JP2009183949A5 - - Google Patents

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Publication number
JP2009183949A5
JP2009183949A5 JP2009114870A JP2009114870A JP2009183949A5 JP 2009183949 A5 JP2009183949 A5 JP 2009183949A5 JP 2009114870 A JP2009114870 A JP 2009114870A JP 2009114870 A JP2009114870 A JP 2009114870A JP 2009183949 A5 JP2009183949 A5 JP 2009183949A5
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JP
Japan
Prior art keywords
ultraviolet light
ultraviolet
processed
gas supply
open
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Application number
JP2009114870A
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Japanese (ja)
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JP4883133B2 (en
JP2009183949A (en
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Priority to JP2009114870A priority Critical patent/JP4883133B2/en
Priority claimed from JP2009114870A external-priority patent/JP4883133B2/en
Publication of JP2009183949A publication Critical patent/JP2009183949A/en
Publication of JP2009183949A5 publication Critical patent/JP2009183949A5/ja
Application granted granted Critical
Publication of JP4883133B2 publication Critical patent/JP4883133B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Claims (3)

搬送される被処理物に、紫外線ランプを備えたランプハウスからの紫外光を照射することで前記被処理物表面の洗浄を行う紫外光洗浄装置であって、前記ランプハウスは、前記被処理物側の一面を開放させた開放ハウジング内に紫外光照射面が平坦なほぼ角筒型をなす複数本の前記紫外線ランプを間隔を隔てて前記被処理物の幅方向に伸びるように、かつ、その紫外光照射面が前記開放ハウジングの開放面に沿うように配置して構成され、前記紫外線ランプの周囲から、搬送された前記被処理物が前記紫外光の照射を受ける領域にかけての紫外光照射空間を、不活性ガス雰囲気にするためのガス供給手段を設けるとともに、前記紫外線ランプの上方に設けられたガス供給口を通して前記不活性ガスを吐出する構成とし、前記被処理物を酸素含有雰囲気中を通った後に前記紫外光照射空間に搬送する搬送機構を設けたことを特徴とする紫外光洗浄装置。 An ultraviolet light cleaning apparatus for cleaning the surface of the object to be processed by irradiating the object to be conveyed with ultraviolet light from a lamp house provided with an ultraviolet lamp, wherein the lamp house includes the object to be processed. A plurality of the ultraviolet lamps having a substantially rectangular tube shape in which an ultraviolet light irradiation surface is flat in an open housing in which one side of the side is open, and extending in the width direction of the object to be processed at intervals, and The ultraviolet light irradiation space is configured such that the ultraviolet light irradiation surface is arranged along the open surface of the open housing, and the region to which the object to be processed is irradiated with the ultraviolet light from the periphery of the ultraviolet lamp. and Rutotomoni provided a gas supply means for the inert gas atmosphere, and configured for ejecting the inert gas through a gas supply port provided above the ultraviolet lamps, oxygen containing said object to be processed Ultraviolet light cleaning apparatus characterized in that a transport mechanism for transporting said ultraviolet light irradiation space after passing through the atmosphere. 前記ランプハウスには、前記紫外線ランプの前記開放ハウジングの前記開放面とは反対側に位置する平坦面に対面するように多孔のガス拡散板が備えられおり、前記ガス供給手段を前記ガス供給口および前記ガス拡散板を通して前記不活性ガスを吐出する構成としたことを特徴とする請求項１に記載の紫外光洗浄装置。The lamp house is provided with a porous gas diffusion plate so as to face a flat surface opposite to the open surface of the open housing of the ultraviolet lamp, and the gas supply means is connected to the gas supply port. The ultraviolet light cleaning apparatus according to claim 1, wherein the inert gas is discharged through the gas diffusion plate. 前記被処理物の搬送速度をＡcm/secとしたときに不活性ガスの供給速度Ｂを（Ａ／２）cm/sec以下とすることを特徴とする請求項１または２に記載の紫外光洗浄装置。3. The ultraviolet light cleaning according to claim 1, wherein an inert gas supply speed B is set to (A / 2) cm / sec or less when a transport speed of the workpiece is Acm / sec. apparatus.
JP2009114870A 2009-05-11 2009-05-11 UV light cleaning equipment Expired - Lifetime JP4883133B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009114870A JP4883133B2 (en) 2009-05-11 2009-05-11 UV light cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009114870A JP4883133B2 (en) 2009-05-11 2009-05-11 UV light cleaning equipment

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003435401A Division JP4337547B2 (en) 2003-12-26 2003-12-26 Ultraviolet light cleaning device and ultraviolet lamp for ultraviolet light cleaning device

Publications (3)

Publication Number Publication Date
JP2009183949A JP2009183949A (en) 2009-08-20
JP2009183949A5 true JP2009183949A5 (en) 2011-04-14
JP4883133B2 JP4883133B2 (en) 2012-02-22

Family

ID=41067764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009114870A Expired - Lifetime JP4883133B2 (en) 2009-05-11 2009-05-11 UV light cleaning equipment

Country Status (1)

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JP (1) JP4883133B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012003980A (en) * 2010-06-17 2012-01-05 Sumitomo Electric Ind Ltd Method and apparatus for manufacturing oxide superconducting thin film wire rod
CN103962346B (en) * 2014-05-21 2016-08-24 深圳市华星光电技术有限公司 The method of the ultraviolet rays cleaning substrate of adjustable ultraviolet radiation energy
JP7281083B2 (en) * 2019-05-14 2023-05-25 ウシオ電機株式会社 Excimer light irradiation device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000260396A (en) * 1999-03-05 2000-09-22 Quark Systems Co Ltd Excimer lamp, excimer irradiation device, and organic compond decomposition method
JP4218192B2 (en) * 1999-08-05 2009-02-04 株式会社日立ハイテクノロジーズ Substrate processing apparatus and processing method
JP2001300451A (en) * 2000-04-25 2001-10-30 Hoya Schott Kk Ultraviolet irradiation device
TWI251506B (en) * 2000-11-01 2006-03-21 Shinetsu Eng Co Ltd Excimer UV photo reactor

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