JP2005026653A - 半導体素子の製造方法 - Google Patents
半導体素子の製造方法 Download PDFInfo
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- JP2005026653A JP2005026653A JP2003413090A JP2003413090A JP2005026653A JP 2005026653 A JP2005026653 A JP 2005026653A JP 2003413090 A JP2003413090 A JP 2003413090A JP 2003413090 A JP2003413090 A JP 2003413090A JP 2005026653 A JP2005026653 A JP 2005026653A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 238000007517 polishing process Methods 0.000 claims abstract description 25
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 17
- 229920005591 polysilicon Polymers 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 8
- 239000002002 slurry Substances 0.000 claims abstract description 8
- 238000000059 patterning Methods 0.000 claims abstract description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims description 5
- 239000011574 phosphorus Substances 0.000 claims description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 238000009413 insulation Methods 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 238000001704 evaporation Methods 0.000 abstract 2
- 238000005530 etching Methods 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 4
- 239000005368 silicate glass Substances 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- 238000002955 isolation Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- GDFCWFBWQUEQIJ-UHFFFAOYSA-N [B].[P] Chemical compound [B].[P] GDFCWFBWQUEQIJ-UHFFFAOYSA-N 0.000 description 1
- 210000004556 brain Anatomy 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 description 1
- 229910021342 tungsten silicide Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31051—Planarisation of the insulating layers
- H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/7684—Smoothing; Planarisation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/05—Making the transistor
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Memories (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Electrodes Of Semiconductors (AREA)
- Weting (AREA)
Abstract
【解決手段】アクティブ領域とフィールド領域に定義される半導体基板を提供する段階と、前記半導体基板のアクティブ領域及びフィールド領域に多数のワードランを形成する段階と、前記ワードラインの間を絶縁するために全体構造上に絶縁膜を蒸着する段階と、前記アクティブ領域のワードラインがオープンされるように前記絶縁膜をパターニングしてランディングプラグコンタクトを形成する段階と、前記ランディングプラグコンタクトを埋め込むようにポリシリコン膜を蒸着する段階と、第1ドーピング物質の添加されたスラリーを用いた第1研磨工程を行い、前記ポリシリコン膜のみ平坦化して前記絶縁膜を露出させる段階と、第2ドーピング物質の添加されたスリラーを用いた第2研磨工程を行い、全体構造上部を平坦化してランディングプラグを形成する段階とを含む。
【選択図】図7
Description
104 …フィールド酸化膜
106 …ゲート酸化膜
108 …ゲート層
110 …ハードマスク層
112 …ワードライン
114 …スペーサー
116 …絶縁膜
118 …LPC
120 …LP用ポリシリコン膜
122 …LP
Claims (5)
- (a)アクティブ領域とフィールド領域に定義される半導体基板を提供する段階と、
(b)前記半導体基板のアクティブ領域及びフィールド領域に多数のワードラインを形成する段階と、
(c)前記ワードラインの間を絶縁するために全体構造上に絶縁膜を蒸着する段階と、
(d)前記アクティブ領域のワードラインがオープンされるように前記絶縁膜をパターニングしてランディングプラグコンタクトを形成する段階と、
(e)前記ランディングプラグコンタクトを埋め込むようにポリシリコン膜を蒸着する段階と、
(f)第1ドーピング物質の添加されたスラリーを用いた第1研磨工程を行い、前記ポリシリコン膜のみ平坦化して前記絶縁膜を露出させる段階と、
(g)第2ドーピング物質の添加されたスリラーを用いた第2研磨工程を行い、全体構造上部を平坦化してランディングプラグを形成する段階とを含む半導体素子の製造方法。 - 前記第1ドーピング物質がボロン(B)である請求項1記載の半導体素子の製造方法。
- 前記ボロン(B)の濃度が2wt%〜5wt%である請求項2記載の半導体素子の製造方法。
- 前記第2ドーピング物質がリン(P)である請求項1記載の半導体素子の製造方法。
- 前記リン(P)の濃度が2wt%〜5wt%である請求項4記載の半導体素子の製造方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030043686A KR20050002315A (ko) | 2003-06-30 | 2003-06-30 | 반도체 소자의 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005026653A true JP2005026653A (ja) | 2005-01-27 |
JP4401156B2 JP4401156B2 (ja) | 2010-01-20 |
Family
ID=33536404
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003413090A Expired - Fee Related JP4401156B2 (ja) | 2003-06-30 | 2003-12-11 | 半導体素子の製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US6927168B2 (ja) |
JP (1) | JP4401156B2 (ja) |
KR (1) | KR20050002315A (ja) |
TW (1) | TWI240968B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007305961A (ja) * | 2006-05-12 | 2007-11-22 | Hynix Semiconductor Inc | 化学的機械的研磨スラリー及びこれを用いる研磨方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100596834B1 (ko) * | 2003-12-24 | 2006-07-04 | 주식회사 하이닉스반도체 | 반도체소자의 폴리실리콘 플러그 형성방법 |
KR100571655B1 (ko) * | 2004-06-23 | 2006-04-17 | 주식회사 하이닉스반도체 | 랜딩 플러그 콘택 구조를 가진 반도체 소자 제조방법 |
KR101185988B1 (ko) * | 2009-12-30 | 2012-09-25 | 에스케이하이닉스 주식회사 | 반도체 메모리소자의 랜딩플러그컨택 형성방법 |
JP2013038095A (ja) * | 2011-08-03 | 2013-02-21 | Elpida Memory Inc | 半導体装置の製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100276387B1 (ko) * | 1998-01-08 | 2000-12-15 | 윤종용 | 반도체 장치의 자기정렬 콘택 형성 방법 |
US6284660B1 (en) * | 1999-09-02 | 2001-09-04 | Micron Technology, Inc. | Method for improving CMP processing |
US6723655B2 (en) * | 2001-06-29 | 2004-04-20 | Hynix Semiconductor Inc. | Methods for fabricating a semiconductor device |
-
2003
- 2003-06-30 KR KR1020030043686A patent/KR20050002315A/ko active Search and Examination
- 2003-12-04 US US10/727,825 patent/US6927168B2/en not_active Expired - Fee Related
- 2003-12-11 JP JP2003413090A patent/JP4401156B2/ja not_active Expired - Fee Related
- 2003-12-26 TW TW092136961A patent/TWI240968B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007305961A (ja) * | 2006-05-12 | 2007-11-22 | Hynix Semiconductor Inc | 化学的機械的研磨スラリー及びこれを用いる研磨方法 |
Also Published As
Publication number | Publication date |
---|---|
US6927168B2 (en) | 2005-08-09 |
JP4401156B2 (ja) | 2010-01-20 |
TW200504871A (en) | 2005-02-01 |
KR20050002315A (ko) | 2005-01-07 |
US20040266166A1 (en) | 2004-12-30 |
TWI240968B (en) | 2005-10-01 |
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