. 12, in the base material part 210 of the gimbal structure of Patent Document 2, the first fixed part 216 is laminated at the site indicated by the broken line P of the second movable part 212, and the first movable part 211 is The first support portion 214 is supported so as to be swingable around the first axis with respect to the first fixed portion 216. This point is different from the base material part 110 having the gimbal structure of Patent Document 1. Also in the MEMS actuator 200 described in Patent Document 2, when the first movable portion 211 is swung around the first axis and the second movable portion 212 is swung around the second axis, the first movable portion 211 is It swings around two axes, the first axis and the second axis. Therefore, the MEMS actuator 200 described in Patent Document 2 can also perform two-dimensional scanning with laser light or the like.

このような２次元走査が可能なＭＥＭＳアクチュエータは、レーザ光を走査するレーザ光走査装置の部品として用いられている。レーザ光走査装置においては、光源又は光源からの光を反射面に導くための光学系が反射面の法線方向に、該反射面に対して離間して設けられる。このため、レーザ光走査装置においては、反射面の法線方向の寸法が必然的に大きくなる。また、特許文献１及び２に記載のＭＥＭＳアクチュエータは、第２固定部が第２可動部の外側に配置されているため、反射面となる第１可動部の法線方向と直交する第１軸線方向、及び、第２軸線方向の寸法が必然的に大きくなる。このため、特許文献１及び２に記載のＭＥＭＳアクチュエータが用いられたレーザ光走査装置は、反射面の法線方向だけでなく、該法線方向と直交する第１軸線方向、及び、第２軸線方向の何れの方向においても、寸法が必然的に大きくなる。
特開平８−３２２２２７号 特開２００４−１９８６４８号 Such a MEMS actuator capable of two-dimensional scanning is used as a component of a laser beam scanning device that scans a laser beam. In the laser beam scanning device, a light source or an optical system for guiding light from the light source to the reflecting surface is provided in the normal direction of the reflecting surface and spaced from the reflecting surface. For this reason, in the laser beam scanning device, the dimension of the reflecting surface in the normal direction is inevitably increased. Moreover, since the 2nd fixed part is arrange | positioned outside the 2nd movable part, the 1st axis line orthogonal to the normal line direction of the 1st movable part used as a reflective surface is the MEMS actuator of patent document 1 and 2 arrange | positioned. The direction and the dimension in the second axial direction are necessarily increased. For this reason, the laser beam scanning device in which the MEMS actuators described in Patent Documents 1 and 2 are used includes not only the normal direction of the reflecting surface but also the first axis direction and the second axis line orthogonal to the normal direction. In any direction, the dimensions inevitably increase.
JP-A-8-322227 JP 2004-198648 A

レーザ光走査装置を昨今の携帯電話等の薄型又は小型の機器に実装して、プロジェクター等として使用する場合を考えると、前述のレーザ光走査装置では、反射面の法線方向、第１軸線方向、及び、第２軸線方向の何れの方向においても寸法が大きくなるため、薄型又は小型の機器に充分に対応できないという問題がある。レーザ光走査装置を薄型又は小型の機器に充分に対応させるためには、どのような配置で取り付けるかに依存するものの、レーザ光走査装置の少なくとも一方向の寸法については、小さくすることが望ましい。換言すれば、ＭＥＭＳアクチュエータの第１軸線方向及び第２軸線方向の少なくとも何れか一方の寸法を小さくすることが望ましい。   Considering the case where the laser beam scanning device is mounted on a thin or small device such as a mobile phone and used as a projector or the like, in the laser beam scanning device described above, the normal direction of the reflecting surface, the first axis direction In addition, since the dimension increases in any direction of the second axis direction, there is a problem that it cannot sufficiently cope with a thin or small device. In order to make the laser beam scanning device sufficiently compatible with thin or small devices, it is desirable to reduce the size of at least one direction of the laser beam scanning device, although it depends on the arrangement. In other words, it is desirable to reduce the size of at least one of the first axial direction and the second axial direction of the MEMS actuator.

そこで、本発明は、少なくとも一方向の寸法を小さくすることができるＭＥＭＳアクチュエータを提供することを目的とする。   Accordingly, an object of the present invention is to provide a MEMS actuator capable of reducing a dimension in at least one direction.

本発明は、第１の手段として、第１基板と、前記第１基板の片面に積層される第２基板とを備え、前記第１基板は、第１固定部と、第１可動部と、前記第１固定部に対して前記第１可動部を第１軸線周りに揺動可能に支持する第１支持部とを有し、前記第２基板は、前記第１固定部が積層され、内側に空間部が形成された第２可動部と、前記空間部に配置される第２固定部と、前記第２固定部に対して前記第２可動部を前記第１軸線と方向が異なる第２軸線周りに揺動可能に支持する第２支持部とを有することを特徴とするＭＥＭＳアクチュエータを提供する。   The present invention comprises as a first means a first substrate and a second substrate laminated on one side of the first substrate, the first substrate comprising a first fixed portion, a first movable portion, A first support portion that supports the first movable portion so as to be swingable about a first axis with respect to the first fixed portion, and the second substrate includes the first fixed portion stacked therein, A second movable portion having a space portion formed therein, a second fixed portion disposed in the space portion, and a second direction different from the first axis with respect to the second movable portion relative to the second fixed portion. There is provided a MEMS actuator having a second support portion that is swingably supported around an axis.

第１の手段として提供されるＭＥＭＳアクチュエータにおいては、第２固定部は、第２可動部の内側に形成された空間部に配置されている。即ち、第２固定部は、第２可動部の内側に配置されている。このように、第２固定部が第２可動部の内側に配置されるので、第１の手段として提供されるＭＥＭＳアクチュエータは、第１可動部の法線方向から見たときにおける寸法を小さくすることが可能である。このため、第１の手段として提供されるＭＥＭＳアクチュエータを、例えば、レーザ光走査装置に用いると、該レーザ光走査装置の第１可動部の法線方向と直交する方向の寸法を小さくすることができる。従って、第１の手段として提供されるＭＥＭＳアクチュエータを用いたレーザ光走査装置は、薄型又は小型の機器への実装に適する。   In the MEMS actuator provided as the first means, the second fixed portion is disposed in a space portion formed inside the second movable portion. In other words, the second fixed portion is disposed inside the second movable portion. Thus, since the 2nd fixed part is arranged inside the 2nd movable part, the MEMS actuator provided as the 1st means reduces the size when it sees from the normal line direction of the 1st movable part. It is possible. For this reason, when the MEMS actuator provided as the first means is used in, for example, a laser beam scanning device, the dimension in the direction perpendicular to the normal direction of the first movable portion of the laser beam scanning device can be reduced. it can. Therefore, the laser beam scanning device using the MEMS actuator provided as the first means is suitable for mounting on a thin or small device.

本発明は、第２の手段として、第１基板と、前記第１基板の片面に積層される第２基板とを備え、前記第１基板は、第１固定部と、第１可動部と、前記第１固定部に対して前記第１可動部を第１軸線周りに揺動可能に支持する第１支持部とを有し、前記第２基板は、前記第１固定部が積層され、且つ、前記第１軸線と直交する方向の幅が狭まった狭小部分を具備する第２可動部と、第２固定部と、前記狭小部分と前記第２固定部とを連結し、前記第２固定部に対して前記第２可動部を前記第１軸線と方向が異なる第２軸線周りに揺動可能に支持する第２支持部とを有することを特徴とするＭＥＭＳアクチュエータを提供する。   The present invention includes, as a second means, a first substrate and a second substrate stacked on one side of the first substrate, the first substrate including a first fixed portion, a first movable portion, A first support portion that supports the first movable portion so as to be swingable about a first axis with respect to the first fixed portion, and the second substrate has the first fixed portion laminated thereon, and A second movable part having a narrow part with a narrow width in a direction orthogonal to the first axis, a second fixed part, the narrow part and the second fixed part, and the second fixed part In contrast, the present invention provides a MEMS actuator comprising: a second support part which supports the second movable part so as to be swingable around a second axis whose direction is different from that of the first axis.

第２の手段として提供されるＭＥＭＳアクチュエータにおいては、第２固定部は、第２可動部の狭小部分と連結されている。よって、第２可動部に狭小部分を形成することによって生まれた空間部に、第２固定部を配置することができる。このような空間部に、第２固定部を配置できるので、第２の手段として提供されるＭＥＭＳアクチュエータは、第１可動部の法線方向から見たときにおける寸法を小さくすることが可能である。このため、第２の手段として提供されるＭＥＭＳアクチュエータを、例えば、レーザ光走査装置に用いると、該レーザ光走査装置の第１可動部の法線方向と直交する方向の寸法を小さくすることができる。従って、第２の手段として提供されるＭＥＭＳアクチュエータを用いたレーザ光走査装置は、薄型又は小型の機器への実装に適する。   In the MEMS actuator provided as the second means, the second fixed portion is connected to the narrow portion of the second movable portion. Therefore, a 2nd fixing | fixed part can be arrange | positioned in the space part produced by forming a narrow part in a 2nd movable part. Since the second fixed portion can be disposed in such a space portion, the MEMS actuator provided as the second means can be reduced in size when viewed from the normal direction of the first movable portion. . For this reason, when the MEMS actuator provided as the second means is used in, for example, a laser beam scanning device, the dimension in the direction perpendicular to the normal direction of the first movable portion of the laser beam scanning device can be reduced. it can. Therefore, the laser beam scanning device using the MEMS actuator provided as the second means is suitable for mounting on a thin or small device.

また、第１の手段及び第２の手段として提供されるＭＥＭＳアクチュエータの具体的な構成として、前記第１可動部に敷設される第１コイルと、前記第１可動部の法線方向から見て、前記第１可動部と異なる前記第２可動部の部位に敷設される第２コイルと、前記第１可動部の法線方向に前記第１可動部に対して離間して配置され、前記第１コイルに磁界を及ぼして、前記第１コイルに前記第１可動部の法線方向の電磁力を発生させることによって、前記第１可動部を前記第１軸線周りに揺動させる第１磁界発生手段と、前記第１軸線方向に前記第２可動部に対して離間して配置され、前記第２コイルに磁界を及ぼして、前記第２コイルに前記第２可動部の法線方向の電磁力を発生させることによって、前記第２可動部を前記第２軸線周りに揺動させる第２磁界発生手段とを備える構成を挙げることができる。   Further, as a specific configuration of the MEMS actuator provided as the first means and the second means, the first coil laid on the first movable portion and the normal direction of the first movable portion are viewed. A second coil laid in a part of the second movable part different from the first movable part, and a second coil arranged in a normal direction of the first movable part and spaced apart from the first movable part, A first magnetic field is generated by causing a magnetic field to be exerted on one coil and causing the first coil to generate an electromagnetic force in a normal direction of the first movable part, thereby swinging the first movable part around the first axis. And electromagnetic force in the normal direction of the second movable part, the magnetic field being exerted on the second coil by being spaced apart from the second movable part in the first axial direction. By generating the second movable portion around the second axis. It can be mentioned structure and a second magnetic field generating means for moving.

かかる構成においては、第１コイルに発生する電磁力によって、第１可動部が第１軸線周りに揺動し、第２コイルに発生する電磁力によって、第２可動部が第２軸線周りに揺動する。第１コイルに電磁力を発生させる第１磁界発生手段は、第１可動部の法線方向に第１可動部に対して離間して配置されている。第２コイルに電磁力を発生させる第２磁界発生手段は、第１軸線方向に第２可動部に対して離間して配置されている。よって、かかる構成によれば、第１可動部の揺動を電磁力により行うＭＥＭＳアクチュエータの第２軸線方向の寸法を小さくすることができる。このため、かかる構成のＭＥＭＳアクチュエータを、例えば、レーザ光走査装置に用いると、該レーザ光走査装置の第２軸線方向の寸法を小さくすることができる。従って、かかる構成のＭＥＭＳアクチュエータを用いたレーザ光走査装置は、薄型又は小型の機器への実装に適する。   In such a configuration, the first movable part swings around the first axis due to the electromagnetic force generated in the first coil, and the second movable part swings around the second axis due to the electromagnetic force generated in the second coil. Move. The first magnetic field generating means for generating the electromagnetic force in the first coil is disposed away from the first movable part in the normal direction of the first movable part. The second magnetic field generating means for generating the electromagnetic force in the second coil is disposed away from the second movable part in the first axial direction. Therefore, according to such a configuration, it is possible to reduce the dimension in the second axis direction of the MEMS actuator that swings the first movable portion by electromagnetic force. For this reason, when the MEMS actuator having such a configuration is used in, for example, a laser beam scanning device, the size of the laser beam scanning device in the second axis direction can be reduced. Therefore, the laser beam scanning device using the MEMS actuator having such a configuration is suitable for mounting on a thin or small device.

また、第１の手段及び第２の手段として提供されるＭＥＭＳアクチュエータの具体的な構成として前記第１可動部に敷設される第１コイルと、前記第１可動部の法線方向から見て、前記第１可動部と異なる前記第２可動部の部位に敷設される第２コイルと、前記第１可動部の法線方向に前記第１可動部に対して離間して配置され、前記第１コイルに磁界を及ぼして、前記第１コイルに前記第１可動部の法線方向の電磁力を発生させることによって、前記第１可動部を前記第１軸線周りに揺動させる第１磁界発生手段と、前記第２可動部の法線方向に前記第２可動部に対して離間して配置され、前記第２コイルに磁界を及ぼして、前記第２コイルに前記第２可動部の法線方向の電磁力を発生させることによって、前記第２可動部を前記第２軸線周りに揺動させる第２磁界発生手段とを備える構成を挙げることができる。   Further, as a specific configuration of the MEMS actuator provided as the first means and the second means, a first coil laid on the first movable part, and a normal direction of the first movable part, A second coil laid at a site of the second movable part different from the first movable part, and a second coil disposed in a normal direction of the first movable part and spaced apart from the first movable part; First magnetic field generating means for swinging the first movable part around the first axis by applying a magnetic field to the coil and generating an electromagnetic force in the normal direction of the first movable part on the first coil. And in the normal direction of the second movable part, spaced apart from the second movable part, exerting a magnetic field on the second coil, and the normal direction of the second movable part on the second coil By generating the electromagnetic force, the second movable part is moved to the second axis. It can be mentioned structure and a second magnetic field generating means for linear oscillating.

かかる構成においては、前述の構成と同様に、第１コイルに発生する電磁力によって、第１可動部が第１軸線周りに揺動し、第２コイルに発生する電磁力によって、第２可動部が第２軸線周りに揺動する。第１コイルに電磁力を発生させる第１磁界発生手段は、第１可動部の法線方向に第１可動部に対して離間して配置されている。第２コイルに電磁力を発生させる第２磁界発生手段は、第２可動部の法線方向に第２コイルに対して離間して配置されている。よって、かかる構成によれば、第１可動部の揺動を電磁力により行うＭＥＭＳアクチュエータの第１軸線方向及び第２軸線方向の両方向の寸法を小さくすることができる。このため、かかる構成のＭＥＭＳアクチュエータを、例えば、レーザ光走査装置に用いると、該レーザ光走査装置の第１軸線方向及び第２軸線方向の両方向の寸法を小さくすることができる。従って、かかる構成のＭＥＭＳアクチュエータを用いたレーザ光走査装置は、薄型又は小型の機器への実装により一層適する。   In such a configuration, similarly to the above-described configuration, the first movable portion swings around the first axis due to the electromagnetic force generated in the first coil, and the second movable portion due to the electromagnetic force generated in the second coil. Swings around the second axis. The first magnetic field generating means for generating the electromagnetic force in the first coil is disposed away from the first movable part in the normal direction of the first movable part. The second magnetic field generating means for generating the electromagnetic force in the second coil is disposed away from the second coil in the normal direction of the second movable part. Therefore, according to such a configuration, it is possible to reduce the dimensions in both the first and second axial directions of the MEMS actuator that swings the first movable portion by electromagnetic force. For this reason, when the MEMS actuator having such a configuration is used in, for example, a laser beam scanning apparatus, the dimensions of the laser beam scanning apparatus in both the first axis direction and the second axis direction can be reduced. Therefore, the laser beam scanning device using the MEMS actuator having such a configuration is more suitable for mounting on a thin or small device.

本発明は、少なくとも一方向の寸法を小さくすることができるＭＥＭＳアクチュエータを提供することができる。   The present invention can provide a MEMS actuator capable of reducing a dimension in at least one direction.

図１は、本実施形態に係るＭＥＭＳアクチュエータ１が備える第１基板２及び第２基板３の全体斜視図である。図１に示すように、第２基板３は、第１基板２の片面に積層されている。尚、以下においては、説明の便宜上、第１基板２及び第２基板３の法線方向のうち第１基板２側を上方向とし、第２基板３側を下方向とする。図２は、第１基板２及び第２基板３の分解斜視図である。   FIG. 1 is an overall perspective view of the first substrate 2 and the second substrate 3 provided in the MEMS actuator 1 according to the present embodiment. As shown in FIG. 1, the second substrate 3 is laminated on one side of the first substrate 2. In the following, for convenience of explanation, of the normal directions of the first substrate 2 and the second substrate 3, the first substrate 2 side is defined as the upward direction, and the second substrate 3 side is defined as the downward direction. FIG. 2 is an exploded perspective view of the first substrate 2 and the second substrate 3.

図２に示すように、第１基板２は、第１可動部２１と、第１固定部２２、２３と、第１支持部２４、２５とを備える。第１可動部２１と、第１固定部２２、２３と、第１支持部２４、２５とは、それぞれ、一点鎖線Ｘで示す第１基板２が含まれる平面内に位置する第１軸線上に配置されている。第１可動部２１は、第１基板２の第１軸線Ｘ方向の中央部に配置されている。第１可動部２１は、円板状に形成されている。第１固定部２２、２３のうち、第１固定部２２は、第１軸線Ｘ方向の一方側に第１可動部２１に対して離間して配置され、第１固定部２３は、第１軸線Ｘ方向の他方側に第１可動部２１に対して離間して配置されている。第１支持部２４、２５のうち、第１支持部２４は、第１固定部２２に対して第１可動部２１を第１軸線Ｘ周りに揺動可能に支持する。この第１支持部２４は、第１可動部２１の第１軸線Ｘ方向の一方側の端部と、第１固定部２２とに接続されている。また、第１支持部２５は、第１固定部２３に対して第１可動部２１を第１軸線Ｘ周りに揺動可能に支持する。この第１支持部２５は、第１可動部２１の第１軸線Ｘ方向の他方側の端部と第１固定部２３とに接続されている。   As shown in FIG. 2, the first substrate 2 includes a first movable portion 21, first fixed portions 22 and 23, and first support portions 24 and 25. The first movable portion 21, the first fixed portions 22, 23, and the first support portions 24, 25 are each on a first axis located in a plane that includes the first substrate 2 indicated by a one-dot chain line X. Has been placed. The first movable portion 21 is disposed at the central portion of the first substrate 2 in the first axis X direction. The 1st movable part 21 is formed in disk shape. Of the first fixed portions 22 and 23, the first fixed portion 22 is disposed on one side in the first axis X direction so as to be separated from the first movable portion 21, and the first fixed portion 23 is the first axis. The other side in the X direction is spaced from the first movable portion 21. Of the first support parts 24, 25, the first support part 24 supports the first movable part 21 so as to be swingable about the first axis X with respect to the first fixed part 22. The first support portion 24 is connected to one end of the first movable portion 21 in the first axis X direction and the first fixed portion 22. The first support portion 25 supports the first movable portion 21 so as to be swingable about the first axis X with respect to the first fixed portion 23. The first support portion 25 is connected to the other end portion of the first movable portion 21 in the first axis X direction and the first fixed portion 23.

以上のような構成の第１基板２において、第１可動部２１の上面に、第１コイル５が敷設されている。この第１コイル５は、第１可動部２１の中央部を除いた部分において、渦状に敷設されている。第１コイル５が敷設されていない第１可動部２１の上面の中央部において、レーザ光等を反射させることができる。また、第１コイル５上には、レーザ光等を反射させるためのミラーを形成してもよい。このようなミラーを形成することで、第１コイル５が敷設されても、第１可動部２１においてレーザ光等を反射させることができる。尚、第１コイル５は、第１可動部２１の下面、又は、上下両面に敷設されてもよい。また、第１固定部２２には電極５１が、第１固定部２３には電極５２が形成されている。第１支持部２４には、第１固定部２２に形成された電極５１と第１コイル５の一端部とを接続する導線膜５３が、第１支持部２５には、第１固定部２３に形成された電極５２と第１コイル５の他端部とを接続する導線膜５４が形成されている。   In the first substrate 2 configured as described above, the first coil 5 is laid on the upper surface of the first movable portion 21. The first coil 5 is laid in a spiral shape in the portion excluding the central portion of the first movable portion 21. Laser light or the like can be reflected at the center of the upper surface of the first movable portion 21 where the first coil 5 is not laid. Further, a mirror for reflecting laser light or the like may be formed on the first coil 5. By forming such a mirror, even if the first coil 5 is laid, the first movable portion 21 can reflect the laser beam or the like. In addition, the 1st coil 5 may be laid on the lower surface of the 1st movable part 21, or both upper and lower surfaces. An electrode 51 is formed on the first fixed portion 22, and an electrode 52 is formed on the first fixed portion 23. The first support portion 24 has a conductive film 53 connecting the electrode 51 formed on the first fixing portion 22 and one end portion of the first coil 5, and the first support portion 25 has the first fixing portion 23. A conductive film 54 that connects the formed electrode 52 and the other end of the first coil 5 is formed.

図２に示すように、第２基板３は、第２可動部３１と、第２固定部３２、３３と、第２支持部３４とを備える。第２可動部３１は、第１固定部２２、２３が上面に積層され、内側に空間部３１１が形成されている。第２可動部３１と第１固定部２２、２３とはスペーサ４を介して積層されている。スペーサ４を介して積層されることにより、第１基板２と第２基板３との間に、第１基板２の第１可動部２１が揺動する空間を確保することができる。尚、スペーサ４は、第１基板２又は第２基板３の何れかと一体的に形成されたものであってもよい。第２固定部３２、３３は、第２可動部３１の内側に形成された空間部３１１に配置されている。第２支持部３４は、第２固定部３２、３３に対して第２可動部３１を図２の一点鎖線Ｙで示す第２軸線周りに揺動可能に支持する。この第２軸線Ｙは、第２基板３が含まれる平面内に位置し、第１可動部２１の法線方向から見て第１軸線Ｘと直交する軸線である。また、第２支持部３４は、長手方向が第１軸線Ｘ方向に向けられた接続部３５を介して第２固定部３２、３３と接続されている。   As shown in FIG. 2, the second substrate 3 includes a second movable part 31, second fixing parts 32 and 33, and a second support part 34. As for the 2nd movable part 31, the 1st fixing | fixed part 22 and 23 is laminated | stacked on the upper surface, and the space part 311 is formed inside. The second movable portion 31 and the first fixed portions 22 and 23 are stacked via the spacer 4. By laminating via the spacers 4, a space in which the first movable portion 21 of the first substrate 2 swings can be secured between the first substrate 2 and the second substrate 3. The spacer 4 may be formed integrally with either the first substrate 2 or the second substrate 3. The second fixed parts 32 and 33 are arranged in a space part 311 formed inside the second movable part 31. The second support portion 34 supports the second movable portion 31 with respect to the second fixed portions 32 and 33 so that the second movable portion 31 can swing around the second axis indicated by the one-dot chain line Y in FIG. The second axis Y is an axis that is located in the plane including the second substrate 3 and is orthogonal to the first axis X when viewed from the normal direction of the first movable portion 21. The second support portion 34 is connected to the second fixing portions 32 and 33 via a connection portion 35 whose longitudinal direction is directed to the first axis X direction.

このような第２基板３の上面には、第１基板２の第１固定部２２に形成された電極５１に接続される電極３６と、第１基板２の第１固定部２３に形成された電極５２に接続される電極３７とが形成されている。第１固定部２２、２３に形成された電極５１、５２と第２基板３の上面に形成された電極３６、３７との接続は、ワイヤボンディングや、第１可動部２１の法線方向にスペーサ４を貫通する貫通電極を設けることによって行うことができる。第２基板３の上面に形成される電極３６、３７は、それぞれ交流電源に接続される。よって、電極５１、５２を介して電極３６、３７と接続される第１コイル５には、交流電流を流すことができる。   On the upper surface of the second substrate 3, the electrode 36 connected to the electrode 51 formed on the first fixing portion 22 of the first substrate 2 and the first fixing portion 23 of the first substrate 2 are formed. An electrode 37 connected to the electrode 52 is formed. The connection between the electrodes 51 and 52 formed on the first fixed portions 22 and 23 and the electrodes 36 and 37 formed on the upper surface of the second substrate 3 is performed by wire bonding or a spacer in the normal direction of the first movable portion 21. This can be done by providing a through electrode penetrating through the electrode 4. The electrodes 36 and 37 formed on the upper surface of the second substrate 3 are each connected to an AC power source. Therefore, an alternating current can be passed through the first coil 5 connected to the electrodes 36 and 37 via the electrodes 51 and 52.

また、第２基板３の第２可動部３１の下面には、第２コイルが敷設されている。図３は、第２基板３の下面図である。第２コイルは、図３に示すように、外コイル６１と内コイル６２、６３とから構成されている。外コイル６１は、第２軸線Ｙを跨ぎ、空間部３１１を囲うように空間部３１１の外側に敷設されている。この外コイル６１が敷設される部位は、第１可動部２１の下方の部位と、第１可動部２１の下方の部位に対して第１軸線Ｘ方向の一方側及び他方側の部位とに跨っている。一方、内コイル６２、６３は、外コイル６１の内側に敷設されている。内コイル６２は、第２軸線Ｙに対して第１軸線Ｘ方向の一方側に敷設されている。内コイル６３は、第２軸線Ｙに対して第１軸線Ｘ方向の他方側に敷設されている。内コイル６２、６３の敷設される部位は、第１可動部２１の下方の部位に対して、第１軸線Ｘ方向にずれている。尚、第２コイルは、第２可動部３１の上面、又は、上下両面に配置されてもよい。また、第２コイルは、外コイル６１のみ、又は、内コイル６２、６３のみで構成されてもよい。   A second coil is laid on the lower surface of the second movable portion 31 of the second substrate 3. FIG. 3 is a bottom view of the second substrate 3. As shown in FIG. 3, the second coil includes an outer coil 61 and inner coils 62 and 63. The outer coil 61 is laid outside the space portion 311 so as to straddle the second axis Y and surround the space portion 311. The part where the outer coil 61 is laid spans the part below the first movable part 21 and the part on the one side and the other side in the first axis X direction with respect to the part below the first movable part 21. ing. On the other hand, the inner coils 62 and 63 are laid inside the outer coil 61. The inner coil 62 is laid on one side in the first axis X direction with respect to the second axis Y. The inner coil 63 is laid on the other side in the first axis X direction with respect to the second axis Y. The site where the inner coils 62 and 63 are laid is shifted in the first axis X direction with respect to the site below the first movable portion 21. The second coil may be disposed on the upper surface of the second movable portion 31 or on both upper and lower surfaces. Further, the second coil may be composed of only the outer coil 61 or only the inner coils 62 and 63.

また、第２基板３の第２固定部３２、３３の下面には、電極４０、４１がそれぞれ形成されている。第２固定部３２の下面に形成された電極４０は、外コイル６１の一端部と内コイル６２の一端部６２１と内コイル６３の一端部６３１とに電気的に接続されている。第２固定部３３の下面に形成された電極４１は、外コイル６１の他端部と内コイル６２の他端部６２２と内コイル６３の他端部６３２とに電気的に接続されている。図３に示すように、外コイル６１と内コイル６２、６３とは、電流が同一周りの向きになるように、電極４０、４１に接続されている。この電極４０、４１は、それぞれ交流電源に接続される。よって、電極４０、４１と接続される外コイル６１及び内コイル６２、６３には、交流電流を流すことができる。   Electrodes 40 and 41 are formed on the lower surfaces of the second fixing portions 32 and 33 of the second substrate 3, respectively. The electrode 40 formed on the lower surface of the second fixing portion 32 is electrically connected to one end portion of the outer coil 61, one end portion 621 of the inner coil 62, and one end portion 631 of the inner coil 63. The electrode 41 formed on the lower surface of the second fixing portion 33 is electrically connected to the other end portion of the outer coil 61, the other end portion 622 of the inner coil 62, and the other end portion 632 of the inner coil 63. As shown in FIG. 3, the outer coil 61 and the inner coils 62 and 63 are connected to the electrodes 40 and 41 so that the currents are directed in the same direction. The electrodes 40 and 41 are each connected to an AC power source. Therefore, an alternating current can be passed through the outer coil 61 and the inner coils 62 and 63 connected to the electrodes 40 and 41.

以上のような構成の第１基板２及び第２基板３を備えるＭＥＭＳアクチュエータ１は、第１基板２及び第２基板３の他、第１磁界発生手段と、第２磁界発生手段と、ヨークとを備える。図４は、ＭＥＭＳアクチュエータ１の全体斜視図である。図５は、ＭＥＭＳアクチュエータ１の分解斜視図である（但し、図５においては、ヨークを省略している。）。尚、第１基板２及び第２基板３は、図示しない筐体等によって支持されている。   The MEMS actuator 1 including the first substrate 2 and the second substrate 3 configured as described above includes a first magnetic field generating unit, a second magnetic field generating unit, a yoke, in addition to the first substrate 2 and the second substrate 3. Is provided. FIG. 4 is an overall perspective view of the MEMS actuator 1. FIG. 5 is an exploded perspective view of the MEMS actuator 1 (however, the yoke is omitted in FIG. 5). In addition, the 1st board | substrate 2 and the 2nd board | substrate 3 are supported by the housing | casing etc. which are not shown in figure.

図５に示すように、第１磁界発生手段７は、第１可動部２１の法線方向に第１可動部２１に対して離間して配置されている。本実施形態においては、第１磁界発生手段７は、第２基板３の下方に配置されている。図６は、図４のＡ−Ａ端面図である。第１磁界発生手段７は、図６に示すように、第１コイル５に磁界を及ぼして、第１コイル５に第１可動部２１の法線方向の電磁力Ｆを発生させることによって、第１可動部２１を第１軸線Ｘ周りに揺動させる。本実施形態においては、第１磁界発生手段７は、第２軸線Ｙ方向の磁界を第１コイル５に及ぼす。また、本実施形態では、第１磁界発生手段７は、磁極が第２軸線Ｙ方向において異なっている。また、第１磁界発生手段７としては、例えば、永久磁石や、電磁石などを使用することができる。尚、第１磁界発生手段７として電磁石を使用する場合は、電磁石を構成する部品のうち、少なくともコイルが第１可動部２１の法線方向に第１可動部２１に対して離間して配置されていればよい。   As shown in FIG. 5, the first magnetic field generating means 7 is disposed away from the first movable part 21 in the normal direction of the first movable part 21. In the present embodiment, the first magnetic field generating means 7 is disposed below the second substrate 3. 6 is an AA end view of FIG. As shown in FIG. 6, the first magnetic field generating means 7 applies a magnetic field to the first coil 5 to cause the first coil 5 to generate an electromagnetic force F in the normal direction of the first movable portion 21. 1 The movable part 21 is swung around the first axis X. In the present embodiment, the first magnetic field generator 7 applies a magnetic field in the second axis Y direction to the first coil 5. In the present embodiment, the first magnetic field generating means 7 has different magnetic poles in the second axis Y direction. Moreover, as the 1st magnetic field generation means 7, a permanent magnet, an electromagnet, etc. can be used, for example. In the case where an electromagnet is used as the first magnetic field generating means 7, at least the coil among the components constituting the electromagnet is arranged away from the first movable portion 21 in the normal direction of the first movable portion 21. It only has to be.

次に、第２磁界発生手段について説明する。図７は、図４のＢ−Ｂ端面図である。図７に示すように第２磁界発生手段８１、８２は、第２可動部３１の法線方向に第２可動部３１に対して離間した位置に配置されている。本実施形態においては、第２磁界発生手段８１、８２は、第２基板３より下方に配置されている。さらに、本実施形態では、第２磁界発生手段８１は、第１磁界発生手段７に対して第１軸線Ｘ方向の一方側に配置され、第２磁界発生手段８２は、第１磁界発生手段７に対して第１軸線Ｘ方向の他方側に配置されている。   Next, the second magnetic field generating means will be described. FIG. 7 is an end view taken along the line BB in FIG. As shown in FIG. 7, the second magnetic field generating means 81 and 82 are arranged at positions separated from the second movable part 31 in the normal direction of the second movable part 31. In the present embodiment, the second magnetic field generating means 81 and 82 are disposed below the second substrate 3. Further, in the present embodiment, the second magnetic field generating means 81 is disposed on one side in the first axis X direction with respect to the first magnetic field generating means 7, and the second magnetic field generating means 82 is the first magnetic field generating means 7. Is arranged on the other side in the first axis X direction.

図７に示すように、第２磁界発生手段８１は、外コイル６１の第２軸線Ｙに対して第１軸線Ｘ方向の一方側の部分（以下、「外コイル６１の一方部」という）６１ａと内コイル６２とに磁界を及ぼして、外コイル６１の一方部６１ａと内コイル６２とに第２可動部３１の法線方向の電磁力Ｆを生じさせる。尚、本実施形態においては、第２磁界発生手段８１は、Ｂ−Ｂ端面においては第１軸線Ｘ方向の磁界を外コイル６１の一方部６１ａと内コイル６２とに及ぼす。また、第２磁界発生手段８１は、内コイル６２の第１軸線Ｘ方向の一方側の部分（以下、「内コイル６２の一方部」という）６２ａと外コイル６１の一方部６１ａとに、第１軸線Ｘ方向の他方側の向き（図７においては右方向）の磁界を及ぼす。また、第２磁界発生手段８１は、内コイル６２の第１軸線Ｘ方向の他方側の部分（以下、「内コイル６２の他方部」という）６２ｂに第１軸線Ｘ方向の一方側の向き（図７においては左方向）の磁界を及ぼす。   As shown in FIG. 7, the second magnetic field generating means 81 includes a portion on one side in the first axis X direction with respect to the second axis Y of the outer coil 61 (hereinafter referred to as “one portion of the outer coil 61”) 61a. A magnetic field is exerted on the inner coil 62 and an electromagnetic force F in the normal direction of the second movable portion 31 is generated in the one portion 61a of the outer coil 61 and the inner coil 62. In the present embodiment, the second magnetic field generating means 81 applies a magnetic field in the first axis X direction to the one portion 61a of the outer coil 61 and the inner coil 62 at the BB end face. The second magnetic field generating means 81 includes a first portion of the inner coil 62 in the first axis X direction (hereinafter referred to as “one portion of the inner coil 62”) 62 a and a first portion 61 a of the outer coil 61. A magnetic field is applied in the direction of the other side of the one-axis X direction (the right direction in FIG. 7). In addition, the second magnetic field generating means 81 has a direction on one side in the first axis X direction (hereinafter referred to as “the other part of the inner coil 62”) 62b on the other side in the first axis X direction of the inner coil 62 ( A magnetic field in the left direction in FIG. 7 is applied.

第２磁界発生手段８２は、外コイル６１の第２軸線Ｙに対して第１軸線Ｘ方向の他方側の部分（以下、「外コイル６１の他方部」という）６１ｂと内コイル６３とに磁界を及ぼして、外コイル６１の他方部６１ｂと内コイル６３とに第２可動部３１の法線方向の電磁力を生じさせる。尚、本実施形態においては、第２磁界発生手段８２は、Ｂ−Ｂ端面においては第１軸線Ｘ方向の磁界を外コイル６１の他方部６１ｂと内コイル６３とに及ぼす。また、第２磁界発生手段８２は、内コイル６３の第１軸線Ｘ方向の他方側の部分（以下、「内コイル６３の他方部」という）６３ｂと、外コイル６１の他方部６１ｂとに第１軸線Ｘ方向の他方側の向き（図７においては右方向）の磁界を及ぼす。また、第２磁界発生手段８２は、内コイル６３の第１軸線Ｘ方向の一方側の部分（以下、「内コイル６３の一方部」という）６３ａに第１軸線Ｘ方向の一方側の向き（図７においては左方向）の磁界を及ぼす。   The second magnetic field generating means 82 applies a magnetic field to the inner coil 63 and the portion on the other side in the first axis X direction with respect to the second axis Y of the outer coil 61 (hereinafter referred to as “the other portion of the outer coil 61”). Therefore, an electromagnetic force in the normal direction of the second movable portion 31 is generated in the other portion 61b of the outer coil 61 and the inner coil 63. In the present embodiment, the second magnetic field generating means 82 applies a magnetic field in the first axis X direction to the other portion 61b of the outer coil 61 and the inner coil 63 at the BB end face. The second magnetic field generating means 82 is connected to the other part of the inner coil 63 in the first axis X direction (hereinafter referred to as “the other part of the inner coil 63”) 63 b and the other part 61 b of the outer coil 61. A magnetic field is applied in the direction of the other side of the one-axis X direction (the right direction in FIG. 7). In addition, the second magnetic field generating means 82 is provided on one side of the inner coil 63 in the first axis X direction (hereinafter referred to as “one part of the inner coil 63”) 63a. A magnetic field in the left direction in FIG. 7 is applied.

本実施形態では、第２磁界発生手段８１、８２の磁極は、第１可動部２１の法線方向において異なっている。さらに、第２磁界発生手段８１と第２磁界発生手段８２とにおいて、磁極の位置関係が反転している。   In the present embodiment, the magnetic poles of the second magnetic field generating means 81 and 82 are different in the normal direction of the first movable portion 21. Furthermore, the positional relationship of the magnetic poles is reversed between the second magnetic field generating means 81 and the second magnetic field generating means 82.

第２磁界発生手段８１、８２としては、例えば永久磁石や、電磁石などを使用することができる。尚、第２磁界発生手段８１、８２として電磁石を使用する場合は、電磁石を構成する部品のうち、少なくともコイルが第２可動部３１の法線方向に第２可動部３１に対して離間して配置されていればよい。   As the second magnetic field generating means 81 and 82, for example, a permanent magnet or an electromagnet can be used. In the case where an electromagnet is used as the second magnetic field generating means 81, 82, among the components constituting the electromagnet, at least the coil is separated from the second movable portion 31 in the normal direction of the second movable portion 31. It only has to be arranged.

ヨークは、第１ヨーク９１、第２ヨーク９２、第３ヨーク９３とから構成されている。図６に示すように、第１ヨーク９１は、第１磁界発生手段７の側面に接し、第１コイル５が含まれる平面近傍まで延出されている。このように、第１コイル５が含まれる平面近傍まで延出されていることで、第１コイル５に及ぶ磁界の磁束密度が高くなり、第１コイル５に大きな電磁力Ｆを発生させることができる。   The yoke is composed of a first yoke 91, a second yoke 92, and a third yoke 93. As shown in FIG. 6, the first yoke 91 is in contact with the side surface of the first magnetic field generating means 7 and extends to the vicinity of the plane including the first coil 5. Thus, by extending to the vicinity of the plane including the first coil 5, the magnetic flux density of the magnetic field reaching the first coil 5 is increased, and a large electromagnetic force F can be generated in the first coil 5. it can.

第２ヨーク９２は、第２磁界発生手段８１の下面に接し、外コイル６１と内コイル６２とが含まれる平面近傍まで延出されている。また、第３ヨーク９３は、第２磁界発生手段８２の下面に接し、外コイル６１と内コイル６３とが含まれる平面近傍まで延出されている。このように、外コイル６１と内コイル６２、６３とが含まれる平面近傍まで延出されていることで、外コイル６１と内コイル６２、６３とに及ぶ磁界の磁束密度が高くなり、外コイル６１と内コイル６２、６３とに大きな電磁力Ｆを発生させることができる。   The second yoke 92 is in contact with the lower surface of the second magnetic field generating means 81 and extends to the vicinity of a plane including the outer coil 61 and the inner coil 62. The third yoke 93 is in contact with the lower surface of the second magnetic field generating means 82 and extends to the vicinity of a plane including the outer coil 61 and the inner coil 63. Thus, the magnetic flux density of the magnetic field extending to the outer coil 61 and the inner coils 62, 63 is increased by extending to the vicinity of the plane including the outer coil 61 and the inner coils 62, 63, and the outer coil. A large electromagnetic force F can be generated in 61 and the inner coils 62 and 63.

以上に説明したＭＥＭＳアクチュエータ１において、第１コイル５に電流が流れると、図６に示すように、第１可動部２１の法線方向の電磁力Ｆが第１コイル５に発生する。第１コイル５の第１軸線Ｘに対して第２軸線Ｙ方向の一方側の部分と、第１コイル５の第１軸線Ｘに対して第２軸線Ｙ方向の他方側の部分では、電流が流れる向き反対である。このため、第１コイル５の第２軸線方向の一方側の部分と、第１コイル５の第２軸線Ｙ方向の他方側の部分とでは、発生する電磁力Ｆの向きが上下反対である。よって、第１コイル５に電流が流れると、第１可動部２１は、第１固定部２２に対して第１軸線Ｘ周りに回動する。よって、第１コイル５に交流電流を流すと、第１コイル５に流れる電流の向きが変化することにより、電磁力の向きも変化するため、第１可動部２１が第１軸線Ｘ周りに揺動する。   In the MEMS actuator 1 described above, when a current flows through the first coil 5, an electromagnetic force F in the normal direction of the first movable portion 21 is generated in the first coil 5 as shown in FIG. 6. Current flows in a portion on one side in the second axis Y direction with respect to the first axis X of the first coil 5 and in a portion on the other side in the second axis Y direction with respect to the first axis X of the first coil 5. The direction of flow is the opposite. For this reason, the direction of the generated electromagnetic force F is upside down in the part on the one side in the second axis direction of the first coil 5 and the part on the other side in the second axis Y direction of the first coil 5. Therefore, when a current flows through the first coil 5, the first movable portion 21 rotates around the first axis X with respect to the first fixed portion 22. Therefore, when an alternating current is passed through the first coil 5, the direction of the current flowing through the first coil 5 changes and the direction of the electromagnetic force also changes, so that the first movable portion 21 swings around the first axis X. Move.

また、外コイル６１及び内コイル６２、６３に電流が流れると、図７に示すように、第２可動部３１の法線方向の電磁力Ｆが外コイル６１及び内コイル６２、６３に発生する。   Further, when a current flows through the outer coil 61 and the inner coils 62 and 63, an electromagnetic force F in the normal direction of the second movable portion 31 is generated in the outer coil 61 and the inner coils 62 and 63 as shown in FIG. .

図７に示すように、外コイル６１の一方部６１ａと内コイル６２の一方部６２ａとにおいては、電流が流れる向き、及び、及ぶ磁界の向きは同一である。よって、外コイル６１の一方部６１ａと、内コイル６２の一方部６２ａとにおいて、同じ向きの電磁力Ｆが発生する。また、外コイル６１の一方部６１ａと、内コイル６２の他方部６２ｂとにおいては、電流が流れる向き、及び、及ぶ磁界の向きは反対である。よって、外コイル６１の一方部６１ａと、内コイル６２の他方部６２ｂとにおいて、同じ向きの電磁力Ｆが発生する。よって、外コイル６１の一方部６１ａと、内コイル６２の一方部６２ａと、内コイル６２の他方部６２ｂとにおいて、同じ向きの電磁力Ｆが発生する。同様の理由により、外コイル６１の他方部６１ｂと、内コイル６３の一方部６３ａと、内コイル６３の他方部６３ｂとにおいて、同じ向きの電磁力Ｆが発生する。   As shown in FIG. 7, in one part 61a of the outer coil 61 and one part 62a of the inner coil 62, the direction in which the current flows and the direction of the magnetic field reaching the same are the same. Therefore, the electromagnetic force F in the same direction is generated in the one portion 61 a of the outer coil 61 and the one portion 62 a of the inner coil 62. Moreover, in the one part 61a of the outer coil 61 and the other part 62b of the inner coil 62, the direction in which the current flows and the direction in which the magnetic field reaches are opposite. Therefore, the electromagnetic force F in the same direction is generated in the one part 61 a of the outer coil 61 and the other part 62 b of the inner coil 62. Therefore, the electromagnetic force F in the same direction is generated in the one portion 61 a of the outer coil 61, the one portion 62 a of the inner coil 62, and the other portion 62 b of the inner coil 62. For the same reason, the electromagnetic force F in the same direction is generated in the other part 61 b of the outer coil 61, one part 63 a of the inner coil 63, and the other part 63 b of the inner coil 63.

外コイル６１の一方部６１ａと、外コイル６１の他方部６１ｂとにおいては、電流が流れる向きが反対であり、及ぶ磁界の向きが同一である。よって、外コイル６１においては、一方部６１ａと他方部６１ｂとで、互いに反対向きの電磁力Ｆが発生する。同様に、内コイル６２の一方部６２ａ及び内コイル６２の他方部６２ｂと、内コイル６３の一方部６３ａ及び内コイル６３の他方部６３ｂとで互いに反対向きの電磁力Ｆが発生する。このように、反対向きの電磁力Ｆが発生することで、第２可動部３１は、第２固定部３２に対して第２軸線Ｙ周りに回動する。よって、外コイル６１及び内コイル６２、６３に交流電流を流すと、電流の流れる方向が変化し、電磁力の向きも変化するため、第２可動部３１が第２軸線Ｙ周りに揺動する。   In one part 61a of the outer coil 61 and the other part 61b of the outer coil 61, the direction in which the current flows is opposite, and the direction of the magnetic field that extends is the same. Therefore, in the outer coil 61, electromagnetic forces F in opposite directions are generated in the one part 61a and the other part 61b. Similarly, electromagnetic forces F in opposite directions are generated in one part 62 a of the inner coil 62 and the other part 62 b of the inner coil 62, and one part 63 a of the inner coil 63 and the other part 63 b of the inner coil 63. As described above, the second movable portion 31 rotates around the second axis Y with respect to the second fixed portion 32 by generating the electromagnetic force F in the opposite direction. Therefore, when an alternating current is passed through the outer coil 61 and the inner coils 62 and 63, the direction in which the current flows changes and the direction of the electromagnetic force also changes, so the second movable portion 31 swings around the second axis Y. .

第１可動部２１は、第２可動部３１に積層された第１固定部２２、２３に対して支持されている。従って、第２可動部３１が第２軸線Ｙ周りに揺動すると、第１可動部２１も第２軸線Ｙ周りに揺動する。よって、ＭＥＭＳアクチュエータ１においては、第１可動部２１は、第１軸線Ｘ及び第２軸線Ｙの２つの軸線周りに揺動することができる。従って、第１可動部２１は、レーザ光等の２次元走査をすることができる。   The first movable portion 21 is supported with respect to the first fixed portions 22 and 23 stacked on the second movable portion 31. Therefore, when the second movable part 31 swings around the second axis Y, the first movable part 21 swings around the second axis Y. Therefore, in the MEMS actuator 1, the first movable portion 21 can swing around the two axes of the first axis X and the second axis Y. Accordingly, the first movable portion 21 can perform two-dimensional scanning with laser light or the like.

以上に説明したように、本実施形態に係るＭＥＭＳアクチュエータ１においては、第２固定部３２、３３は、第２可動部３１の内側に形成された空間部３１１に配置されている。即ち、第２固定部３２、３３は、第２可動部３１の内側に配置されている。このように、第２固定部３２、３３が第２可動部３１の内側に配置されるので、本実施形態に係るＭＥＭＳアクチュエータ１は、第１可動部２１の法線方向から見たときにおける寸法を小さくすることが可能である。このため、本実施形態に係るＭＥＭＳアクチュエータ１を、例えば、レーザ光走査装置に用いると、該レーザ光走査装置の第１可動部２１の法線方向と直交する方向の寸法を小さくすることができる。従って、本実施形態に係るＭＥＭＳアクチュエータ１を用いたレーザ光走査装置は、薄型又は小型の機器への実装に適する。   As described above, in the MEMS actuator 1 according to the present embodiment, the second fixed portions 32 and 33 are disposed in the space portion 311 formed inside the second movable portion 31. That is, the second fixed parts 32 and 33 are arranged inside the second movable part 31. Thus, since the 2nd fixing | fixed part 32 and 33 is arrange | positioned inside the 2nd movable part 31, the dimension when the MEMS actuator 1 which concerns on this embodiment is seen from the normal line direction of the 1st movable part 21 is shown. Can be reduced. For this reason, when the MEMS actuator 1 according to the present embodiment is used in, for example, a laser beam scanning device, the dimension in the direction orthogonal to the normal direction of the first movable portion 21 of the laser beam scanning device can be reduced. . Therefore, the laser beam scanning device using the MEMS actuator 1 according to the present embodiment is suitable for mounting on a thin or small device.

また、ＭＥＭＳアクチュエータ１においては、第１磁界発生手段７は、第１可動部２１の法線方向に第１可動部２１に対して離間して配置されている。また、第２磁界発生手段８１、８２は、第２可動部３１の法線方向に第２可動部３１に対して離間して配置されている。このように、第１磁界発生手段７、及び、第２磁界発生手段８１、８２を配置することで、第１可動部２１の法線方向から見て第１基板２及び第２基板３の外側に第１磁界発生手段７及び第２磁界発生手段８１、８２がはみ出すことを防ぐことができる。よって、ＭＥＭＳアクチュエータ１によれば、第１軸線Ｘ方向及び第２軸線Ｙ方向の両方向の寸法が小さい電磁駆動型のＭＥＭＳアクチュエータを実現することができる。よって、本実施形態に係るＭＥＭＳアクチュエータ１によれば、薄型又は小型の機器への実装に適する電磁駆動型のレーザ光走査装置を提供することができる。   Further, in the MEMS actuator 1, the first magnetic field generating means 7 is disposed away from the first movable part 21 in the normal direction of the first movable part 21. Further, the second magnetic field generating means 81 and 82 are arranged away from the second movable part 31 in the normal direction of the second movable part 31. As described above, by arranging the first magnetic field generating means 7 and the second magnetic field generating means 81 and 82, the outer sides of the first substrate 2 and the second substrate 3 when viewed from the normal direction of the first movable portion 21. It is possible to prevent the first magnetic field generating means 7 and the second magnetic field generating means 81 and 82 from protruding. Therefore, according to the MEMS actuator 1, an electromagnetically driven MEMS actuator having small dimensions in both the first axis X direction and the second axis Y direction can be realized. Therefore, according to the MEMS actuator 1 according to the present embodiment, it is possible to provide an electromagnetically driven laser beam scanning device suitable for mounting on a thin or small device.

また、ＭＥＭＳアクチュエータ１においては、第１磁界発生手段７と第２磁界発生手段８１、８２とが第２基板３の下方に配置されている。よって、第１基板３の上方から、レーザ光等を第１可動部２１に照射してレーザ光等を走査する際に、第１磁界発生手段７と第２磁界発生手段８１、８２とがレーザ光等の走査を妨げることがない。   Further, in the MEMS actuator 1, the first magnetic field generating means 7 and the second magnetic field generating means 81 and 82 are disposed below the second substrate 3. Therefore, when the first movable portion 21 is irradiated with laser light or the like from above the first substrate 3 to scan the laser light or the like, the first magnetic field generating means 7 and the second magnetic field generating means 81 and 82 are lasers. Scanning of light or the like is not hindered.

また、本実施形態に係るＭＥＭＳアクチュエータ１においては、ヨークによって、大きな電磁力Ｆを発生させることができるので、大きな振れ角で、第１可動部２１を第１軸線Ｘ及び第２軸線Ｙ周りに揺動させることができる。また、本実施形態に係るＭＥＭＳアクチュエータ１においては、外コイル６１と内コイル６２、６３とに電磁力Ｆが発生する。このため、例えば、外コイル６１の敷設するスペースが少なく、外コイル６１の巻数を多くできない場合であっても、大きい電磁力Ｆを得ることができ、ひいては、大きな振れ角で、第１可動部２１を第２軸線Ｙ周りに揺動させることができる。   In the MEMS actuator 1 according to the present embodiment, since the large electromagnetic force F can be generated by the yoke, the first movable portion 21 is moved around the first axis X and the second axis Y with a large deflection angle. It can be swung. Further, in the MEMS actuator 1 according to the present embodiment, an electromagnetic force F is generated in the outer coil 61 and the inner coils 62 and 63. For this reason, for example, even when the space for laying the outer coil 61 is small and the number of turns of the outer coil 61 cannot be increased, a large electromagnetic force F can be obtained. 21 can be swung around the second axis Y.

第１基板２及び第２基板３として、シリコン製の基板を使用することができる。また、第１基板２として、シリコン製の基板を使用し、第２基板３としてシリコン製の基板よりも剛性の低い樹脂製の基板等を使用することができる。第２基板３として、第１基板２よりも剛性の低い基板を使用すると、第２軸線Ｘ周りの揺動周波数を第１軸線Ｘ周りの揺動周波数より低くすることが容易にできる。よって、第１軸線Ｘ周りの揺動で主走査を実現し、第２軸線Ｙ周りの揺動で副走査を実現することで、インターレス走査や、プログレッシブ走査等の２次元走査を容易に行うことができる。   As the first substrate 2 and the second substrate 3, silicon substrates can be used. Further, a silicon substrate can be used as the first substrate 2, and a resin substrate having a lower rigidity than the silicon substrate can be used as the second substrate 3. When a substrate having lower rigidity than the first substrate 2 is used as the second substrate 3, the oscillation frequency around the second axis X can be easily made lower than the oscillation frequency around the first axis X. Therefore, by performing main scanning by swinging around the first axis X and realizing sub-scanning by swinging around the second axis Y, two-dimensional scanning such as interlaced scanning and progressive scanning is easily performed. be able to.

また、本実施形態に係るＭＥＭＳアクチュエータ１は、一つのウエハに第１基板２を複数形成し、他のウエハ上に第２基板３を複数形成した後、この２つのウエハをスペーサ４を挟んで積層して複数のＭＥＭＳアクチュエータを形成し、各ＭＥＭＳアクチュエータを切り離すことで作成してもよい。また、本実施形態に係るＭＥＭＳアクチュエータ１は、２つのウエハをスペーサ４を挟んで積層した後、２つのウエハが積層された積層体に複数のＭＥＭＳアクチュエータを形成した後、各ＭＥＭＳアクチュエータを切り離すことで作成してもよい。   In the MEMS actuator 1 according to the present embodiment, a plurality of first substrates 2 are formed on one wafer, a plurality of second substrates 3 are formed on another wafer, and then the two wafers are sandwiched with a spacer 4 interposed therebetween. A plurality of MEMS actuators may be formed by stacking, and each MEMS actuator may be separated. In the MEMS actuator 1 according to the present embodiment, two wafers are stacked with the spacer 4 interposed therebetween, a plurality of MEMS actuators are formed on the stacked body in which the two wafers are stacked, and then each MEMS actuator is separated. You may create it.

本実施形態においては、第１可動部２１及び第２可動部３１の揺動は、電磁力によって行っているが、これらの駆動は、静電力や、圧電素子を用いて行ってもよい。   In the present embodiment, the first movable portion 21 and the second movable portion 31 are swung by electromagnetic force. However, these drives may be performed using an electrostatic force or a piezoelectric element.

以上においては、第１可動部２１に第１コイル５を敷設した構成について説明したが、本実施形態に係るＭＥＭＳアクチュエータ１は、必ずしもこの構成に限られるものでない。以下、第１可動部２１に第１コイル５を敷設しない構成について説明する。本実施形態に係るＭＥＭＳアクチュエータ１は、前述のように第２軸線Ｙ周りに第２可動部３１を揺動させるだけでなく、第１軸線Ｘ周りにも第２可動部３１を揺動させることができる場合がある。これは、例えば第１磁界発生手段７の第２軸方向の寸法等によっては、第１磁界発生手段７が発生させる第１コイル５に及ぶ第２軸線Ｙ方向の磁界は、外コイル６１の第１可動部２１の下方の部分及びその近傍にも及ぶためである。図３に示すように、外コイル６１の第２軸線Ｙ方向の一方側の部分６１ｃと外コイル６１の第２軸線Ｙ方向の他方側の部分６１ｄとでは、電流が流れる向きが反対である。このため、外コイル６１の第２軸線Ｙ方向の一方側の部分６１ｃと他方側の部分６１ｄとでは、上下反対向きの電磁力が発生する。このように、反対向きの電磁力が発生することで、第２可動部３１は接続部３５を中心にして第２固定部３２、３３に対して第１軸線Ｘ周りに揺動する。よって、本実施形態に係るＭＥＭＳアクチュエータ１は、第２可動部３１を第１軸線Ｘ及び第２軸線Ｙの２つの軸線周りに揺動させることができる。このように、第２可動部３１を第１軸線Ｘ及び第２軸線Ｙの２つの軸線周りに揺動させると、第１可動部２１も第１軸線Ｘ及び第２軸線Ｙの２つの軸線周りに揺動する。よって、本実施形態に係るＭＥＭＳアクチュエータ１によれば、第１コイル５に発生する電磁力によって第１可動部２１を第１軸線Ｘ周りに揺動させなくても、第１可動部２１を第１軸線Ｘ及び第２軸線Ｙの２つの軸線周りに揺動させることができる。即ち、本実施形態に係るＭＥＭＳアクチュエータ１によれば、第１可動部２１に第１コイル５を敷設しなくても、第１可動部２１を第１軸線Ｘ及び第２軸線Ｙの２つの軸線周りに揺動させることができる。   In the above description, the configuration in which the first coil 5 is laid on the first movable portion 21 has been described. However, the MEMS actuator 1 according to the present embodiment is not necessarily limited to this configuration. Hereinafter, the structure which does not lay the 1st coil 5 in the 1st movable part 21 is demonstrated. The MEMS actuator 1 according to this embodiment not only swings the second movable part 31 around the second axis Y as described above, but also swings the second movable part 31 around the first axis X. May be possible. For example, depending on the size of the first magnetic field generating means 7 in the second axial direction, the magnetic field in the second axis Y direction extending to the first coil 5 generated by the first magnetic field generating means 7 is This is because it extends to the lower part of the movable part 21 and its vicinity. As shown in FIG. 3, the direction in which the current flows is opposite between the portion 61 c on the one side in the second axis Y direction of the outer coil 61 and the portion 61 d on the other side in the second axis Y direction of the outer coil 61. For this reason, the electromagnetic force of the direction opposite to the up-and-down direction generate | occur | produces in the part 61c and the other side part 61d of the 2nd axis Y direction of the outer coil 61. In this way, when the electromagnetic force in the opposite direction is generated, the second movable portion 31 swings around the first axis X with respect to the second fixed portions 32 and 33 around the connection portion 35. Therefore, the MEMS actuator 1 according to the present embodiment can swing the second movable portion 31 around the two axes of the first axis X and the second axis Y. As described above, when the second movable portion 31 is swung around the two axes of the first axis X and the second axis Y, the first movable portion 21 is also rotated around the two axes of the first axis X and the second axis Y. Rocks. Therefore, according to the MEMS actuator 1 according to the present embodiment, the first movable part 21 can be moved to the first movable part 21 without the first movable part 21 being swung around the first axis X by the electromagnetic force generated in the first coil 5. It can be swung around the two axes of the first axis X and the second axis Y. That is, according to the MEMS actuator 1 according to the present embodiment, the first movable portion 21 can be moved along the two axes of the first axis X and the second axis Y without laying the first coil 5 on the first movable portion 21. It can be swung around.

尚、外コイル６１の第２軸線Ｙ方向の一方側の部分６１ｃと他方側の部分６１ｄとに発生する電磁力を大きくするために、第１ヨーク９１を外コイル６１が含まれる平面近傍まで延出してもよい。このような位置まで延出することで、外コイル６１の第２軸線Ｙ方向の一方側の部分６１ｃと他方側の部分６１ｄとに及ぶ磁界の磁束密度が高くなる。このことによって、外コイル６１の第２軸線Ｙ方向の一方側の部分６１ｃと他方側の部分６１ｄとに大きな電磁力が発生する。このように、大きな電磁力を発生させることで、大きな振れ角で、第２可動部３１、ひいては、第１可動部２１を第１軸線Ｘ周りに揺動させることができる。   Incidentally, in order to increase the electromagnetic force generated in one portion 61c and the other portion 61d in the second axis Y direction of the outer coil 61, the first yoke 91 is extended to the vicinity of the plane including the outer coil 61. May be issued. By extending to such a position, the magnetic flux density of the magnetic field extending to one portion 61c and the other portion 61d in the second axis Y direction of the outer coil 61 is increased. As a result, a large electromagnetic force is generated in one portion 61c and the other portion 61d of the outer coil 61 in the second axis Y direction. In this way, by generating a large electromagnetic force, the second movable part 31 and thus the first movable part 21 can be swung around the first axis X with a large deflection angle.

また、第１可動部２１は、第１軸部２４、２５によって、第２可動部３１に積層された第１固定部２２、２３に対して第１軸線Ｘ周りに揺動可能に支持されている。前述のように、第２可動部３１が第１軸線Ｘ及び第２軸線Ｙの２つの軸線周りに揺動する構成の場合においては、第２可動部３１は、接続部３５を中心にして第２固定部３２、３３に対して第１軸線Ｘ周りに揺動する。即ち、第１可動部２１は、第１軸部２４、２５、及び、接続部３５によって、第２固定部３２、３３に対して第１軸線Ｘ周りに揺動可能に支持されている。よって、第１基板２、第２基板３、及び、スペーサ４からなる構造体の第１軸線Ｘ周りの揺動における該構造体の共振周波数で第２可動部３１を第２固定部３２、３３に対して第１軸線Ｘ周りに揺動させると、第１可動部２１は、第２可動部３１よりも大きな振れ角で第１軸線Ｘ周りに揺動する。従って、以上のように、第２可動部３１を第１軸線Ｘ及び第２軸線Ｙの２つの軸線周りに揺動させることができる場合においては、第２可動部３１の第１軸線Ｘ周りの揺動の振れ角が小さくても、大きな振れ角で第１可動部２１を第１軸線Ｘ周りに揺動させることができる。   The first movable portion 21 is supported by the first shaft portions 24 and 25 so as to be swingable around the first axis X with respect to the first fixed portions 22 and 23 stacked on the second movable portion 31. Yes. As described above, in the case where the second movable portion 31 is configured to swing around the two axes of the first axis X and the second axis Y, the second movable portion 31 is centered on the connecting portion 35. 2 It swings around the first axis X with respect to the fixed parts 32, 33. That is, the first movable portion 21 is supported by the first shaft portions 24 and 25 and the connection portion 35 so as to be swingable around the first axis X with respect to the second fixed portions 32 and 33. Accordingly, the second movable portion 31 is moved to the second fixed portions 32 and 33 at the resonance frequency of the structure formed of the first substrate 2, the second substrate 3, and the spacer 4 around the first axis X. On the other hand, if the first movable part 21 is swung around the first axis X, the first movable part 21 is swung around the first axis X with a larger swing angle than the second movable part 31. Accordingly, as described above, when the second movable portion 31 can be swung around the two axes of the first axis X and the second axis Y, the second movable portion 31 around the first axis X Even if the swing angle is small, the first movable portion 21 can be swung around the first axis X with a large swing angle.

また、第２可動部３１を第１軸線Ｘ及び第２軸線Ｙの２つの軸線周りに揺動させる構成として、第２可動部３１を第１軸線Ｘ周りに揺動させるための電磁力を発生させるコイルと、第２可動部３１を第２軸線Ｙ周りに揺動させるための電磁力を発生させるコイルとを第２可動部３１に敷設する構成を挙げることができる。この構成の具体例として、図３に示す外コイル６１と、内コイル６２と、内コイル６３とのそれぞれが、互いに電気的に接続されていない状態の構成を挙げることができる。この具体例の場合は、外コイル６１が第２可動部３１を第１軸線Ｘ周りに揺動させるための電磁力を発生させるコイルであり、内コイル６２、６３が第２可動部３１を第２軸線Ｙ周りに揺動させるための電磁力を発生させるコイルである。外コイル６１に第２可動部３１を第１軸線Ｘ周りに揺動させるための電磁力が発生するのは、前述のとおりである。また、内コイル６２、６３が発生する電磁力により第２可動部３１を第２軸線Ｙ周りに揺動させる方法としては、例えば、内コイル６２、６３に互いに上下反対向きの電磁力が生じるように、電流及び及ぶ磁界を制御する方法を挙げることができる。以上のような構成においても、本実施形態に係るＭＥＭＳアクチュエータ１は、第１可動部２１に第１コイル５を敷設しなくても、第１可動部２１を第１軸線Ｘ及び第２軸線Ｙの２つの軸線周りに揺動させることができる。   Further, as a configuration in which the second movable portion 31 is swung around the two axes of the first axis X and the second axis Y, an electromagnetic force for swinging the second movable portion 31 around the first axis X is generated. A configuration in which a coil to be generated and a coil that generates an electromagnetic force for swinging the second movable portion 31 around the second axis Y can be provided on the second movable portion 31. A specific example of this configuration is a configuration in which the outer coil 61, the inner coil 62, and the inner coil 63 shown in FIG. 3 are not electrically connected to each other. In this specific example, the outer coil 61 is a coil that generates an electromagnetic force for swinging the second movable portion 31 around the first axis X, and the inner coils 62 and 63 cause the second movable portion 31 to move to the second movable portion 31. This coil generates an electromagnetic force for swinging around the biaxial line Y. As described above, the electromagnetic force for causing the second movable portion 31 to swing around the first axis X is generated in the outer coil 61. Further, as a method of swinging the second movable portion 31 around the second axis Y by the electromagnetic force generated by the inner coils 62, 63, for example, electromagnetic forces in opposite directions are generated in the inner coils 62, 63. In particular, there may be mentioned a method for controlling the current and the applied magnetic field. Even in the configuration as described above, the MEMS actuator 1 according to the present embodiment can connect the first movable portion 21 to the first axis X and the second axis Y without laying the first coil 5 on the first movable portion 21. Can be swung around the two axes.

また、第２磁界発生手段８１、８２は、第１軸線Ｘ方向に第２可動部３１に対して離間して配置されてもよい。第２磁界発生手段８１、８２をこのように配置しても、第２軸線方向において、第１可動部２１の法線方向から見て第１基板２及び第２基板３の外側に第１磁界発生手段７及び第２磁界発生手段８１、８２がはみ出すことを防ぐことができる。よって、第２磁界発生手段８１、８２をこのように配置すれば、第２軸線Ｙ方向の寸法が小さい電磁駆動型のＭＥＭＳアクチュエータを実現することができる。よって、第２磁界発生手段８１、８２がこのように配置されたＭＥＭＳアクチュエータ１によれば、薄型又は小型の機器への実装に適する電磁駆動型のレーザ光走査装置を提供することができる。   Further, the second magnetic field generating means 81 and 82 may be disposed apart from the second movable portion 31 in the first axis X direction. Even if the second magnetic field generating means 81 and 82 are arranged in this way, the first magnetic field is formed outside the first substrate 2 and the second substrate 3 when viewed from the normal direction of the first movable portion 21 in the second axial direction. The generation means 7 and the second magnetic field generation means 81 and 82 can be prevented from protruding. Therefore, if the second magnetic field generating means 81 and 82 are arranged in this way, an electromagnetically driven MEMS actuator having a small size in the second axis Y direction can be realized. Therefore, according to the MEMS actuator 1 in which the second magnetic field generating means 81 and 82 are arranged in this way, an electromagnetically driven laser beam scanning apparatus suitable for mounting on a thin or small device can be provided.

図８は、第２磁界発生手段８１、８２を、第１軸線Ｘ方向に第２可動部３１に対して離間して配置した場合の具体例を示し、第２磁界発生手段８１、８２をこのように配置したときの図４のＢ−Ｂ端面図である。図８に示すように、第２磁界発生手段８１は、第１軸線Ｘ方向の一方に第２可動部３１に対して離間して配置されている。また、第２磁界発生手段８２は、第１軸線Ｘ方向の他方に第２可動部３１に対して離間して配置されている。各第２磁界発生手段８１、８２は、第２可動部３１に対して第１軸線Ｘ方向に離間した部位にＳ極が、第２可動部３１に近接した部位にＮ極が形成されている。各第２磁界発生手段８１、８２において、Ｓ極が形成された部位から、第１基板２の上方及び第２基板３の下方にヨーク９ａ、９ｂが延出されている。このように第２磁界発生手段８１を配置することによって、外コイル６１の一方部６１ａと内コイル６２の一方部６２ａとに磁界が及び、外コイル６１の一方部６１ａと内コイル６２の一方部６２ａとに第２可動部３１の法線方向の電磁力を生じさせることができる。同様に、このように第２磁界発生手段８２を配置することによって、外コイル６１の他方部６１ｂと内コイル６３の他方部６３ｂとに磁界が及び、外コイル６１の他方部６１ｂと内コイル６３の他方部６３ｂとに第２可動部３１の法線方向の電磁力を生じさせることができる。   FIG. 8 shows a specific example in which the second magnetic field generating means 81 and 82 are arranged apart from the second movable portion 31 in the first axis X direction. It is a BB end elevation of Drawing 4 when arranged in this way. As shown in FIG. 8, the second magnetic field generating means 81 is disposed away from the second movable portion 31 on one side in the first axis X direction. Further, the second magnetic field generating means 82 is disposed on the other side in the first axis X direction so as to be separated from the second movable portion 31. Each of the second magnetic field generating means 81, 82 has an S pole formed in a portion spaced apart from the second movable portion 31 in the first axis X direction, and an N pole formed in a portion close to the second movable portion 31. . In each of the second magnetic field generating means 81 and 82, yokes 9a and 9b extend from the portion where the S pole is formed above the first substrate 2 and below the second substrate 3. By arranging the second magnetic field generating means 81 in this way, a magnetic field is applied to one part 61a of the outer coil 61 and one part 62a of the inner coil 62, and one part 61a of the outer coil 61 and one part of the inner coil 62. The electromagnetic force in the normal direction of the second movable portion 31 can be generated in 62a. Similarly, by arranging the second magnetic field generating means 82 in this way, the magnetic field is applied to the other part 61 b of the outer coil 61 and the other part 63 b of the inner coil 63, and the other part 61 b of the outer coil 61 and the inner coil 63. The electromagnetic force in the normal direction of the second movable portion 31 can be generated in the other portion 63b of the second movable portion 31b.

次に、第１基板２に備えられる第１支持部２４、２５の変形例、及び、第２基板３に備えられる第２支持部３４の変形例について説明する。図９は、本変形例に係る第１支持部２４Ａ、２５Ａを備える第１基板２、及び、本変形例に係る第２支持部３４１Ａ、３４２Ａを備える第２基板３の全体斜視図である。   Next, a modified example of the first support parts 24 and 25 provided on the first substrate 2 and a modified example of the second support part 34 provided on the second substrate 3 will be described. FIG. 9 is an overall perspective view of the first substrate 2 including the first support portions 24A and 25A according to the present modification example and the second substrate 3 including the second support portions 341A and 342A according to the present modification example.

図９に示すように、本変形例に係る第１支持部２４Ａ、２５Ａは、第１可動部２１側が２つに分かれ、第１可動部２１側の２つの部分のそれぞれは、蛇行し、互いに離間した第１可動部２１の部位に接続されている。   As shown in FIG. 9, the first support parts 24A and 25A according to this modification are divided into two parts on the first movable part 21 side, and each of the two parts on the first movable part 21 side meanders to each other. It is connected to a part of the first movable part 21 that is separated.

一方、本変形例に係る第２支持部３４１Ａは、第２可動部３１の内側の端部のうち第１軸線Ｘの一方側の端部と、第２固定部３２の第１軸線Ｘの一方側の端部とを接続している。また、本変形例に係る第２支持部３４２Ａは、第２可動部３１の内側の端部のうち第１軸線Ｘの他方側の端部と、第２固定部３２の第１軸線Ｘの他方側の端部とを接続している。これらの第２支持部３４１Ａ、３４２Ａは蛇行している。尚、本変形例に係る第２支持部３４１Ａ、３４２Ａを備える第２基板３においては、図９に示すように、第２固定部３２は１つのみであってもよい。   On the other hand, the second support portion 341 </ b> A according to this modification includes one end of the first axis X on the inner end of the second movable portion 31 and one of the first axes X of the second fixed portion 32. The end of the side is connected. Further, the second support portion 342A according to the present modification includes the other end of the first axis X of the second fixed portion 32 and the other end of the first axis X among the inner ends of the second movable portion 31. The end of the side is connected. These second support portions 341A and 342A meander. In addition, in the 2nd board | substrate 3 provided with 2nd support part 341A, 342A which concerns on this modification, as shown in FIG. 9, the 2nd fixing | fixed part 32 may be only one.

第１基板３と第２基板２との組み合わせは、図１又は図２を参照して前述した実施形態に係る第１基板２と前述した実施形態に係る第２基板３との組み合わせの他、次の３通りの組み合わせの中から任意の１つを採用することができる。１つ目は、本変形例に係る第１支持部２４Ａ、２５Ａを備えた第１基板２と、本変形例に係る第２支持部３４１Ａ、３４２Ａを備えた第２基板３との組み合わせである。また、２つ目は、前述した実施形態に係る第１支持部２４、２５を備えた第１基板２と、本変形例に係る第２支持部３４１Ａ、３４２Ａを備えた第２基板３との組み合わせである。さらに、３つ目は、本変形例に係る第１支持部２４Ａ、２５Ａを備えた第１基板２と、前述した実施形態に係る第２支持部３４を備えた第２基板３との組み合わせである。   The combination of the first substrate 3 and the second substrate 2 is a combination of the first substrate 2 according to the embodiment described above with reference to FIG. 1 or 2 and the second substrate 3 according to the embodiment described above, Any one of the following three combinations can be adopted. The first is a combination of the first substrate 2 including the first support portions 24A and 25A according to the present modification and the second substrate 3 including the second support portions 341A and 342A according to the present modification. . Second, the first substrate 2 including the first support portions 24 and 25 according to the above-described embodiment and the second substrate 3 including the second support portions 341A and 342A according to the present modification. It is a combination. Furthermore, the third is a combination of the first substrate 2 provided with the first support portions 24A and 25A according to this modification and the second substrate 3 provided with the second support portion 34 according to the above-described embodiment. is there.

次に、第２基板の変形例について説明する。図１０は、本変形例に係る第２基板３Ａの平面図である。図１０に示すように、本変形例に係る第２基板３Ａは、実施形態に係る第２基板３と同様に、第２可動部３１Ａと、第２固定部３２Ａ、３３Ａと、第２支持部３４Ａとを備える。   Next, a modified example of the second substrate will be described. FIG. 10 is a plan view of the second substrate 3A according to the present modification. As shown in FIG. 10, the second substrate 3A according to this modification example is similar to the second substrate 3 according to the embodiment in that the second movable portion 31A, the second fixed portions 32A and 33A, and the second support portion. 34A.

第２可動部３１Ａは、第１軸線Ｘと直交する方向の幅が狭まった狭小部分３１２Ａを具備する。この狭小部分３１２Ａの第１軸線Ｘと直交する方向の幅は、実施形態に係る第２可動部３１の幅よりも狭くすることができる。さらに、第２可動部３１Ａは、この狭小部分３１２Ａの第１軸線Ｘ方向の両方に位置する幅広部分３１３Ａを具備する。幅広部分３１３Ａには、第１固定部が積層される。第２固定部３２Ａは、狭小部分３１２Ａに対して第２軸線Ｙ方向の一方側に配置され、第２固定部３３Ａは、狭小部分３１２Ａに対して第２軸線Ｙ方向の他方側に配置されている。第２支持部３４Ａは、狭小部分３１２Ａと第２固定部３２Ａ、３３Ａとを連結し、第２固定部３２Ａ、３３Ａに対して第２可動部３１Ａを第２軸線Ｙ周りに揺動可能に支持する。このような第２基板３Ａの上面には、実施形態に係る第２基板３と同様に各種の電極、及び、第２コイルが敷設される。   The second movable portion 31A includes a narrow portion 312A having a narrow width in a direction orthogonal to the first axis X. The width of the narrow portion 312A in the direction orthogonal to the first axis X can be made narrower than the width of the second movable portion 31 according to the embodiment. Further, the second movable portion 31A includes a wide portion 313A located in both the first axis X direction of the narrow portion 312A. A first fixing portion is stacked on the wide portion 313A. The second fixing portion 32A is disposed on one side in the second axis Y direction with respect to the narrow portion 312A, and the second fixing portion 33A is disposed on the other side in the second axis Y direction with respect to the narrow portion 312A. Yes. The second support portion 34A connects the narrow portion 312A and the second fixed portions 32A and 33A, and supports the second movable portion 31A to be swingable around the second axis Y with respect to the second fixed portions 32A and 33A. To do. Various electrodes and a second coil are laid on the upper surface of the second substrate 3A like the second substrate 3 according to the embodiment.

以上のように、本変形例に係る第２基板３Ａにおいては、第２固定部３２Ａ、３３Ａは、第２可動部３１Ａの狭小部分３１２Ａと連結されている。よって、第２可動部３１Ａに狭小部分３１２Ａを形成することによって生まれた空間部に、第２固定部３２Ａ、３３Ａを配置することができる。このような空間部に、第２固定部３２Ａ、３３Ａを配置できるので、本変形例に係る第２基板３Ａが用いられたＭＥＭＳアクチュエータは、第１可動部の法線方向から見たときにおける寸法を小さくすることが可能である。このため、本変形例に係る第２基板３Ａが用いられたＭＥＭＳアクチュエータは、実施形態に係るＭＥＭＳアクチュエータ１と同様の効果を有する。   As described above, in the second substrate 3A according to this modification, the second fixed portions 32A and 33A are connected to the narrow portion 312A of the second movable portion 31A. Therefore, the second fixed portions 32A and 33A can be arranged in the space created by forming the narrow portion 312A in the second movable portion 31A. Since the second fixed portions 32A and 33A can be disposed in such a space portion, the MEMS actuator using the second substrate 3A according to the present modification has dimensions as viewed from the normal direction of the first movable portion. Can be reduced. For this reason, the MEMS actuator using the second substrate 3A according to the present modification has the same effect as the MEMS actuator 1 according to the embodiment.

図１は、実施形態に係るＭＥＭＳアクチュエータが備える第１基板及び第２基板の全体斜視図である。FIG. 1 is an overall perspective view of a first substrate and a second substrate included in the MEMS actuator according to the embodiment. 図２は、第１基板及び第２基板の分解斜視図である。FIG. 2 is an exploded perspective view of the first substrate and the second substrate. 図３は、第２基板の下面図である。FIG. 3 is a bottom view of the second substrate. 図４は、実施形態に係るＭＥＭＳアクチュエータの全体斜視図である。FIG. 4 is an overall perspective view of the MEMS actuator according to the embodiment. 図５は、実施形態に係るＭＥＭＳアクチュエータの分解斜視図である。但し、ヨークを省略している。FIG. 5 is an exploded perspective view of the MEMS actuator according to the embodiment. However, the yoke is omitted. 図６は、図４のＡ−Ａ端面図である。6 is an AA end view of FIG. 図７は、図４のＢ―Ｂ端面図である。FIG. 7 is an end view taken along the line BB in FIG. 図８は、第２磁界発生手段を、第１軸線方向に第２可動部に対して離間して配置したときの実施形態に係るＭＥＭＳアクチュエータの図４のＢ−Ｂ端面図である。FIG. 8 is a BB end view of FIG. 4 of the MEMS actuator according to the embodiment when the second magnetic field generating means is disposed apart from the second movable part in the first axial direction. 図９は、変形例に係る第１支持部を備える第１基板、及び、変形例に係る第２支持部を備える第２基板の全体斜視図である。FIG. 9 is an overall perspective view of the first substrate including the first support portion according to the modification and the second substrate including the second support portion according to the modification. 図１０は、変形例に係る第２基板の平面図である。FIG. 10 is a plan view of a second substrate according to a modification. 図１１は、特許文献１に記載のＭＥＭＳアクチュエータの構成を示す図である。FIG. 11 is a diagram showing a configuration of the MEMS actuator described in Patent Document 1. As shown in FIG. 図１２は、特許文献２に記載のＭＥＭＳアクチュエータの構成を示す図である。FIG. 12 is a diagram showing a configuration of the MEMS actuator described in Patent Document 2. As shown in FIG.

符号の説明Explanation of symbols

１…ＭＥＭＳアクチュエータ、２…第１基板、３、３Ａ…第２基板、２１…第１可動部、２２、２３…第１固定部、２４、２４Ａ、２５、２５Ａ…第１支持部、３１、３１Ａ…第２可動部、３２、３２Ａ、３３、３３Ａ…第２固定部、３４、３４Ａ、３４１Ａ、３４２Ａ…第２支持部 DESCRIPTION OF SYMBOLS 1 ... MEMS actuator, 2 ... 1st board | substrate, 3 and 3A ... 2nd board | substrate, 21 ... 1st movable part, 22, 23 ... 1st fixed part, 24, 24A, 25, 25A ... 1st support part, 31, 31A: second movable part, 32, 32A, 33, 33A ... second fixed part, 34, 34A, 341A, 342A ... second support part

Claims (4)

第１基板と、前記第１基板の片面に積層される第２基板とを備え、
前記第１基板は、
第１固定部と、第１可動部と、前記第１固定部に対して前記第１可動部を第１軸線周りに揺動可能に支持する第１支持部とを有し、
前記第２基板は、
前記第１固定部が積層され、内側に空間部が形成された第２可動部と、前記空間部に配置される第２固定部と、前記第２固定部に対して前記第２可動部を前記第１軸線と方向が異なる第２軸線周りに揺動可能に支持する第２支持部とを有することを特徴とするＭＥＭＳアクチュエータ。 A first substrate and a second substrate laminated on one side of the first substrate;
The first substrate is
A first fixed portion; a first movable portion; and a first support portion that supports the first movable portion so as to be swingable about a first axis with respect to the first fixed portion.
The second substrate is
A second movable part formed by laminating the first fixed part and having a space formed inside; a second fixed part disposed in the space; and the second movable part with respect to the second fixed part. A MEMS actuator, comprising: a second support portion that is supported so as to be swingable around a second axis whose direction is different from that of the first axis. 第１基板と、前記第１基板の片面に積層される第２基板とを備え、
前記第１基板は、
第１固定部と、第１可動部と、前記第１固定部に対して前記第１可動部を第１軸線周りに揺動可能に支持する第１支持部とを有し、
前記第２基板は、
前記第１固定部が積層され、且つ、前記第１軸線と直交する方向の幅が狭まった狭小部分を具備する第２可動部と、第２固定部と、前記狭小部分と前記第２固定部とを連結し、前記第２固定部に対して前記第２可動部を前記第１軸線と方向が異なる第２軸線周りに揺動可能に支持する第２支持部とを有することを特徴とするＭＥＭＳアクチュエータ。 A first substrate and a second substrate laminated on one side of the first substrate;
The first substrate is
A first fixed portion; a first movable portion; and a first support portion that supports the first movable portion so as to be swingable about a first axis with respect to the first fixed portion.
The second substrate is
A second movable portion having a narrow portion in which the first fixed portion is stacked and a width in a direction orthogonal to the first axis is narrowed, a second fixed portion, the narrow portion, and the second fixed portion And a second support part that supports the second movable part so as to be swingable about a second axis whose direction is different from that of the first axis with respect to the second fixed part. MEMS actuator. 前記第１可動部に敷設される第１コイルと、
前記第１可動部の法線方向から見て、前記第１可動部と異なる前記第２可動部の部位に敷設される第２コイルと、
前記第１可動部の法線方向に前記第１可動部に対して離間して配置され、前記第１コイルに磁界を及ぼして、前記第１コイルに前記第１可動部の法線方向の電磁力を発生させることによって、前記第１可動部を前記第１軸線周りに揺動させる第１磁界発生手段と、
前記第１軸線方向に前記第２可動部に対して離間して配置され、前記第２コイルに磁界を及ぼして、前記第２コイルに前記第２可動部の法線方向の電磁力を発生させることによって、前記第２可動部を前記第２軸線周りに揺動させる第２磁界発生手段とを備えることを特徴とする請求項１又２に記載のＭＥＭＳアクチュエータ。 A first coil laid on the first movable part;
A second coil laid in a part of the second movable part different from the first movable part as seen from the normal direction of the first movable part;
The first movable part is arranged in the normal direction of the first movable part and is spaced apart from the first movable part. The magnetic field is applied to the first coil, and the first coil has an electromagnetic force in the normal direction of the first movable part. First magnetic field generating means for swinging the first movable part around the first axis by generating a force;
The first coil is disposed in the first axial direction so as to be separated from the second movable part, and exerts a magnetic field on the second coil to generate an electromagnetic force in the normal direction of the second movable part on the second coil. 3. The MEMS actuator according to claim 1, further comprising: a second magnetic field generation unit configured to swing the second movable portion around the second axis. 4. 前記第１可動部に敷設される第１コイルと、
前記第１可動部の法線方向から見て、前記第１可動部と異なる前記第２可動部の部位に敷設される第２コイルと、
前記第１可動部の法線方向に前記第１可動部に対して離間して配置され、前記第１コイルに磁界を及ぼして、前記第１コイルに前記第１可動部の法線方向の電磁力を発生させることによって、前記第１可動部を前記第１軸線周りに揺動させる第１磁界発生手段と、
前記第２可動部の法線方向に前記第２可動部に対して離間して配置され、前記第２コイルに磁界を及ぼして、前記第２コイルに前記第２可動部の法線方向の電磁力を発生させることによって、前記第２可動部を前記第２軸線周りに揺動させる第２磁界発生手段とを備えることを特徴とする請求項１又２に記載のＭＥＭＳアクチュエータ。 A first coil laid on the first movable part;
A second coil laid in a part of the second movable part different from the first movable part as seen from the normal direction of the first movable part;
The first movable part is arranged in the normal direction of the first movable part and is spaced apart from the first movable part. The magnetic field is applied to the first coil, and the first coil has an electromagnetic force in the normal direction of the first movable part. First magnetic field generating means for swinging the first movable part around the first axis by generating a force;
The second movable part is arranged in the normal direction of the second movable part and is spaced apart from the second movable part, applies a magnetic field to the second coil, and the electromagnetic force in the normal direction of the second movable part acts on the second coil. 3. The MEMS actuator according to claim 1, further comprising: a second magnetic field generation unit configured to swing the second movable portion around the second axis by generating a force. 4.
JP2008105333A 2008-04-15 2008-04-15 Mems actuator Withdrawn JP2011128173A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008105333A JP2011128173A (en) 2008-04-15 2008-04-15 Mems actuator
PCT/JP2009/057578 WO2009128473A1 (en) 2008-04-15 2009-04-15 Mems actuator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008105333A JP2011128173A (en) 2008-04-15 2008-04-15 Mems actuator

Publications (1)

Publication Number Publication Date
JP2011128173A true JP2011128173A (en) 2011-06-30

Family

ID=41199161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008105333A Withdrawn JP2011128173A (en) 2008-04-15 2008-04-15 Mems actuator

Country Status (2)

Country Link
JP (1) JP2011128173A (en)
WO (1) WO2009128473A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011521792A (en) * 2008-04-29 2011-07-28 ミクラリン インコーポレイティッド MEMS device that rotates independently on two rotation axes
JP2018130031A (en) * 2018-05-25 2018-08-16 ミネベアミツミ株式会社 Vibration generator

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008026649A (en) * 2006-07-21 2008-02-07 Citizen Miyota Co Ltd Planar type actuator and optical attenuator using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011521792A (en) * 2008-04-29 2011-07-28 ミクラリン インコーポレイティッド MEMS device that rotates independently on two rotation axes
US9036229B2 (en) 2008-04-29 2015-05-19 Micralyne Inc. MEMS device with independent rotation in two axes of rotation
JP2018130031A (en) * 2018-05-25 2018-08-16 ミネベアミツミ株式会社 Vibration generator

Also Published As

Publication number Publication date
WO2009128473A1 (en) 2009-10-22

Similar Documents

Publication Publication Date Title
JP6349229B2 (en) Biaxial optical deflector and manufacturing method thereof
JP4251206B2 (en) Actuator, optical scanner and image forming apparatus
JP4232835B2 (en) Actuator, optical scanner and image forming apparatus
JP5099020B2 (en) Optical scanning apparatus and image forming apparatus
JP6805225B2 (en) Drive
US9759908B2 (en) Optical scanner, image display device, head mount display, and heads-up display
WO2015092907A1 (en) Drive device
JP2007014130A (en) Planar-type electromagnetic actuator
JPWO2008149796A1 (en) Optical scanning actuator
JP2010169948A (en) Rocking mirror for optical scanner, rocking state detector, and optical scanner
JPH08334723A (en) Optical deflection element
KR100941798B1 (en) Scanning micromirror
JP2011128173A (en) Mems actuator
JP5447411B2 (en) Two-dimensional optical scanning device and image projection device
JP4968760B1 (en) Actuator
JP5949345B2 (en) Actuator, optical scanner, image display device, and head mounted display
JP2006072251A (en) Planar type actuator
JP4720699B2 (en) Actuator, optical scanner and image forming apparatus
WO2014162521A1 (en) Actuator
JP2004237400A (en) Planar-type actuator
JP5806089B2 (en) Planar type electromagnetic actuator
JP5294033B2 (en) Optical scanning apparatus and image forming apparatus
WO2021100803A1 (en) Mirror scanner
JP7512487B2 (en) Optical Modules
JP4882595B2 (en) Optical scanner and image forming apparatus

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20110705