JP2010094577A - Method and apparatus for cleaning film-like substrate - Google Patents

Method and apparatus for cleaning film-like substrate Download PDF

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JP2010094577A
JP2010094577A JP2008265186A JP2008265186A JP2010094577A JP 2010094577 A JP2010094577 A JP 2010094577A JP 2008265186 A JP2008265186 A JP 2008265186A JP 2008265186 A JP2008265186 A JP 2008265186A JP 2010094577 A JP2010094577 A JP 2010094577A
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film
cleaning
squeegee
substrate
liquid
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Toyofusa Yoshimura
豊房 吉村
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Nikka Equipment and Engineering Co Ltd
Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
Nikka Equipment and Engineering Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning a film-like substrate which remove adhesive foreign matter adhered to the surface of the film-like substrate efficiently by cleaning the whole surface of the film-like substrate uniformly, prevent removed foreign matter from being adhered again and cause no defects of the appearance, e.g. scratches, in the delicate surface of the film-like substrate. <P>SOLUTION: The cleaning apparatus is for cleaning a conveyed film-like substrate 9, and its cleaning section for carrying out cleaning has a squeegee 4 and a cleaning solution blowing nozzle 5. The method is for cleaning a conveyed film-like substrate and comprises blowing the cleaning solution near the site at which the squeegee is being pressed on the film-like substrate while pressing the squeegee on the film-like substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明はフイルム状基材を連続的に移動させながらスキージをフイルム状基材に押し当て、且つ、洗浄液をスキージ押付け部付近に吹き出して、フイルム面に付着した異物を効率的に除去するフイルム状基材の洗浄方法及び洗浄装置に関する。   The present invention is a film-like shape in which the squeegee is pressed against the film-like substrate while continuously moving the film-like substrate, and the cleaning liquid is blown out in the vicinity of the squeegee pressing portion to effectively remove foreign matter adhering to the film surface. The present invention relates to a substrate cleaning method and a cleaning apparatus.

液晶ディスプレイ及びプラズマディスプレイの出現により、様々な種類の機能性フイルムが多用されている。特にテレビ用ディスプレイでは高精細、高画質化が進行し、フイルム状基材に異物が存在すると画質欠陥となるので付着異物を洗浄することが要求されてきている。そのため、フイルム面に付着した異物を効率的に洗浄するフイルム状基材の洗浄方法及び洗浄装置を考案する必要がある。   With the advent of liquid crystal displays and plasma displays, various types of functional films are frequently used. Particularly in television displays, high definition and high image quality have progressed, and if foreign matter is present on a film-like substrate, image quality is defective, and it has been required to clean the attached foreign matter. Therefore, it is necessary to devise a cleaning method and a cleaning apparatus for a film-like base material that efficiently cleans foreign matter adhering to the film surface.

液晶ディスプレイ及びプラズマディスプレイに使用されるガラス基板の枚葉式洗浄機については、既に多くの洗浄装置が考案されているが、いわゆるロールツーロール（ロール状に巻いた樹脂フイルム状基材を繰り出して、搬送しながらフイルム状基材を連続して処理し、ロールに巻き取る方式）でフイルム状基材を高度に洗浄する洗浄方法及び洗浄装置は、未だあまり知られていない。   Many cleaning devices have already been devised for single-wafer cleaning of glass substrates used in liquid crystal displays and plasma displays. However, so-called roll-to-roll (resin film-like substrates wound into rolls are fed out). A cleaning method and a cleaning apparatus for highly cleaning a film-like substrate by a method of continuously treating a film-like substrate while being conveyed and winding it on a roll) are not yet well known.

例えば、特許文献１及び特許文献２には、ロールツーロールのフイルム洗浄装置についての発明が記載されており、被洗浄物を連続的に移動させながら洗浄液を高圧で噴霧することにより洗浄する方法が記載されている。また、例えば、特許文献３及び特許文献４にはブラシロールを使用したフイルム洗浄についての発明が記載されている。
特開２００８−２９９９０号公報 特開２００８−２３４６６号公報 実開平１−６６８４８号公報 実開平２−８３０８１号公報 For example, Patent Document 1 and Patent Document 2 describe an invention about a roll-to-roll film cleaning apparatus, and a method of cleaning by spraying a cleaning liquid at high pressure while continuously moving an object to be cleaned. Are listed. Further, for example, Patent Document 3 and Patent Document 4 describe an invention about film cleaning using a brush roll.
JP 2008-29990 A JP 2008-23466 A Japanese Utility Model Publication No. 1-66848 Japanese Utility Model Publication No. 2-83081

フイルム状基材に付着した異物には浮遊異物が付着したものや製品を加工する際に発生して付着した樹脂状異物等、数種類の異物がある。浮遊異物でも粘着性の少ないものは洗浄を行うことにより比較的簡単に除去できる。このような異物は前記記載の洗浄液を高圧で噴霧する洗浄方法でも除去できる。   There are several types of foreign matters attached to the film-like substrate, such as those attached with floating foreign matters and resinous foreign matters generated and attached when processing a product. Floating foreign substances with low adhesiveness can be removed relatively easily by washing. Such foreign matters can be removed by a cleaning method in which the above-described cleaning liquid is sprayed at a high pressure.

しかしながら、粘着性のある浮遊異物や製品を加工する際に発生して付着した樹脂状異物は粘着力が強く簡単に除去することは困難である。しかもロール状に強く巻かれているために巻き締められて扁平形状になり、粘着力も増していっそう除去することが困難になっている。そのため、洗浄液を高圧噴霧する洗浄方法や、洗浄液と高圧エアーを混合して噴霧する二流体洗浄方法が採用されたりしているが十分な洗浄効果が得られていないのが実情である。   However, sticky floating foreign substances and resinous foreign substances generated and adhered when processing a product have a strong adhesive force and are difficult to remove easily. Moreover, since it is strongly wound in a roll shape, it is tightened into a flat shape, and the adhesive force is also increased, making it more difficult to remove. For this reason, a cleaning method in which the cleaning liquid is sprayed at a high pressure and a two-fluid cleaning method in which the cleaning liquid and high-pressure air are mixed and sprayed are adopted, but a sufficient cleaning effect is not obtained.

フイルムの洗浄方法としてはブラシを被洗浄物であるフイルム状基材に直接接触させて洗浄する方法も採用されている。しかし、ブラシでは接触するところと非接触のところが生じ、フイルム全面を均一に洗浄することが困難である。しかも、ブラシが接触したところはブラシ先端が点接触で激しくフイルム面と衝突するために微細なすり傷等が発生し易い。それから、使用していくなかでブラシの劣化が進み、ブラシ先端部分が破損したりして新たな異物発生源となる場合もあり、いくつかの問題がある。   As a method for cleaning the film, a method is also adopted in which the brush is brought into direct contact with the film-like substrate that is the object to be cleaned. However, there are places where the brush comes into contact and non-contact, and it is difficult to uniformly clean the entire surface of the film. In addition, when the brush comes into contact, the tip of the brush violently collides with the film surface due to point contact, and fine scratches are likely to occur. Then, as the brush is used, the deterioration of the brush progresses, and the tip of the brush may be damaged to become a new foreign matter generation source, which causes several problems.

本発明は、上記問題点に鑑みなされたものであり、フォルム状基材表面に付着した粘着力のある異物を、フイルム状基材の全面を均一に洗浄して効率よく除去するとともに、除去した異物が再付着しにくく、しかもデリケートなフイルム表面にすり傷等の外観欠陥を発生させない洗浄装置及び洗浄方法を提供することを目的とする。   The present invention has been made in view of the above-mentioned problems, and removed the adhesive foreign matter adhering to the surface of the film-like substrate efficiently by washing the entire surface of the film-like substrate uniformly. It is an object of the present invention to provide a cleaning device and a cleaning method in which foreign matter is difficult to be reattached and does not cause appearance defects such as scratches on the delicate film surface.

本発明は、以下のものに関する。
（１） 搬送されてくるフイルム状基材を洗浄する洗浄装置であって、前記洗浄を行う洗浄部がスキージと洗浄液吹き出しノズルとを有することを特徴とするフイルム状基材の洗浄装置。
（２） 搬送されてくるフイルム状基材を洗浄する洗浄装置であって、スキージと洗浄液吹き出しノズルを有し前記洗浄を行う洗浄部と、リンス液吹き出しノズルを有し前記洗浄後の洗浄液を洗い流すリンス部と、水切り用エアーナイフを有し前記リンス後のリンス液を切る液切り部と、乾燥用エアーナイフを有し前記液切り後の液を乾燥する乾燥部と、を有することを特徴とするフイルム状基材の洗浄装置。
（３） スキージがフイルム状基材表面に押付けられるスキージ押付け部付近に、洗浄液吹き出しノズルからの洗浄液が、前記スキージ押付け部よりも上流側から当たるように、前記洗浄液吹き出しノズルが設けられることを特徴とする上記（１）または（２）に記載のフイルム状基材の洗浄装置。
（４） スキージはフイルム状基材に対して角度調整及び押し込み量調整ができる機構部を有することを特徴とする請求項１から３の何れかに記載のフイルム状基材の洗浄装置。
（５） スキージが樹脂板であることを特徴とする上記（１）から（４）の何れかに記載のフイルム状基材の洗浄装置。
（６） スキージが樹脂板であり、且つ、被洗浄物のフイルム状基材よりも硬度が低いことを特徴とする上記（１）から（５）の何れかに記載のフイルム状基材の洗浄装置。
（７） スキージ材質がテフロン（登録商標）であることを特徴とする上記（１）から（６）の何れかに記載のフイルム状基材の洗浄装置。
（８） スキージ材質が金属であり、かつ、フイルム状基材と接触するスキージエッジ部分のＲが０．５ｍｍ乃至３ｍｍであることを特徴とする除木（１）から（７）の何れかに記載のフイルム状基材の洗浄装置。
（９） スキージ長さが被洗浄物であるフイルム幅より長いことを特徴とする上記（１）から（８）の何れかに記載のフイルム状基材の洗浄装置。
（１０） 搬送されてくるフイルム状基材を洗浄する方法において、スキージをフイルム上に押付けながら洗浄液をスキージ押付け部付近に吹き出すことを特徴とするフイルム状基材の洗浄方法。
（１１） スキージに角度を付けて、スキージエッジ部分がフイルム面に接触するようにした上記（１０）記載にフイルム基材の洗浄方法。 The present invention relates to the following.
(1) A cleaning apparatus for cleaning a film-shaped substrate that is being conveyed, wherein the cleaning section that performs the cleaning includes a squeegee and a cleaning liquid blowing nozzle.
(2) A cleaning device for cleaning a film-like substrate being conveyed, the cleaning unit having a squeegee and a cleaning liquid blowing nozzle and the cleaning, and a rinsing liquid blowing nozzle having a rinsing liquid blowing nozzle to wash away the cleaning liquid after the cleaning A rinsing part, a liquid draining part having an air knife for draining and cutting the rinse liquid after rinsing, and a drying part having an air knife for drying and drying the liquid after draining. A cleaning device for film-like substrates.
(3) The cleaning liquid blowing nozzle is provided in the vicinity of the squeegee pressing portion where the squeegee is pressed against the surface of the film-like substrate so that the cleaning liquid from the cleaning liquid blowing nozzle hits from the upstream side of the squeegee pressing portion. The apparatus for cleaning a film-like substrate according to (1) or (2) above.
(4) The cleaning device for a film-like substrate according to any one of claims 1 to 3, wherein the squeegee has a mechanism part capable of adjusting an angle and a pressing amount with respect to the film-like substrate.
(5) The film-like substrate cleaning device according to any one of (1) to (4), wherein the squeegee is a resin plate.
(6) The cleaning of a film-like substrate according to any one of (1) to (5) above, wherein the squeegee is a resin plate and has a lower hardness than the film-like substrate of the object to be cleaned. apparatus.
(7) The film-type substrate cleaning apparatus according to any one of (1) to (6) above, wherein the squeegee material is Teflon (registered trademark).
(8) Any one of the tree removals (1) to (7), wherein the squeegee material is metal and R of the squeegee edge portion contacting the film-like substrate is 0.5 mm to 3 mm. The apparatus for cleaning a film-like substrate as described.
(9) The film-type substrate cleaning apparatus according to any one of (1) to (8) above, wherein the squeegee length is longer than a film width as an object to be cleaned.
(10) A method for cleaning a film-like substrate, characterized in that, in the method for washing a film-like substrate being conveyed, a cleaning liquid is blown out in the vicinity of a squeegee pressing portion while pressing a squeegee onto the film.
(11) The method for cleaning a film substrate according to the above (10), wherein the squeegee is provided with an angle so that the squeegee edge is in contact with the film surface.

本発明によれば、フォルム状基材表面に付着した粘着力のある異物を、フイルム状基材の全面を均一に洗浄して効率よく除去するとともに、除去した異物が再付着しにくく、しかもデリケートなフイルム表面にすり傷等の外観欠陥を発生させない洗浄装置及び洗浄方法を提供することができる。   According to the present invention, the adhesive foreign matter adhering to the surface of the film-like substrate is efficiently removed by uniformly cleaning the entire surface of the film-like substrate, and the removed foreign matter is difficult to reattach and is delicate. It is possible to provide a cleaning device and a cleaning method that do not cause appearance defects such as scratches on the surface of a thin film.

以下、本発明に係わる実施の形態について、図面を参照して説明する。ここで、図１乃至図７は本発明の実施の形態を示す図である。   Embodiments according to the present invention will be described below with reference to the drawings. Here, FIG. 1 thru | or FIG. 7 is a figure which shows embodiment of this invention.

図１に示すように、フイルム状基材９は巻出部１から繰出され、ローラ３を経由して搬送され、洗浄部、リンス部、液切り部、乾燥部を経由して巻取部２に巻き取られる。洗浄部は、スキージ４と洗浄液吹き出しノズル５を有し、搬送されてくるフイルム状基材９の洗浄を行う。リンス部は、リンス液吹き出しノズル６を有し、洗浄後に残留した洗浄液１４を洗い流す。液切り部は、エアーナイフ７を有し、リンス後のリンス液を液切りする。乾燥部は、熱風を吹き出すエアーナイフ８を有し、液切り後のリンス液を乾燥する。これらの洗浄部、リンス部、液切り部、乾燥部は、筐体１０の中に設置されている。図１では詳細機構部は省略されているがスキージ４の角度や押付け圧力を調節する機構部、洗浄液吹き出しノズル５及びリンス液吹き出しノズル６の角度や圧力を調節する機構部、エアーナイフ７、８の角度や距離や圧力を調節する機構部、フイルム状基材のテンションを調節する機構部や排気口等も配置されている。   As shown in FIG. 1, the film-like substrate 9 is fed out from the unwinding unit 1 and conveyed via the roller 3, and the winding unit 2 passes through the cleaning unit, the rinse unit, the liquid draining unit, and the drying unit. Rolled up. The cleaning unit has a squeegee 4 and a cleaning liquid blowing nozzle 5 and cleans the film-like substrate 9 being conveyed. The rinsing section has a rinsing liquid blowing nozzle 6 to wash away the cleaning liquid 14 remaining after cleaning. The liquid draining part has an air knife 7 and drains the rinse liquid after rinsing. The drying unit includes an air knife 8 that blows hot air, and dries the rinse liquid after draining. The cleaning unit, the rinse unit, the liquid draining unit, and the drying unit are installed in the housing 10. Although the detailed mechanism is omitted in FIG. 1, the mechanism for adjusting the angle and pressure of the squeegee 4, the mechanism for adjusting the angle and pressure of the cleaning liquid blowing nozzle 5 and the rinsing liquid blowing nozzle 6, and air knives 7 and 8. A mechanism for adjusting the angle, distance and pressure, a mechanism for adjusting the tension of the film-like substrate, an exhaust port, and the like are also arranged.

スキージ４を保持する方法は、特に限定されないが、例えば、図３、図４に示すように、スキージ４をスキージホルダー１３に保持した状態で、洗浄装置内に保持することができる。また、洗浄液吹き出しノズル５やリンス液吹き出しノズル６を保持する方法は、特に限定されないが、例えば、図５、図６に示すように、これらのノズルを、フイルム状基材９の幅方向に、複数並べて共通の配管に繋げた状態で、洗浄装置内に保持することができる。なお、図５、図６では、洗浄液吹き出しノズル５やリンス液吹き出しノズル６を洗浄液吹き出しノズル５で、洗浄液１４やリンス液を洗浄液１４で代表させて示している。スキージ４は、フイルム状基材９表面に押付けられるように、スキージ４の角度及び押付け圧力を調整されると同時に、洗浄液吹き出しノズル５からの洗浄液１４の吹き出しは、スキージ４よりも上流側（図１の搬送方向とは逆側）から、スキージ押付け部１１付近に当たるように、洗浄液吹き出しノズル５の角度及び距離が調整される。つまり、スキージ４がフイルム状基材９表面に押付けられるスキージ押付け部１１付近に、洗浄液吹き出しノズル５からの洗浄液１４が、スキージ押付け部１１よりも上流側から当たるように、洗浄液吹き出しノズル５が設けられる。これにより、スキージをフイルム上に押付けながら、洗浄液吹き出しノズル５から洗浄液１４をスキージ押付け部１１付近に向けて吹き出す洗浄装置及び洗浄方法が可能となる。   The method for holding the squeegee 4 is not particularly limited. For example, as shown in FIGS. 3 and 4, the squeegee 4 can be held in the cleaning device while being held by the squeegee holder 13. The method of holding the cleaning liquid blowing nozzle 5 and the rinsing liquid blowing nozzle 6 is not particularly limited. For example, as shown in FIGS. 5 and 6, these nozzles are arranged in the width direction of the film-like substrate 9. It can be held in the cleaning apparatus in a state where a plurality of lines are connected to a common pipe. In FIGS. 5 and 6, the cleaning liquid blowing nozzle 5 and the rinsing liquid blowing nozzle 6 are represented by the cleaning liquid blowing nozzle 5, and the cleaning liquid 14 and the rinsing liquid are represented by the cleaning liquid 14. The angle and pressing pressure of the squeegee 4 are adjusted so that the squeegee 4 is pressed against the surface of the film-like substrate 9, and at the same time, the cleaning liquid 14 is blown from the cleaning liquid blowing nozzle 5 upstream (see FIG. The angle and the distance of the cleaning liquid blowing nozzle 5 are adjusted so as to hit the vicinity of the squeegee pressing portion 11 from the opposite side to the conveying direction of 1. That is, the cleaning liquid blowing nozzle 5 is provided in the vicinity of the squeegee pressing portion 11 where the squeegee 4 is pressed against the surface of the film-shaped substrate 9 so that the cleaning liquid 14 from the cleaning liquid blowing nozzle 5 hits the upstream side of the squeegee pressing portion 11. It is done. This enables a cleaning device and a cleaning method that blows the cleaning liquid 14 from the cleaning liquid blowing nozzle 5 toward the vicinity of the squeegee pressing portion 11 while pressing the squeegee onto the film.

図２は図１の平面図である。フイルム状基材９の幅方向（搬送方向に対して直角方向）を全てカバーするためのスキージ４長さと洗浄液吹き出しノズル５数を有している。通常、洗浄液ノズル５はスキージ４の下流側（搬送方向に対して）に位置し、スキージ押付け部１１に吹き出される。スキージ４と洗浄液吹き出しノズル５は洗浄仕様に応じてフイルム状基材９の両側に配置することができるし、同じ面に二段乃至三段、配置してもよい。スキージ４の長さはフイルム状基材９の幅（搬送方向に対して直角方向の長さ）より大きくすることにより、スキージ４とフイルム状基材９の幅方向全面の接触が均一になるようにしている。   FIG. 2 is a plan view of FIG. It has a squeegee 4 length and the number of cleaning liquid blowing nozzles 5 for covering all the width direction (perpendicular to the conveying direction) of the film-like substrate 9. Usually, the cleaning liquid nozzle 5 is located downstream of the squeegee 4 (relative to the conveying direction) and is blown out to the squeegee pressing portion 11. The squeegee 4 and the cleaning liquid blowing nozzle 5 can be arranged on both sides of the film-like substrate 9 according to the cleaning specification, or may be arranged in two to three stages on the same surface. By making the length of the squeegee 4 larger than the width of the film-like substrate 9 (the length in the direction perpendicular to the conveying direction), the entire contact in the width direction between the squeegee 4 and the film-like substrate 9 is made uniform. I have to.

フイルム状基材９の付着異物はいくつか種類がある。単に浮遊異物が付着したものは洗浄液１４を吹き出すだけで簡単に除去できる。しかし、樹脂状異物は粘着性があり、ロール状に巻かれたりすると巻き締められて扁平形状となり、強く粘着しているために、洗浄液１４を吹き出すだけでは除去することが困難である。このような粘着力の強い異物を高度に洗浄するには、まず、かなり強い洗浄力が必要である。本発明では、洗浄部は、スキージ４と洗浄液吹き出しノズル５を有するため、スキージ４の角度及び押付け圧力を調整しながらスキージ４をフイルム状基材９表面に押付けると同時に、スキージ押付け部１１付近に洗浄液１４を吹き出しながら洗浄する方法が採れる。このため、フイルム基材９の表面に存在する樹脂系のへばりついた付着異物も、スキージ４で剥がされた後、洗浄液吹き出しノズル５から吹き出した洗浄液１４と一緒に洗い流される。このように、スキージ４によってかき落としながら、洗浄液１４で除去できるので、効果的に除去できる。   There are several types of foreign matter adhered to the film-like substrate 9. The matter with the adhering floating foreign matters can be easily removed simply by blowing out the cleaning liquid 14. However, the resinous foreign matter is sticky, and when it is wound in a roll shape, it is tightened into a flat shape and strongly adhered, so that it is difficult to remove it simply by blowing out the cleaning liquid 14. In order to highly clean such a foreign substance having a strong adhesive force, first, a considerably strong cleaning force is required. In the present invention, since the cleaning unit includes the squeegee 4 and the cleaning liquid blowing nozzle 5, the squeegee 4 is pressed against the surface of the film-like substrate 9 while adjusting the angle and pressing pressure of the squeegee 4, and at the same time, in the vicinity of the squeegee pressing unit 11. A method of cleaning while blowing the cleaning liquid 14 can be employed. For this reason, the adhering foreign matter adhered to the resin base on the surface of the film substrate 9 is also removed by the squeegee 4 and then washed away together with the cleaning liquid 14 blown out from the cleaning liquid blowing nozzle 5. Thus, since it can remove with the washing | cleaning liquid 14, scraping off with the squeegee 4, it can remove effectively.

フイルム状基材９の洗浄で重要なのは上記の洗浄力の他に、除去した異物を再付着させることなく洗い流すことである。これについては、スキージ押付け部１１付近に向けて洗浄液１４を吹き出すことにより、スキージ押付け部１１に当たった洗浄液１４が、スキージ４とフイルム基材９に囲まれて行き場を失い、スキージ４に沿ってフイルム基材９の幅方向に勢いよく排出されるので、除去した付着異物も一緒にフイルム基材９の外へ洗い流されることにより、除去した異物の再付着を防止することができる。   What is important in cleaning the film-like substrate 9 is to wash away the removed foreign substances without reattaching in addition to the above-described cleaning power. With respect to this, by blowing the cleaning liquid 14 toward the vicinity of the squeegee pressing portion 11, the cleaning liquid 14 hitting the squeegee pressing portion 11 is surrounded by the squeegee 4 and the film base material 9 and loses a place to go along the squeegee 4. Since the discharged foreign matter is vigorously discharged in the width direction of the film base 9, the removed attached foreign matter is washed out of the film base 9 together, thereby preventing the removed foreign matter from reattaching.

また、フイルム状基材９の洗浄で重要なことは洗浄の際にすり傷を発生させないことである。特にスキージ４を直接接触させる場合はこれに留意する必要がある。すり傷が発生する要因の一つは、除去した異物がスキージ４とフイルム基材９表面に挟まれた状態になることであり、フイルム基材９より硬い異物の場合はすり傷が発生する可能性がある。本発明では、スキージ押付け部１１付近に洗浄液１４を吹き出して瞬時に洗い流すので、異物の挟み込みを防止できる。また、洗浄液１４をスキージ押付け部１１付近に吹き出すことにより、フイルム基材９表面とスキージ４との接触摩擦力を著しく低下させ、フイルム基材９表面のスキージ４の移動を滑らかにすることにより防止できる。ほとんどのフイルム状基材９及び樹脂系スキージ４は液体に濡れると接触摩擦力が著しく低下するという特性があるが、そのなかでもテフロン（登録商標）は特に顕著であり、スキージ４材質にテフロン（登録商標）を使用するとより好適である。   Also, what is important in cleaning the film-like substrate 9 is that no scratches are generated during the cleaning. This must be noted especially when the squeegee 4 is brought into direct contact. One of the factors that cause scratches is that the removed foreign matter is sandwiched between the squeegee 4 and the surface of the film substrate 9. If the foreign matter is harder than the film substrate 9, the scratch may occur. There is sex. In the present invention, since the cleaning liquid 14 is blown out in the vicinity of the squeegee pressing portion 11 to be washed away instantaneously, it is possible to prevent foreign matter from being caught. Further, by blowing out the cleaning liquid 14 in the vicinity of the squeegee pressing portion 11, the contact frictional force between the surface of the film base 9 and the squeegee 4 is remarkably reduced, and the movement of the squeegee 4 on the surface of the film base 9 is prevented by smooth movement. it can. Most film-like substrates 9 and resin-based squeegees 4 have a characteristic that the contact frictional force is remarkably lowered when wetted with a liquid. Among them, Teflon (registered trademark) is particularly prominent. (Registered trademark) is more preferable.

すり傷を防止する方法としては、使用する樹脂系スキージ４の硬度を、被洗浄物のフイルム状基材９の硬度より低くすることである。これに洗浄液１４による接触摩擦力低下を組合わせれば、すり傷発生は完全に防止できる。フイルム状基材９よりも硬度の低いスキージ４用の樹脂の種類としては、例えば、ウレタン樹脂で硬度５０Ｈｓ乃至９０Ｈｓのなかから選択することもできる。フイルム状基材９よりわずかに低硬度であればよく、著しく低硬度にする必要はない。あまり低硬度にすると異物と接触したときにスキージ４の方が変形して、洗浄力が低下する。なお、本発明において、Ｈｓとは、Ｈａｒｄｎｅｓｓ ｓｐｒｉｎｇの略であり、ＪＩＳ Ｋ ６２５３に基づいて、タイプＡデュロメータを用いて測定されたデュロメータ硬さ（スプリング式）をいう。   As a method for preventing scratches, the hardness of the resin squeegee 4 to be used is lower than the hardness of the film-like substrate 9 to be cleaned. Combining this with the reduction of the contact friction force by the cleaning liquid 14 can completely prevent the generation of scratches. The type of resin for the squeegee 4 having a hardness lower than that of the film-like substrate 9 can be selected from, for example, urethane resin having a hardness of 50Hs to 90Hs. The hardness may be slightly lower than that of the film-like substrate 9, and it is not necessary to make the hardness extremely low. If the hardness is too low, the squeegee 4 is deformed when it comes into contact with a foreign substance, and the cleaning power decreases. In the present invention, Hs is an abbreviation for Hardness spring and refers to durometer hardness (spring type) measured using a type A durometer based on JIS K 6253.

異物除去を効果的に実施するには、フイルム状基材９の幅方向全てにスキージ４を完全に接触させる必要がある。そのためにはスキージ４長さをフイルム基材９の幅より大きくすることが重要であると同時に、フイルム状基材９の張力制御が必要である。張力は、フイルム状基材９の材質及び厚みにもよるが２０Ｎｍ乃至２５０Ｎｍ付加することが好適であるし、１００Ｎｍ乃至２００Ｎｍがより好適である。張力が２０Ｎｍ以下ではフイルム状基材９とスキージ４が全幅にわたって均一に接触することが困難になるし、２５０Ｎｍ以上ではフイルム状基材９が伸びたり、切断したりして好ましくない。   In order to effectively remove the foreign matter, the squeegee 4 needs to be completely brought into contact with the entire width direction of the film-like substrate 9. For that purpose, it is important to make the length of the squeegee 4 larger than the width of the film substrate 9 and at the same time, it is necessary to control the tension of the film-like substrate 9. The tension is preferably 20 Nm to 250 Nm, more preferably 100 Nm to 200 Nm, depending on the material and thickness of the film-like substrate 9. If the tension is 20 Nm or less, it is difficult for the film-like substrate 9 and the squeegee 4 to uniformly contact over the entire width, and if it is 250 Nm or more, the film-like substrate 9 is undesirably stretched or cut.

フイルム状基材９表面にスキージ４を軽く接触させ、この状態からのスキージ４押し込み量は３ｍｍ乃至５０ｍｍが好適であるし、１０ｍｍ乃至２０ｍｍがより好適である。押し込み量３ｍｍ以下ではスキージ４とフイルム状基材９表面が均一に接触しないし、押し込み量５０ｍｍ以上ではフイルム状基材９が伸びたり、切断したりして好ましくない。   The squeegee 4 is lightly brought into contact with the surface of the film-shaped substrate 9, and the amount of squeegee 4 pushed in from this state is preferably 3 mm to 50 mm, and more preferably 10 mm to 20 mm. If the pushing amount is 3 mm or less, the squeegee 4 and the surface of the film-like substrate 9 do not contact uniformly, and if the pushing amount is 50 mm or more, the film-like substrate 9 is undesirably stretched or cut.

スキージ４は、図１に示すような方向（矢印で示したフイルム状基材９の搬送方向）に、あるいは図１とは逆の方向（矢印の反対方向）に、フイルム状基材９表面と垂直な姿勢から５度乃至６０度程傾けて、スキージエッジ部１２が接触するようにすると好適であるが、３０度乃至４５度がより好適である。垂直な姿勢から５度以下ではスキージエッジ部がフイルム全幅にわたって安定して接触しないし、６０度以上ではスキージでの押付け圧力がフイルム面に伝えることが困難になり好ましくない。   The squeegee 4 is disposed on the surface of the film-shaped substrate 9 in the direction as shown in FIG. 1 (the conveyance direction of the film-shaped substrate 9 indicated by the arrow) or in the direction opposite to that in FIG. It is preferable that the squeegee edge portion 12 is brought into contact with the squeegee edge portion 12 by inclining about 5 to 60 degrees from the vertical posture, but 30 to 45 degrees is more preferable. If it is 5 degrees or less from a vertical posture, the squeegee edge portion does not come into stable contact over the entire width of the film, and if it is 60 degrees or more, it is difficult to transmit the pressing pressure on the squeegee to the film surface.

スキージ材質に耐食性のある金属を使用するときは、スキージエッジ部にＲをとる必要がある。金属は樹脂と比較すると硬いし、液体に濡れても接触摩擦力が樹脂のときほど低下しないので、エッジ部にＲを取ってカバーする必要がある。金属性スキージ４のエッジ部にＲをとるときは０．５ｍｍ乃至０．３ｍｍのＲをとると好適であるし、１ｍｍ乃至２ｍｍがより好適である。Ｒが０．５ｍｍ以下ではフイルム状基材９表面にすり傷を発生させる可能性があるし、Ｒが３ｍｍ以上では微小な異物を逆に押しつぶすようになり好ましくない。   When a metal having corrosion resistance is used as the squeegee material, it is necessary to take R at the edge of the squeegee. The metal is harder than the resin, and even if it gets wet with the liquid, the contact frictional force does not decrease as much as that of the resin. When taking R at the edge portion of the metallic squeegee 4, it is preferable to take R of 0.5 mm to 0.3 mm, and more preferably 1 mm to 2 mm. If R is 0.5 mm or less, scratches may occur on the surface of the film-like substrate 9, and if R is 3 mm or more, minute foreign matters are crushed in reverse, which is not preferable.

フイルム状基材はフイルム幅が３００ｍｍ〜２０００ｍｍと広範囲にある。特に問題となるのは幅広になるときで、洗浄方法としては高圧で洗浄液１４を噴霧する方法や高圧エアーと洗浄液１４を混合して噴霧する二流体洗浄方法があるが、使用するユーティリティが増大するために、ランニングコストや装置価格が高価になる。本発明はスキージ４と洗浄液吹き出しノズル５を設置するだけなので、ランニングコストや装置価格を安価にできる。   The film-like substrate has a wide film width of 300 mm to 2000 mm. There is a particular problem when the width is widened. As cleaning methods, there are a method of spraying the cleaning liquid 14 at a high pressure and a two-fluid cleaning method of mixing and spraying the high-pressure air and the cleaning liquid 14, but the utility to be used increases. Therefore, the running cost and the equipment price become expensive. In the present invention, since only the squeegee 4 and the cleaning liquid blowing nozzle 5 are installed, the running cost and the apparatus price can be reduced.

洗浄液吹き出しノズル５やリンス液吹き出しノズル６に用いるノズルは、吹き出し時のスプレー形状が扇型で、扇形に広がったスプレー形状の全域にわたって流量分布が均等ないわゆるフラットタイプであるのが望ましい。つまり、スプレー形状１５の正面からの形状は扇形（図７（ａ））で、スプレー形状１５の断面形状は、細長い楕円（図７（ｂ））となるものが望ましい。このようなものとして、例えば、均等扇形ノズルのＶＥＰシリーズ（株式会社いけうち製、商品名）が挙げられる。そして、洗浄液吹き出しノズル５から吹き出す洗浄液が、フイルム状基材９の幅方向全体に扇型に広がった状態で、スキージ押付け部１１付近に上流側から当たるように、洗浄液吹き出しノズル５が配置される。また、リンス液吹き出しノズル６から吹き出すリンス液が、フイルム状基材９の幅方向全体に扇型に広がった状態で、フイルム状基材９に当たるように、リンス液吹き出しノズル６が配置される。   The nozzle used for the cleaning liquid blowing nozzle 5 and the rinsing liquid blowing nozzle 6 is desirably a so-called flat type in which the spray shape at the time of blowing is a fan shape and the flow rate distribution is uniform over the entire spray shape spreading in a fan shape. That is, the shape of the spray shape 15 from the front is preferably a fan shape (FIG. 7A), and the cross-sectional shape of the spray shape 15 is preferably an elongated ellipse (FIG. 7B). As such a thing, the VEP series (made by Ikeuchi Co., Ltd., a brand name) of a uniform fan nozzle is mentioned, for example. Then, the cleaning liquid blowing nozzle 5 is arranged so that the cleaning liquid blown from the cleaning liquid blowing nozzle 5 hits the vicinity of the squeegee pressing portion 11 from the upstream side in a state where the cleaning liquid spreads in a fan shape over the entire width direction of the film-like substrate 9. . Further, the rinsing liquid blowing nozzle 6 is arranged so that the rinsing liquid blown out from the rinsing liquid blowing nozzle 6 hits the film-shaped substrate 9 in a state of spreading in a fan shape over the entire width direction of the film-shaped substrate 9.

（実施例１）
図１に示すように、異物が付着した４４０ｍｍ幅のＰＥＴ（ポリエチレンテレフタレート）フイルム９（５０μｍ厚）を巻出部１に装着し、張力１００Ｎｍを付加し、搬送速度３ｍ／ｍｉｎで洗浄した。洗浄液１４及びリンス液は純水を使用し、スキージ４には角形状テフロン（登録商標）（長さ５５０ｍｍ×高さ４０ｍｍ×厚み１０ｍｍ）を使用し、ＰＥＴフイルム９表面に垂直に押し当てた状態から、矢印で示した搬送方向とは逆方向に、３０度程斜めにしてスキージエッジ部１２が、ＰＥＴフイルム９の幅方向全体に亘って、ＰＥＴフイルム９表面と均一に接触するようにした。スキージ４の押し込み量は１５ｍｍとし、洗浄液吹き出しノズル５からの洗浄液１４の吹き出しが、スキージ４よりも上流側（搬送方向とは逆側）から、スキージ押付け部１１付近に当たるように、洗浄液吹き出しノズル５のノズル角度及び距離を調整し、吹き出し圧力０．３５Ｍｐａで、洗浄液１４量は０．７Ｌ／ノズル／ｍｉｎとした。スキージ４の形状は、角形状スキージや剣形状スキージ等の中から選択できるが、ここでは角形状スキージを選択し、表面は研磨してある。図７（ａ）、（ｂ）に示すように、洗浄液吹き出しノズル５には、フラット型の均等扇形ノズルであるＶＥＰシリーズ（株式会社いけうち製、商品名）のうち、噴角９０°、噴量０．７Ｌ／ノズル／ｍｉｎ（０．３ＭＰａ）のノズルを用いた。 Example 1
As shown in FIG. 1, a PET (polyethylene terephthalate) film 9 (50 μm thick) having a width of 440 mm, to which foreign matter had adhered, was attached to the unwinding section 1, applied with a tension of 100 Nm, and washed at a conveyance speed of 3 m / min. The cleaning solution 14 and the rinsing solution are pure water, and the squeegee 4 is square Teflon (registered trademark) (length 550 mm × height 40 mm × thickness 10 mm), and is pressed vertically against the surface of the PET film 9. Therefore, the squeegee edge portion 12 is obliquely inclined by about 30 degrees in the direction opposite to the conveying direction indicated by the arrow so as to be in uniform contact with the surface of the PET film 9 over the entire width direction of the PET film 9. The amount of pressing of the squeegee 4 is 15 mm, and the cleaning liquid blowing nozzle 5 so that the cleaning liquid 14 blowing from the cleaning liquid blowing nozzle 5 hits the vicinity of the squeegee pressing portion 11 from the upstream side (opposite to the conveying direction) of the squeegee 4. The nozzle angle and distance were adjusted, the blowing pressure was 0.35 Mpa, and the amount of the cleaning liquid 14 was 0.7 L / nozzle / min. The shape of the squeegee 4 can be selected from a square shape squeegee, a sword shape squeegee, and the like. Here, a square shape squeegee is selected and the surface is polished. As shown in FIGS. 7A and 7B, the cleaning liquid blowing nozzle 5 has an injection angle of 90 ° and an injection amount in the VEP series (product name, manufactured by Ikeuchi Co., Ltd.) which is a flat type uniform fan nozzle. A nozzle of 0.7 L / nozzle / min (0.3 MPa) was used.

洗浄されたＰＥＴフイルム９はリンス部に移動し、リンス液吹き出しノズル６で両面同時に洗い流される。このとき、リンス液吹き出しノズル６からの吹き出し圧力は０．３５Ｍｐａで純水量は０．７Ｌ／ノズル／ｍｉｎである。このあと、液切り部に送られ両面同時にエアーナイフ７で水切りを行うが、このときのエアー圧力は０．２ＭＰａでエアーナイフとフイルムとの距離は５ｍｍ乃至１０ｍｍ程度である。水切り後は乾燥部に移動し、ヒータで６０℃に加温された熱風が両面同時にエアーナイフ８で吹き出される。エアー圧力と距離は液切り部と同じである。   The washed PET film 9 moves to the rinse part, and is washed away simultaneously on both sides by the rinse liquid blowing nozzle 6. At this time, the blowing pressure from the rinsing liquid blowing nozzle 6 is 0.35 Mpa, and the amount of pure water is 0.7 L / nozzle / min. After that, it is sent to the liquid draining part and drained simultaneously with the air knife 7 on both sides. At this time, the air pressure is 0.2 MPa, and the distance between the air knife and the film is about 5 mm to 10 mm. After draining, it moves to the drying section, and hot air heated to 60 ° C. by the heater is blown out by the air knife 8 on both sides simultaneously. The air pressure and distance are the same as the liquid draining part.

洗浄されたＰＥＴフイルム９を巻取部２に巻取り、異物有無及びすり傷有無を詳細に観察した結果、異物及びすり傷は観察されず、異物除去が効果的に行われていた。
（実施例２） The washed PET film 9 was wound around the winding unit 2 and the presence or absence of foreign matter and the presence or absence of scratches were observed in detail. As a result, foreign matter and scratches were not observed, and foreign matter removal was performed effectively.
(Example 2)

実施例１ではスキージ４の材質に水に濡れると接触摩擦力が特に著しく低下するテフロン（登録商標）を使用したが、ここではコストを下げるためにテフロン（登録商標）より安価なウレタン樹脂を使用することにした。ウレタン樹脂の硬度は５０Ｈｓ乃至９０Ｈｓの範囲のなかから選択することが可能で、ここでは７０Ｈｓを選択した。スキージ４の形状は実施例１のときと同じである。   In Example 1, the material of the squeegee 4 used was Teflon (registered trademark) whose contact friction force is particularly reduced when wet with water. However, in order to reduce the cost, urethane resin less expensive than Teflon (registered trademark) is used here. Decided to do. The hardness of the urethane resin can be selected from the range of 50Hs to 90Hs, and 70Hs was selected here. The shape of the squeegee 4 is the same as in the first embodiment.

洗浄プロセス、洗浄条件は実施例１のときと同じであるが、洗浄後のＰＥＴフイルム９を詳細に観察した結果、異物及びすり傷は観察されず、異物除去が効果的に行われていた。
（実施例３） The cleaning process and the cleaning conditions were the same as in Example 1, but as a result of observing the PET film 9 after cleaning in detail, foreign matter and scratches were not observed, and the foreign matter was effectively removed.
(Example 3)

スキージ４にＳＵＳ３０４材質を使用し、ＰＥＴフイルム９と接触するスキージエッジ部１２には０．５ｍｍのＲをとり、Ｒ部は研磨してなめらかにした。スキージ４の角度やスキージ４の押し込み量、洗浄液１４の吹き出し条件等は実施例１と同じである。   A SUS304 material was used for the squeegee 4, and the squeegee edge portion 12 in contact with the PET film 9 had an R of 0.5 mm, and the R portion was polished and smoothed. The angle of the squeegee 4, the pushing amount of the squeegee 4, the blowing condition of the cleaning liquid 14, etc. are the same as those in the first embodiment.

洗浄プロセス、洗浄条件は実施例１のときと同じであるが、洗浄後のＰＥＴフイルム９を詳細に観察した結果、異物及びすり傷は観察されず、異物除去が効果的に行われていた。   The cleaning process and the cleaning conditions were the same as in Example 1, but as a result of observing the PET film 9 after cleaning in detail, foreign matter and scratches were not observed, and the foreign matter was effectively removed.

（比較例）
実施例１と同じ条件で、洗浄液１４の吹き出しを停止して、スキージ４のみで洗浄を行った。異物除去は行われるが、除去された異物がスキージエッジ部１２に付着したり、ＰＥＴフイルム９の他のところに再付着する現象が観察された。すり傷についても数箇所で観察された。 (Comparative example)
Under the same conditions as in Example 1, blowing of the cleaning liquid 14 was stopped, and cleaning was performed only with the squeegee 4. Although foreign matter removal is performed, a phenomenon has been observed in which the removed foreign matter adheres to the squeegee edge portion 12 or reattaches to other portions of the PET film 9. Scratches were also observed in several places.

フイルム状基材の洗浄装置全体構成図（正面図）Overall configuration diagram of a film-like substrate cleaning device (front view) フイルム状基材の洗浄装置構成図（平面図）Structure of cleaning device for film-like substrate (plan view) スキージの正面図Front view of squeegee スキージの側面図Side view of squeegee 洗浄液及びリンス液の吹き出しノズル正面図Front view of cleaning liquid and rinse liquid nozzle 洗浄液及びリンス液の吹き出しノズル側面図Side view of cleaning liquid and rinse liquid nozzle スプレー形状の正面図（ａ）及びスプレー形状の断面図（ｂ）Front view of spray shape (a) and sectional view of spray shape (b)

符号の説明Explanation of symbols

１ 巻出部
２ 巻取部
３ ローラ
４ スキージ
５ 洗浄液吹き出しノズル
６ リンス液吹き出しノズル
７ 水切り用エアーナイフ
８ 乾燥用エアーナイフ
９ フイルム状基材（ＰＥＴフイルム）
１０ 筐体
１１ スキージ押付け部
１２ スキージエッジ部
１３ スキージホルダー
１４ 洗浄液
１５ スプレー形状 DESCRIPTION OF SYMBOLS 1 Unwinding part 2 Winding part 3 Roller 4 Squeegee 5 Cleaning liquid blowing nozzle 6 Rinse liquid blowing nozzle 7 Draining air knife 8 Drying air knife 9 Film-like substrate (PET film)
DESCRIPTION OF SYMBOLS 10 Housing | casing 11 Squeegee pressing part 12 Squeegee edge part 13 Squeegee holder 14 Cleaning liquid 15 Spray shape

Claims (11)

搬送されてくるフイルム状基材を洗浄する洗浄装置であって、前記洗浄を行う洗浄部がスキージと洗浄液吹き出しノズルとを有することを特徴とするフイルム状基材の洗浄装置。   A cleaning apparatus for cleaning a film-shaped substrate being conveyed, wherein the cleaning section for cleaning includes a squeegee and a cleaning liquid blowing nozzle. 搬送されてくるフイルム状基材を洗浄する洗浄装置であって、スキージと洗浄液吹き出しノズルを有し前記洗浄を行う洗浄部と、リンス液吹き出しノズルを有し前記洗浄後の洗浄液を洗い流すリンス部と、水切り用エアーナイフを有し前記リンス後のリンス液を切る液切り部と、乾燥用エアーナイフを有し前記液切り後の液を乾燥する乾燥部と、を有することを特徴とするフイルム状基材の洗浄装置。   A cleaning device for cleaning a film-like substrate being conveyed, a cleaning unit having a squeegee and a cleaning liquid blowing nozzle and performing the cleaning, and a rinsing unit having a rinsing liquid blowing nozzle and washing out the cleaning liquid after cleaning And a film-cutting part having a draining air knife for cutting off the rinse liquid after rinsing, and a drying part having a drying air knife for drying the liquid after draining. Substrate cleaning device. スキージがフイルム状基材表面に押付けられるスキージ押付け部付近に、洗浄液吹き出しノズルからの洗浄液が、前記スキージ押付け部よりも上流側から当たるように、前記洗浄液吹き出しノズルが設けられることを特徴とする請求項１または２に記載のフイルム状基材の洗浄装置。   The cleaning liquid blowing nozzle is provided in the vicinity of the squeegee pressing portion where the squeegee is pressed against the surface of the film-like substrate so that the cleaning liquid from the cleaning liquid blowing nozzle hits from the upstream side of the squeegee pressing portion. Item 3. The apparatus for cleaning a film-like substrate according to Item 1 or 2. スキージはフイルム状基材に対して角度調整及び押し込み量調整ができる機構部を有することを特徴とする請求項１から３の何れかに記載のフイルム状基材の洗浄装置。   4. The film-type substrate cleaning apparatus according to claim 1, wherein the squeegee has a mechanism portion capable of adjusting an angle and a pressing amount with respect to the film-type substrate. スキージが樹脂板であることを特徴とする請求項１から４の何れかに記載のフイルム状基材の洗浄装置。   5. The film-like substrate cleaning apparatus according to claim 1, wherein the squeegee is a resin plate. スキージが樹脂板であり、且つ、被洗浄物のフイルム状基材よりも硬度が低いことを特徴とする請求項１から５の何れかに記載のフイルム状基材の洗浄装置。   6. The film-like substrate cleaning apparatus according to claim 1, wherein the squeegee is a resin plate and has a lower hardness than the film-like substrate of the object to be cleaned. スキージ材質がテフロン（登録商標）であることを特徴とする請求項１から６の何れかに記載のフイルム状基材の洗浄装置。   7. The film-like substrate cleaning apparatus according to claim 1, wherein the squeegee material is Teflon (registered trademark). スキージ材質が金属であり、かつ、フイルム状基材と接触するスキージエッジ部分のＲが０．５ｍｍ乃至３ｍｍであることを特徴とする請求項１から７の何れかに記載のフイルム状基材の洗浄装置。   The squeegee material is metal, and R of the squeegee edge portion that comes into contact with the film-like substrate is 0.5 mm to 3 mm, The film-like substrate according to any one of claims 1 to 7 Cleaning device. スキージ長さが被洗浄物であるフイルム幅より長いことを特徴とする請求項１から８の何れかに記載のフイルム状基材の洗浄装置。   9. The film-type substrate cleaning apparatus according to claim 1, wherein the squeegee length is longer than a film width as an object to be cleaned. 搬送されてくるフイルム状基材を洗浄する方法において、スキージをフイルム上に押付けながら洗浄液をスキージ押付け部付近に吹き出すことを特徴とするフイルム状基材の洗浄方法。   In the method for cleaning a film-like substrate being conveyed, a cleaning method for blowing a film-like substrate, wherein a cleaning liquid is blown out in the vicinity of a squeegee pressing portion while pressing a squeegee onto the film. スキージに角度を付けて、スキージエッジ部分がフイルム面に接触するようにした請求項１０記載にフイルム基材の洗浄方法。   11. The method for cleaning a film substrate according to claim 10, wherein the squeegee is angled so that the squeegee edge portion contacts the film surface.
JP2008265186A 2008-10-14 2008-10-14 Method and apparatus for cleaning film-like substrate Pending JP2010094577A (en)

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