JP2011046792A - Light resistance improver for synthetic resin and synthetic resin product, and method for improving light resistance - Google Patents

Light resistance improver for synthetic resin and synthetic resin product, and method for improving light resistance Download PDF

Info

Publication number
JP2011046792A
JP2011046792A JP2009194732A JP2009194732A JP2011046792A JP 2011046792 A JP2011046792 A JP 2011046792A JP 2009194732 A JP2009194732 A JP 2009194732A JP 2009194732 A JP2009194732 A JP 2009194732A JP 2011046792 A JP2011046792 A JP 2011046792A
Authority
JP
Japan
Prior art keywords
light resistance
nickel salt
urethane
nylon resin
sulfonic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009194732A
Other languages
Japanese (ja)
Other versions
JP5190576B2 (en
Inventor
Hiroshi Izumida
博志 泉田
Nagisa Sugiyama
渚 杉山
Aya Kuge
彩 久家
Hironori Oda
博則 織田
Yasumi Donowaki
靖已 堂ノ脇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PYRAMID KK
Osaka Kyoiku University NUC
Fukuoka Prefecture
Original Assignee
PYRAMID KK
Osaka Kyoiku University NUC
Fukuoka Prefecture
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PYRAMID KK, Osaka Kyoiku University NUC, Fukuoka Prefecture filed Critical PYRAMID KK
Priority to JP2009194732A priority Critical patent/JP5190576B2/en
Publication of JP2011046792A publication Critical patent/JP2011046792A/en
Application granted granted Critical
Publication of JP5190576B2 publication Critical patent/JP5190576B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Anti-Oxidant Or Stabilizer Compositions (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a light resistance improver improving the light resistance of a urethane resin and a nylon resin, and products produced therefrom compared to that by nickel p-toluenesulfonate, and not or hardly affecting the coloring of a final product, and to provide a method for improving the light resistance. <P>SOLUTION: The light resistance is improved by adding at least one kind of nickel mesitylenesulfonate, nickel m-xylene-4-sulfonate and nickel polystyrenesulfonate to the urethane resin, the urethane resin composition or the urethane resin product, or adding at least one of the nickel mesitylenesulfonate and the nickel m-xylene-4-sulfonate to the nylon resin, the nylon resin composition or the nylon resin product. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、合成樹脂及び合成樹脂製品の耐光性向上剤及び耐光性向上方法に係り、更に詳しくは、ウレタン樹脂、ナイロン樹脂又はウレタン-ナイロン樹脂複合材料、又はそれらから作られる製品の耐光性向上を図ると共に、最終製品の色合いに影響を及ぼさないか又は及ぼしにくいものに関する。   The present invention relates to a light resistance improver and a light resistance improvement method for synthetic resins and synthetic resin products, and more specifically, to improve light resistance of urethane resins, nylon resins or urethane-nylon resin composite materials, or products made therefrom. In addition, the present invention relates to a product that does not affect or hardly affects the color of the final product.

例えば、ウレタン樹脂は、空気中の酸素で酸化され、強度の低下、ひび割れ、黄変を起こす。特に紫外線などの光、水によって酸化が促進される。紫外線などの光、水などの耐候劣化を防ぐためには紫外線吸収剤や光安定剤、酸化防止剤などを用いて劣化対策を行うのが一般的である。   For example, urethane resin is oxidized by oxygen in the air, causing a decrease in strength, cracking, and yellowing. In particular, oxidation is promoted by light such as ultraviolet rays and water. In order to prevent deterioration of weather resistance such as light such as ultraviolet rays and water, it is common to take countermeasures against deterioration using ultraviolet absorbers, light stabilizers, antioxidants, and the like.

紫外線など光に対する耐光性材料の一つとして、一重項酸素クエンチャーがある。一重項酸素クエンチャーには、フェノール類、カロチン類、或いはニッケル錯体などがあるが、いずれもクエンチャー機能が低かったり、光劣化を起こしたり、有色(濃色)であるために最終製品の色合いに影響を及ぼすなどの課題があり、耐光性が必要な製品、例えばライフジャケットの基材、トラック用の幌材、自動車用のトノカバー、懸垂幕等に使用するには十分とはいえない。   One light-resistant material against light such as ultraviolet rays is a singlet oxygen quencher. Singlet oxygen quenchers include phenols, carotenes, or nickel complexes, all of which have low quencher function, cause photodegradation, and are colored (dark), so the color of the final product It is not sufficient for use in products that require light resistance, such as base materials for life jackets, hood materials for trucks, tonneau covers for automobiles, and banners.

特許文献1には、一重項酸素クエンチャーとしてベンゼンスルホン酸ニッケル塩、p-トルエンスルホン酸ニッケル塩等が開示されており、その中でもp-トルエンスルホン酸ニッケル塩は、無色性の一重項酸素クエンチャーであるため、染料の色調や色彩に悪影響を及ぼすおそれが少なく、幅広い染料と併用して用いることができることが記載されている(段落〔0028〕参照)。   Patent Document 1 discloses benzenesulfonic acid nickel salt, p-toluenesulfonic acid nickel salt, and the like as singlet oxygen quenchers. Among them, p-toluenesulfonic acid nickel salt is colorless singlet oxygen quencher. Since it is a char, it is less likely to adversely affect the color tone and color of the dye and can be used in combination with a wide range of dyes (see paragraph [0028]).

また、非特許文献1には、ニッケルp-トルエンスルホン酸塩(NTS)は無色性(λmax=221nm)で、有効な一重項酸素脱活性化効果を有していることが記載されている。   Non-Patent Document 1 describes that nickel p-toluenesulfonate (NTS) is colorless (λmax = 221 nm) and has an effective singlet oxygen deactivation effect.

特開平8−108699号公報JP-A-8-108699

織田博則、「色素の退色防止」、シーエムシー出版刊、 2007年10月Hironori Oda, “Preventing fading of pigments”, published by CMC Publishing, October 2007

しかし、本発明者等の実験によれば、p-トルエンスルホン酸ニッケル塩は、ウレタン樹脂、ナイロン樹脂、ウレタン-ナイロン樹脂複合材料で黄変現象があり、このため更なる耐光性の向上が必要とされる。   However, according to experiments by the present inventors, p-toluenesulfonic acid nickel salt has a yellowing phenomenon in urethane resin, nylon resin, and urethane-nylon resin composite material. Therefore, further improvement in light resistance is necessary. It is said.

本発明者等は、耐光性及び耐溶出性化合物の研究を行っており、透明性を有するニッケル化合物について着目し、ニッケル化合物の疎水化と耐光性の向上を図るべく実験を重ね、耐光性の試験を行ったところ、アリールスルホン酸ニッケル塩である、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩、及びポリスチレンスルホン酸ニッケル塩は、いずれもp-トルエンスルホン酸ニッケル塩よりはるかに耐光性があることを知見した。特に、これらの化合物は、ウレタン樹脂、ナイロン樹脂での耐光性機能が高いことがわかった。本発明は、この知見に基づいて完成したものである。   The present inventors have been studying light resistance and elution resistance compounds, paying attention to the nickel compound having transparency, repeated experiments to improve the hydrophobicity and light resistance of the nickel compound, When tested, the aryl sulfonic acid nickel salt, mesitylene sulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt, and polystyrene sulfonic acid nickel salt are all far more than p-toluene sulfonic acid nickel salt. Has been found to have light resistance. In particular, these compounds were found to have a high light resistance function in urethane resins and nylon resins. The present invention has been completed based on this finding.

(発明の目的)
そこで、本発明の目的は、p-トルエンスルホン酸ニッケル塩に比べてウレタン樹脂、ナイロン樹脂及びそれらから作られる製品の耐光性向上を図ると共に、最終製品の色合いに影響を及ぼさないか又は及ぼしにくい耐光性向上剤及び耐光性向上方法を提供することにある。
(Object of invention)
Therefore, the object of the present invention is to improve the light resistance of urethane resin, nylon resin and products made from them compared to p-toluenesulfonic acid nickel salt, and does not affect or hardly affect the color of the final product. The object is to provide a light fastness improving agent and a light fastness improving method.

上記課題を解決するために本発明が講じた手段は次のとおりである。   Means taken by the present invention to solve the above problems are as follows.

本発明は、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩又はポリスチレンスルホン酸ニッケル塩の少なくとも一種を含む、ウレタン樹脂、ウレタン樹脂組成物又はウレタン樹脂製品の耐光性向上剤である。   The present invention is a light resistance improver for a urethane resin, a urethane resin composition or a urethane resin product containing at least one of nickel mesitylene sulfonate, nickel m-xylene-4-sulfonate or nickel polystyrene sulfonate. .

本発明は、ウレタン樹脂、ウレタン樹脂組成物又はウレタン樹脂製品に、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩又はポリスチレンスルホン酸ニッケル塩の少なくとも一種を添加することを含む、耐光性向上方法である。   The present invention comprises adding at least one of mesitylene sulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt or polystyrene sulfonic acid nickel salt to a urethane resin, a urethane resin composition or a urethane resin product. It is a property improvement method.

本発明は、ウレタン樹脂100重量部に対してメシチレンスルホン酸ニッケル塩0.3重量部未満を添加することを含む、ウレタン樹脂の耐光性向上方法である。   This invention is the light resistance improvement method of a urethane resin including adding less than 0.3 weight part of mesitylenesulfonic acid nickel salt with respect to 100 weight part of urethane resins.

本発明は、ウレタン樹脂100重量部に対してm-キシレン-4-スルホン酸ニッケル塩0.35重量部未満を添加することを含む、ウレタン樹脂の耐光性向上方法である。   The present invention is a method for improving the light resistance of a urethane resin, comprising adding less than 0.35 parts by weight of m-xylene-4-sulfonic acid nickel salt to 100 parts by weight of the urethane resin.

本発明は、メシチレンスルホン酸ニッケル塩又はm-キシレン-4-スルホン酸ニッケル塩の少なくとも一種を含む、ナイロン樹脂、ナイロン樹脂組成物又はナイロン樹脂製品の耐光性向上剤である。   The present invention is a light resistance improver for a nylon resin, a nylon resin composition or a nylon resin product, containing at least one of mesitylenesulfonic acid nickel salt or m-xylene-4-sulfonic acid nickel salt.

本発明は、ナイロン樹脂、ナイロン樹脂組成物又はナイロン樹脂製品に、メシチレンスルホン酸ニッケル塩又はm-キシレン-4-スルホン酸ニッケル塩の少なくとも一種を添加することを含む、耐光性向上方法である。   The present invention is a method for improving light resistance, comprising adding at least one of mesitylenesulfonic acid nickel salt or m-xylene-4-sulfonic acid nickel salt to a nylon resin, a nylon resin composition or a nylon resin product.

ナイロン樹脂100重量部に対してメシチレンスルホン酸ニッケル塩0.25重量部以下を添加することを含む、ナイロン樹脂の耐光性向上方法である。 A method for improving the light resistance of a nylon resin, comprising adding 0.25 parts by weight or less of nickel mesitylene sulfonate to 100 parts by weight of the nylon resin.

本発明は、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩又はポリスチレンスルホン酸ニッケル塩の少なくとも一種を含む、
ウレタン-ナイロン樹脂複合材料、ウレタン-ナイロン樹脂複合材料組成物又はウレタン-ナイロン樹脂複合材料製品の耐光性向上剤である。
The present invention includes at least one of mesitylenesulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt or polystyrenesulfonic acid nickel salt,
It is a light resistance improver for urethane-nylon resin composite material, urethane-nylon resin composite material composition or urethane-nylon resin composite material product.

本発明は、ウレタン-ナイロン樹脂複合材料、ウレタン-ナイロン樹脂複合材料組成物又はウレタン-ナイロン樹脂複合材料製品に、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩又はポリスチレンスルホン酸ニッケル塩の少なくとも一種を添加することを含む、耐光性向上方法である。   The present invention relates to urethane-nylon resin composite material, urethane-nylon resin composite material composition or urethane-nylon resin composite material product, mesitylene sulfonate nickel salt, m-xylene-4-sulfonate nickel salt or polystyrene sulfonate nickel A method for improving light resistance comprising adding at least one salt.

なお、「発明を実施するための形態」及び「実施例」では、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩又はポリスチレンスルホン酸ニッケル塩をウレタン樹脂に、また、メシチレンスルホン酸ニッケル塩又はm-キシレン-4-スルホン酸ニッケル塩をナイロン樹脂に添加した事例についてについて言及し、ウレタン-ナイロン樹脂複合材料については言及していない。   In the “Mode for Carrying Out the Invention” and “Example”, mesitylenesulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt or polystyrene sulfonic acid nickel salt is used as a urethane resin, and mesitylenesulfonic acid. Reference is made to the case where nickel salt or nickel m-xylene-4-sulfonate is added to the nylon resin, and no mention is made of the urethane-nylon resin composite material.

しかし、ウレタン-ナイロン樹脂複合材料は、ウレタン樹脂およびナイロン樹脂が配合されて複合材料になっただけであり、前記耐光性向上剤の作用効果においてウレタン-ナイロン樹脂複合材料を排除する要因は見当たらないから、ウレタン樹脂、ナイロン樹脂の結果はウレタン-ナイロン樹脂複合材料についても妥当する。   However, the urethane-nylon resin composite material is only a composite material by blending urethane resin and nylon resin, and there is no factor to eliminate the urethane-nylon resin composite material in the effect of the light resistance improver. Therefore, the results of urethane resin and nylon resin are also valid for urethane-nylon resin composite material.

本発明によれば、p-トルエンスルホン酸ニッケル塩に比べてウレタン樹脂、ナイロン樹脂又はウレタン-ナイロン樹脂複合材料又はそれらから作られる製品の耐光性向上を図ると共に、最終製品の色合いに影響を及ぼさないか、又は及ぼしにくい耐光性向上剤、耐光性向上方法が提供できる。   According to the present invention, compared to p-toluenesulfonic acid nickel salt, the light resistance of urethane resin, nylon resin or urethane-nylon resin composite material or products made therefrom is improved, and the color of the final product is affected. There can be provided a light resistance improver and a light resistance improvement method that are not or hardly exerted.

本発明に係る耐光性向上剤として、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩、ポリスチレンスルホン酸ニッケル塩が挙げられる。下記にこれらの化合物の合成方法を説明するが、下記の合成方法は、一例を示したものであり、他の合成方法を排除する意図はない。   Examples of the light fastness improver according to the present invention include mesitylenesulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt, and polystyrenesulfonic acid nickel salt. Although the synthesis method of these compounds is demonstrated below, the following synthesis method shows an example and does not intend to exclude other synthesis methods.

〔メシチレンスルホン酸ニッケル塩の合成〕
メシチレンスルホン酸ニッケル塩の合成は次のようにして行った。
メシチレンスルホン酸・2水和物(東京化成工業株式会社製)300g(1.5mol)を水300mlに加え、70℃で溶解させた後、塩化ニッケル(無水)(キシダ化学株式会社製)を97.1g(0.75mol)加えた。析出物を水で十分に洗浄して櫨取し、乾燥させてメシチレンスルホン酸ニッケル塩を得た。メシチレンスルホン酸ニッケル塩の収量は205gであった。
また、この化合物は水中でλmax=208nmであった。
(Synthesis of nickel mesitylene sulfonate)
The synthesis of nickel mesitylene sulfonate was carried out as follows.
After adding 300 g (1.5 mol) of mesitylenesulfonic acid dihydrate (manufactured by Tokyo Chemical Industry Co., Ltd.) to 300 ml of water and dissolving at 70 ° C., 97.1 g of nickel chloride (anhydrous) (manufactured by Kishida Chemical Co., Ltd.) (0.75 mol) was added. The precipitate was sufficiently washed with water, collected and dried to obtain nickel mesitylene sulfonate. The yield of mesitylenesulfonic acid nickel salt was 205 g.
Further, this compound had λmax = 208 nm in water.

下記にメシチレンスルホン酸ニッケル塩の構造式を示す。   The structural formula of nickel mesitylene sulfonate is shown below.

Figure 2011046792
Figure 2011046792

〔m-キシレン-4-スルホン酸ニッケル塩の合成〕
m-キシレン-4-スルホン酸ニッケル塩の合成は次のようにして行った。
m-キシレン-4-スルホン酸ナトリウム・1水和物(東京化成工業株式会社製)502g(2.3mol)を水1リットルに加え、70℃で溶解させた後、塩化ニッケル(無水)(キシダ化学株式会社製)を155.6g(1.2mol)加えて、温水浴中で3時間撹拌した。反応終了後、室温で放冷し、析出物を櫨取した。これを水で再結晶し、乾燥させてm-キシレン-4-スルホン酸ニッケル塩を得た。m-キシレン-4-スルホン酸ニッケル塩の収量は275gであった。
また、この化合物は水中でλmax=202nmであった。
[Synthesis of nickel salt of m-xylene-4-sulfonic acid]
The synthesis of m-xylene-4-sulfonic acid nickel salt was performed as follows.
After adding 502 g (2.3 mol) of sodium m-xylene-4-sulfonate monohydrate (manufactured by Tokyo Chemical Industry Co., Ltd.) to 1 liter of water and dissolving at 70 ° C., nickel chloride (anhydrous) (Kishida Chemical) 155.6 g (1.2 mol) was added, and the mixture was stirred in a warm water bath for 3 hours. After completion of the reaction, the mixture was allowed to cool at room temperature, and the precipitate was collected. This was recrystallized with water and dried to obtain m-xylene-4-sulfonic acid nickel salt. The yield of m-xylene-4-sulfonic acid nickel salt was 275 g.
Further, this compound had λmax = 202 nm in water.

下記にm-キシレン-4-スルホン酸ニッケル塩の構造式を示す。   The structural formula of m-xylene-4-sulfonic acid nickel salt is shown below.

Figure 2011046792
Figure 2011046792

〔ポリスチレンスルホン酸ニッケル塩の合成〕
ポリスチレンスルホン酸ニッケル塩の合成は、次のようにして行った。
ポリスチレンスルホン酸ナトリウム(ACROS社製、平均分子量70000)10g(0.14mmol)を水80mlに溶かし、塩化ニッケル(無水)(キシダ化学株式会社製)を3.5g(27.1mmol)加え、70℃で3時間撹拌した。反応液は濃縮した後、SephadexG-10にてゲルろ過を行い、回収した溶液を濃縮後、乾燥させてポリスチレンスルホン酸ニッケル塩を得た。ポリスチレンスルホン酸ニッケル塩の収量は4.6gであった。
また、この化合物は水中でλmax=202nmであった。
[Synthesis of polystyrene sulfonate nickel salt]
The synthesis of nickel polystyrene sulfonate was performed as follows.
Dissolve 10 g (0.14 mmol) of sodium polystyrenesulfonate (ACROS, average molecular weight 70000) in 80 ml of water, add 3.5 g (27.1 mmol) of nickel chloride (anhydrous) (manufactured by Kishida Chemical Co., Ltd.), and continue at 70 ° C. for 3 hours. Stir. The reaction solution was concentrated and then subjected to gel filtration with Sephadex G-10. The recovered solution was concentrated and dried to obtain a polystyrene sulfonate nickel salt. The yield of polystyrene sulfonate nickel salt was 4.6 g.
Further, this compound had λmax = 202 nm in water.

下記にポリスチレンスルホン酸ニッケル塩の構造式を示す。   The structural formula of polystyrene sulfonate nickel salt is shown below.

Figure 2011046792
Figure 2011046792

本発明において、ウレタン樹脂としては−NHCOO−のウレタン結合を有するポリウレタン、熱可塑性ポリウレタン、ウレタンフォーム、ウレタンゴムを挙げることができる。
また、ウレタン樹脂製品としては、輸送分野の自動車用シートクッション、ドアパネル、土木建築用の建材、塗料、生活用品の繊維、水着などを挙げることができる。
In the present invention, examples of the urethane resin include polyurethane having a —NHCOO— urethane bond, thermoplastic polyurethane, urethane foam, and urethane rubber.
Examples of urethane resin products include automobile seat cushions, door panels, construction materials for civil engineering, paints, textiles for daily necessities, and swimwear.

本発明において、ナイロン樹脂としては、−NHCO−のポリアミド結合を有するポリアミド系樹脂のナイロン6、ナイロン66、ナイロン46、ナイロンMXD6を挙げることができる。
また、ナイロン樹脂製品としては、生活用品のストッキング、水着、合羽、ウインドブレーカーなどを挙げることができる。
In the present invention, examples of the nylon resin include polyamide resin nylon 6, nylon 66, nylon 46, and nylon MXD6 having a —NHCO— polyamide bond.
In addition, examples of nylon resin products include daily goods stockings, bathing suits, goggles, and windbreakers.

本発明において、ウレタン-ナイロン樹脂複合材料としては上記のウレタン樹脂とナイロン樹脂を複合した材料を挙げることができる。
本発明において、ウレタン-ナイロン樹脂複合材料製品としては人工皮革などを挙げることができる。
In the present invention, examples of the urethane-nylon resin composite material include materials obtained by combining the urethane resin and the nylon resin.
In the present invention, examples of urethane-nylon resin composite material products include artificial leather.

前記方法で得られた、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩、及びポリスチレンスルホン酸ニッケル塩のそれぞれについて、耐光性能の試験を行った。試験は、ウレタン樹脂に着色剤、及び通常製品に配合される光安定剤等の耐光剤を配合した基材(以下、「基材A」という。)を調整して行った。耐光剤を配合したのは実際の製品に近い条件とするためである。
基材Aの配合は表1のとおりである。
Each of the mesitylenesulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt, and polystyrene sulfonic acid nickel salt obtained by the above method was tested for light resistance. The test was performed by adjusting a base material (hereinafter referred to as “base material A”) in which a urethane resin was mixed with a colorant and a light stabilizer such as a light stabilizer that is usually blended in a product. The reason why the light-proofing agent is blended is to make the conditions close to the actual product.
The composition of the substrate A is as shown in Table 1.

Figure 2011046792
Figure 2011046792

前記基材Aに、メシチレンスルホン酸ニッケル塩(表では「メシチレン」と表記する。)、m-キシレン-4-スルホン酸ニッケル塩(表では「m-キシレン」と表記する。)、ポリスチレンスルホン酸ニッケル塩(表では「ポリスチレン」と表記する。)を所要量添加した試料を作成し、耐光性能を測定した。基材Aにp-トルエンスルホン酸ニッケル塩(表では「p-トルエン」と表記する。)を添加した試料も作成し対照とした。   On the base material A, mesitylenesulfonic acid nickel salt (referred to as “mesitylene” in the table), m-xylene-4-sulfonic acid nickel salt (referred to as “m-xylene” in the table), polystyrene sulfonic acid A sample to which a required amount of nickel salt (indicated as “polystyrene” in the table) was added was prepared, and the light resistance was measured. A sample in which p-toluenesulfonic acid nickel salt (referred to as “p-toluene” in the table) was added to the substrate A was also prepared and used as a control.

耐光性試験条件としては、強エネルギーキセノンフェードメーター(スガ試験機株式会社製 SC700-FA型)を使用し、JIS L 0843 キセノンアーク灯光に対する染色堅ろう度試験方法に規定された耐光試験で行い、ブラックパネルの温度を63℃±2℃、キセノンアーク灯光の照射時間を100時間と200時間に分けて行った。   As the light resistance test conditions, a strong energy xenon fade meter (SC700-FA model made by Suga Test Instruments Co., Ltd.) was used, and the light resistance test specified in the dye fastness test method for JIS L 0843 xenon arc lamp was performed. The panel temperature was 63 ° C. ± 2 ° C., and the irradiation time of the xenon arc lamp was divided into 100 hours and 200 hours.

照射後、色差測定装置SE2000(日本電色工業株式会社製)にて、照射面と未照射面との色差ΔE*abを測定した。その結果を表2に示す。照射前の試料の色は灰色であるが、照射後の試料は黄変し、数値が高い方が変色(黄変)の程度が大きいことを表している。   After the irradiation, the color difference ΔE * ab between the irradiated surface and the non-irradiated surface was measured with a color difference measuring device SE2000 (manufactured by Nippon Denshoku Industries Co., Ltd.). The results are shown in Table 2. The color of the sample before irradiation is gray, but the sample after irradiation is yellowed. A higher numerical value indicates a greater degree of discoloration (yellowing).

Figure 2011046792
Figure 2011046792

表2から明らかなように、基材Aにメシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩、ポリスチレンスルホン酸ニッケル塩を添加すると、添加しない場合のブランクに比較して耐光性が向上していることがわかる。   As is apparent from Table 2, when mesitylenesulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt, and polystyrene sulfonic acid nickel salt are added to the base material A, the light resistance is higher than that of the blank when not added. It can be seen that it has improved.

また、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩、ポリスチレンスルホン酸ニッケル塩は、一重項酸素クエンチャーとして知られているp-トルエンスルホン酸ニッケル塩と比較して耐光性能の向上が見られた。   In addition, nickel mesitylene sulfonate, nickel m-xylene-4-sulfonate, and nickel polystyrene sulfonate are light resistant compared to p-toluene sulfonate nickel salt known as singlet oxygen quencher. An improvement was seen.

前記耐光性能の試験でそれぞれの化合物で最適な添加量があることが示唆された。そこで、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩、ポリスチレンスルホン酸ニッケル塩についての添加量の影響を以下の実施例に基づき説明する。実施例1〜3は、ウレタン樹脂の場合、実施例4,5はナイロン樹脂の場合である。   The light resistance test suggested that there was an optimum amount added for each compound. Therefore, the influence of the addition amount on the mesitylenesulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt, and polystyrene sulfonic acid nickel salt will be described based on the following examples. Examples 1 to 3 are for urethane resin, and Examples 4 and 5 are for nylon resin.

〔実施例1〕
実施例1は、ウレタン樹脂にメシチレンスルホン酸ニッケル塩を添加した例である。前記実施の形態で調整した基材Aに、メシチレンスルホン酸ニッケル塩を、0.05重量部の添加から開始し、0.05重量部ずつ追加して0.5重量部に至るまでの10段階に分けて添加した。添加しない場合をブランクとした。
耐光試験条件は前記実施の形態で使用した同じ機器と条件で行い、キセノンアーク灯光の照射時間を100時間と200時間に分けて行った。その結果を表3に示す。
[Example 1]
Example 1 is an example in which nickel mesitylene sulfonate is added to a urethane resin. Starting from the addition of 0.05 part by weight of mesitylenesulfonic acid nickel salt to the base material A prepared in the above embodiment, 10 steps from adding 0.05 parts by weight to 0.5 parts by weight. Added in portions. The case where it was not added was used as a blank.
The light resistance test conditions were the same as those used in the above embodiment, and the xenon arc lamp irradiation time was divided into 100 hours and 200 hours. The results are shown in Table 3.

Figure 2011046792
Figure 2011046792

表3からも明らかなように、ウレタン樹脂にメシチレンスルホン酸ニッケル塩を添加した場合は、ブランクと比べて0.30重量部未満、好ましくは0.25重量部以下に有意差が認められた。特に0.15〜0.25重量部の添加量に顕著に有意差が認められ、耐光性の向上には最も有効であった。
したがって表3の結果から、添加量は0.30重量部未満、更には0.25重量部以下が有効であり、好ましくは0.05重量部以上0.25重量部以下であり、より好ましくは、0.15重量部以上0.25重量部以下である。
As is clear from Table 3, when nickel mesitylene sulfonate was added to the urethane resin, a significant difference was observed in less than 0.30 parts by weight, preferably 0.25 parts by weight or less, compared to the blank. In particular, a significant difference was recognized in the addition amount of 0.15 to 0.25 parts by weight, which was most effective in improving light resistance.
Therefore, from the results of Table 3, the addition amount is less than 0.30 parts by weight, more preferably 0.25 parts by weight or less, preferably 0.05 parts by weight or more and 0.25 parts by weight or less, more preferably 0.15 parts by weight or more and 0.25 parts by weight or less.

〔実施例2〕
実施例2は、ウレタン樹脂にm-キシレン-4-スルホン酸ニッケル塩を添加した例である。前記基材Aに、m-キシレン-4-スルホン酸ニッケル塩を、0.05重量部の添加から開始し、0.05重量部ずつ追加して0.5重量部に至るまでの10段階に分けて添加した。添加しない場合をブランクとした。耐光試験条件は実施例1の場合と同様である。その結果を表4に示す。
[Example 2]
Example 2 is an example in which m-xylene-4-sulfonic acid nickel salt is added to a urethane resin. Starting from the addition of 0.05 parts by weight of m-xylene-4-sulfonic acid nickel salt to the base material A, 0.05 parts by weight is added to reach 10 parts by weight. Added in portions. The case where it was not added was used as a blank. The light resistance test conditions are the same as in Example 1. The results are shown in Table 4.

Figure 2011046792
Figure 2011046792

表4からも明らかなように、ウレタン樹脂にm-キシレン-4-スルホン酸ニッケル塩を添加する場合は、ブランクと比べて0.35重量部未満、好ましくは0.30重量部以下に有意差が認められた。特に0.05重量部での添加量に顕著に有意差が認められた。
したがって表4の結果から、添加量は0.35重量部未満、更には0.3重量部以下が有効であり、好ましくは0.05重量部以上0.30重量部以下である。
As is apparent from Table 4, when m-xylene-4-sulfonic acid nickel salt is added to the urethane resin, the difference is significantly less than 0.35 parts by weight, preferably 0.30 parts by weight or less compared to the blank. Was recognized. In particular, a significant difference was recognized in the amount added at 0.05 part by weight.
Therefore, from the results shown in Table 4, it is effective that the addition amount is less than 0.35 parts by weight, further 0.3 parts by weight or less, and preferably 0.05 parts by weight or more and 0.30 parts by weight or less.

〔実施例3〕
実施例3は、ウレタン樹脂にポリスチレンスルホン酸ニッケル塩を添加した例である。前記基材Aに、ポリスチレンスルホン酸ニッケル塩を、0.1重量部の添加から開始し、0.1重量部ずつ追加して0.50重量部に至るまでの5段階に分けて添加した。添加しない場合をブランクとした。耐光試験条件は実施例1の場合と同様である。その結果を表5に示す。
Example 3
Example 3 is an example in which a nickel polystyrene sulfonate is added to a urethane resin. The polystyrene sulfonate nickel salt was added to the base material A in five stages from the start of addition of 0.1 parts by weight to the addition of 0.1 parts by weight up to 0.50 parts by weight. The case where it was not added was used as a blank. The light resistance test conditions are the same as in Example 1. The results are shown in Table 5.

Figure 2011046792
Figure 2011046792

表5からも明らかなように、ウレタン樹脂にポリスチレンスルホン酸ニッケル塩を添加する場合は、ブランクと比べて0.50重量部以下に有意差が認められた。特に0.10重量部以上0.20重量部以下での添加量に顕著に有意差が認められた。
したがって表5の結果から、添加量は0.50重量部以下が有効であり、好ましくは0.10重量部以上0.50重量部以下である。
As is clear from Table 5, when a polystyrene sulfonate nickel salt was added to the urethane resin, a significant difference was recognized at 0.50 parts by weight or less compared to the blank. In particular, a significant difference was recognized in the addition amount in the range of 0.10 parts by weight to 0.20 parts by weight.
Therefore, from the results shown in Table 5, the effective amount is 0.50 parts by weight or less, preferably 0.10 parts by weight or more and 0.50 parts by weight or less.

〔実施例4〕
実施例4は、ナイロン樹脂にメシチレンスルホン酸ニッケル塩を添加した例である。試験は、ナイロン樹脂に通常製品に配合される光安定剤等の耐光剤を配合した基材(以下、「基材B」という。)を調整して行った。耐光剤を配合したのは実際の製品に近い条件とするためである。なお、実施例4,5は、着色剤は添加していないので、照射前の試料の色は透明であるが、照射後の試料は黄変し、数値が高い方が変色(黄変)の程度が大きいことを表している。
基材Bの配合は表6のとおりである。
Example 4
Example 4 is an example in which nickel mesitylene sulfonate is added to nylon resin. The test was performed by adjusting a base material (hereinafter referred to as “base material B”) in which a light resistance agent such as a light stabilizer usually blended in a product was blended with a nylon resin. The reason why the light-proofing agent is blended is to make the conditions close to the actual product. In Examples 4 and 5, since the colorant was not added, the color of the sample before irradiation was transparent, but the sample after irradiation turned yellow, and the higher the numerical value, the more discolored (yellowing). The degree is large.
The composition of the base material B is as shown in Table 6.

Figure 2011046792
Figure 2011046792

基材Bにメシチレンスルホン酸ニッケル塩を、0.15重量部の添加から開始し、0.05重量部ずつ追加して0.25重量部に至るまでの3段階に分けて添加した。添加しない場合をブランクとし、耐光剤を配合しないナイロン樹脂単独の試験も行った。耐光試験条件は、キセノンアーク灯光の照射時間200時間を行わなかった以外は、実施例1の場合と同様である。その結果を表7に示す。   Starting with the addition of 0.15 parts by weight of the mesitylene sulfonic acid nickel salt to the base material B, 0.05 parts by weight was added in increments of 0.25 parts by weight. A case where no addition was made was a blank, and a test of a nylon resin alone containing no light-proofing agent was also conducted. The light resistance test conditions were the same as in Example 1 except that the irradiation time of xenon arc lamp light was not 200 hours. The results are shown in Table 7.

Figure 2011046792
Figure 2011046792

表7からも明らかなように、ナイロン樹脂にメシチレンスルホン酸ニッケル塩を添加する場合は、ブランクと比較して0.25重量部以下、好ましくは0.15重量部以上0.25重量部以下での添加量に有意差が認められた。なお、添加量を増加すると、耐光性能も向上することが認められる。   As is clear from Table 7, when adding mesitylenesulfonic acid nickel salt to the nylon resin, it is 0.25 parts by weight or less, preferably 0.15 parts by weight or more and 0.25 parts by weight or less compared to the blank. There was a significant difference in the amount of added. In addition, it is recognized that when the addition amount is increased, the light resistance is also improved.

〔実施例5〕
実施例5は、ナイロン樹脂の耐光向上剤としてm-キシレン-4-スルホン酸ニッケル塩を添加した例である。基材Bは実施例4で調整されたものを使用した。
Example 5
Example 5 is an example in which m-xylene-4-sulfonic acid nickel salt is added as a light resistance improver of a nylon resin. The base material B used in Example 4 was used.

基材Bにm-キシレン-4-スルホン酸ニッケル塩を、0.05重量部添加した試験のみを行った。耐光試験条件は実施例4の場合と同じである。その結果を表8に示す。   Only the test in which 0.05 part by weight of m-xylene-4-sulfonic acid nickel salt was added to the base material B was performed. The light resistance test conditions are the same as in Example 4. The results are shown in Table 8.

Figure 2011046792
Figure 2011046792

表8からも明らかなように、ナイロン樹脂にm-キシレン-4-スルホン酸ニッケル塩を0.05重量部添加すると、樹脂のみの場合、ブランクの場合と比較して耐光性の向上には有効である。   As is apparent from Table 8, when 0.05 part by weight of m-xylene-4-sulfonic acid nickel salt is added to the nylon resin, it is effective for improving the light resistance in the case of the resin alone compared to the case of the blank. It is.

なお、本明細書で使用している用語と表現は、あくまでも説明上のものであって、なんら限定的なものではなく、本明細書に記述された特徴およびその一部と等価の用語や表現を除外する意図はない。また、本発明の技術思想の範囲内で、種々の変形態様が可能であるということは言うまでもない。   Note that the terms and expressions used in this specification are merely explanatory and are not limiting at all, and terms and expressions equivalent to the features described in this specification and parts thereof. There is no intention to exclude. It goes without saying that various modifications are possible within the scope of the technical idea of the present invention.

本発明は、ウレタン樹脂、ナイロン樹脂又はウレタン-ナイロン樹脂複合材料、又はそれらから作られる製品の耐光性向上を図ると共に、最終製品の色合いに影響を及ぼさないことが必要な分野、例えばライフジャケットの基材、トラック用の幌材、自動車用のトノカバー、懸垂幕等の分野において有効である。   The present invention aims to improve light resistance of urethane resin, nylon resin or urethane-nylon resin composite material, or a product made from the same, and not to affect the color of the final product, such as life jackets. It is effective in fields such as base materials, truck hoods, automobile tonneau covers, and banners.

Claims (9)

メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩又はポリスチレンスルホン酸ニッケル塩の少なくとも一種を含む、ウレタン樹脂、ウレタン樹脂組成物又はウレタン樹脂製品の耐光性向上剤。 A light resistance improver for urethane resin, urethane resin composition or urethane resin product, comprising at least one of nickel mesitylene sulfonate, nickel m-xylene-4-sulfonate or nickel polystyrene sulfonate. ウレタン樹脂、ウレタン樹脂組成物又はウレタン樹脂製品に、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩又はポリスチレンスルホン酸ニッケル塩の少なくとも一種を添加する、耐光性向上方法。 A method for improving light resistance, comprising adding at least one of mesitylene sulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt or polystyrene sulfonic acid nickel salt to a urethane resin, a urethane resin composition or a urethane resin product. ウレタン樹脂100重量部に対してメシチレンスルホン酸ニッケル塩0.3重量部未満を添加することを含む、ウレタン樹脂の耐光性向上方法。    A method for improving the light resistance of a urethane resin, comprising adding less than 0.3 parts by weight of nickel mesitylene sulfonate to 100 parts by weight of the urethane resin. ウレタン樹脂100重量部に対してm-キシレン-4-スルホン酸ニッケル塩0.35重量部未満を添加することを含む、ウレタン樹脂の耐光性向上方法。    A method for improving the light resistance of a urethane resin, comprising adding less than 0.35 parts by weight of m-xylene-4-sulfonic acid nickel salt to 100 parts by weight of the urethane resin. メシチレンスルホン酸ニッケル塩又はm-キシレン-4-スルホン酸ニッケル塩の少なくとも一種を含む、ナイロン樹脂、ナイロン樹脂組成物又はナイロン樹脂製品の耐光性向上剤。 A light resistance improver for a nylon resin, a nylon resin composition or a nylon resin product, comprising at least one of nickel mesitylene sulfonate and nickel m-xylene-4-sulfonate. ナイロン樹脂、ナイロン樹脂組成物又はナイロン樹脂製品に、メシチレンスルホン酸ニッケル塩又はm-キシレン-4-スルホン酸ニッケル塩の少なくとも一種を添加すること含む、耐光性向上方法。 A method for improving light resistance, comprising adding at least one of mesitylenesulfonic acid nickel salt or m-xylene-4-sulfonic acid nickel salt to a nylon resin, a nylon resin composition or a nylon resin product. ナイロン樹脂100重量部に対してメシチレンスルホン酸ニッケル塩0.25重量部以下を添加することを含む、ナイロン樹脂の耐光性向上方法。    A method for improving the light resistance of a nylon resin, comprising adding 0.25 parts by weight or less of nickel mesitylene sulfonate to 100 parts by weight of the nylon resin. メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩又はポリスチレンスルホン酸ニッケル塩の少なくとも一種を含む、
ウレタン-ナイロン樹脂複合材料、ウレタン-ナイロン樹脂複合材料組成物又はウレタン-ナイロン樹脂複合材料製品の耐光性向上剤。
Including at least one of mesitylene sulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt or polystyrene sulfonic acid nickel salt,
Light resistance improver for urethane-nylon resin composite material, urethane-nylon resin composite material composition or urethane-nylon resin composite material product.
ウレタン-ナイロン樹脂複合材料、ウレタン-ナイロン樹脂複合材料組成物又はウレタン-ナイロン樹脂複合材料製品に、メシチレンスルホン酸ニッケル塩、m-キシレン-4-スルホン酸ニッケル塩又はポリスチレンスルホン酸ニッケル塩の少なくとも一種を添加することを含む、耐光性向上方法。 At least one of mesitylene sulfonic acid nickel salt, m-xylene-4-sulfonic acid nickel salt or polystyrene sulfonic acid nickel salt in urethane-nylon resin composite material, urethane-nylon resin composite material composition or urethane-nylon resin composite material product A method for improving light resistance, comprising adding
JP2009194732A 2009-08-25 2009-08-25 Method for improving light resistance of synthetic resin and synthetic resin product Expired - Fee Related JP5190576B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009194732A JP5190576B2 (en) 2009-08-25 2009-08-25 Method for improving light resistance of synthetic resin and synthetic resin product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009194732A JP5190576B2 (en) 2009-08-25 2009-08-25 Method for improving light resistance of synthetic resin and synthetic resin product

Publications (2)

Publication Number Publication Date
JP2011046792A true JP2011046792A (en) 2011-03-10
JP5190576B2 JP5190576B2 (en) 2013-04-24

Family

ID=43833456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009194732A Expired - Fee Related JP5190576B2 (en) 2009-08-25 2009-08-25 Method for improving light resistance of synthetic resin and synthetic resin product

Country Status (1)

Country Link
JP (1) JP5190576B2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6141381A (en) * 1984-07-31 1986-02-27 大阪府 Enhancement of light fastness of dyed fiber or leather
JPS62267360A (en) * 1986-05-16 1987-11-20 Oouchi Shinko Kagaku Kogyo Kk Light-resistant stabilized polymer colored composition
JPH02132133A (en) * 1989-05-26 1990-05-21 Oouchi Shinko Kagaku Kogyo Kk Polymer coloring composition stable to light

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6141381A (en) * 1984-07-31 1986-02-27 大阪府 Enhancement of light fastness of dyed fiber or leather
JPS62267360A (en) * 1986-05-16 1987-11-20 Oouchi Shinko Kagaku Kogyo Kk Light-resistant stabilized polymer colored composition
JPH02132133A (en) * 1989-05-26 1990-05-21 Oouchi Shinko Kagaku Kogyo Kk Polymer coloring composition stable to light

Also Published As

Publication number Publication date
JP5190576B2 (en) 2013-04-24

Similar Documents

Publication Publication Date Title
JP6078001B2 (en) Organic colorant and colored polymer composition having high stability in terms of weather resistance
JP2009096974A (en) Ultraviolet absorber composition
CN107001782B (en) Weather resistant thermoplastic composition, preparation method and its product
JP6178332B2 (en) Polycarbonate multilayer body with deep gloss effect
KR20070024516A (en) Disperse dyes for poly(lactic acid) based fibers
BRPI0412325B1 (en) DYE MIXTURES WHICH HAVE A HIGH DEGREE OF LIGHTING
JP2016507402A (en) Polycarbonate multilayer with high weather resistance
JP5190576B2 (en) Method for improving light resistance of synthetic resin and synthetic resin product
KR101000812B1 (en) Rubber composition for tire tread
CN110964195B (en) Polymer dye colorant and preparation method thereof
Kobrakov et al. New aroyleneimidazoles as dyes for thermoplastic polymeric materials
JP2010100787A (en) Ultraviolet absorber and polymeric material containing the same
JP4493160B2 (en) High light fast dye composition and dyeing method using the same
Kurdyukova et al. Symmetric anionic polymethine dyes derived from fluorene and its derivatives with electron-acceptor substituents: synthesis and spectral properties
KR100799388B1 (en) Dyeable polypropylene containing polar group
JPH11189729A (en) Coloring matter-cum-ultraviolet stabilizer and polymer composition containing the same
KR100548146B1 (en) Tire sidewall rubber composition containing photosensitive pigment and its manufacturing method
MXPA05000288A (en) Polyoxymethylene composition for colored zipper, colored zipper using polyoxymethylene composition and method for preparing colored zipper.
Oda Effect of phenyl ester UV absorbers bearing a singlet oxygen quencher on photofading of crystal violet in a polymer substrate
CN103525085B (en) High-property high-light screening PA6T (polyhexamethylene terephthalamide) polymer and preparation method and application thereof
Rao et al. Silicon Substitution Expands the Repertoire of Si-Rhodamine Fluorescent Probes
JPS62267360A (en) Light-resistant stabilized polymer colored composition
JPS6047042A (en) Colored rubber composition
JPH1045785A (en) Novel nickel complex and near-infrared absorption resin molded product for construction material using the same
JP3729611B2 (en) Light-resistant resin composition

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20111108

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20111108

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20111220

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120605

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120606

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120803

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120828

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20121023

TRDD Decision of grant or rejection written
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20121023

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20121113

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20121207

R150 Certificate of patent or registration of utility model

Ref document number: 5190576

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20160208

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees