JP2007194468A - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
- Publication number
- JP2007194468A JP2007194468A JP2006012355A JP2006012355A JP2007194468A JP 2007194468 A JP2007194468 A JP 2007194468A JP 2006012355 A JP2006012355 A JP 2006012355A JP 2006012355 A JP2006012355 A JP 2006012355A JP 2007194468 A JP2007194468 A JP 2007194468A
- Authority
- JP
- Japan
- Prior art keywords
- film
- semiconductor device
- plug
- gas
- barrier metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 86
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 56
- 230000004888 barrier function Effects 0.000 claims abstract description 91
- 229910052751 metal Inorganic materials 0.000 claims abstract description 83
- 239000002184 metal Substances 0.000 claims abstract description 83
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 57
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 52
- 230000006911 nucleation Effects 0.000 claims description 50
- 238000010899 nucleation Methods 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 34
- 239000010936 titanium Substances 0.000 claims description 25
- 229910052721 tungsten Inorganic materials 0.000 claims description 19
- 239000010937 tungsten Substances 0.000 claims description 19
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 15
- 238000000231 atomic layer deposition Methods 0.000 claims description 7
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 claims description 7
- 230000005669 field effect Effects 0.000 claims description 3
- 239000012212 insulator Substances 0.000 claims description 3
- -1 tungsten nitride Chemical class 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 39
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 20
- 229910052731 fluorine Inorganic materials 0.000 description 20
- 239000011737 fluorine Substances 0.000 description 20
- 239000011229 interlayer Substances 0.000 description 18
- 229910021332 silicide Inorganic materials 0.000 description 18
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 18
- 239000010949 copper Substances 0.000 description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 13
- 229910052782 aluminium Inorganic materials 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 11
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 230000001186 cumulative effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 238000004380 ashing Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000635 electron micrograph Methods 0.000 description 2
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 description 2
- 229910021334 nickel silicide Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76895—Local interconnects; Local pads, as exemplified by patent document EP0896365
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
- H01L21/28556—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table by chemical means, e.g. CVD, LPCVD, PECVD, laser CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76871—Layers specifically deposited to enhance or enable the nucleation of further layers, i.e. seed layers
- H01L21/76876—Layers specifically deposited to enhance or enable the nucleation of further layers, i.e. seed layers for deposition from the gas phase, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76897—Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Chemical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
【解決手段】コンタクトホールまたはビアホール内に、TiN膜等のバリアメタル膜を形成する。その後、WF6ガスをB2H6ガスにより還元させるCVD法により、W核付け膜をバリアメタル膜上に形成する。そして、CVD法によりW核付け膜上にコンタクトプラグまたはビアプラグとしてWプラグを形成する。
【選択図】 図4
Description
本実施の形態は、WF6ガスをB2H6ガスにより還元させるCVD法により、W核付け膜をバリアメタル膜上に形成した後、CVD法によりW核付け膜上にコンタクトプラグとしてWプラグを形成する、半導体装置およびその製造方法である。
本実施の形態は、実施の形態1に係る半導体装置およびその製造方法の変形例であって、実施の形態1の上層配線層に接続するビアプラグを更に設け、そのビアプラグについても、WF6ガスをB2H6ガスにより還元させるCVD法にてW核付け膜をバリアメタル膜上に形成した後、CVD法にてW核付け膜上にWプラグを成膜することにより、形成するものである。
Claims (6)
- (a)半導体基板の表面に、ソース・ドレイン領域、ゲート絶縁膜およびゲート電極を有するMISFET(Metal Insulator Semiconductor Field Effect Transistor)を形成する工程と、
(b)前記半導体基板の前記表面および前記MISFETを覆う絶縁膜を形成する工程と、
(c)前記ソース・ドレイン領域の少なくとも一部および前記ゲート電極の側面の少なくとも一部が露出するコンタクトホールを、前記絶縁膜内に形成する工程と、
(d)前記コンタクトホール内にバリアメタル膜を形成する工程と、
(e)WF6(六フッ化タングステン)ガスをB2H6(ジボラン)ガスにより還元させるCVD(Chemical Vapor Deposition)法により、W(タングステン)核付け膜を前記バリアメタル膜上に形成する工程と、
(f)WF6ガスを用いたCVD法により、前記W核付け膜上にW(タングステン)プラグを形成し、前記Wプラグを前記コンタクトホール内に埋め込む工程と
を備える半導体装置の製造方法。 - (a)半導体基板の上方に、配線層を形成する工程と、
(b)前記配線層上に、バリア膜を形成する工程と、
(c)前記配線層および前記バリア膜を覆う絶縁膜を形成する工程と、
(d)前記バリア膜の少なくとも一部が露出するビアホールを、前記絶縁膜内に形成する工程と
を備え、
前記工程(d)において、前記配線層の側面の少なくとも一部も前記ビアホールに露出し、
(e)前記ビアホール内にバリアメタル膜を形成する工程と、
(f)WF6(六フッ化タングステン)ガスをB2H6(ジボラン)ガスにより還元させるCVD(Chemical Vapor Deposition)法により、W(タングステン)核付け膜を前記バリアメタル膜上に形成する工程と、
(g)WF6ガスを用いたCVD法により、前記W核付け膜上にW(タングステン)プラグを形成し、前記Wプラグを前記ビアホール内に埋め込む工程と
をさらに備える半導体装置の製造方法。 - 請求項1または請求項2に記載の半導体装置の製造方法であって、
前記バリアメタル膜は、TiN(窒化チタン)膜、WN(窒化タングステン)膜、TiN膜およびTi(チタン)膜の積層膜、WN膜およびW(タングステン)膜の積層膜のいずれかであって、
前記TiN膜および前記WN膜は、MOCVD(Metal Organic Chemical Vapor Deposition)法により形成される
半導体装置の製造方法。 - 請求項1または請求項2に記載の半導体装置の製造方法であって、
前記W核付け膜は、原子層堆積法(Atomic Layer Deposition)により形成される
半導体装置の製造方法。 - 請求項1または請求項2に記載の半導体装置の製造方法であって、
前記Wプラグも、WF6ガスをB2H6ガスにより還元させるCVD法により形成する
半導体装置の製造方法。 - 請求項1ないし請求項5のいずれかに記載の半導体装置の製造方法により形成された
半導体装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006012355A JP2007194468A (ja) | 2006-01-20 | 2006-01-20 | 半導体装置およびその製造方法 |
US11/655,162 US20070173050A1 (en) | 2006-01-20 | 2007-01-19 | Semiconductor device and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006012355A JP2007194468A (ja) | 2006-01-20 | 2006-01-20 | 半導体装置およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007194468A true JP2007194468A (ja) | 2007-08-02 |
JP2007194468A5 JP2007194468A5 (ja) | 2009-01-29 |
Family
ID=38286087
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006012355A Pending JP2007194468A (ja) | 2006-01-20 | 2006-01-20 | 半導体装置およびその製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20070173050A1 (ja) |
JP (1) | JP2007194468A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009130211A (ja) * | 2007-11-26 | 2009-06-11 | Fujitsu Microelectronics Ltd | 半導体装置及びその製造方法 |
US7955925B2 (en) | 2007-07-03 | 2011-06-07 | Renesas Electronics Corporation | Method of manufacturing semiconductor device |
US7994049B2 (en) | 2007-06-15 | 2011-08-09 | Renesas Electronics Corporation | Manufacturing method of semiconductor device including filling a connecting hole with metal film |
JP2012175073A (ja) * | 2011-02-24 | 2012-09-10 | Tokyo Electron Ltd | 成膜方法および記憶媒体 |
JPWO2012049823A1 (ja) * | 2010-10-15 | 2014-02-24 | 株式会社アルバック | 半導体装置の製造方法および半導体装置 |
US9379199B2 (en) | 2013-10-16 | 2016-06-28 | Micron Technology, Inc. | Semiconductor device including a contact plug with barrier materials |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009141096A (ja) * | 2007-12-06 | 2009-06-25 | Renesas Technology Corp | 半導体装置の製造方法 |
JP2014038960A (ja) * | 2012-08-17 | 2014-02-27 | Ps4 Luxco S A R L | 半導体装置及びその製造方法 |
JP2018049867A (ja) * | 2016-09-20 | 2018-03-29 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11150087A (ja) * | 1997-07-09 | 1999-06-02 | Lsi Logic Corp | 窒化チタン障壁層の形成方法及び窒化チタン障壁層を含む半導体デバイス |
JP2000156409A (ja) * | 1998-11-20 | 2000-06-06 | Nec Corp | 半導体装置とその製造方法 |
JP2003179132A (ja) * | 2001-12-10 | 2003-06-27 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
JP2003303881A (ja) * | 2002-04-10 | 2003-10-24 | Hitachi Ltd | 半導体装置及びその製造方法 |
JP2003332347A (ja) * | 2002-05-10 | 2003-11-21 | Sony Corp | 半導体装置および製造方法 |
JP2005505690A (ja) * | 2001-10-10 | 2005-02-24 | アプライド マテリアルズ インコーポレイテッド | 一連の堆積技術を用いる耐火性金属層を堆積する方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6686278B2 (en) * | 2001-06-19 | 2004-02-03 | United Microelectronics Corp. | Method for forming a plug metal layer |
KR100414220B1 (ko) * | 2001-06-22 | 2004-01-07 | 삼성전자주식회사 | 공유 콘택을 가지는 반도체 장치 및 그 제조 방법 |
US7211144B2 (en) * | 2001-07-13 | 2007-05-01 | Applied Materials, Inc. | Pulsed nucleation deposition of tungsten layers |
KR100486248B1 (ko) * | 2002-07-09 | 2005-05-03 | 삼성전자주식회사 | 실리콘옥사이드층을 포함하는 반도체소자의 제조방법 |
-
2006
- 2006-01-20 JP JP2006012355A patent/JP2007194468A/ja active Pending
-
2007
- 2007-01-19 US US11/655,162 patent/US20070173050A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11150087A (ja) * | 1997-07-09 | 1999-06-02 | Lsi Logic Corp | 窒化チタン障壁層の形成方法及び窒化チタン障壁層を含む半導体デバイス |
JP2000156409A (ja) * | 1998-11-20 | 2000-06-06 | Nec Corp | 半導体装置とその製造方法 |
JP2005505690A (ja) * | 2001-10-10 | 2005-02-24 | アプライド マテリアルズ インコーポレイテッド | 一連の堆積技術を用いる耐火性金属層を堆積する方法 |
JP2003179132A (ja) * | 2001-12-10 | 2003-06-27 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
JP2003303881A (ja) * | 2002-04-10 | 2003-10-24 | Hitachi Ltd | 半導体装置及びその製造方法 |
JP2003332347A (ja) * | 2002-05-10 | 2003-11-21 | Sony Corp | 半導体装置および製造方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7994049B2 (en) | 2007-06-15 | 2011-08-09 | Renesas Electronics Corporation | Manufacturing method of semiconductor device including filling a connecting hole with metal film |
US7955925B2 (en) | 2007-07-03 | 2011-06-07 | Renesas Electronics Corporation | Method of manufacturing semiconductor device |
JP2009130211A (ja) * | 2007-11-26 | 2009-06-11 | Fujitsu Microelectronics Ltd | 半導体装置及びその製造方法 |
JPWO2012049823A1 (ja) * | 2010-10-15 | 2014-02-24 | 株式会社アルバック | 半導体装置の製造方法および半導体装置 |
JP2012175073A (ja) * | 2011-02-24 | 2012-09-10 | Tokyo Electron Ltd | 成膜方法および記憶媒体 |
US9379199B2 (en) | 2013-10-16 | 2016-06-28 | Micron Technology, Inc. | Semiconductor device including a contact plug with barrier materials |
Also Published As
Publication number | Publication date |
---|---|
US20070173050A1 (en) | 2007-07-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6118434B2 (ja) | 半導体装置の製造方法 | |
JP5622335B2 (ja) | 半導体装置の製造方法 | |
JP2007194468A (ja) | 半導体装置およびその製造方法 | |
TWI685063B (zh) | 內連線結構的形成方法、半導體結構的形成方法以及積體電路 | |
JP2008205010A (ja) | 半導体装置及びその製造方法 | |
JP2007335891A (ja) | 半導体デバイス | |
JP2007194468A5 (ja) | ||
JP2007214436A (ja) | 半導体装置の製造方法および半導体装置 | |
WO2009102062A1 (ja) | 半導体装置及びその製造方法 | |
JP6014726B2 (ja) | 半導体装置及びその製造方法 | |
WO2009102060A1 (ja) | 半導体装置とその製造方法 | |
JP5632055B2 (ja) | 半導体装置及びその製造方法 | |
US7067417B2 (en) | Methods of removing resistive remnants from contact holes using silicidation | |
US6723608B2 (en) | Method for manufacturing a semiconductor device having a layered gate electrode | |
JP5779702B2 (ja) | 半導体装置及びその製造方法 | |
JP5356260B2 (ja) | 半導体装置及びその製造方法 | |
JP2009266999A (ja) | 半導体装置、およびその製造方法 | |
JP5340180B2 (ja) | 半導体装置とその製造方法 | |
JP5356258B2 (ja) | 半導体装置の製造方法 | |
JP2009099611A (ja) | 半導体装置及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081209 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20081209 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20081209 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20100524 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110121 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110510 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110629 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20120207 |