JP2009235265A - Curable silicone rubber composition and photosemiconductor device using the same as sealing material - Google Patents
Curable silicone rubber composition and photosemiconductor device using the same as sealing material Download PDFInfo
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- JP2009235265A JP2009235265A JP2008084142A JP2008084142A JP2009235265A JP 2009235265 A JP2009235265 A JP 2009235265A JP 2008084142 A JP2008084142 A JP 2008084142A JP 2008084142 A JP2008084142 A JP 2008084142A JP 2009235265 A JP2009235265 A JP 2009235265A
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- silicone rubber
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- organopolysiloxane
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- 239000000203 mixture Substances 0.000 title claims abstract description 50
- 229920002379 silicone rubber Polymers 0.000 title claims abstract description 15
- 239000004945 silicone rubber Substances 0.000 title claims abstract description 15
- 239000003566 sealing material Substances 0.000 title abstract description 3
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 38
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 23
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 17
- 229920005989 resin Polymers 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 17
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910021485 fumed silica Inorganic materials 0.000 claims abstract description 13
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- 239000003054 catalyst Substances 0.000 claims abstract description 7
- 230000003287 optical effect Effects 0.000 claims description 21
- 239000004065 semiconductor Substances 0.000 claims description 21
- 239000013008 thixotropic agent Substances 0.000 claims description 7
- 238000002834 transmittance Methods 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 15
- 229910052710 silicon Inorganic materials 0.000 abstract description 11
- 238000000465 moulding Methods 0.000 abstract description 6
- 239000003795 chemical substances by application Substances 0.000 abstract description 4
- -1 chloropropyl group Chemical group 0.000 description 27
- 125000001183 hydrocarbyl group Chemical group 0.000 description 19
- 239000000758 substrate Substances 0.000 description 17
- 125000004432 carbon atom Chemical group C* 0.000 description 16
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 12
- 125000003342 alkenyl group Chemical group 0.000 description 11
- 229920001577 copolymer Polymers 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 238000001723 curing Methods 0.000 description 8
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 8
- 229920002050 silicone resin Polymers 0.000 description 8
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 7
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- 229910004283 SiO 4 Inorganic materials 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 4
- 125000005388 dimethylhydrogensiloxy group Chemical group 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 125000006038 hexenyl group Chemical group 0.000 description 4
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 0 *CCC(C*1)C1N Chemical compound *CCC(C*1)C1N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 238000013006 addition curing Methods 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000005998 bromoethyl group Chemical group 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004344 phenylpropyl group Chemical group 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 230000009974 thixotropic effect Effects 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 1
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229920001342 Bakelite® Polymers 0.000 description 1
- WPHGSKGZRAQSGP-UHFFFAOYSA-N C1C2C1CCCC2 Chemical compound C1C2C1CCCC2 WPHGSKGZRAQSGP-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000004637 bakelite Substances 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 229920005645 diorganopolysiloxane polymer Polymers 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- NYMPGSQKHIOWIO-UHFFFAOYSA-N hydroxy(diphenyl)silicon Chemical class C=1C=CC=CC=1[Si](O)C1=CC=CC=C1 NYMPGSQKHIOWIO-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical compound [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/10—Metal compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Led Device Packages (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
本発明は、支持構造体上に搭載された光半導体チップの被覆ないし封止の材料として有用な付加硬化型の硬化性シリコーンゴム組成物に関し、特に半導体チップに直接に適量適用し、成形、硬化させて透明な被覆を形成するのに適した付加硬化型の硬化性シリコーンゴム組成物に関する。 The present invention relates to an addition-curing type curable silicone rubber composition useful as a material for coating or sealing an optical semiconductor chip mounted on a support structure, and in particular, an appropriate amount is directly applied to a semiconductor chip to be molded and cured. The present invention relates to an addition-curable curable silicone rubber composition suitable for forming a transparent coating.
LED発光装置用レンズは、射出成形等の機械成形よって大量に製造されている。従来はアクリル樹脂、ポリカーボネート樹脂等の熱可塑樹脂を用いて成形されていたが、LED発光装置の高出力化に伴い、熱可塑樹脂では耐熱性、耐変色性が不十分であるとの問題が出てきた。また、最近では鉛フリー半田が多く使用されるようになってきたが、鉛フリー半田は従来の半田に比べ溶融温度が高いため、通常260℃以上の高温で光学素子を基板に半田付けする。このような温度で半田付けを行った場合、従来の熱可塑性材料からなるレンズでは変形が起ったり、高温のため黄変する不具合が発生し使用することが出来なくなる。 A large number of lenses for LED light emitting devices are manufactured by mechanical molding such as injection molding. Conventionally, it was molded using thermoplastic resin such as acrylic resin and polycarbonate resin, but with the increase in output of LED light emitting device, there is a problem that thermoplastic resin has insufficient heat resistance and discoloration resistance. It came out. In recent years, lead-free solder has been frequently used. Since lead-free solder has a higher melting temperature than conventional solder, the optical element is usually soldered to the substrate at a high temperature of 260 ° C. or higher. When soldering is performed at such a temperature, a conventional lens made of a thermoplastic material may be deformed, or may be yellowed due to a high temperature and cannot be used.
このような状況からLED等のためのレンズ材料にシリコーン樹脂を使用する試みが数多くなされている。例えば、シリコーン樹脂を用いて射出成形等の成形方法で予め製造したレンズを、LEDチップを搭載したパッケージに装着する方法が提案されている(特許文献1)。しかし、この方法では接着樹脂とインナー樹脂とが必要になる上に作業も煩雑で容易でない。 Under such circumstances, many attempts have been made to use a silicone resin as a lens material for an LED or the like. For example, a method has been proposed in which a lens manufactured in advance by a molding method such as injection molding using silicone resin is mounted on a package on which an LED chip is mounted (Patent Document 1). However, this method requires an adhesive resin and an inner resin and is cumbersome and difficult.
支持構造体上に装着した光半導体チップ上で材料を成形、硬化させる方法として、オーバーモールド法が知られている(特許文献2参照)。この方法は、樹脂の透明性やチクソ性のコントロールが不十分であるという欠点を有する。 As a method for molding and curing a material on an optical semiconductor chip mounted on a support structure, an overmold method is known (see Patent Document 2). This method has a drawback that the transparency and thixotropic control of the resin are insufficient.
そこで、近年、支持構造体上に搭載されたLEDチップ上にシリコーン樹脂を直接適用し、レンズ状に成形する方法が提案されている(特許文献3)。しかし、使用されるシリコーン樹脂のチクソ性が劣るため、これを支持基板上のLEDチップにディスペンサーを用いて直接に適量を適用し、成形・硬化させようとしても流れてしまい、目的の形状を有する成形・硬化物が得られないという問題があった。また、シリコーン樹脂のチクソ性が不十分である結果、これを使用する製造装置も高価なものとならざるを得ないという問題もあった。 Therefore, in recent years, a method has been proposed in which a silicone resin is directly applied to an LED chip mounted on a support structure and molded into a lens shape (Patent Document 3). However, since the thixotropy of the silicone resin used is inferior, the appropriate amount is directly applied to the LED chip on the support substrate using a dispenser, and it flows even if it is molded and cured, so that it has the desired shape. There was a problem that a molded / cured product could not be obtained. Further, as a result of insufficient thixotropy of the silicone resin, there has been a problem that a manufacturing apparatus using the silicone resin has to be expensive.
シリコーン樹脂にヒュームドシリカを添加すればチクソ性を付与できることは知られているが白濁が生じたり得られるチクソ性にロットごとにバラツキがあるため実用的でなかった。 Although it is known that thixotropy can be imparted by adding fumed silica to a silicone resin, it is not practical because of the cloudiness or the thixotropy obtained varies from lot to lot.
そこで、本発明の課題は、支持構造体上に装着したLEDチップにディスペンサーを用いて直接に適量を適用し、成形・硬化させることにより透明性の高いレンズ形状の被覆ないし封止体を形成することができる硬化性シリコーンゴム組成物を提供することにある。 Accordingly, an object of the present invention is to form a highly transparent lens-shaped coating or sealing body by applying an appropriate amount directly to a LED chip mounted on a support structure using a dispenser, and molding and curing the LED chip. An object of the present invention is to provide a curable silicone rubber composition that can be used.
そこで、本発明者らは、オルガノポリシロキサン成分の構成、ヒュームドシリカの屈折率とそれ以外の成分全体の屈折率との関係などを検討することにより、硬化物の透明性と安定したチクソ性を両立したシリコーン樹脂組成物を見出し、上記の課題を解決することができた。 Therefore, the present inventors examined the constitution of the organopolysiloxane component, the relationship between the refractive index of fumed silica and the refractive index of the other components as a whole, and the transparency of the cured product and stable thixotropy. The present inventors have found a silicone resin composition that satisfies both of the above and has solved the above problems.
即ち、本発明は、具体的には、
(A)一分子中に2個以上の脂肪族不飽和結合を有し、本質的に直鎖状であるオルガノポリシロキサン、
(B)一分子中に2個以上の脂肪族不飽和結合を有し、樹脂構造を有するオルガノポリシロキサン、
(C)一分子中にケイ素原子結合水素原子を2個以上有するオルガノハイドロジェンポリシロキサン、
(D)白金族金属系触媒、
(E)(F)成分以外のチクソ性付与剤、および
(F)ヒュームドシリカ
を含有してなり、かつ(A)〜(E)成分からなる組成物の屈折率が1.42〜1.47であることを特徴とする硬化性シリコーンゴム組成物を提供する。
That is, the present invention specifically includes
(A) an organopolysiloxane having two or more aliphatic unsaturated bonds in one molecule and being essentially linear;
(B) an organopolysiloxane having two or more aliphatic unsaturated bonds in one molecule and having a resin structure;
(C) an organohydrogenpolysiloxane having two or more silicon-bonded hydrogen atoms in one molecule;
(D) a platinum group metal catalyst,
(E) The thixotropic agent other than (F) component and (F) fumed silica are contained, and the refractive index of the composition comprising components (A) to (E) is 1.42 to 1.47. A curable silicone rubber composition is provided.
また、本発明は上記の組成物を硬化してなり、厚さ1mmの層状態で20℃における波長450nmの光の透過率が80%以上であるシリコーンゴム硬化物を提供する。 In addition, the present invention provides a cured silicone rubber obtained by curing the above composition and having a layer state of 1 mm thickness and a light transmittance of 450 nm at 20 ° C. of light having a wavelength of 450% or more.
該硬化物は例えば光半導体装置に用いられる光半導体チップの封止材料として有用である。 The cured product is useful, for example, as a sealing material for an optical semiconductor chip used in an optical semiconductor device.
そこで、本発明は、さらに、光半導体チップと、該光半導体チップを被覆する、上記組成物を硬化してなるシリコーンゴム硬化物とを有する光半導体装置を提供する。 Therefore, the present invention further provides an optical semiconductor device having an optical semiconductor chip and a cured silicone rubber obtained by curing the above composition and covering the optical semiconductor chip.
本発明の組成物はチクソ性に優れているので、例えば、支持構造体上に装着された光半導体チップにディスペンサーを用いて適量の組成物を簡便に適用することができ、その後成形、硬化させることによりレンズ形状の被覆体を安定的に形成することができる。 Since the composition of the present invention is excellent in thixotropy, for example, an appropriate amount of the composition can be simply applied to the optical semiconductor chip mounted on the support structure using a dispenser, and then molded and cured. Thus, a lens-shaped covering can be stably formed.
−(A)脂肪族不飽和結合含有オルガノポリシロキサン−
本発明のベース成分である(A)成分は、一分子中に2個以上の脂肪族不飽和結合を有し、本質的に直鎖状であるオルガノポリシロキサンである。該オルガノポリシロキサンは粘度が作業性、硬化性などの点から、25℃で10〜1,000,000mPa・s、特に100〜100,000mPa・sであることが望ましい。
-(A) Aliphatic unsaturated bond-containing organopolysiloxane-
The component (A), which is the base component of the present invention, is an organopolysiloxane that has two or more aliphatic unsaturated bonds in one molecule and is essentially linear. The organopolysiloxane desirably has a viscosity of 10 to 1,000,000 mPa · s, particularly 100 to 100,000 mPa · s at 25 ° C. from the viewpoint of workability and curability.
分子構造は本質的に直鎖状であり、好ましくは直鎖状である。「本質的に直鎖状である」とは、本成分中の両末端を封鎖するトリオルガノシロキシ基以外の全てのシロキサン単位が主に2官能単位(D単位)(具体的には、式:R1 2SiOで表される単位)で構成されるが、全シロキサン単位の3モル%以下、好ましくは2モル%以下で分岐を形成する3官能単位(T単位)(具体的には、式:R1SiO3/2で表される単位)および4官能単位(Q単位)(具体的には、式:SiO4/2単位で表される単位)の少なくとも1種のシロキサン単位を含有してもよいことを意味する。好ましくは両末端のみが一官能性単位(M単位)(具体的には、式:R1 3SiO1/2で表される単位)で構成され、その他のシロキサン単位がすべてD単位からなる直鎖状のジオルガノポリシロキサンである。ここで、R1は置換もしくは非置換の一価炭化水素基である。 The molecular structure is essentially linear, preferably linear. “Essentially linear” means that all siloxane units other than the triorganosiloxy group blocking both ends in this component are mainly bifunctional units (D units) (specifically, the formula: R units composed of R 1 2 SiO), but a trifunctional unit (T unit) that forms a branch at 3 mol% or less, preferably 2 mol% or less of all siloxane units (specifically, a formula : Units represented by R 1 SiO 3/2 ) and tetrafunctional units (Q units) (specifically, units represented by the formula: SiO 4/2 units) It means you may. Preferably, only both terminals are composed of monofunctional units (M units) (specifically, units represented by the formula: R 1 3 SiO 1/2 ), and other siloxane units are all composed of D units. It is a chain diorganopolysiloxane. Here, R 1 is a substituted or unsubstituted monovalent hydrocarbon group.
ここで、R1の一価炭化水素基としては、炭素原子数1〜10、特に1〜6のものが好ましく、具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert−ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、オクチル基、ノニル基、デシル基等のアルキル基;等のアルキル基;シクロヘキシル基;フェニル基、トリル基、キシリル基、ナフチル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基等のアラルキル基、ビニル基、アリル基、プロペニル基、イソプロペニル基、ブテニル基、ペンテニル基、ヘキセニル基、オクテニル基等のアルケニル基;シクロヘキセニル基;およびこれらの炭化水素基の水素原子の一部又は全部をフッ素、臭素、塩素等のハロゲン原子、シアノ基等で置換したもの、例えばクロロメチル基、クロロプロピル基、ブロモエチル基、トリフロロプロピル基等のハロゲン置換アルキル基やシアノエチル基等が挙げられる。 Here, the monovalent hydrocarbon group for R 1 is preferably a group having 1 to 10 carbon atoms, particularly 1 to 6 carbon atoms, and specifically includes a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, Alkyl group such as isobutyl group, tert-butyl group, pentyl group, neopentyl group, hexyl group, octyl group, nonyl group, decyl group; alkyl group; cyclohexyl group; phenyl group, tolyl group, xylyl group, naphthyl group, etc. Aralkyl groups such as aryl group, benzyl group, phenylethyl group and phenylpropyl group, alkenyl groups such as vinyl group, allyl group, propenyl group, isopropenyl group, butenyl group, pentenyl group, hexenyl group and octenyl group; cyclohexenyl And a part or all of the hydrogen atoms of these hydrocarbon groups may be substituted with halogen atoms such as fluorine, bromine and chlorine, Those substituted with amino group or the like, such as chloromethyl group, chloropropyl group, bromoethyl group, and a halogen-substituted alkyl group or cyanoethyl group such trifluoropropyl group.
(A)成分のオルガノポリシロキサンは、一分子中に2個以上の脂肪族不飽和結合を有する。脂肪族不飽和結合としては、炭素原子数2〜8、特に2〜6のアルケニル基およびシクロアルケニル基が代表的であり、具体的には上述のビニル基、アリル基、プロペニル基、イソプロペニル基、ブテニル基、ペンテニル基、ヘキセニル基等のアルケニル基、シクロヘキセニル基等のシクロアルケニル基で例示される。中でも、好ましくはビニル基およびアリル基である。 The organopolysiloxane of component (A) has two or more aliphatic unsaturated bonds in one molecule. Typical examples of the aliphatic unsaturated bond include alkenyl groups and cycloalkenyl groups having 2 to 8 carbon atoms, particularly 2 to 6 carbon atoms. Specifically, the above-described vinyl group, allyl group, propenyl group, and isopropenyl group. And an alkenyl group such as a butenyl group, a pentenyl group and a hexenyl group, and a cycloalkenyl group such as a cyclohexenyl group. Among these, a vinyl group and an allyl group are preferable.
(A)成分のオルガノポリシロキサンの好ましい具体例としては、下記一般式(1)で表される分子鎖両末端のケイ素原子のおのおのに少なくとも1個のアルケニル基を有する直鎖状オルガノポリシロキサンであって、上記でも述べた通り、25℃における粘度が10〜1,000,000mPa・sのものである。 A preferred specific example of the organopolysiloxane of component (A) is a linear organopolysiloxane having at least one alkenyl group for each silicon atom at both ends of the molecular chain represented by the following general formula (1). As described above, the viscosity at 25 ° C. is 10 to 1,000,000 mPa · s.
(式中、R1は前記の通り、独立に、非置換又は置換の一価炭化水素基、R2は互いに同一又は異種の脂肪族不飽和結合を有しない非置換又は置換一価炭化水素基であり、kおよびmは独立に0又は正の整数であってk+mがこのオルガノポリシロキサンの25℃の粘度を10〜1,000,000mPa・sとなる数である。) (Wherein, R 1 is independently an unsubstituted or substituted monovalent hydrocarbon group as described above, and R 2 is an unsubstituted or substituted monovalent hydrocarbon group that does not have the same or different aliphatic unsaturated bond. And k and m are each independently 0 or a positive integer, and k + m is a number at which the viscosity of this organopolysiloxane at 25 ° C. is 10 to 1,000,000 mPa · s.)
また、R2の脂肪族不飽和結合を有しない一価炭化水素基としても、炭素原子数1〜10、特に1〜6のものが好ましく、上記R1の具体例と同様のものが例示できるが、但しアルケニル基およびシクロヘキセニル基は含まない。 Further, even if the monovalent hydrocarbon group with no aliphatic unsaturated bonds R 2, 1 to 10 carbon atoms, particularly preferably having 1 to 6, are the same as specific examples of the R 1 may be exemplified However, an alkenyl group and a cyclohexenyl group are not included.
kおよびmは、一般的には、0≦k≦2,000、1≦m≦10,000で、かつ、1≦k+m≦10,000を満足する0又は正の整数であり、好ましくは5≦k+m≦2,000で、0≦k/(k+m)≦0.2を満足する整数である。 k and m are generally 0 or a positive integer satisfying 0 ≦ k ≦ 2,000, 1 ≦ m ≦ 10,000, and 1 ≦ k + m ≦ 10,000, preferably 5 ≦ k + m ≦ 2,000 and an integer satisfying 0 ≦ k / (k + m) ≦ 0.2.
一般式(1で表されるオルガノポリシロキサンとして具体的には、下記のものを例示することができる。 Specific examples of the organopolysiloxane represented by the general formula (1) include the following.
(上記式において、kおよびmは上述した通りである。) (In the above formula, k and m are as described above.)
(A)成分のオルガノポリシロキサンをさらに具体的な例は以下の通りである。 Specific examples of the organopolysiloxane (A) are as follows.
−(B)樹脂構造を有するオルガノポリシロキサン−
本発明では、脂肪族不飽和結合を有するオルガノポリシロキサンとして、(A)成分の本質的に直鎖状であるオルガノポリシロキサンとともに、樹脂構造のオルガノポリシロキサンが(B)成分として使用される。
-(B) Organopolysiloxane having a resin structure-
In the present invention, as the organopolysiloxane having an aliphatic unsaturated bond, an organopolysiloxane having a resin structure is used as the component (B) together with the organopolysiloxane that is essentially linear as the component (A).
(B)成分の脂肪族不飽和基を有する樹脂構造のオルガノポリシロキサンは、予め三次元架橋され、三次元網状構造を有する。該オルガノポリシロキサン、R1 3SiO1/2単位と、SiO2単位とからなるが、さらに場合によりR1SiO3/2単位およびR1 2SiO単位の少なくとも一種を含んでもよい。即ち、基本的に、R1 3SiO1/2単位とSiO2単位とからなるが、任意的にR1SiO3/2単位および/またはR1 2SiO単位を発明の目的効果を損わない範囲で含有してよいものである。好ましくは、R1 3SiO1/2単位とSiO2単位とからなる。ここで、R1は同じもしくは異なり、独立に、置換または非置換の、好ましくは炭素原子数1〜10の、一価炭化水素基であり、(A)成分に関して説明したとおりである。またこのオルガノポリシロキサンは、重量平均分子量が500〜10,000の範囲であるものが好適である。 The organopolysiloxane having a resin structure having an aliphatic unsaturated group (B) is three-dimensionally crosslinked in advance and has a three-dimensional network structure. The organopolysiloxane is composed of R 1 3 SiO 1/2 units and SiO 2 units, but may further contain at least one of R 1 SiO 3/2 units and R 1 2 SiO units. That is, it basically comprises R 1 3 SiO 1/2 units and SiO 2 units, but optionally R 1 SiO 3/2 units and / or R 1 2 SiO units do not impair the object effects of the invention. It may be contained in a range. Preferably, it consists of R 1 3 SiO 1/2 units and SiO 2 units. Here, R 1 is the same or different and is independently a substituted or unsubstituted monovalent hydrocarbon group, preferably having 1 to 10 carbon atoms, as described for the component (A). The organopolysiloxane preferably has a weight average molecular weight in the range of 500 to 10,000.
(B)成分のオルガノポリシロキサンは「樹脂構造を有する」点で(A)成分の本質的に直鎖状であるオルガノポリシロキサンと相違する。本明細書において、(B)成分のオルガノポリシロキサンが「樹脂構造を有する」とは該オルガノポリシロキサン樹脂中の全シロキサン単位の5モル%以上、好ましくは10モル%以上、より好ましくは15〜75モル%、更に好ましくは25〜50モル%が、SiO2単位からなることを意味する。この単位は分子のシロキサン骨格を三次元網状構造にする作用を有する。 The (B) component organopolysiloxane differs from the (A) component essentially linear organopolysiloxane in that it has a “resin structure”. In this specification, the organopolysiloxane of the component (B) is “having a resin structure” means 5 mol% or more, preferably 10 mol% or more, more preferably 15 to 15 mol% of all siloxane units in the organopolysiloxane resin. 75 mol%, more preferably 25 to 50 mol%, means that consist of SiO 2 units. This unit has a function of making the siloxane skeleton of the molecule into a three-dimensional network structure.
(B)成分の樹脂構造を有するオルガノポリシロキサンとして好ましいものは、SiO2単位(QB単位)、R3 nR4 pSiO0.5単位(MB1単位)およびR3 qR4 rSiO0.5単位(MB2単位)から基本的になり、任意的に二官能性シロキサン単位および/または三官能性シロキサン単位(即ち、オルガノシルセスキオキサン単位)を上述の割合で含んでよいオルガノポリシロキサンである(ここで、R3はビニル基又はアリル基、R4は脂肪族不飽和結合を含まない一価炭化水素基であり、nは2又は3、pは0又は1で、n+p=3の関係にあり、qは0又は1、rは2又は3で、q+r=3の関係にある。)。 (B) Preferred examples of organopolysiloxane having a resin structure of the components, SiO 2 units (Q B units), R 3 n R 4 p SiO 0.5 units (M B1 unit) and R 3 q R 4 r SiO 0.5 units It is an organopolysiloxane consisting essentially of (MB 2 units) and optionally containing difunctional siloxane units and / or trifunctional siloxane units (ie organosilsesquioxane units) in the above-mentioned proportions. (Where R 3 is a vinyl group or an allyl group, R 4 is a monovalent hydrocarbon group not containing an aliphatic unsaturated bond, n is 2 or 3, p is 0 or 1, and n + p = 3) Q is 0 or 1, r is 2 or 3, and q + r = 3.
なお、R4の脂肪族不飽和結合を含まない置換または非置換の一価炭化水素基としては、上記R2と同様の炭素原子数1〜10、特に1〜6のものが挙げられる。 In addition, examples of the substituted or unsubstituted monovalent hydrocarbon group not containing the aliphatic unsaturated bond of R 4 include those having 1 to 10 carbon atoms, particularly 1 to 6 carbon atoms, similar to the above R 2 .
ここで、QB単位のモル数をq、MB1単位のモル数をm1、MB2単位のモル数をm2としたときに、次の関係式(イ)および(ロ):
(m1+m2)/q=0.3〜3、特に0.7〜1 (イ)
m2/q=0.01〜1、特に0.07〜0.15 (ロ)
を満たすことが好ましい。
Here, when the number of moles of Q B units is q, the number of moles of M B1 units is m 1 , and the number of moles of M B2 units is m 2 , the following relational expressions (A) and (B):
(M 1 + m 2 ) /q=0.3-3, especially 0.7-1 (A)
m 2 /q=0.01 to 1, especially 0.07 to 0.15 (b)
It is preferable to satisfy.
このような樹脂構造のオルガノポリシロキサンの合成は、それぞれの単位源となる化合物を、生成単位が所要の割合となるように組み合わせ、例えば酸の存在下で共加水分解を行うことによって容易に行うことができる。 The synthesis of the organopolysiloxane having such a resin structure is easily performed by combining each unit source compound so that the generated units have a required ratio and co-hydrolyzing in the presence of an acid, for example. be able to.
ここで、前記QB単位源としては、ケイ酸ソーダ、アルキルシリケート、ポリアルキルシリケート、四塩化ケイ素等を例示することができる。 Here, as the Q B unit source, sodium silicate, alkyl silicates, polyalkyl silicates, can be exemplified silicon tetrachloride.
また、MB1単位源としては、下記の化合物を例示することができる。 Examples of the MB1 unit source include the following compounds.
更に、MB2単位源としては、下記の化合物を例示することができる。 Further, examples of the MB2 unit source include the following compounds.
この(B)成分の樹脂構造を有するオルガノポリシロキサンは、得られる硬化物の硬度を調整するために配合されるものであり、先にも説明した通り、前記(A)成分と(B)成分の合計量当り、0.1〜50質量%の量で、好ましくは1〜30質量%配合される。該(B)成分の割合を調整することにより硬さが調整できる。 The organopolysiloxane having the resin structure of the component (B) is blended to adjust the hardness of the resulting cured product, and as described above, the components (A) and (B) The amount is 0.1 to 50% by mass, preferably 1 to 30% by mass based on the total amount. The hardness can be adjusted by adjusting the proportion of the component (B).
−(C)オルガノハイドロジェンポリシロキサン−
(C)成分のオルガノハイドロジェンポリシロキサンは架橋剤として作用するものであり、該成分中のSiH基と(A)成分および(B)成分中のアルケニル基等の脂肪族不飽和基とが付加反応することにより硬化物を形成するものである。かかるオルガノハイドロジェンポリシロキサンは、一分子中にケイ素原子に結合した水素原子(即ち、SiH基)を2個以上、好ましくは3個以上、特に4〜1,000個有するものであればいずれのものでもよい。ケイ素原子に結合した水素原子の位置は特に制約はなく、分子の末端でも非末端でもよい。
-(C) Organohydrogenpolysiloxane-
Component (C), the organohydrogenpolysiloxane, acts as a crosslinking agent, and the addition of SiH groups in the component and aliphatic unsaturated groups such as alkenyl groups in the components (A) and (B). A cured product is formed by reaction. Such organohydrogenpolysiloxane is any one having 2 or more, preferably 3 or more, particularly 4 to 1,000, hydrogen atoms bonded to silicon atoms in one molecule (that is, SiH group). It may be a thing. The position of the hydrogen atom bonded to the silicon atom is not particularly limited and may be the terminal or non-terminal of the molecule.
(C)成分のオルガノハイドロジェンポリシロキサンは、(A)成分および(B)成分と反応し、架橋剤として作用するものであり、一分子中に平均2個以上、好ましくは平均3個以上の珪素原子に結合した水素原子(SiHで表されるヒドロシリル基)を有する必要があり、通常、3〜1,000個、好ましくは3〜500個、より好ましくは3〜200個、更に好ましくは4〜100個程度のケイ素原子結合水素原子を有することが望ましい。その分子構造には特に制限はなく、従来付加反応硬化型シリコーン組成物に架橋剤として使用されているいずれも使用することができ、例えば線状、環状、分岐状、三次元網状構造(樹脂状)等各種のものが使用可能である。 The (C) component organohydrogenpolysiloxane reacts with the (A) component and the (B) component to act as a cross-linking agent, and has an average of 2 or more, preferably an average of 3 or more per molecule. It is necessary to have a hydrogen atom (hydrosilyl group represented by SiH) bonded to a silicon atom, and usually 3 to 1,000, preferably 3 to 500, more preferably 3 to 200, and still more preferably 4 It is desirable to have about ˜100 silicon-bonded hydrogen atoms. There are no particular restrictions on the molecular structure, and any of the conventionally used addition reaction curable silicone compositions used as a crosslinking agent can be used. For example, linear, cyclic, branched, and three-dimensional network structures (resinous ) Etc. can be used.
一分子中に2個以上、好ましくは3個以上含有されるケイ素原子結合水素原子は、分子鎖末端および分子鎖非末端のいずれに位置していてもよく、またこの両方に位置するものであってもよい。かかる水素原子以外の、ケイ素原子に結合した一価の原子または置換基はすべて脂肪族不飽和結合を含まない、好ましくは炭素原子数1〜10の、珪素原子に結合した非置換又は置換の一価炭化水素基である。 The silicon-bonded hydrogen atoms contained in two or more, preferably three or more in one molecule may be located at either the molecular chain terminal or the molecular chain non-terminal, or both. May be. All monovalent atoms or substituents bonded to silicon atoms other than such hydrogen atoms do not contain aliphatic unsaturated bonds, and preferably are unsubstituted or substituted bonded to silicon atoms having 1 to 10 carbon atoms. Is a valent hydrocarbon group.
該オルガノハイドロジェンポリシロキサンの一分子中の珪素原子の数(即ち、重合度)は通常2〜1,000個、好ましくは3〜300個、より好ましくは4〜150個程度のものが望ましく、25℃における粘度が、通常、0.1〜100,000mPa.s、好ましくは、0.5〜5,000mPa.s程度の、室温(25℃)で液状のものが使用される。 The number of silicon atoms in one molecule of the organohydrogenpolysiloxane (that is, the degree of polymerization) is usually 2 to 1,000, preferably 3 to 300, more preferably about 4 to 150, A liquid having a viscosity at 25 ° C. of usually 0.1 to 100,000 mPa.s, preferably about 0.5 to 5,000 mPa.s, at room temperature (25 ° C.) is used.
このオルガノハイドロジェンポリシロキサンとしては、例えば、下記平均組成式(2)で示されるものが用いられる。 As this organohydrogenpolysiloxane, for example, those represented by the following average composition formula (2) are used.
R5 bHcSiO(4-b-c)/2 (2)
(式中、R5は、脂肪族不飽和結合を含まない、好ましくは炭素原子数1〜10の、珪素原子に結合した非置換又は置換の一価炭化水素基であり、bは0.7〜2.1の数、cは0.001〜1.0数であって、かつb+cが0.8〜3.0の範囲である。)
R 5 b H c SiO (4-bc) / 2 (2)
(Wherein R 5 is an unsubstituted or substituted monovalent hydrocarbon group bonded to a silicon atom having no aliphatic unsaturated bond, preferably having 1 to 10 carbon atoms, and b is 0.7 The number of ~ 2.1, c is 0.001 to 1.0, and b + c is in the range of 0.8 to 3.0.)
上記R5で表される脂肪族不飽和結合を含まない非置換又は置換の一価炭化水素基としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert−ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、シクロヘキシル基、オクチル基、ノニル基、デシル基等のアルキル基、フェニル基、トリル基、キシリル基、ナフチル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基等のアラルキル基、これらの炭化水素基の水素原子の一部又は全部をフッ素、臭素、塩素等のハロゲン原子で置換したもの、例えばクロロメチル基、クロロプロピル基、ブロモエチル基、トリフロロプロピル基等が挙げられる。これらの非置換又は置換の一価炭化水素基の中でも、好ましくはアルキル基、アリール基であり、より好ましくはメチル基、フェニル基である。 Examples of the unsubstituted or substituted monovalent hydrocarbon group not containing an aliphatic unsaturated bond represented by R 5 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, and tert-butyl. Group, pentyl group, neopentyl group, hexyl group, cyclohexyl group, octyl group, nonyl group, alkyl group such as decyl group, aryl group such as phenyl group, tolyl group, xylyl group, naphthyl group, benzyl group, phenylethyl group, Aralkyl groups such as phenylpropyl groups, or those obtained by substituting some or all of the hydrogen atoms of these hydrocarbon groups with halogen atoms such as fluorine, bromine and chlorine, such as chloromethyl groups, chloropropyl groups, bromoethyl groups, trifluoro A propyl group etc. are mentioned. Among these unsubstituted or substituted monovalent hydrocarbon groups, an alkyl group and an aryl group are preferable, and a methyl group and a phenyl group are more preferable.
また、好ましくは、bは1.0〜2.0の数、cは0.01〜1.0の数であって、b+cが1.5〜2.5の範囲である。 Preferably, b is a number from 1.0 to 2.0, c is a number from 0.01 to 1.0, and b + c is in a range from 1.5 to 2.5.
このようなオルガノハイドロジェンポリシロキサンは、通常、R5SiHCl2、(R5)3SiCl、(R5)2SiCl2、(R5)2SiHCl(R5は、前記の通りである)のようなクロロシランを加水分解するか、加水分解して得られたシロキサンを平衡化することにより得ることができる。 Such organohydrogenpolysiloxanes are usually R 5 SiHCl 2 , (R 5 ) 3 SiCl, (R 5 ) 2 SiCl 2 , (R 5 ) 2 SiHCl (R 5 is as described above). Such chlorosilanes can be hydrolyzed or siloxanes obtained by hydrolysis can be equilibrated.
平均組成式(2)で表されるオルガノハイドロジェンポリシロキサンとして、具体的には、例えば、1,1,3,3−テトラメチルジシロキサン、1,3,5,7−テトラメチルシクロテトラシロキサン、トリス(ハイドロジェンジメチルシロキシ)メチルシラン、トリス(ハイドロジェンジメチルシロキシ)フェニルシラン、メチルハイドロジェンシクロポリシロキサン、メチルハイドロジェンシロキサン・ジメチルシロキサン環状共重合体、両末端トリメチルシロキシ基封鎖メチルハイドロジェンポリシロキサン、両末端トリメチルシロキシ基封鎖ジメチルシロキサン・メチルハイドロジェンシロキサン共重合体、両末端ジメチルハイドロジェンシロキシ基封鎖ジメチルポリシロキサン、両末端ジメチルハイドロジェンシロキシ基封鎖ジメチルシロキサン・メチルハイドロジェンシロキサン共重合体、両末端トリメチルシロキシ基封鎖メチルハイドロジェンシロキサン・ジフェニルシロキサン共重合体、両末端トリメチルシロキシ基封鎖メチルハイドロジェンシロキサン・ジフェニルシロキサン・ジメチルシロキサン共重合体、両末端トリメチルシロキシ基封鎖メチルハイドロジェンシロキサン・メチルフェニルシロキサン・ジメチルシロキサン共重合体、両末端ジメチルハイドロジェンシロキシ基封鎖メチルハイドロジェンシロキサン・ジメチルシロキサン・ジフェニルシロキサン共重合体、両末端ジメチルハイドロジェンシロキシ基封鎖メチルハイドロジェンシロキサン・ジメチルシロキサン・メチルフェニルシロキサン共重合体、(CH3)2HSiO1/2単位と(CH3)3SiO1/2単位とSiO4/2単位とからなる共重合体、(CH3)2HSiO1/2単位とSiO4/2単位とからなる共重合体、(CH3)2HSiO1/2単位とSiO4/2単位と(C6H5)3SiO1/2単位とからなる共重合体などが挙げられる。 Specific examples of the organohydrogenpolysiloxane represented by the average composition formula (2) include 1,1,3,3-tetramethyldisiloxane and 1,3,5,7-tetramethylcyclotetrasiloxane. , Tris (hydrogendimethylsiloxy) methylsilane, tris (hydrogendimethylsiloxy) phenylsilane, methylhydrogencyclopolysiloxane, methylhydrogensiloxane-dimethylsiloxane cyclic copolymer, trimethylsiloxy group-blocked methylhydrogenpolysiloxane , Both ends trimethylsiloxy group-blocked dimethylsiloxane / methylhydrogensiloxane copolymer, both ends dimethylhydrogensiloxy group-blocked dimethylpolysiloxane, both ends dimethylhydrogensiloxy group-blocked dimethyl Siloxane / methylhydrogensiloxane copolymer, trimethylsiloxy group-blocked methylhydrogensiloxane / diphenylsiloxane copolymer, trimethylsiloxy group-blocked methylhydrogensiloxane / diphenylsiloxane / dimethylsiloxane copolymer, both ends Trimethylsiloxy group-blocked methylhydrogensiloxane / methylphenylsiloxane / dimethylsiloxane copolymer, both ends dimethylhydrogensiloxy group-blocked methylhydrogensiloxane / dimethylsiloxane / diphenylsiloxane copolymer, both ends dimethylhydrogensiloxy group-blocked methyl Hydrogensiloxane / dimethylsiloxane / methylphenylsiloxane copolymer, (CH 3 ) 2 HSiO 1/2 unit and (CH 3 ) 3 A copolymer composed of SiO 1/2 units and SiO 4/2 units, a copolymer composed of (CH 3 ) 2 HSiO 1/2 units and SiO 4/2 units, (CH 3 ) 2 HSiO 1/2 Examples thereof include copolymers comprising units, SiO 4/2 units, and (C 6 H 5 ) 3 SiO 1/2 units.
さらに具体的には、下記式で表される構造のハイドロジェンオルガノシロキサンが例示できる。 More specifically, hydrogen organosiloxane having a structure represented by the following formula can be exemplified.
(上の式中、Lは0〜200の整数、Mは1〜200の整数、R6はエポキシ基、(メタ)アクリロキシ基、アルコキシシリル基から選ばれる官能基を含有する官能基置換アルキル基である。) (In the above formula, L is an integer of 0 to 200, M is an integer of 1 to 200, R 6 is a functional group-substituted alkyl group containing a functional group selected from an epoxy group, a (meth) acryloxy group, and an alkoxysilyl group. .)
なお、(C)成分のオルガノハイドロジェンポリシロキサンの配合量は、上記(A)成分および(B)成分の硬化有効量であり、特にこれに含まれるケイ素原子結合水素原子が、(A)成分および(B)成分中のアルケニル基等の脂肪族不飽和基の合計1モル当たり0.8〜4.0モルであることが好ましく、1.0〜3.0モルがより好ましく、1.0〜2.0モルであることがさらに好ましい。該(C)成分が多すぎると、未反応のケイ素原子結合水素原子が硬化物中に多量に残存する結果、ゴム物性が経時的に変化する原因となる恐れがある。 In addition, the compounding amount of the organohydrogenpolysiloxane of the component (C) is an effective curing amount of the component (A) and the component (B), and the silicon atom-bonded hydrogen atoms contained therein are particularly the component (A). And preferably 0.8 to 4.0 moles, more preferably 1.0 to 3.0 moles per mole of aliphatic unsaturated groups such as alkenyl groups in component (B), More preferably, it is -2.0 mol. If the component (C) is too much, a large amount of unreacted silicon-bonded hydrogen atoms remain in the cured product, which may cause the rubber properties to change over time.
−(D)白金族金属系触媒−
(D)成分の白金族金属系触媒は本発明の組成物の付加硬化反応を生じさせる作用を有する。該触媒としては、白金系、パラジウム系、ロジウム系のものがあるが、コスト等の見地から白金、白金黒、塩化白金酸などの白金系のもの、例えば、H2PtCl6・mH2O,K2PtCl6,KHPtCl6・mH2O,K2PtCl4,K2PtCl4・mH2O,PtO2・mH2O(mは、正の整数)等や、これらと、オレフィン等の炭化水素、アルコール又はビニル基含有オルガノポリシロキサンとの錯体等が挙げられる。これらは一種単独でも2種以上を組み合わせても使用することができる。
-(D) Platinum group metal catalyst-
The platinum group metal catalyst of component (D) has the effect of causing an addition curing reaction of the composition of the present invention. Examples of the catalyst include platinum-based, palladium-based, and rhodium-based catalysts. From the viewpoint of cost and the like, platinum-based catalysts such as platinum, platinum black, and chloroplatinic acid such as H 2 PtCl 6 · mH 2 O, K 2 PtCl 6 , KHPtCl 6 · mH 2 O, K 2 PtCl 4 , K 2 PtCl 4 · mH 2 O, PtO 2 · mH 2 O (m is a positive integer), etc., and carbonization of olefins and the like Examples thereof include a complex with hydrogen, alcohol, or vinyl group-containing organopolysiloxane. These can be used singly or in combination of two or more.
(D)成分の配合量は有効量でよく、通常、前記(A)〜(E)成分の合計量に対して白金族金属換算(質量)で0.1〜1,000ppm、好ましくは0.5〜200ppmの範囲で使用される。 The compounding amount of the component (D) may be an effective amount, and is usually 0.1 to 1,000 ppm, preferably 0.00 in terms of platinum group metal (mass) based on the total amount of the components (A) to (E). Used in the range of 5 to 200 ppm.
−(E)チクソ性付与剤−
該チクソ性付与剤は(F)成分のヒュームドシリカ以外のチクソ性付与剤であって、(F)成分のヒュームドシリカが有する水酸基(OH)と水素結合や擬似架橋を形成することによりチクソ性を発現させるもので、好適には室温(25℃)において液状のものである。
-(E) thixotropic agent-
The thixotropic agent is a thixotropic agent other than the fumed silica of the component (F), and forms a hydrogen bond or pseudo-crosslinking with the hydroxyl group (OH) of the fumed silica of the component (F). And is preferably liquid at room temperature (25 ° C.).
該チクソ成分付与剤としては、ヒドロキシ基(−OH基)、アルコキシ基、アルケニルオキシ基、アリールオキシ基等のオルガノオキシ基等の極性基、並びに、エポキシ基のいずれか一方をもつシリコーン化合物(オルガノポリシロキサン)やポリエーテル等の有機樹脂成分を用いることができる。具体的には、例えば、下記の式で表されるケイ素原子結合水素原子とエポキシ基をもつオルガノポリシロキサン(但し、アルコキシ基等の極性基を含有しないもの)が挙げられる。該(E)成分は(A)〜(C)成分の合計100質量部当り、0.01〜5質量部の範囲で添加される。 The thixo component-imparting agent includes a silicone compound (organo) having any one of a polar group such as an organooxy group such as a hydroxy group (—OH group), an alkoxy group, an alkenyloxy group, and an aryloxy group, and an epoxy group. Organic resin components such as polysiloxane) and polyether can be used. Specifically, for example, organopolysiloxane having a silicon atom-bonded hydrogen atom represented by the following formula and an epoxy group (however, it does not contain a polar group such as an alkoxy group). The component (E) is added in the range of 0.01 to 5 parts by mass per 100 parts by mass in total of the components (A) to (C).
(上記式中、l=0〜100の整数、m=1〜100の整数、nは1〜100の整数を示す。) (In the above formula, l is an integer from 0 to 100, m is an integer from 1 to 100, and n is an integer from 1 to 100.)
−(F)ヒュームドシリカ−
該成分は上述のように(E)成分のチクソ性付与剤と相互作用して本発明の組成物にチクソ性を付与する作用を示す。該ヒュームドシリカは、1次粒子径が5nm〜50nmであり、比表面積が10〜500m2/gであることが好ましい。
-(F) Fumed silica-
As described above, the component interacts with the thixotropic agent of component (E) and exhibits the effect of imparting thixotropy to the composition of the present invention. The fumed silica preferably has a primary particle size of 5 nm to 50 nm and a specific surface area of 10 to 500 m 2 / g.
該(F)成分の添加量は(A)〜(E)成分の合計100質量部に対して1〜30質量部、特に5〜25質量部が好ましい。 The added amount of the component (F) is preferably 1 to 30 parts by mass, particularly 5 to 25 parts by mass with respect to 100 parts by mass in total of the components (A) to (E).
−その他の成分−
本発明の組成物には、上述した(A)〜(F)成分の他に必要に応じて他の成分を任意的に添加することができる。例えば、接着助剤、着色剤、蛍光体、顔料、樹脂粉体等が挙げられる。
-Other ingredients-
In addition to the components (A) to (F) described above, other components can be optionally added to the composition of the present invention as necessary. For example, an adhesion assistant, a colorant, a phosphor, a pigment, a resin powder, and the like can be given.
・接着助剤:
本発明の組成物の基材に対する接着性を高めるために接着助剤を添加することが好ましい。接着助剤としては、例えば、一般式(3)で示されるオルガノオキシシリル変性イソシアヌレート化合物および/又はその加水分解縮合物(オルガノシロキサン変性イソシアヌレート化合物)が挙げられる。
・ Adhesion aid:
In order to increase the adhesion of the composition of the present invention to the substrate, it is preferable to add an adhesion assistant. Examples of the adhesion assistant include an organooxysilyl-modified isocyanurate compound represented by the general formula (3) and / or a hydrolysis condensate thereof (organosiloxane-modified isocyanurate compound).
〔式中、R7は、下記式(4): [Wherein R 7 represents the following formula (4):
(ここで、R8は水素原子又は炭素原子数1〜6の一価炭化水素基、sは1〜6、特に1〜4の整数である。)
で表される有機基、又は脂肪族不飽和結合を含有する一価炭化水素基であり、但しR7の少なくとも1個は式(4)で表される有機基である。〕
(Here, R 8 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms, and s is an integer of 1 to 6, particularly 1 to 4.)
Or a monovalent hydrocarbon group containing an aliphatic unsaturated bond, provided that at least one of R 7 is an organic group represented by the formula (4). ]
一般式(3)において、R7で表される脂肪族不飽和結合を含有する一価炭化水素基としては、ビニル基、アリル基、プロペニル基、イソプロペニル基、ブテニル基、イソブテニル基、ペンテニル基、ヘキセニル基等の炭素原子数2〜8、特に2〜6のアルケニル基、およびシクロヘキセニル基等が挙げられる。 In the general formula (3), the monovalent hydrocarbon group containing an aliphatic unsaturated bond represented by R 7 includes a vinyl group, an allyl group, a propenyl group, an isopropenyl group, a butenyl group, an isobutenyl group, and a pentenyl group. And an alkenyl group having 2 to 8 carbon atoms, particularly 2 to 6 carbon atoms, such as a hexenyl group, and a cyclohexenyl group.
また、R8で表される炭素原子数1〜6の一価炭化水素基としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert−ブチル基、ペンチル基、ヘキシル基等のアルキル基;シクロヘキシル基;ビニル基、アリル基、プロペニル基、イソプロペニル基、ブテニル基、イソブテニル基、ペンテニル基、ヘキセニル基等のアルケニル基;シクロヘキセニル基;フェニル基等のアリール基などの炭素原子数1〜8、特に1〜6の一価炭化水素基が挙げられ、好ましくはアルキル基である。 Examples of the monovalent hydrocarbon group having 1 to 6 carbon atoms represented by R 8 include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, and hexyl. Alkyl groups such as groups; cyclohexyl groups; alkenyl groups such as vinyl groups, allyl groups, propenyl groups, isopropenyl groups, butenyl groups, isobutenyl groups, pentenyl groups, hexenyl groups; cyclohexenyl groups; aryl groups such as phenyl groups, etc. Examples thereof include monovalent hydrocarbon groups having 1 to 8 carbon atoms, particularly 1 to 6 carbon atoms, and preferably an alkyl group.
上記一般式(3)のオルガノオキシシリル変性イソシアヌレート化合物の具体例として下記の式で表される化合物が挙げられる。 Specific examples of the organooxysilyl-modified isocyanurate compound represented by the general formula (3) include compounds represented by the following formula.
また、接着助剤として、ケイ素原子結合アルコキシ基を必須に含有すると共に、ケイ素原子結合水素原子、ケイ素原子結合アルケニル基、および/またはエポキシ基を有する有機ケイ素化合物(即ち、オルガノシランおよびオルガノポリシロキサン)が挙げられ、具体例として下記の式で表されるものがある。 Further, as an adhesion assistant, an organic silicon compound (ie, organosilane and organopolysiloxane) which essentially contains a silicon atom-bonded alkoxy group and has a silicon atom-bonded hydrogen atom, a silicon atom-bonded alkenyl group, and / or an epoxy group. And specific examples include those represented by the following formula.
(式中、mは0〜50の整数であり、nは0〜50の整数であり、但し、m+nが2〜50、好ましくは4〜20を満足する。) (In the formula, m is an integer of 0 to 50, and n is an integer of 0 to 50, provided that m + n satisfies 2 to 50, preferably 4 to 20.)
このような有機ケイ素化合物の内、得られる硬化物の接着性が特に優れている化合物としては、一分子中にケイ素原子結合アルコキシ基と、アルケニル基もしくはケイ素原子結合水素原子(SiH基)とを有する有機ケイ素化合物であることが好ましい。 Among these organosilicon compounds, the resulting cured product has a particularly excellent adhesive property, and includes silicon-bonded alkoxy groups and alkenyl groups or silicon-bonded hydrogen atoms (SiH groups) in one molecule. It is preferable that it is an organosilicon compound.
該接着助剤の配合量は、(A)成分、(B)成分および(C)成分の合計100質量部に対して、通常10質量部以下(即ち、0〜10質量部)、好ましくは0.01〜5質量部、より好ましくは0.1〜1質量部程度配合することができる。(F)成分の配合量が多すぎると硬化物の硬度や表面タック性に悪影響を及ぼすことがある。 The compounding amount of the adhesion assistant is usually 10 parts by mass or less (that is, 0 to 10 parts by mass), preferably 0 with respect to 100 parts by mass in total of the components (A), (B) and (C). .01 to 5 parts by mass, more preferably about 0.1 to 1 part by mass can be blended. If the amount of component (F) is too large, the hardness and surface tackiness of the cured product may be adversely affected.
−組成物の調製・使用−
本発明のシリコーンゴム組成物は、上述した各成分を所要量均一に混合することによって調製される。その際に、アセチレンアルコール等の硬化抑制剤を少量添加して1液型として調製することができる。また、2液型として調製する場合は、(C)成分と(D)成分とを同一パートに配すると脱水素反応が起こる危険があるので、これを避けるために別々のパートに配する必要がある。
-Preparation and use of the composition-
The silicone rubber composition of the present invention is prepared by uniformly mixing the above-described components in required amounts. At that time, a small amount of a curing inhibitor such as acetylene alcohol can be added to prepare a one-pack type. In addition, when preparing as a two-part type, there is a risk that a dehydrogenation reaction will occur if component (C) and component (D) are placed in the same part, so it is necessary to place them in separate parts to avoid this. is there.
こうして調製した本発明の組成物は厚さ1mmの層状態で20℃における波長450nmの光の透過率が80%以上であることが好ましく、85%以上であることがより好ましい。透過率が厚さ1mmで求められる理由は、LEDチップを被覆してレンズを形成したときのレンズの厚さが約1mmであるからである。 The composition of the present invention thus prepared preferably has a light transmittance at a wavelength of 450 nm at 20 ° C. in a layer state of 1 mm thickness of 80% or more, more preferably 85% or more. The reason why the transmittance is required at a thickness of 1 mm is that when the lens is formed by covering the LED chip, the thickness of the lens is about 1 mm.
本発明の組成物は、必要により、例えば60〜150℃に加熱することにより直ちに硬化させることができる。こうして得られる硬化物は高い透明性をもち且つパッケージ材料や金属基板に非常によく接着する。そのためLEDを基板に装着して封止する際にCOB(チップオンボード)用封止剤として非常に優れている。またフォットダイオード、CCD、CMOS等の汎用の半導体パッケージに広く使用することができる。 If necessary, the composition of the present invention can be cured immediately by heating to, for example, 60 to 150 ° C. The cured product thus obtained has high transparency and adheres very well to packaging materials and metal substrates. Therefore, it is very excellent as a COB (chip on board) sealant when an LED is mounted on a substrate and sealed. Further, it can be widely used for general-purpose semiconductor packages such as a photo diode, a CCD, and a CMOS.
なお、本発明のシリコーンゴム組成物において、(F)成分のヒュームドシリカ以外の(A)〜(E)成分を均一に混合した混合物の屈折率は、ヒュームドシリカの屈折率と同一又は互いに近似したものであることが硬化物の透明性の点で重要である。具体的には、ヒュームドシリカを除く(A)〜(E)成分を均一に混合した混合物の屈折率は1.42〜1.47の範囲内である必要がある。本発明の組成物の屈折率は硬化後も実質的に変わらず同じである。 In the silicone rubber composition of the present invention, the refractive index of the mixture obtained by uniformly mixing the components (A) to (E) other than the fumed silica of the component (F) is the same as or different from the refractive index of the fumed silica. The approximation is important in terms of the transparency of the cured product. Specifically, the refractive index of the mixture obtained by uniformly mixing the components (A) to (E) excluding fumed silica needs to be in the range of 1.42 to 1.47. The refractive index of the composition of the present invention remains substantially the same after curing.
本発明の組成物で光半導体チップを封止した光半導体装置において、光半導体チップが装着される支持構造体は特に限定されずパッケージでもよいし、パッケージレスの支持基板、例えばセラミック基板、シリコン基板、ガラスエポキシ基板、ベークライト(エポキシ樹脂)基板、金属基板等でもよい。 In the optical semiconductor device in which the optical semiconductor chip is sealed with the composition of the present invention, the support structure on which the optical semiconductor chip is mounted is not particularly limited and may be a package, or a packageless support substrate such as a ceramic substrate or a silicon substrate. A glass epoxy substrate, a bakelite (epoxy resin) substrate, a metal substrate or the like may be used.
次に本発明の実施例により本発明を具体的に説明する。以下の記載において、部は質量部を意味し、また粘度は25℃での測定値を示す。Meはメチル基を、Phはフェニル基を、Viはビニル基をそれぞれ示す。 Next, the present invention will be described specifically by way of examples of the present invention. In the following description, “part” means “part by mass”, and “viscosity” indicates a value measured at 25 ° C. Me represents a methyl group, Ph represents a phenyl group, and Vi represents a vinyl group.
・実施例1
(a)末端がビニル基で封鎖された粘度1Pa.sの下記式で示されるポリシロキサン(VF)50部、および、
Example 1
(A) 50 parts of a polysiloxane (VF) represented by the following formula having a viscosity of 1 Pa.s whose ends are blocked with vinyl groups, and
(b)SiO2単位50モル%、(CH3)3SiO0.5単位42.5モル%およびViMe2SiO0.5単位7.5モル%からなる樹脂構造のビニルメチルシロキサン(VMQ)50部、
(c)SiH基量が前記(a)成分および(b)成分中のビニル基の合計1モル当り1.5モルとなる量の下記式:
(B) 50 parts by weight of vinylmethylsiloxane (VMQ) having a resin structure consisting of 50 mol% of SiO 2 units, 42.5 mol% of (CH 3 ) 3 SiO 0.5 units and 7.5 mol% of ViMe 2 SiO 0.5 units;
(C) The following formula in which the amount of SiH groups is 1.5 moles per mole of vinyl groups in the components (a) and (b):
で示されるオルガノハイドロジェンポリシロキサン4.9部、および
(d)塩化白金酸のオクチルアルコール変性溶液0.05部((a)、(b)、(c)、(d)、および後述の(e)の各成分の合計に対して白金換算(質量)で約5ppm)に、
(f)ヒュームドシリカ(製品名エロジル300をヘキサメチルジシラザンでシリルカ処理した)12部、
を十分に混合し3本ロールミルにて混練した。
4.9 parts of an organohydrogenpolysiloxane represented by the formula: (d) 0.05 part of an octyl alcohol-modified solution of chloroplatinic acid ((a), (b), (c), (d), and (e) described later) In terms of platinum (mass) of about 5ppm)
(F) 12 parts of fumed silica (product name Erosil 300 treated with hexamethyldisilazane in silylca)
Were sufficiently mixed and kneaded in a three-roll mill.
得られた混練物に、
(e)下記のフローコントロール剤(チクソ性付与剤)0.5部と、下記の接着付与成分0.2部と添加し、組成物を調製した。
In the obtained kneaded product,
(E) 0.5 parts of the following flow control agent (thixotropic agent) and 0.2 parts of the following adhesion-imparting component were added to prepare a composition.
〔フローコントロール剤(チクソ性付与剤)〕 [Flow control agent (thixotropic agent)]
(式中、lは10、mは8である。) (Wherein l is 10 and m is 8)
〔接着付与成分〕 (Adhesion imparting component)
図1はガラスエポキシ基板1にLED素子2を搭載した光半導体装置3を示す断面図である。LED素子2と基板1上の電極4とはワイヤ5で接続されている。上記で得た組成物を、LED素子2を被覆するように塗布し、成形、硬化させて凸レンズ状の透明封止体6を形成した。この光半導体装置の下記の特性を測定し信頼性を評価した。
FIG. 1 is a sectional view showing an optical semiconductor device 3 in which an LED element 2 is mounted on a glass epoxy substrate 1. The LED element 2 and the electrode 4 on the substrate 1 are connected by a
・・外観:
得られた封止体の外観を肉眼で観察し、透明性を評価した。
・・機械的特性:
前記組成物を、150℃で4時間の加熱成型に供して硬化物を得、JIS K 6301に準拠して、硬度(A型スプリング試験機を用いて測定)を測定した。
··appearance:
The appearance of the obtained sealed body was observed with the naked eye, and the transparency was evaluated.
..Mechanical characteristics:
The composition was subjected to heat molding at 150 ° C. for 4 hours to obtain a cured product, and the hardness (measured using an A-type spring tester) was measured in accordance with JIS K 6301.
・・加湿リフロー試験:
MSLレベル2に準ずる加湿リフロー試験を実施した。即ち、光半導体装置(サンプル数5)を60℃/90%RHの雰囲気下に放置して十分吸湿させた後に260℃のIRリフロー炉に所定回数(1回約6分)通した。クラック、剥離等の不良発生数を目視に評価した。比較のために、硬化直後の光半導体装置を吸湿させずに同様にIRリフロー工程に供した。
..Humidification reflow test:
A humidified reflow test according to MSL level 2 was performed. That is, the optical semiconductor device (number of samples: 5) was left in an atmosphere of 60 ° C./90% RH to sufficiently absorb moisture, and then passed through a 260 ° C. IR reflow furnace a predetermined number of times (about 6 minutes once). The number of defects such as cracks and peeling was visually evaluated. For comparison, the optical semiconductor device immediately after curing was similarly subjected to an IR reflow process without absorbing moisture.
・・光透過率:
組成物を厚さ1mmのシート状に成形、硬化させたものの波長450nmの光に対する光透過率を20℃において分光光度計により測定した。
・・輝度:
またLEDに10mAの電流を印加しLED各5個を発光させて大塚電子製LED光学特性モニター(商品名:LP-3400)により輝度を測定した。
..Light transmittance:
The composition was molded into a 1 mm thick sheet and cured, and the light transmittance with respect to light having a wavelength of 450 nm was measured at 20 ° C. with a spectrophotometer.
··Luminance:
In addition, a current of 10 mA was applied to the LEDs to cause each of the five LEDs to emit light, and the luminance was measured with an LED optical characteristic monitor (trade name: LP-3400) manufactured by Otsuka Electronics.
・・組成物の屈折率:
ヒュームドシリカを配合しない以外は上記組成物と同様にして組成物を調製し、該組成物の屈折率をアッベ屈折率計により測定した。
・・組成物の流動性:
ガラス基板上に組成物1gをディスペンサーにより半球状の形状に滴下し、25℃で30分間放置後、150℃×30分の条件で硬化した後、得られた硬化物の直径をノギスで測定することにより組成物の流動性(形状保持性)を評価した。
.. Refractive index of composition:
A composition was prepared in the same manner as the above composition except that fumed silica was not blended, and the refractive index of the composition was measured with an Abbe refractometer.
.. Fluidity of the composition:
1 g of the composition is dropped on a glass substrate into a hemispherical shape with a dispenser, left at 25 ° C. for 30 minutes, and cured under conditions of 150 ° C. × 30 minutes, and then the diameter of the resulting cured product is measured with a caliper. Thus, the fluidity (shape retention) of the composition was evaluated.
・実施例2
実施例1で用いた(a)成分の添加量を87.5部に、(b)成分の添加量を12.5部に変え、実施例1で用いた(c)成分のオルガノハイドロジェンポリシロキサンの添加量を2部((a)、(b)成分のビニル基の合計1モル当りのSiH基量1.5モルに相当する)に変更した以外は、実施例1と同様にして組成物を調製し、評価した。
Example 2
The amount of component (a) used in Example 1 was changed to 87.5 parts, the amount of component (b) added was changed to 12.5 parts, and the organohydrogen poly of component (c) used in Example 1 was changed. The composition was the same as in Example 1 except that the amount of siloxane added was changed to 2 parts (corresponding to 1.5 mol of SiH groups per 1 mol of total vinyl groups of components (a) and (b)). Articles were prepared and evaluated.
・実施例3
実施例1で(a)成分として用いたVFの代りに下記式で表されるビニルポリシロキサン50部を使用した以外は、実施例1と同様にして組成物を調製し評価した。
Example 3
A composition was prepared and evaluated in the same manner as in Example 1 except that 50 parts of vinylpolysiloxane represented by the following formula was used instead of VF used as the component (a) in Example 1.
・比較例1
実施例1で(a)成分として用いたVFの代りに下記式で表されるビニルポリシロキサン50部を添加した以外は、実施例1と同様にして組成物を調製し評価した。
Comparative example 1
A composition was prepared and evaluated in the same manner as in Example 1 except that 50 parts of vinylpolysiloxane represented by the following formula was added instead of VF used as the component (a) in Example 1.
・比較例2
実施例1で用いた(b)成分を使用せず、(a)成分のビニルポリシロキサン50部の代りに下記式:
Comparative example 2
The component (b) used in Example 1 was not used, and instead of 50 parts of the vinyl polysiloxane of component (a), the following formula:
で表されるビニルポリシロキサン100部を使用し、さらに(c)成分のオルガノハイドロジェンポリシロキサン4.9部の他に、下記式: In addition to 4.9 parts of component (c) organohydrogenpolysiloxane, the following formula:
で表されるハイドロジェンシロキサン2.5部を添加した以外は、実施例1と同様にして組成物を調製し評価した。 A composition was prepared and evaluated in the same manner as in Example 1 except that 2.5 parts of hydrogen siloxane represented by the formula:
これらの結果を表1および表2に示す。 These results are shown in Tables 1 and 2.
(注)
・数字は供試サンプル数5個中の不良発生数
・「260リフロー/n回」はIRリフロー工程をn回(1回当り約6分)繰り返したことを示す。
(note)
Numbers indicate the number of failures in 5 test samples. “260 reflow / n times” indicates that the IR reflow process was repeated n times (about 6 minutes per time).
1.ガラスエポキシ基板
2.LED素子
6.透明封止体
1. 1. Glass epoxy substrate LED element6. Transparent encapsulant
Claims (3)
(B)一分子中に2個以上の脂肪族不飽和結合を有し、樹脂構造を有するオルガノポリシロキサン、
(C)一分子中にケイ素原子結合水素原子を2個以上有するオルガノハイドロジェンポリシロキサン、
(D)白金族金属系触媒、
(E)(F)成分以外のチクソ性付与剤、および
(F)ヒュームドシリカ
を含有してなり、かつ(A)〜(E)成分からなる組成物の屈折率が1.42〜1.47であることを特徴とする硬化性シリコーンゴム組成物。 (A) an organopolysiloxane having two or more aliphatic unsaturated bonds in one molecule and being essentially linear;
(B) an organopolysiloxane having two or more aliphatic unsaturated bonds in one molecule and having a resin structure;
(C) an organohydrogenpolysiloxane having two or more silicon-bonded hydrogen atoms in one molecule;
(D) a platinum group metal catalyst,
(E) The thixotropic agent other than (F) component and (F) fumed silica are contained, and the refractive index of the composition comprising components (A) to (E) is 1.42 to 1.47. A curable silicone rubber composition characterized by the above.
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JP5000566B2 (en) | 2012-08-15 |
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