JP2010533309A - Duv透過マッピングのための方法と装置 - Google Patents
Duv透過マッピングのための方法と装置 Download PDFInfo
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Abstract
【選択図】図1
Description
102 コリメーティングレンズ
103 リダイレクト光学系
104 DUV放射線
105 集束レンズ
106 XYステージ
107 フォトマスク
108 収集レンズ
109 DUV検出器
110 CCDカメラ
111 チューブ−レンズ
112 リダイレクト光学系
113 対物レンズ
114 集光レンズ
115 光源
116 コンピュータユニット
117、118 接続
119 データリンク
120 領域
122 スポット
124 検出器並進ステージ
201 パラメータ
202 測定値
203 データベース
204 検出しきい値
205 セット内分析
206 セット間分析
207 透過率劣化情報
208 アラート
209 予測
301 DUVビーム
302 基板
303 マスク表面
304 保護ペリクル
305 ビーム
401 曇り汚染物質
402 DUVビーム
501 マスク表面
502 ビーム
Claims (26)
- 深紫外線を少なくとも部分的に透過する対象物の透過率マッピングのための装置であって、前記装置が、
広帯域深紫外線非コヒーレント照射を生成する放射線源と、
前記対象物の連続領域の配列の領域を照明するように前記広帯域深紫外線を方向付ける光学系と、
前記対象物から出てくる前記広帯域深紫外線を検出するために前記放射線源に対して前記対象物の反対側に配置される光学式検出器と、
前記対象物と前記検出器との間の、または、前記対象物と前記放射線との間の相対的変位を容易にするための相対的変位配置と、
前記光学式検出器からの信号を処理するプロセッサとを備える装置。
- 請求項1に記載の装置であって、前記光学系が非画像形成光学系を備える、ことを特徴とする装置。
- 請求項1に記載の装置であって、前記相対的変位配置がX−Yステージを備える、ことを特徴とする装置。
- 請求項1に記載の装置であって、前記相対的変位配置が前記対象物に対して前記検出器を変位するための変位配置を備える、ことを特徴とする装置。
- 請求項1に記載の装置であって、前記相対的変位配置が前記連続領域の配列の異なる領域上へ前記放射線をリダイレクトするためのリダイレクト光学系を備える、ことを特徴とする装置。
- 請求項1に記載の装置であって、前記放射線源がキセノン、水銀キセノンおよび重水素放電灯を含む一群の放射線源から選ばれる、ことを特徴とする装置。
- 請求項1に記載の装置であって、前記放射線源が180nmないし290nmの範囲内の波長の放射線を発生させるための放射線源を備える、ことを特徴とする装置。
- 請求項1に記載の装置であって、前記光学系が前記放射線を前記対象物の前記所定の領域に集中させるための光学系を備える、ことを特徴とする装置。
- 請求項1に記載の装置であって、前記検出器が、高速フォトダイオード、光電子増倍管および光電管、を含む一群の検出器から選ばれる検出器を備える、ことを特徴とする装置。
- 請求項1に記載の装置であって、さらに、前記対象物から出てくる前記放射線を前記検出器上へ集中させるための非画像形成光学系を備える装置。
- 請求項1に記載の装置であって、さらに、画像形成システムを備える装置。
- 請求項1に記載の装置であって、前記検出器が2.5桁以上の広ダイナミックレンジを有する、ことを特徴とする装置。
- 深紫外線を少なくとも部分的に透過する対象物の透過率マッピングのための方法であって、前記方法が、
前記対象物の連続領域の配列の異なる領域を照明するように広帯域深紫外線非コヒーレント照射を方向付けるステップと、
前記放射線源に対して前記対象物の反対側に配置される光学式検出器を使用して前記対象物から出てくる前記広帯域深紫外線を検出するステップと、
前記光学式検出器からの信号を処理して、前記対象物の前記連続領域の配列の前記異なる領域を通して前記放射線の前記透過率を測定するステップと、を含む方法。
- 請求項13に記載の方法であって、前記対象物が、パターン化されたフォトマスク、フォトマスクブランクおよびレンズ、を含む一群の対象物から選ばれる対象物を備える、ことを特徴とする方法。
- 請求項14に記載の方法であって、前記対象物がパターン化されたフォトマスクを備え、および前記連続領域の配列の前記異なる領域の横方向寸法が、これらの異なる領域の前記パターン化されたフォトマスク上の前記パターンの細部の横方向寸法より少なくとも2桁大きい、ことを特徴とする方法。
- 請求項13に記載の方法であって、前記透過率の変化を測定するために定期的に実行される方法。
- 請求項13に記載の方法であって、さらに、前記検出器と前記対象物との間の相対的変位を与えるステップを含む方法。
- 請求項13に記載の方法であって、さらに、前記対象物と前記放射線との間の相対的変位を与えるステップを含む方法。
- 請求項13に記載の方法であって、前記放射線が180nmないし290nmの範囲内の波長の放射線を備える、ことを特徴とする方法。
- 請求項13に記載の方法であって、さらに、既知の座標に対して前記対象物を整列配置するために前記対象物を画像形成するステップを含む方法。
- 請求項13に記載の方法であって、前記検出器が3桁以上の広ダイナミックレンジを有する、ことを特徴とする方法。
- 請求項13に記載の方法であって、前もって得られる前記対象物の前記連続領域の配列の前記異なる領域に対する透過率測定の基準セットが、測定の前記基準セットと前記異なる領域を通しての現在の透過率を比較するために使われる、ことを特徴とする方法。
- 請求項22に記載の方法であって、さらに、少なくとも一つの異なる領域を通しての前記透過率が所定の閾値より下であるときに、アラートを出すステップを含む方法。
- 請求項22に記載の方法であって、さらに、前記対象物の前記連続領域の配列の前記異なる領域を通しての前記放射線の前記透過率が所定の閾値より下であるときに、アラートを出すステップを含む方法。
- 請求項22に記載の方法であって、前記透過率測定の基準セットが、被写体の他の領域で繰り返される光学的フィーチャーを有する前記対象物の領域の測定を含む、ことを特徴とする方法。
- 請求項13に記載の方法であって、さらに、大気較正を実行するステップを含む方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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US92978307P | 2007-07-12 | 2007-07-12 | |
US60/929,783 | 2007-07-12 | ||
US3009308P | 2008-02-20 | 2008-02-20 | |
US61/030,093 | 2008-02-20 | ||
PCT/IL2008/000960 WO2009007977A2 (en) | 2007-07-12 | 2008-07-10 | Method and apparatus for duv transmission mapping |
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JP2010533309A true JP2010533309A (ja) | 2010-10-21 |
JP5489002B2 JP5489002B2 (ja) | 2014-05-14 |
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US (1) | US8592770B2 (ja) |
EP (1) | EP2171539B1 (ja) |
JP (1) | JP5489002B2 (ja) |
KR (1) | KR101387071B1 (ja) |
WO (1) | WO2009007977A2 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102628804A (zh) * | 2011-02-03 | 2012-08-08 | Hoya株式会社 | 透射率测定装置和透射率测定方法 |
JP2014505900A (ja) * | 2010-12-23 | 2014-03-06 | カール ツァイス エスエムエス ゲーエムベーハー | マスク上の構造を特徴付ける方法及び方法を実施するためのデバイス |
JP2015510149A (ja) * | 2012-02-15 | 2015-04-02 | ケーエルエー−テンカー コーポレイション | レチクルの時間変化強度マップの生成 |
Families Citing this family (13)
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KR20100042924A (ko) * | 2008-10-17 | 2010-04-27 | 삼성전자주식회사 | 포토 마스크의 헤이즈 모니터링 시스템 및 모니터링 방법 |
JP5114367B2 (ja) * | 2008-11-21 | 2013-01-09 | Hoya株式会社 | フォトマスクの製造方法及びそのフォトマスクを用いたパターン転写方法 |
WO2011104617A1 (en) * | 2010-02-23 | 2011-09-01 | Carl Zeiss Sms Ltd. | Analyses of measurement data |
DE102010015884B4 (de) * | 2010-03-09 | 2015-05-28 | Kla-Tencor Mie Gmbh | Verfahren zur reproduzierbaren Bestimmung der Position von Strukturen auf einer Maske mit Pellicle-Rahmen |
TWI497055B (zh) * | 2010-07-30 | 2015-08-21 | Hoya Corp | 透過率測定裝置、光罩之透過率檢查裝置、透過率檢查方法、光罩製造方法、圖案轉印方法、光罩製品 |
JP6012609B2 (ja) * | 2010-10-07 | 2016-10-25 | カール ツァイス エスエムエス リミテッド | 臨界寸法均一性再構成のための広域標識方法 |
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Also Published As
Publication number | Publication date |
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EP2171539A4 (en) | 2013-01-09 |
EP2171539B1 (en) | 2014-09-03 |
JP5489002B2 (ja) | 2014-05-14 |
US8592770B2 (en) | 2013-11-26 |
KR101387071B1 (ko) | 2014-04-18 |
EP2171539A2 (en) | 2010-04-07 |
US20110101226A1 (en) | 2011-05-05 |
WO2009007977A2 (en) | 2009-01-15 |
KR20100063003A (ko) | 2010-06-10 |
WO2009007977A3 (en) | 2010-02-25 |
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