JP2002346372A - Apparatus and method for evaporating and feeding liquid - Google Patents
Apparatus and method for evaporating and feeding liquidInfo
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- JP2002346372A JP2002346372A JP2001154551A JP2001154551A JP2002346372A JP 2002346372 A JP2002346372 A JP 2002346372A JP 2001154551 A JP2001154551 A JP 2001154551A JP 2001154551 A JP2001154551 A JP 2001154551A JP 2002346372 A JP2002346372 A JP 2002346372A
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- liquid
- temperature
- raw material
- vaporizer
- gas
- Prior art date
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- Feeding And Controlling Fuel (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、液体原料を気化さ
せてガスを供給するための液体気化供給装置および液体
気化供給方法であって、容易にかつ安定的に液体原料を
気化させる技術に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid vapor supply apparatus and a liquid vapor supply method for supplying a gas by vaporizing a liquid raw material, and relates to a technique for easily and stably vaporizing a liquid raw material. It is.
【０００２】[0002]
【従来の技術】従来、液体原料を気化させてガス化しそ
の供給流量を制御する技術としては２種類あり、原料で
ある液体を気化させてから気体の流量を制御する気体流
量制御法と、液体原料の流量を制御してから気化させる
液体流量制御法がある。2. Description of the Related Art Conventionally, there are two types of techniques for vaporizing a liquid raw material and gasifying the same to control the supply flow rate. There are two methods for controlling the flow rate of gas after vaporizing the liquid as a raw material. There is a liquid flow rate control method in which the flow rate of a raw material is controlled and then vaporized.
【０００３】前者の方法は、一旦気化させた気体を加熱
した容器に飽和蒸気圧のまま貯留し、供給先への流量を
気体用マスフローコントローラによって制御するため、
ガスタンクから供給先の供給口までの全てのガスライン
において、液化しないように蒸気圧と温度を一定に保つ
ための非常に複雑な装置と制御が必要である。In the former method, a gas once vaporized is stored in a heated vessel at a saturated vapor pressure at a saturated vapor pressure, and a flow rate to a supply destination is controlled by a gas mass flow controller.
In all gas lines from the gas tank to the supply port of the supply destination, very complicated devices and controls for keeping the vapor pressure and the temperature constant so as not to liquefy are required.
【０００４】後者の方法は、ヒータによる温度制御箇所
は液体の流路部分だけで済むが、気化する際に奪われる
気化熱が大きく、気化器内の温度を一定に保つために気
化器全体に大きな熱量を供給しなければならず、なおか
つ精密な温度制御と流量制御が必要である。[0004] In the latter method, the temperature is controlled only by the liquid flow path portion by the heater. However, a large amount of vaporization heat is taken away during vaporization, and the entire vaporizer is maintained in order to keep the temperature inside the vaporizer constant. A large amount of heat must be supplied, and precise temperature control and flow rate control are required.
【０００５】[0005]
【発明が解決しようとする課題】そこで、本発明は、こ
のような問題点に鑑みてなされてもので、安価で容易に
かつ安定的に液体原料を気化させ、気化ガスを安定的に
供給先に供給することができる液体気化供給装置および
液体気化供給方法を提供することを主たる目的とする。SUMMARY OF THE INVENTION Accordingly, the present invention has been made in view of the above-mentioned problems, and therefore, it is possible to easily and stably vaporize a liquid raw material at a low cost and to supply a vaporized gas to a stable supply destination. A main object of the present invention is to provide a liquid vaporization supply device and a liquid vaporization supply method capable of supplying a liquid to a liquid.
【０００６】[0006]
【課題を解決するための手段】上記課題を解決するた
め、本発明に係る液体気化供給装置の発明は、液体原料
を気化してガスを供給する液体気化供給装置であって、
少なくとも、原料を通過させる多孔質体充填層を内蔵
し、該充填層の外套に加熱源を具備するとともに、温度
を制御する温度制御器を有する気化器を２台以上直列に
接続して成り、各気化器の温度制御器は、独立して温度
を制御できるものであることを特徴としている（請求項
１）。In order to solve the above-mentioned problems, an invention of a liquid vaporization supply apparatus according to the present invention is a liquid vaporization supply apparatus for vaporizing a liquid material and supplying a gas,
At least, a built-in porous material packed layer through which the raw material passes, equipped with a heating source in the jacket of the packed layer, connected in series with two or more vaporizers having a temperature controller for controlling the temperature, The temperature controller of each vaporizer can control the temperature independently (claim 1).
【０００７】上記構成の液体気化供給装置によれば、各
気化器の多孔質体充填層およびそこを通過する液体原料
は気化器毎に独立した温度に加熱され、大量に必要とさ
れる気化熱も分散されるので各多孔質体充填層の温度は
一定に保持され安定した気化が進行する。また、多孔質
体は熱交換率がよい上に、これを通過する液体あるいは
気体の流量を一定にする役割も果たす。従って、本発明
の装置は、気化したガスを容易にかつ安定した流量で供
給先に供給することができる。[0007] According to the liquid vaporization supply device having the above-described structure, the porous material packed layer of each vaporizer and the liquid raw material passing therethrough are heated to an independent temperature for each vaporizer, and a large amount of vaporization heat is required. Is also dispersed, so that the temperature of each porous material packed layer is kept constant, and stable vaporization proceeds. In addition, the porous body has a good heat exchange rate and also serves to keep the flow rate of the liquid or gas passing therethrough constant. Therefore, the apparatus of the present invention can easily supply a vaporized gas to a supply destination at a stable flow rate.
【０００８】この場合、制御温度を、第１段気化器は液
体原料の沸点未満に制御されるものとし、最終段の気化
器は液体原料の沸点以上に制御されるものであることが
好ましい（請求項２）。このようにすると、第１段気化
器で液体原料は沸点未満の気化に適切な温度まで予熱制
御され、最終段の気化器では液体原料の沸点以上に加熱
制御されるので、気化熱量が適切に分散し、最終段の気
化器において、液体原料は気化と同時にガスは高温にな
りかつ安定した流量で供給先に供給することができる。In this case, it is preferable that the control temperature of the first-stage vaporizer is controlled to be lower than the boiling point of the liquid raw material, and that the final-stage vaporizer is controlled to be higher than the boiling point of the liquid raw material ( Claim 2). In this way, the first stage vaporizer controls the preheating of the liquid raw material to a temperature suitable for vaporization below the boiling point, and the final stage vaporizer controls the heating of the liquid raw material to a temperature higher than the boiling point of the liquid raw material. In the vaporizer at the last stage of the dispersion, the liquid raw material is vaporized and the gas becomes hot at the same time as the vaporization, and can be supplied to the supply destination at a stable flow rate.
【０００９】また、この場合、第１段気化器の前に送液
ポンプを具備することが好ましく（請求項３）、さらに
第１段気化器の前に流量制御バルブを具備することが好
ましい（請求項４）。このようにすると、第１段気化器
への液体原料の供給量を精度よく制御することができ、
結果として気化するガスの流量を精密に制御することが
でき、安定した流量で供給することができる。In this case, it is preferable that a liquid feed pump is provided before the first-stage vaporizer (claim 3), and it is further preferable that a flow control valve is provided before the first-stage vaporizer (claim 3). Claim 4). With this configuration, the supply amount of the liquid raw material to the first-stage vaporizer can be controlled with high accuracy,
As a result, the flow rate of the gas to be vaporized can be precisely controlled, and the gas can be supplied at a stable flow rate.
【００１０】本発明によれば、前記液体気化供給装置に
よって液体原料を気化し、製造されたガスを供給先に安
定して供給することができる（請求項５）。[0010] According to the present invention, the liquid material is vaporized by the liquid vaporization supply device, and the produced gas can be stably supplied to the supply destination.
【００１１】さらに、本発明の液体気化供給方法に係る
発明は、液体原料を気化してガスを供給する液体気化供
給方法であって、少なくとも液体原料を第１段気化器の
多孔質体充填層に送液して液体原料の沸点未満に加熱
し、その後加熱液を最終段気化器の多孔質体充填層に送
液して液体原料の沸点以上に加熱して気化させ、ガスを
供給することを特徴としている（請求項６）。Further, the invention according to the liquid vaporizing / supplying method of the present invention is a liquid vaporizing / supplying method for vaporizing a liquid raw material and supplying a gas, wherein at least the liquid raw material is a porous material packed layer of a first-stage vaporizer. And heating the liquid to a temperature lower than the boiling point of the liquid raw material, and then feeding the heated liquid to the porous material packed bed of the final vaporizer to heat the liquid to a temperature higher than the boiling point of the liquid raw material and vaporize it. (Claim 6).
【００１２】この方法によれば、第１段気化器では液体
原料の沸点未満まで急速かつ均一に予熱することがで
き、最終段気化器では予熱された液体原料を沸点以上に
急速かつ均一に加熱することができるので、大量に必要
となる気化熱を分散させることができ、多孔質体充填層
の温度は一定に保持され安定した気化が進行する。従っ
て、気化したガスを容易にかつ安定した流量で供給先に
供給することが可能となるとともに熱効率もよいので、
コストを低減することも可能である。According to this method, the first-stage vaporizer can rapidly and uniformly preheat the liquid raw material to a temperature lower than the boiling point, and the final-stage vaporizer can rapidly and uniformly heat the preheated liquid raw material to the boiling point or higher. Therefore, the heat of vaporization required in a large amount can be dispersed, and the temperature of the porous material packed layer is kept constant and stable vaporization proceeds. Therefore, it is possible to easily supply the vaporized gas to the supply destination at a stable flow rate and the thermal efficiency is good,
It is also possible to reduce costs.
【００１３】[0013]
【発明の実施の形態】以下、本発明の実施の形態につい
て図面に基づいて具体的に説明するが、本発明はこれら
に限定されるものではない。ここで、図１は本発明の液
体気化供給装置の構成例を示す図である。図１に示した
ように、この液体気化供給装置２０は、少なくとも気化
器１と気化器２を直列に接続して構成されている。各気
化器は、収納容器５に多孔質体充填層７を内蔵してい
る。収納容器５の外套には加熱源８が取付けられ、多孔
質体充填層７を加熱する。この多孔質体充填層７の温度
制御は各気化器毎に独立して具備する温度制御器１４に
よって行い、加熱源８の出力を制御している。そして液
体原料を気化させるには、この液体気化供給装置２０の
第１段気化器１の入口を液体原料タンク９に接続し、最
終段の気化器２の出口を気化ガスチャンバー１０に接続
し、さらにドライ真空ポンプ１１を繋いで気化ガスを受
給側に供給するようになっている。DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be specifically described below with reference to the drawings, but the present invention is not limited thereto. Here, FIG. 1 is a diagram showing a configuration example of the liquid vaporization supply device of the present invention. As shown in FIG. 1, the liquid vaporization supply device 20 is configured by connecting at least a vaporizer 1 and a vaporizer 2 in series. Each vaporizer has a porous container-filled layer 7 built in a storage container 5. A heating source 8 is attached to the outer jacket of the storage container 5 and heats the porous body filling layer 7. The temperature of the porous material packed layer 7 is controlled by a temperature controller 14 provided independently for each vaporizer, and the output of the heating source 8 is controlled. In order to vaporize the liquid raw material, the inlet of the first-stage vaporizer 1 of the liquid vaporization supply device 20 is connected to the liquid raw material tank 9, and the outlet of the last vaporizer 2 is connected to the vaporized gas chamber 10. Further, a dry vacuum pump 11 is connected to supply the vaporized gas to the receiving side.
【００１４】この装置を用いて液体原料の気化供給方法
は、先ず、液体気化供給装置２０の気化器１および気化
器２の多孔質体充填層７、７の温度を各々所定の設定温
度になるように予熱しておく。次に液体原料タンク９か
ら液体原料を気化器１に送り込み、多孔質体充填層７内
で液体原料の沸点未満まで加熱昇温させる。次いで加熱
液体を気化器２に送り込み多孔質体充填層７内で液体原
料の沸点以上まで加熱し、液体原料を気化させ、気化ガ
スを送り出し、一旦気化ガスチャンバー１０に貯留した
後、ドライ真空ポンプ１１で気化ガスを受給側に供給す
る。In the method for vaporizing and supplying a liquid raw material using this apparatus, first, the temperatures of the porous material packed layers 7, 7 of the vaporizer 1 and the vaporizer 2 of the liquid vaporizing and supplying apparatus 20 are each set to a predetermined set temperature. Preheat as follows. Next, the liquid raw material is sent from the liquid raw material tank 9 to the vaporizer 1, and heated to a temperature lower than the boiling point of the liquid raw material in the porous material packed layer 7. Next, the heated liquid is fed into the vaporizer 2 and heated to a temperature equal to or higher than the boiling point of the liquid raw material in the porous material packed layer 7 to vaporize the liquid raw material, send out the vaporized gas, and temporarily store it in the vaporized gas chamber 10. At 11, the vaporized gas is supplied to the receiving side.
【００１５】次に本発明の液体気化供給装置の別の構成
例を示す。図２に示した液体気化供給装置３０は上記液
体気化供給装置２０の第１段気化器１の入口前に流量制
御バルブ１２および送液ポンプ１３を付帯設置したもの
で、液体原料の送液量を制御するとともに多孔質体充填
層７、７の温度を段階的に制御することによって気化ガ
スの流量を制御しようというものである。Next, another example of the configuration of the liquid vaporization supply device of the present invention will be described. The liquid vaporization supply device 30 shown in FIG. 2 is provided with a flow control valve 12 and a liquid supply pump 13 before the inlet of the first stage vaporizer 1 of the liquid vaporization supply device 20. And the temperature of the porous material-filled layers 7, 7 is controlled stepwise to control the flow rate of the vaporized gas.
【００１６】さらに他の液体気化供給装置の構成例を図
３に示した。図３に示した本発明の液体気化供給装置４
０は、上記図１、図２に示した液体気化供給装置２０、
３０では、分離して配置されていた気化器１、２を直結
し、２個の多孔質体充填層７、７を直列に接続して、１
個の収納容器６に内蔵させ、２個の多孔質体充填層７、
７に対応する外套位置に加熱源８、８を取付け、温度制
御も温度制御器１４、１４を各加熱源に独立して配備
し、流量制御バルブ１２および送液ポンプ１３を付加し
た構成になっている。この装置４０によっても、１段目
の多孔質体充填層７の温度を液体原料の沸点未満に設定
し、最終段（２段目）の多孔質体充填層７の温度を液体
原料の沸点以上に設定して液体原料を供給すれば、気化
気体を受給側に安定的に供給することができる。この構
成では、第１段の気化器での温度をほとんど保持したま
ま、最終段の気化器に原料を送ることができ、より効率
的である。FIG. 3 shows an example of the configuration of another liquid vaporization supply device. The liquid vaporizer 4 of the present invention shown in FIG.
0 is the liquid vaporization supply device 20 shown in FIGS.
In 30, the vaporizers 1 and 2 which are separately arranged are directly connected, and the two porous material packed layers 7 and 7 are connected in series to form
Built-in two storage containers 6, two porous material-filled layers 7,
Heating sources 8 and 8 are attached to the jacket position corresponding to 7, temperature controllers 14 and 14 are independently provided for each heating source for temperature control, and a flow control valve 12 and a liquid feed pump 13 are added. ing. Also in this device 40, the temperature of the first-stage porous material packed layer 7 is set to be lower than the boiling point of the liquid material, and the temperature of the final-stage (second-stage) porous material packed layer 7 is set to be equal to or higher than the boiling point of the liquid material. When the liquid raw material is supplied at a setting of, the vaporized gas can be stably supplied to the receiving side. In this configuration, the raw material can be sent to the final-stage vaporizer while the temperature in the first-stage vaporizer is almost maintained, which is more efficient.
【００１７】以上、本発明の液体気化供給装置の構成例
につき３例を図面に基づいて説明したが、本発明の特徴
とするところは、液体原料を気化してガスを供給する液
体気化供給装置において、少なくとも、原料を通過させ
る多孔質体充填層を内蔵し、該充填層の外套に加熱源を
具備するとともに、温度を制御する温度制御器を有する
気化器を２つ以上直列に接続して成り、各気化器の温度
制御器は、独立して温度を制御できるものであることに
ある。従って、本発明の趣旨を逸脱しない範囲で変形で
きることは言うまでもなく、特に気化器については、２
段とする場合に限られず、３段以上直列に接続してもよ
い。As described above, three examples of the configuration of the liquid vaporizing and supplying apparatus of the present invention have been described with reference to the drawings. The characteristic of the present invention is that the liquid vaporizing and supplying apparatus for supplying a gas by vaporizing a liquid material is provided. In, at least, a porous body packed layer through which the raw material is passed, a heating source is provided in a jacket of the packed layer, and two or more vaporizers having a temperature controller for controlling the temperature are connected in series. In other words, the temperature controller of each vaporizer can independently control the temperature. Therefore, it is needless to say that modifications can be made without departing from the spirit of the present invention.
The number of stages is not limited, and three or more stages may be connected in series.
【００１８】次に本発明の作用について説明する。気化
させたい液体原料には固有の沸点があり、沸点以上に加
熱すれば当然のことながら気体になる。気化器が１段、
すなわち加熱源である例えば電熱ヒータが１段の場合、
液体が気化する際に奪われる気化熱が非常に大きいため
に気化器内の充填層の温度を一定に保つことが難しく、
そのため安定的に液体を気化させ気化ガスを供給するこ
とが困難である。Next, the operation of the present invention will be described. The liquid raw material to be vaporized has a unique boiling point, and if heated to a temperature higher than the boiling point, it naturally becomes a gas. One stage vaporizer,
That is, for example, when the heating source that is an electric heater is one stage,
It is difficult to keep the temperature of the packed bed in the vaporizer constant because the heat of vaporization taken when the liquid is vaporized is very large,
Therefore, it is difficult to stably vaporize the liquid and supply the vaporized gas.
【００１９】そこで、ヒータを複数化することによっ
て、気化する際に奪われる大きな気化熱を分散すること
ができ、気化器全体の急激な温度変化を緩和し、安定的
に液体を気化させ気化ガスを供給することが可能とな
る。Therefore, by using a plurality of heaters, it is possible to disperse a large amount of heat of vaporization which is taken away during vaporization, to alleviate a sudden change in temperature of the entire vaporizer, to stably vaporize the liquid and to vaporize the vaporized gas. Can be supplied.
【００２０】液体原料を気化させるには、液体原料の流
路部分に多孔質体充填層を熱交換媒体として配置し、そ
の周囲を加熱源で加熱する。多孔質体充填層を内蔵する
収納容器と加熱源と温度制御器を有する気化器を少なく
とも２台以上直列に配置し、導入する液体原料の温度を
１段目の加熱源で沸点近辺に予熱し、最終段の加熱源で
沸点以上の温度に加熱するようにする。１段目の気化器
では多孔質体充填層を通過して沸点近くの高温の液体と
なり、最終段の気化器では液体原料が気化して高温の気
化気体が多孔質体充填層を通過し、このガスを受給側に
供給することになる。In order to vaporize the liquid raw material, a porous material packed layer is arranged as a heat exchange medium in the flow path portion of the liquid raw material, and the periphery thereof is heated by a heating source. At least two or more vaporizers having a heating container and a temperature controller having a storage container containing a porous material-packed layer therein are arranged in series, and the temperature of the liquid material to be introduced is preheated to near the boiling point by the first stage heating source. Then, the mixture is heated to a temperature equal to or higher than the boiling point by the final stage heating source. In the first stage vaporizer, the liquid passes through the porous material packed bed and becomes a high-temperature liquid near the boiling point. In the last stage vaporizer, the liquid raw material is vaporized and the high-temperature vaporized gas passes through the porous material packed layer. This gas will be supplied to the receiving side.
【００２１】この際、液体原料の沸点未満の温度まで加
熱する予熱を段階的に行うために３段以上の気化器を直
列に配置し、各気化器毎に温度制御器を設けて独立して
温度を制御し、さらに予熱液体を沸点以上の温度に加熱
して気化させ、気化したガスを保温あるいは加熱するた
めに、複数の気化器を直列に配置し、各気化器毎に温度
制御器を設けて独立して温度を制御することもできる。At this time, three or more stages of vaporizers are arranged in series in order to preheat the liquid raw material to a temperature lower than the boiling point in a stepwise manner, and a temperature controller is provided for each vaporizer and independently. In order to control the temperature, further heat the preheated liquid to a temperature equal to or higher than the boiling point and vaporize it, and keep or heat the vaporized gas, a plurality of vaporizers are arranged in series, and a temperature controller is provided for each vaporizer. It can also be provided to control the temperature independently.
【００２２】尚、液体の蒸発速度は、温度Ｔと正の相関
があり、本発明の液体の気化速度は、例えば気化器が気
化器１と気化器２の２段の場合、気化器２に導入される
液体の温度Ｔ3 で決まってくる。原料液体は、気化器１
から気化器２に移動する間に放熱するので、温度Ｔ3 は
気化器１の温度Ｔ1 （沸点未満）より若干低下してお
り、気化器２では、この温度Ｔ3 から気化器２の温度Ｔ
2 （沸点以上）まで原料液体を昇温し、気化させること
になる。この低温部Ｔ3 が存在することにより、例えば
気体が供給される側が真空である等減圧されている場合
に、沸点が低下し、気化領域を制御出来ずに気化器１の
液体領域まで気化領域が拡大してくるといった問題を防
止することが可能となる。すなわち、Ｔ3 の低温部が存
在すれば、気化領域の気化器１への拡大をそこで阻止す
る作用があるので、気化器２に所望温度の液体原料を安
定して送ることができ、気化器２において安定かつ高精
度で気化が行われる。Incidentally, the evaporation rate of the liquid has a positive correlation with the temperature T, and the vaporization rate of the liquid of the present invention is, for example, when the vaporizer has two stages of the vaporizer 1 and the vaporizer 2, the vaporizer 2 It is determined by the temperature T3 of the liquid to be introduced. The raw material liquid is the vaporizer 1
Since the heat is dissipated while moving from the vaporizer 2 to the vaporizer 2, the temperature T3 is slightly lower than the temperature T1 (below the boiling point) of the vaporizer 1. In the vaporizer 2, the temperature T3 of the vaporizer 2 is reduced from this temperature T3.
The raw material liquid is heated to 2 (boiling point or higher) and vaporized. Due to the presence of the low-temperature portion T3, when the pressure is reduced, for example, when the gas supply side is a vacuum, the boiling point decreases, and the vaporization region cannot be controlled and the vaporization region extends to the liquid region of the vaporizer 1. The problem of expansion can be prevented. That is, if there is a low temperature portion of T3, there is an action of preventing the expansion of the vaporization region to the vaporizer 1, so that the liquid raw material at a desired temperature can be sent to the vaporizer 2 stably. Vaporization is performed stably and with high accuracy.
【００２３】ここで、充填層として用いる多孔質体とし
ては、無数の方向性のない微小直径貫通孔を有する材料
であって、材質は金属、セラミックス、プラスチックス
等が挙げられるが、気化させる液体の沸点以上で使用で
きる耐熱性と耐食性を有するものであれば材質は問わな
い。しかし特に金属が熱伝導率の面で優れており、市販
品としてはステンレススチール製のＫｕｐｏｒｅｘ
（（株）クボタ製商品名クポレックス）等があり、形
状、大きさ等はある程度自由に成型できる。この金属多
孔質体の気孔部分は材質の特性としてほぼ均一であり、
特定の材質を選定し、成型体の外径および長さを規定す
ることによって通過する液体または気体の流量は一定と
なり、流量一定のオリフィスの役割を果たすものであ
る。また、粒状の多孔質体を所定量、収納容器に充填し
て多孔質体充填層を形成しても上記金属成型体とほぼ同
様の効果を挙げることができる。また、多孔質体は熱交
換率がよく、効率的に原料を加熱できるという利点もあ
る。Here, the porous material used as the filling layer is a material having an infinite number of small-diameter through-holes having no directionality. Examples of the material include metal, ceramics, and plastics. Any material can be used as long as it has heat resistance and corrosion resistance that can be used at a boiling point or higher. However, metals are particularly excellent in terms of thermal conductivity, and commercially available Kupolex made of stainless steel.
(Kubota Co., Ltd. product name Kupolex), etc., and the shape, size, etc. can be freely molded to some extent. The pores of this porous metal body are almost uniform in material properties,
By selecting a specific material and defining the outer diameter and length of the molded body, the flow rate of the liquid or gas passing therethrough becomes constant, and serves as an orifice with a constant flow rate. Further, even if a predetermined amount of the granular porous body is filled in a storage container to form a porous body filled layer, substantially the same effects as those of the metal molded body can be obtained. Further, the porous body has an advantage that the heat exchange rate is good and the raw material can be efficiently heated.
【００２４】加熱源としては、電熱ヒータ、高周波誘導
加熱、ランプ加熱、高圧蒸気、燃焼ガス等が挙げられる
が、電熱ヒータが気化器単位の設置が簡単であり、温度
制御が容易で精度が高く、設備費も安価になる利点があ
る。Examples of the heating source include an electric heater, high-frequency induction heating, lamp heating, high-pressure steam, combustion gas, and the like. The electric heater is easy to install in a carburetor unit, and the temperature control is easy and the accuracy is high. In addition, there is an advantage that the equipment cost is reduced.
【００２５】各気化器を通過する液体および気体の流量
は温度によって変化するため、制御する温度によっても
流量は変化する。気化流量を増やすためには、気化器の
前段部分に送液ポンプを取り付け、気化器に流入する液
体の流量を増やすことによって所望の気化流量を得るこ
とが可能となる。逆に気化流量を減らす必要があるとき
には気化器の前段部分に制御バルブを取り付け、気化器
に流れる液体の流量を減らすことによって所望の気化流
量を得ることが可能となる。Since the flow rates of the liquid and gas passing through each vaporizer change depending on the temperature, the flow rates also change depending on the temperature to be controlled. In order to increase the vaporization flow rate, it is possible to obtain a desired vaporization flow rate by attaching a liquid feed pump to the front part of the vaporizer and increasing the flow rate of the liquid flowing into the vaporizer. Conversely, when it is necessary to reduce the vaporization flow rate, it is possible to obtain a desired vaporization flow rate by installing a control valve in the front part of the vaporizer and reducing the flow rate of the liquid flowing through the vaporizer.
【００２６】液体原料の気化に当たっては、液体原料の
性質、流量、多孔質体の特性、多孔質体充填層の長さ、
径および気化器の段数、加熱源の段数、制御温度等の各
条件の組合せによって本発明の液体気化供給装置の基本
性能を決定することができる。In vaporizing the liquid raw material, the properties of the liquid raw material, the flow rate, the characteristics of the porous material, the length of the porous material packed layer,
The basic performance of the liquid vaporization supply device of the present invention can be determined by a combination of conditions such as the diameter, the number of vaporizer stages, the number of heating source stages, and the control temperature.
【００２７】[0027]
【実施例】以下、本発明の実施例を挙げて本発明を具体
的に説明するが、本発明はこれらに限定されるものでは
ない。EXAMPLES Hereinafter, the present invention will be described specifically with reference to examples of the present invention, but the present invention is not limited thereto.
【００２８】（実施例１）本発明の液体気化供給装置を
図１に示すような構成で組立てた。図１に示されている
ように、第１段の気化器１と最終段の気化器２を直列に
接続した。各気化器は、直径１０ｍｍ×長さ１００ｍｍ
の金属多孔体Ｋｕｐｏｒｅｘ（（株）クボタ製商品名ク
ポレックス、グレード：＃２１２９、材質：ＳＵＳ６３
０、気孔率：２２．４％）を多孔質体充填層として収納
容器に内蔵している。収納容器の外套には電熱ヒータを
取付け、温度制御は多孔質体充填層の温度を各気化器毎
に独立して行った。この液体気化供給装置２０の気化器
１の入口を液体原料タンクに接続し、気化器２の出口を
気化ガスチャンバーに接続し、さらにドライ真空ポンプ
１１（ＳＤＥ１２０、樫山工業（株）製商品名）につな
いだ。(Embodiment 1) A liquid vaporizing and supplying apparatus according to the present invention was assembled in a configuration as shown in FIG. As shown in FIG. 1, a first stage vaporizer 1 and a last stage vaporizer 2 were connected in series. Each vaporizer is 10mm in diameter x 100mm in length
Kuporex (product name: Kupolex, manufactured by Kubota Corporation, grade: # 2129, material: SUS63)
0, porosity: 22.4%) is contained in the container as a porous material-filled layer. An electric heater was attached to the jacket of the storage container, and the temperature was controlled independently for each vaporizer by controlling the temperature of the porous material packed bed. The inlet of the vaporizer 1 of the liquid vaporization supply device 20 is connected to a liquid raw material tank, the outlet of the vaporizer 2 is connected to a vaporized gas chamber, and a dry vacuum pump 11 (SDE120, trade name of Kashiyama Industry Co., Ltd.) Connected to.
【００２９】気化器１の金属多孔体の温度を９８℃、気
化器２の金属多孔体の温度を２００℃に設定し、純水を
供給したところ、０．１６ｇ／ｍｉｎの速度で純水が気
化し、換算流量２００ＳＣＣＭ（ｓｔａｎｄａｒｄ ｃ
ｍ3 ／ｍｉｎ）の気化気体を安定的に供給することがで
きた。この時、ドライ真空ポンプＳＤＥ１２０の排気速
度は２０００Ｌ／ｍｉｎであり、真空度は３０Ｐａであ
った。When the temperature of the porous metal body of the vaporizer 1 was set at 98 ° C. and the temperature of the porous metal body of the vaporizer 2 was set at 200 ° C., and pure water was supplied, pure water was supplied at a rate of 0.16 g / min. Vaporization, converted flow 200 SCCM (standard c
m 3 / min) could be supplied stably. At this time, the pumping speed of the dry vacuum pump SDE120 was 2000 L / min, and the degree of vacuum was 30 Pa.
【００３０】（実施例２）純水の気化する量をさらに正
確に制御するために、実施例１と同様の構成に対して液
体原料タンク出口に制御バルブと送液ポンプを加え、図
２に示した液体気化供給装置３０を構成した。０．２４
ｇ／ｍｉｎの送液速度で純水を送液したところ、すべて
の純水が気化し換算流量３００ＳＣＣＭの気化気体を供
給することができた。また制御バルブの調節によって
０．１６ｇ／ｍｉｎ以下の送液速度でも気化気体を安定
的に供給することができた。(Embodiment 2) In order to more precisely control the amount of pure water vaporized, a control valve and a liquid feed pump were added to the liquid raw material tank outlet in the same configuration as in Embodiment 1, and FIG. The liquid vaporization supply device 30 shown was configured. 0.24
When pure water was supplied at a liquid supply speed of g / min, all the pure water was vaporized and a vaporized gas having a reduced flow rate of 300 SCCM could be supplied. Further, by adjusting the control valve, the vaporized gas could be stably supplied even at a liquid sending speed of 0.16 g / min or less.
【００３１】（実施例３）実施例１および実施例２で
は、分離して配置した気化器１、２を直結し、２個の金
属多孔体を直列に接続して、１個の収納容器に内蔵さ
せ、２個の金属多孔体に対応する外套位置に電熱ヒータ
を取付けた液体気化供給装置４０を図３に示したように
組立て、１段目の金属多孔体の温度を９８℃、２段目の
金属多孔体の温度を２００℃に設定して純水を供給した
ところ、実施例１および実施例２と同様に０．１６ｇ／
ｍｉｎの速度で純水が気化し、換算流量２００ＳＣＣＭ
の気化気体を安定的に供給することができた。(Embodiment 3) In Embodiments 1 and 2, the vaporizers 1 and 2 which are separately arranged are directly connected, and two metal porous bodies are connected in series to form one storage container. The liquid vaporization supply device 40, which is built-in and has an electric heater attached to the jacket position corresponding to the two porous metal bodies, is assembled as shown in FIG. When the temperature of the metal porous body was set to 200 ° C. and pure water was supplied, the same as in Examples 1 and 2, 0.16 g /
The pure water is vaporized at the speed of min, and the converted flow rate is 200 SCCM.
Could be supplied stably.
【００３２】上記実施例１ないし実施例３に例示した３
種類の液体気化供給装置では０．８ｇ／ｍｉｎの送液速
度（換算流量１０００ＳＣＣＭ）まで気化気体を供給す
ることができたが、条件の組合せによってそれ以上の送
液速度での気化も充分可能である。The third embodiment exemplified in the first to third embodiments
The liquid vaporization supply device of the type could supply the vaporized gas up to a liquid supply speed of 0.8 g / min (converted flow rate of 1000 SCCM), but vaporization at a liquid supply speed higher than that is possible depending on a combination of conditions. is there.
【００３３】尚、本発明は、上記実施形態に限定される
ものではない。上記実施形態は例示であり、本発明の特
許請求の範囲に記載された技術的思想と実質的に同一な
機構を有し、同様な作用効果を奏するものは、いかなる
ものであっても本発明の技術的範囲に包含される。The present invention is not limited to the above embodiment. The above embodiment is an exemplification, and the present invention is applicable to any apparatus having substantially the same mechanism as the technical idea described in the claims of the present invention and exerting the same function and effect. Within the technical scope of
【００３４】[0034]
【発明の効果】以上、詳細に説明したように、本発明に
よれば、液体原料を容易に安定的に気化させ、気化ガス
を一定流量で受給側に低コストで供給することができ
る。As described in detail above, according to the present invention, a liquid raw material can be easily and stably vaporized, and a vaporized gas can be supplied at a constant flow rate to a receiving side at low cost.
【図１】本発明の液体気化供給装置の構成例を示す図で
ある。FIG. 1 is a diagram showing a configuration example of a liquid vaporization supply device of the present invention.
【図２】本発明の液体気化供給装置の別の例を示す図で
ある。FIG. 2 is a diagram showing another example of the liquid vaporization supply device of the present invention.
【図３】本発明の液体気化供給装置の他の例を示す図で
ある。FIG. 3 is a diagram showing another example of the liquid vaporization supply device of the present invention.
２０、３０、４０…液体気化供給装置、 １、２、３…
気化器、５、６…収納容器、 ７…多孔質体充填層、
８…加熱源、９…液体原料タンク、 １０…気化ガスチ
ャンバー、１１…ドライ真空ポンプ、 １２…流量制御
バルブ、１３…送液ポンプ、 １４…温度制御器。20, 30, 40 ... liquid vaporization supply device, 1, 2, 3, ...
Vaporizer, 5, 6 ... storage container, 7: porous material packed layer,
8: heating source, 9: liquid material tank, 10: vaporized gas chamber, 11: dry vacuum pump, 12: flow control valve, 13: liquid sending pump, 14: temperature controller.
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 3K068 AA11 AB20 AB23 CA11 4G068 DA10 DB04 DB26 DD03 DD11 DD15 DD20 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 3K068 AA11 AB20 AB23 CA11 4G068 DA10 DB04 DB26 DD03 DD11 DD15 DD20
Claims (6)
気化供給装置であって、少なくとも、原料を通過させる
多孔質体充填層を内蔵し、該充填層の外套に加熱源を具
備するとともに、温度を制御する温度制御器を有する気
化器を２台以上直列に接続して成り、各気化器の温度制
御器は、独立して温度を制御できるものであることを特
徴とする液体気化供給装置。1. A liquid vaporization supply device for vaporizing a liquid raw material and supplying a gas, comprising at least a built-in porous material packed layer through which the raw material passes, and a heating source provided in a jacket of the packed layer. Liquid vapor supply, characterized in that two or more vaporizers having a temperature controller for controlling the temperature are connected in series, and the temperature controllers of each vaporizer can independently control the temperature. apparatus.
料の沸点未満に制御されるものとし、最終段の気化器は
液体原料の沸点以上に制御されるものであることを特徴
とする請求項１に記載した液体気化供給装置。2. The control temperature of the first-stage vaporizer is controlled to be lower than the boiling point of the liquid raw material, and the last-stage vaporizer is controlled to be higher than the boiling point of the liquid raw material. The liquid vaporization supply device according to claim 1, wherein
備することを特徴とする請求項１または請求項２に記載
した液体気化供給装置。3. The liquid vaporization supply device according to claim 1, further comprising a liquid feed pump before the first stage vaporizer.
を具備することを特徴とする請求項１ないし請求項３の
いずれか１項に記載した液体気化供給装置。4. The liquid vaporization supply device according to claim 1, further comprising a flow control valve before the first stage vaporizer.
に記載した液体気化供給装置を使用して、液体原料を気
化し、ガスを供給することを特徴とする液体気化供給方
法。5. A liquid vaporization supply method, comprising vaporizing a liquid raw material and supplying a gas by using the liquid vaporization supply apparatus according to any one of claims 1 to 4.
気化供給方法であって、少なくとも液体原料を第１段気
化器の多孔質体充填層に送液して液体原料の沸点未満に
加熱し、その後加熱液を最終段気化器の多孔質体充填層
に送液して液体原料の沸点以上に加熱して気化させ、ガ
スを供給することを特徴とする液体気化供給方法。6. A liquid vaporization supply method for vaporizing a liquid raw material and supplying a gas, wherein at least the liquid raw material is sent to a porous material packed bed of a first-stage vaporizer and heated to a temperature lower than the boiling point of the liquid raw material. Then, a heating liquid is supplied to the porous material packed bed of the final stage vaporizer, heated to a temperature higher than the boiling point of the liquid raw material, vaporized, and supplied with a gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001154551A JP2002346372A (en) | 2001-05-23 | 2001-05-23 | Apparatus and method for evaporating and feeding liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001154551A JP2002346372A (en) | 2001-05-23 | 2001-05-23 | Apparatus and method for evaporating and feeding liquid |
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| Publication Number | Publication Date |
|---|---|
| JP2002346372A true JP2002346372A (en) | 2002-12-03 |
Family
ID=18998874
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001154551A Pending JP2002346372A (en) | 2001-05-23 | 2001-05-23 | Apparatus and method for evaporating and feeding liquid |
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|---|---|
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| US10710022B2 (en) | 2012-08-30 | 2020-07-14 | Element 1 Corp. | Hydrogen generation assemblies |
| US10717040B2 (en) | 2012-08-30 | 2020-07-21 | Element 1 Corp. | Hydrogen purification devices |
| US11141692B2 (en) | 2012-08-30 | 2021-10-12 | Element 1 Corp | Hydrogen generation assemblies and hydrogen purification devices |
| US11590449B2 (en) | 2012-08-30 | 2023-02-28 | Element 1 Corp | Hydrogen purification devices |
| US11738305B2 (en) | 2012-08-30 | 2023-08-29 | Element 1 Corp | Hydrogen purification devices |
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