JP2010537235A - 炭化ケイ素の走査および光学ミラーの製造および加工方法 - Google Patents
炭化ケイ素の走査および光学ミラーの製造および加工方法 Download PDFInfo
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/5093—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with elements other than metals or carbon
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
- C04B41/5035—Silica
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
- C04B41/5127—Cu, e.g. Cu-CuO eutectic
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
- C04B41/515—Other specific metals
- C04B41/5155—Aluminium
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
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- C—CHEMISTRY; METALLURGY
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/80—Optical properties, e.g. transparency or reflexibility
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
【選択図】図1
Description
Claims (12)
- 炭化ケイ素の走査または光学ミラーの製造方法であって、
加工された型または工具を使用して炭化ケイ素の粉末をプレスまたは型押しあるいは静水圧プレスして、走査または光学ミラーの形状および構造を形成する工程と、
次いで、この実施形態においては焼結を行って、前記走査または光学ミラーのフェース面となる表面を形成する工程と、
次いで、前記走査または光学ミラーのフェース面に対する熱溶射プロセスによって、前記表面に対してこの実施形態においては適切な厚さのケイ素材料の層をコートまたは結合する工程と、
次いで、所望の表面品質および/または粗さおよび/または平坦度を達成するために研磨する工程と、
次いで、完成後の炭化ケイ素の走査または光学ミラーの最終的な用途において反射するものとして使用される1つ以上の波長に対し特有の適切な高反射率を有する光学コーティングによって反射面となる前記フェース面をコートするために、コーティング技術および材料を使用して光学的なコートを施す工程とを含む製造方法。 - 炭化ケイ素の走査または光学ミラーに付着または結合する適切な厚さの材料の層は、二酸化ケイ素である請求項1に記載の製造方法。
- 炭化ケイ素の走査または光学ミラーに付着または結合する適切な厚さの材料の層は、銅である請求項1に記載の製造方法。
- 炭化ケイ素の走査または光学ミラーに付着または結合する適切な厚さの材料の層は、アルミニウムである請求項1に記載の製造方法。
- 炭化ケイ素の走査または光学ミラーに付着する適切な厚さの材料の層は、任意の適切な材料である請求項1に記載の方法。
- 炭化ケイ素の走査または光学ミラーに付着する適切な厚さの材料の層は、高速の酸素燃料熱溶射プロセスまたはHVOFを使用して実現される請求項1〜5の何れか1項に記載の製造方法。
- 炭化ケイ素の走査または光学ミラーに付着する適切な厚さの材料の層は、低温ガス溶射プロセスを使用して実現される請求項1〜5の何れか1項に記載の製造方法。
- 炭化ケイ素の走査ミラーに付着する適切な厚さの材料の層は、減圧プラズマ溶射プロセスまたはLPPSを使用して実現される請求項1〜5の何れか1項に記載の製造方法。
- 炭化ケイ素の走査または光学ミラーに付着する適切な厚さの材料の層は、任意の付着プロセスを使用して実現される請求項1〜5の何れか1項に記載の製造方法。
- 適切な厚さの材料の層は、炭化ケイ素の走査または光学ミラーに結合された適切な基材のウエハである請求項1〜5の何れか1項に記載の製造方法。
- 炭化ケイ素のミラーは、非走査または静止ミラーである請求項1〜10の何れか1項に記載の製造方法。
- 前記炭化ケイ素の走査または光学ミラーは、あらかじめプレスまたは静水圧プレスされた炭化ケイ素粉末のブロックにコンピュータ数値制御による加工を施すことによって製造される請求項1〜11の何れか1項に記載の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2007/058615 WO2009024181A1 (en) | 2007-08-20 | 2007-08-20 | Method of manufacturing and processing silicon carbide scanning mirrors |
EPPCT/EP2007/058615 | 2007-08-20 | ||
PCT/EP2007/061693 WO2009024193A1 (en) | 2007-08-20 | 2007-10-30 | Method of manufacturing and processing silicon carbide scanning and optical mirrors |
Publications (2)
Publication Number | Publication Date |
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JP2010537235A true JP2010537235A (ja) | 2010-12-02 |
JP5307139B2 JP5307139B2 (ja) | 2013-10-02 |
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Application Number | Title | Priority Date | Filing Date |
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JP2010521316A Active JP5307139B2 (ja) | 2007-08-20 | 2007-10-30 | 炭化ケイ素のミラーの製造方法 |
Country Status (4)
Country | Link |
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US (1) | US20100136248A1 (ja) |
JP (1) | JP5307139B2 (ja) |
ES (1) | ES2400925T3 (ja) |
WO (2) | WO2009024181A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6272587B1 (ja) * | 2017-04-12 | 2018-01-31 | 三菱電機株式会社 | ガルバノミラー、ガルバノミラーを用いたガルバノスキャナ、ガルバノミラーを用いたレーザ加工機及びガルバノミラーの製造方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012223904A1 (de) * | 2012-10-05 | 2014-04-10 | Continental Automotive Gmbh | Verfahren zum Herstellen eines elektronischen Hochstrom-Schaltkreises mittels Gasspritz-Technologie und Abdichten mit isolierendem Polymer |
RU2015146081A (ru) * | 2013-03-28 | 2017-05-04 | Керамтек-Этек Гмбх | Керамический материал с функциональным покрытием |
PL420430A1 (pl) | 2017-02-09 | 2018-08-13 | General Electric Company | Kwalifikacja procesów obróbki plastycznej na zimno i polerowania |
CN112776384A (zh) * | 2020-11-30 | 2021-05-11 | 中国科学院上海高等研究院 | 一种内部冷却光学反射镜及其制备方法 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4814232A (en) * | 1987-03-25 | 1989-03-21 | United Technologies Corporation | Method for depositing laser mirror coatings |
JPH06281795A (ja) * | 1993-03-30 | 1994-10-07 | Toshiba Ceramics Co Ltd | 放射光・X線反射用SiCミラーの製造方法 |
JPH06300907A (ja) * | 1993-04-16 | 1994-10-28 | Nippon Steel Corp | 炭化珪素焼結体を用いた光学用及びx線用部品及びその製造方法 |
JPH08201591A (ja) * | 1995-01-26 | 1996-08-09 | Nikon Corp | 反射用光学素子 |
JP2002520601A (ja) * | 1998-07-08 | 2002-07-09 | カール−ツアイス−スチフツング | EUVのためのSiO2被覆したミラー基板 |
JP2003270432A (ja) * | 2002-03-13 | 2003-09-25 | Shin Etsu Handotai Co Ltd | 可視光反射部材 |
JP2004165629A (ja) * | 2002-08-02 | 2004-06-10 | Carl-Zeiss-Stiftung | 特にマイクロリソグラフィのための基板 |
JP2005134680A (ja) * | 2003-10-31 | 2005-05-26 | Mitsubishi Electric Corp | 反射ミラー、導光光学系システム、レーザ加工機、および反射ミラーの製造方法 |
JP2006183135A (ja) * | 2004-11-23 | 2006-07-13 | United Technol Corp <Utc> | 高強度を有する銅のコールドガスダイナミックスプレー |
JP2006518883A (ja) * | 2003-02-24 | 2006-08-17 | レイセオン・カンパニー | 高精密度のミラーおよびその製造方法 |
WO2006104737A2 (en) * | 2005-03-28 | 2006-10-05 | Sulzer Metco Venture, Llc. | Thermal spray feedstock composition |
JP2006308836A (ja) * | 2005-04-28 | 2006-11-09 | Mitsubishi Electric Corp | スキャンミラー、その製造方法およびレーザ加工機 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3049326A1 (de) * | 1980-12-29 | 1982-07-08 | Alkem Gmbh, 6450 Hanau | "verfahren zum herstellen von presslingen aus keramischem pulver, z.b. pulverfoermigen kernreaktorbrennstoffen und presseinrichtung, insbesondere fuer dieses verfahren" |
US4962069A (en) * | 1988-11-07 | 1990-10-09 | Dow Corning Corporation | Highly densified bodies from preceramic polysilazanes filled with silicon carbide powders |
US5257003A (en) * | 1992-01-14 | 1993-10-26 | Mahoney John J | Thermistor and its method of manufacture |
JP2829192B2 (ja) * | 1992-05-15 | 1998-11-25 | 住友電気工業株式会社 | レ−ザビ−ムスキャナ |
US5417803A (en) * | 1993-09-29 | 1995-05-23 | Intel Corporation | Method for making Si/SiC composite material |
GB9807992D0 (en) * | 1998-04-15 | 1998-06-17 | Unilever Plc | Water softening and detergent compositions |
-
2007
- 2007-08-20 WO PCT/EP2007/058615 patent/WO2009024181A1/en active Application Filing
- 2007-10-30 JP JP2010521316A patent/JP5307139B2/ja active Active
- 2007-10-30 ES ES07822047T patent/ES2400925T3/es active Active
- 2007-10-30 WO PCT/EP2007/061693 patent/WO2009024193A1/en active Application Filing
- 2007-10-30 US US11/993,702 patent/US20100136248A1/en not_active Abandoned
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4814232A (en) * | 1987-03-25 | 1989-03-21 | United Technologies Corporation | Method for depositing laser mirror coatings |
JPH06281795A (ja) * | 1993-03-30 | 1994-10-07 | Toshiba Ceramics Co Ltd | 放射光・X線反射用SiCミラーの製造方法 |
JPH06300907A (ja) * | 1993-04-16 | 1994-10-28 | Nippon Steel Corp | 炭化珪素焼結体を用いた光学用及びx線用部品及びその製造方法 |
JPH08201591A (ja) * | 1995-01-26 | 1996-08-09 | Nikon Corp | 反射用光学素子 |
JP2002520601A (ja) * | 1998-07-08 | 2002-07-09 | カール−ツアイス−スチフツング | EUVのためのSiO2被覆したミラー基板 |
JP2003270432A (ja) * | 2002-03-13 | 2003-09-25 | Shin Etsu Handotai Co Ltd | 可視光反射部材 |
JP2004165629A (ja) * | 2002-08-02 | 2004-06-10 | Carl-Zeiss-Stiftung | 特にマイクロリソグラフィのための基板 |
JP2006518883A (ja) * | 2003-02-24 | 2006-08-17 | レイセオン・カンパニー | 高精密度のミラーおよびその製造方法 |
JP2005134680A (ja) * | 2003-10-31 | 2005-05-26 | Mitsubishi Electric Corp | 反射ミラー、導光光学系システム、レーザ加工機、および反射ミラーの製造方法 |
JP2006183135A (ja) * | 2004-11-23 | 2006-07-13 | United Technol Corp <Utc> | 高強度を有する銅のコールドガスダイナミックスプレー |
WO2006104737A2 (en) * | 2005-03-28 | 2006-10-05 | Sulzer Metco Venture, Llc. | Thermal spray feedstock composition |
JP2006308836A (ja) * | 2005-04-28 | 2006-11-09 | Mitsubishi Electric Corp | スキャンミラー、その製造方法およびレーザ加工機 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6272587B1 (ja) * | 2017-04-12 | 2018-01-31 | 三菱電機株式会社 | ガルバノミラー、ガルバノミラーを用いたガルバノスキャナ、ガルバノミラーを用いたレーザ加工機及びガルバノミラーの製造方法 |
WO2018189828A1 (ja) * | 2017-04-12 | 2018-10-18 | 三菱電機株式会社 | ガルバノミラー、ガルバノミラーを用いたガルバノスキャナ、ガルバノミラーを用いたレーザ加工機及びガルバノミラーの製造方法 |
CN110494789A (zh) * | 2017-04-12 | 2019-11-22 | 三菱电机株式会社 | 电控反射镜、使用了电控反射镜的电扫描器、使用了电控反射镜的激光加工机及电控反射镜的制造方法 |
CN110494789B (zh) * | 2017-04-12 | 2021-07-06 | 三菱电机株式会社 | 电控反射镜及其制造方法、电扫描器、激光加工机 |
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US20100136248A1 (en) | 2010-06-03 |
WO2009024193A1 (en) | 2009-02-26 |
WO2009024181A1 (en) | 2009-02-26 |
JP5307139B2 (ja) | 2013-10-02 |
ES2400925T3 (es) | 2013-04-15 |
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