JP2006306993A - Detergent composition and washing method using the same - Google Patents
Detergent composition and washing method using the same Download PDFInfo
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- JP2006306993A JP2006306993A JP2005130906A JP2005130906A JP2006306993A JP 2006306993 A JP2006306993 A JP 2006306993A JP 2005130906 A JP2005130906 A JP 2005130906A JP 2005130906 A JP2005130906 A JP 2005130906A JP 2006306993 A JP2006306993 A JP 2006306993A
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- aminocarboxylic acid
- acid ammonium
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Abstract
Description
本発明は、 LCD 製造工程等で、基板表面に有機もしくは無機薄膜を成膜した後に前記基板表面を洗浄処理するのに有効な精密洗浄用の洗浄剤組成物ならびに該洗浄剤を用いた洗浄方法に関するものである。 The present invention relates to a cleaning composition for precision cleaning effective for cleaning the substrate surface after forming an organic or inorganic thin film on the substrate surface in an LCD manufacturing process or the like, and a cleaning method using the cleaning agent It is about.
LCD 製造工程等において基板上にコートされたポリイミドなどの高分子膜は、液晶配向のためラビング処理される。ラビング後のポリイミド表面にはポリイミド片、ラビング布片、人体剥離片、イオンおよびその溶出油脂等が残留しているため精密洗浄が必要である。従来はIPA等の溶剤洗浄、純水および非イオン界面活性剤を用いた洗浄を行っていた。しかしながら、溶剤洗浄ではそれぞれ環境負荷、引火性に問題がある。また、純水では十分な洗浄性が得られないし、非イオン界面活性剤を添加するとポリイミド膜表面への残留が歩留まりを低下させるという弊害がある。現在、更なる歩留まり向上のために残留しにくく、且つ粒子、イオン等の洗浄性が高い界面活性剤の要求が高まってきている。 また、カラ−フィルター、ブラックマトリックス及びオーバーコート成膜後の表面洗浄では、アルカリイオン等を除去する要求が高まってきている。 A polymer film such as polyimide coated on a substrate in an LCD manufacturing process or the like is rubbed for liquid crystal alignment. Since the polyimide piece after rubbing has a piece of polyimide, a piece of rubbing cloth, a human body peeling piece, ions, and their oils and fats, precise cleaning is required. Conventionally, solvent cleaning such as IPA and cleaning using pure water and a nonionic surfactant have been performed. However, solvent cleaning has problems in environmental load and flammability. In addition, pure water does not provide sufficient detergency, and when a nonionic surfactant is added, there is an adverse effect that the residue on the polyimide film surface reduces the yield. Currently, there is an increasing demand for surfactants that are difficult to remain and have high cleaning properties such as particles and ions for further yield improvement. Further, in the surface cleaning after color filter, black matrix and overcoat film formation, there is an increasing demand for removing alkali ions and the like.
例えば、特開平3−62018号公報によると純水で超音波洗浄することにより洗浄を行うと共に安定したプレチルト角を得る方法が提案されているが、その洗浄性については近年の要求清浄度に追随出来ていない。
本発明は、高度な洗浄性と共に残留しにくい性能を有し、 LCD 製造工程等において基板表面に有機もしくは無機薄膜を成膜した後に、前記基板表面を洗浄処理する洗浄剤組成物であって、液晶、半導体及びその周辺部品等の歩留まりを向上させる洗浄剤を提供することを目的とする。現在、更なる歩留まり向上のために残留しにくく、且つ粒子、イオン等の洗浄性が高い界面活性剤の要求が高まってきている。 また、カラ−フィルター、ブラックマトリックス及びオーバーコート成膜後の表面洗浄では、アルカリイオン等を除去する要求が高まってきている。本発明は前記洗浄剤組成物を用いた、残留性の低い高度な洗浄方法を提供することを目的とする。 The present invention is a cleaning composition for cleaning the substrate surface after forming an organic or inorganic thin film on the substrate surface in an LCD manufacturing process or the like, having a performance that is difficult to remain with high cleaning properties. It is an object of the present invention to provide a cleaning agent that improves the yield of liquid crystals, semiconductors and their peripheral components. Currently, there is an increasing demand for surfactants that are difficult to remain and have high cleaning properties such as particles and ions for further yield improvement. Further, in the surface cleaning after color filter, black matrix and overcoat film formation, there is an increasing demand for removing alkali ions and the like. An object of the present invention is to provide an advanced cleaning method with low persistence using the cleaning composition.
本発明は、アミノカルボン酸塩と、アルコール又は、ポリオキシアルキレンアルキルエーテルのノニオン化合物の併用物で上記課題を解決できるとの知見に基づいてなされたのである。 The present invention has been made based on the knowledge that the above-mentioned problems can be solved by using a combination of an aminocarboxylate and an alcohol or a nonionic compound of polyoxyalkylene alkyl ether.
上記成分(A)及び成分(B)を含有することを特徴とする洗浄剤組成物を提供する。更に、本発明は、前記洗浄剤組成物を所定の濃度に希釈した後、基板表面を洗浄する方法を提供する。 A cleaning composition comprising the component (A) and the component (B) is provided. Furthermore, the present invention provides a method for cleaning the substrate surface after the cleaning composition is diluted to a predetermined concentration.
本発明の洗浄剤組成物はその優れた洗浄性により洗浄性能が飛躍的に改善され、粒子、イオン残留による歩留まりの低下を抑えることが可能で液晶配向膜表面に使用した場合に効果が現れる。 The cleaning composition of the present invention has drastically improved cleaning performance due to its excellent detergency, and can suppress a decrease in yield due to residual particles and ions, which is effective when used on the liquid crystal alignment film surface.
本発明で(A)成分として用いられる一般式(1)〜(6)は、アンモニウム塩構造をとる。アミノカルボン酸酸、及びアミノカルボン酸アンモニウム塩として、それぞれ単独又は2種以上の混合物として用いることができる。
また、一般式(7)のアルコールは炭素数1〜4のアルコールが用いられ、一般式(8)のポリオキシアルキレンアルキルエーテル付加物が用いられる。一般式(9)及び(10)は分岐鎖を持つ分子構造を好適に用いる。
The general formulas (1) to (6) used as the component (A) in the present invention have an ammonium salt structure. The aminocarboxylic acid and the aminocarboxylic acid ammonium salt can be used alone or as a mixture of two or more.
Moreover, C1-C4 alcohol is used for alcohol of General formula (7), and the polyoxyalkylene alkyl ether adduct of General formula (8) is used. In general formulas (9) and (10), a molecular structure having a branched chain is preferably used.
一般式(1)〜(6)で表される化合物から一種類又は、二種以上選択しても構わないし、一般式(7)〜(10)の化合物から二種以上選択しても構わない。また、(A)成分及び(B)成分を任の割合で配合することができる。 One type or two or more types may be selected from the compounds represented by the general formulas (1) to (6), or two or more types may be selected from the compounds represented by the general formulas (7) to (10). . Moreover, (A) component and (B) component can be mix | blended in an arbitrary ratio.
洗浄に際しては、この洗浄剤組成物を水で 希釈して用い、有機もしくは無機薄膜を成膜した後の基板表面を該洗浄液中に浸漬させて洗浄するが、超音波を作用させて洗浄処理することより洗浄効果が良好となる。洗浄後はイオン交換水で基板表面を清浄化する。また、被洗浄物の乾燥にはホットプレート、熱風、IR(赤外線)などの熱源を与え、50℃〜200℃の範囲で乾燥させる。
本発明の洗浄剤組成物は、金属不純物ができる限り少ないことが望ましく、金属不純物は1ppm以下(Fe、Cu、Mg,Al、K、Ca、Mn、Ni、Ag、Cr、Zn、Pb等)であることが好ましい。
At the time of cleaning, this cleaning composition is diluted with water and used, and the substrate surface after the organic or inorganic thin film is formed is immersed in the cleaning solution for cleaning, but is cleaned by applying ultrasonic waves. As a result, the cleaning effect is improved. After cleaning, the substrate surface is cleaned with ion exchange water. In addition, a heat source such as a hot plate, hot air, or IR (infrared ray) is applied to dry the object to be cleaned, and the object is dried in the range of 50 ° C to 200 ° C.
The cleaning composition of the present invention desirably has as little metal impurities as possible, and the metal impurities are 1 ppm or less (Fe, Cu, Mg, Al, K, Ca, Mn, Ni, Ag, Cr, Zn, Pb, etc.) It is preferable that
評価は以下の方法で行い、その結果を表−1に示した。(1)洗浄性評価基板として、 ポリイミド膜を形成したLCD ガラス板を水道水で洗浄し、粒子、イオンを付着させた物をテストピースとした。
トリカルボン酸アンモニュウム塩及び(A)成分から選択した材料に(B)成分から選ばれた1種類の材料を混合して洗浄液を作成した。25℃に調製した洗浄液中に上記テストピースを浸漬して1分間超音波洗浄を行い、更に1分間イオン交換水の流水でリンスを行った。 上記テストピースの洗浄性を以下の方法にて評価した。
濡れ性による汚垢洗浄性評価
表面の濡れ性より下記の基準で評価した。
A:十分洗浄されており、テストピース面全体が水に濡れている。
B:一部洗浄不良をおこしており、テストピース面の一部が撥水をしている。
C:一部しか洗浄されておらず、テストピース面のほとんどが撥水をしている。
D:洗浄されておらず、テストピース面全体が撥水をしている。
粒子状汚垢
顕微鏡によリ粒子状汚垢洗浄性を評価した。
A:顕微鏡でダストを確認できない。
B:1cm 2 当たり数個の粒子が確認できる。
C:半分程度の粒子が確認できる。
D:初期状態と同程度の粒子が確認出来る。
表面イオン除去性評価
Naイオンの変化割合を求め、0〜100%の範囲で除去率を評価した。
腐食性評価
Al基板を25℃の条件で24時間浸漬して腐食性を確認した。
A:腐食は認められない。
B:やや光沢を失う。
C:黒く変色する。
The evaluation was performed by the following method, and the results are shown in Table 1. (1) Detergency evaluation As an evaluation substrate, an LCD glass plate on which a polyimide film was formed was washed with tap water, and particles and ions adhered thereto were used as test pieces.
A cleaning liquid was prepared by mixing one material selected from the component (B) with the material selected from the ammonium salt of tricarboxylic acid and the component (A). The test piece was immersed in a cleaning solution prepared at 25 ° C. and subjected to ultrasonic cleaning for 1 minute, and further rinsed with running water of ion exchange water for 1 minute. The washability of the test piece was evaluated by the following method.
Evaluation of dirt cleaning property by wettability The following criteria evaluated the wettability of the surface.
A: Thoroughly cleaned and the entire test piece surface is wet.
B: Some cleaning defects occurred, and part of the test piece surface was water repellent.
C: Only a part has been cleaned, and most of the test piece surface is water repellent.
D: Not cleaned and the entire test piece surface is water repellent.
The particulate dirt cleaning ability was evaluated by a particulate dirt microscope.
A: Dust cannot be confirmed with a microscope.
B: Several particles per 1 cm 2 can be confirmed.
C: About half of the particles can be confirmed.
D: Particles similar to the initial state can be confirmed.
Surface ion removal evaluation
The change rate of Na ion was calculated | required and the removal rate was evaluated in 0-100% of range.
Corrosion evaluation
The Al substrate was immersed for 24 hours at 25 ° C. to confirm the corrosivity.
A: Corrosion is not recognized.
B: Slightly loses gloss.
C: Turns black.
Claims (7)
A cleaning method comprising using the cleaning composition according to claim 3 or 4 as an aqueous solution diluted to 500 times or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2005130906A JP2006306993A (en) | 2005-04-28 | 2005-04-28 | Detergent composition and washing method using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2005130906A JP2006306993A (en) | 2005-04-28 | 2005-04-28 | Detergent composition and washing method using the same |
Publications (1)
Publication Number | Publication Date |
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JP2006306993A true JP2006306993A (en) | 2006-11-09 |
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JP2005130906A Pending JP2006306993A (en) | 2005-04-28 | 2005-04-28 | Detergent composition and washing method using the same |
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2005
- 2005-04-28 JP JP2005130906A patent/JP2006306993A/en active Pending
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