JP2009114399A5 - - Google Patents
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- JP2009114399A5 JP2009114399A5 JP2007291673A JP2007291673A JP2009114399A5 JP 2009114399 A5 JP2009114399 A5 JP 2009114399A5 JP 2007291673 A JP2007291673 A JP 2007291673A JP 2007291673 A JP2007291673 A JP 2007291673A JP 2009114399 A5 JP2009114399 A5 JP 2009114399A5
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Description
すなわち、本発明は、少なくとも、下記の構造式(1)で示される化合物1及びスチレンを含有する単量体組成物を有機溶媒中で重合する工程を有する樹脂の製造方法において、
前記単量体組成物中の全単量体に対する前記化合物1の割合が1.0乃至12.0モル%であり、
前記有機溶媒が非アルコール系溶媒であり、かつ、
前記工程は、10時間半減期温度が73乃至112℃であるラジカル開始剤を前記単量体組成物中の単量体100質量部に対して1.0乃至10.0質量部用いて、前記ラジカル開始剤の10時間半減期温度より5乃至20℃高い温度で重合する工程を含むことを特徴とする樹脂の製造方法に関する。
That is, the present invention provides a resin production method comprising a step of polymerizing a monomer composition containing at least compound 1 represented by the following structural formula (1) and styrene in an organic solvent,
The proportion of the compound 1 on total monomer in the monomer composition is from 1.0 to 12.0 mol%,
The organic solvent is a non-alcohol solvent, and
The process uses 1.0 to 10.0 parts by mass of 10-hour half-life radical initiator temperature of 73 to 112 ° C. the monomer 100 parts by weight of the monomer composition, the The present invention relates to a resin production method comprising a step of polymerizing at a temperature 5 to 20 ° C. higher than the 10-hour half-life temperature of a radical initiator.
上記樹脂の製造方法は、下記構造式(1)で示される特定の(メタ)アクリルアミド系単量体(化合物1と記載する)をスチレンと共重合する場合に適用される。この共重合体を所望の分子量、分子量分布、組成分布を持たせつつ、収率よく安定して製造するための製造条件について鋭意検討した結果、以下に述べる条件が優れていることを見出した。本発明の条件は特に単量体組成物中の全単量体に対する化合物1の割合が1.0乃至12.0モル%の時に顕著である。 The method for producing the resin is applied when a specific (meth) acrylamide monomer (denoted as Compound 1) represented by the following structural formula (1) is copolymerized with styrene. As a result of intensive investigations on production conditions for producing the copolymer with a desired molecular weight, molecular weight distribution, and composition distribution in a stable manner with good yield, the inventors have found that the conditions described below are excellent. The conditions of the present invention are particularly remarkable when the ratio of Compound 1 to the total monomer in the monomer composition is 1.0 to 12.0 mol%.
撹拌機、温度計、窒素導入管を付した反応容器に、2−ニトロベンゼンスルホン酸メチルエステル688g、酢酸4.7L、SnCl・H 2 O 2.18kgを仕込み、10℃以下に冷却した。これに撹拌下、塩酸ガスを4時間吹き込んだ。その後、10℃以下で10時間撹拌させた。反応混合物に、クロロホルム8.4Lを加え、10℃以下に保持しながら20%NaOH水溶液にて中和した。さらに水56Lを加え分液した。水相をクロロホルム4Lで抽出し、クロロホルム層を合わせて水4Lで2回洗浄し、分液した。無水硫酸マグネシウムにて乾燥後、ろ過して2−アミノベンゼンスルホン酸メチルエステルのクロロホルム溶液を得た。 A reaction vessel equipped with a stirrer, a thermometer, and a nitrogen introduction tube was charged with 688 g of 2-nitrobenzenesulfonic acid methyl ester, 4.7 L of acetic acid, and 2.18 kg of SnCl.H 2 O, and cooled to 10 ° C. or lower. Under stirring, hydrochloric acid gas was blown for 4 hours. Then, it was made to stir at 10 degrees C or less for 10 hours. To the reaction mixture, 8.4 L of chloroform was added and neutralized with a 20% aqueous NaOH solution while maintaining the temperature at 10 ° C. or lower. Further, 56 L of water was added for liquid separation. The aqueous phase was extracted with 4 L of chloroform, the chloroform layers were combined, washed twice with 4 L of water, and separated. After drying over anhydrous magnesium sulfate, filtration was performed to obtain a chloroform solution of 2-aminobenzenesulfonic acid methyl ester.
Claims (6)
前記単量体組成物中の全単量体に対する前記化合物1の割合が1.0乃至12.0モル%であり、
前記有機溶媒が非アルコール系溶媒であり、かつ、
前記工程は、10時間半減期温度が73乃至112℃であるラジカル開始剤を前記単量体組成物中の単量体100質量部に対して1.0乃至10.0質量部用いて、前記ラジカル開始剤の10時間半減期温度より5乃至20℃高い温度で重合する工程を含むことを特徴とする樹脂の製造方法。
The proportion of the compound 1 on total monomer in the monomer composition is from 1.0 to 12.0 mol%,
The organic solvent is a non-alcohol solvent, and
The process uses 1.0 to 10.0 parts by mass of 10-hour half-life radical initiator temperature of 73 to 112 ° C. the monomer 100 parts by weight of the monomer composition, the A method for producing a resin, comprising a step of polymerizing at a temperature 5 to 20 ° C. higher than a 10-hour half-life temperature of a radical initiator.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007291673A JP5252885B2 (en) | 2007-11-09 | 2007-11-09 | Resin production method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007291673A JP5252885B2 (en) | 2007-11-09 | 2007-11-09 | Resin production method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009114399A JP2009114399A (en) | 2009-05-28 |
JP2009114399A5 true JP2009114399A5 (en) | 2010-12-09 |
JP5252885B2 JP5252885B2 (en) | 2013-07-31 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007291673A Expired - Fee Related JP5252885B2 (en) | 2007-11-09 | 2007-11-09 | Resin production method |
Country Status (1)
Country | Link |
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JP (1) | JP5252885B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120172562A1 (en) * | 2009-11-19 | 2012-07-05 | Canon Kabushiki Kaisha | Resin for toners, and toner |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3956354A (en) * | 1973-05-07 | 1976-05-11 | The Lubrizol Corporation | Method for the preparation of sulfonic acid esters from free sulfonic acids |
JP4533300B2 (en) * | 2005-11-11 | 2010-09-01 | キヤノン株式会社 | Resin for toner, toner and two-component developer |
JP4732137B2 (en) * | 2005-11-11 | 2011-07-27 | キヤノン株式会社 | Charge control resin for toner, toner and method for producing toner particle |
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2007
- 2007-11-09 JP JP2007291673A patent/JP5252885B2/en not_active Expired - Fee Related
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