JP2002327296A - Horizontally movable plating equipment, and other horizontally moving method - Google Patents

Horizontally movable plating equipment, and other horizontally moving method

Info

Publication number
JP2002327296A
JP2002327296A JP2001168841A JP2001168841A JP2002327296A JP 2002327296 A JP2002327296 A JP 2002327296A JP 2001168841 A JP2001168841 A JP 2001168841A JP 2001168841 A JP2001168841 A JP 2001168841A JP 2002327296 A JP2002327296 A JP 2002327296A
Authority
JP
Japan
Prior art keywords
processing
weir
tank
liquid
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001168841A
Other languages
Japanese (ja)
Inventor
Susumu Sudo
進 須藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INS JAPAN KK
Original Assignee
INS JAPAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INS JAPAN KK filed Critical INS JAPAN KK
Priority to JP2001168841A priority Critical patent/JP2002327296A/en
Publication of JP2002327296A publication Critical patent/JP2002327296A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To solve the problems in a conventional carrier transfer type or a horizontally movable type, which are oxidation of a treated workpiece, dispersion of noxious discharged fumes from a treatment liquid on picking the workpiece up from the treatment liquid, a countermeasure for environmental problems such as dripping of the treatment liquid, a high flow rate at a gateway of the workpiece caused by overflowing, and occurrence of defective products such as falling of the workpiece caused by the excessive flow amount. SOLUTION: This equipment comprises arranging a passing aperture part for the workpiece 15 in a traveling direction along a side wall of a treatment tank, a weir 4 at the opening, and a communicating pipe for transferring the treatment liquid to a bus box, a preliminary tank, and a transfer pump, in each tank. The method is characterized by actuating the weir when a liquid level or pressure in each tank is equal.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、処理液移動と堰を
交互動作させることにより、平行移動のみで処理可能と
したことにより、従来の処理装置、処理方法に全て摘要
する事が出来る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention enables processing only by parallel movement by alternately moving a processing liquid and a weir, so that all conventional processing apparatuses and processing methods can be used.

【0002】[0002]

【従来の技術】1 キャリアー移送式 従来は処理工程毎にワークを処理槽ごと持ち上げ移動を
している為処理後の空中放置時間が有り、処理皮膜が酸
化する等の問題、又ワーク移動時に処理液からの、有害
ガス、の飛散、処理液の液垂れ等が有り排ガス、排水処
理設備も能力の大きな設備が必要とされ、装置本体価格
装置の保守も、高所作業となり、技術者依頼を必要とす
る為、装置本体価格維持管理費、装置本体価格、も多大
な経費を必要とした。それ等はワークの製造価格に反映
する要因と成つている。
2. Description of the Related Art (1) Carrier transfer type Conventionally, since a work is lifted and moved together with a processing tank in each processing step, there is a standing time in the air after the processing, and there is a problem that a processing film is oxidized. There is scatter of harmful gas from the liquid, dripping of the treatment liquid, etc.There is a need for equipment with large capacity for exhaust gas and wastewater treatment equipment. Because of the necessity, the maintenance cost of the apparatus body and the price of the apparatus body also required enormous expenses. These are factors that affect the production price of the work.

【0003】[0003]

【従来の技術】2 水平移動処理方式 ワーク出入り口部の処理液がオーバーフローから出る流
速が早い為、処理ワーク、サイズに制限が有り、サイズ
が大きく成ればオーバーフロー部も大きくなる、汲み上
げ用ポンプも高流量となり、液流出量も大きく、流出液
でワークが外れる、等形状変化等不良品となり、ワーク
サイズが きわめて小サイズの流出抵抗、の少ないワー
クに採用された。
2. Description of the Related Art 2 Horizontal movement processing method Since the flow rate of the processing liquid at the work entrance and exit from the overflow is high, the processing work and the size are limited. The larger the size, the larger the overflow area, and the pump for pumping. The flow rate was high, the amount of outflow of liquid was large, the work was detached by the outflow liquid, the shape was changed, and the product became defective. The work size was extremely small, and it was adopted for work with little outflow resistance.

【0004】[0004]

【発明が解決しようとする課題】装置は的確に堰で止水
をした後、排液後にワークを移動するため従来のトラブ
ルを解消する他、大きなワークサイズにも摘要する
Since the apparatus moves the work after draining the water after the water is properly stopped by the weir, it solves the conventional trouble and requires a large work size.

【0005】[0005]

【発明が解決しようとする課題】ワークは形状、材質、
サイズにより、処理時間が不特定で処理時間が異なる従
来処理装置は処理する処理槽をフロアーに設置し、下部
より搬送機用フレームを立ち上げ移送台車レールを付
け,2〜5台の搬送機を設置した装置で設置スペースも
大きく、装置全高は処理ワーク高さの約5倍のスペース
を必要とした。また処理ワークは各々の処理プログラム
を使用する必要があつた。
The work has a shape, a material,
In the conventional processing equipment, the processing time is unspecified and the processing time varies depending on the size. The processing tank for processing is installed on the floor, the frame for the transporter is set up from the lower part, the transfer trolley rail is attached, and two to five transporters are installed. The installed equipment requires a large installation space, and the total height of the equipment requires about five times the height of the processing work. Also, the processing work had to use each processing program.

【0006】[0006]

【課題を解決するための手段】ワークを空中移動させな
い為、処理ワークの酸化、処理液より引き上げ出す際、
放出ガスによる環境対策の問題、装置の設置スペース、
等を解決する事による諸経費の軽減が可能となる。
In order to prevent the workpiece from being moved in the air, when the workpiece is oxidized and pulled out of the processing solution,
Problems of environmental measures due to released gas, installation space for equipment,
It is possible to reduce various expenses by solving the above.

【0007】ワークは処理はプログラムを必要としない
で、搬送コンベアーを可変する事により、処理時間を任
意に設定する事が出来る。
[0007] The processing of the workpiece does not require a program, and the processing time can be arbitrarily set by changing the conveyor.

【0008】[0008]

【発明の実施の形態】装置 装置はチエーン等、エンドレスコンベアーで連続水平移
送処理をする。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Apparatus The apparatus performs a continuous horizontal transfer process using an endless conveyor such as a chain.

【0009】 処理槽 槽側壁進行方向に、ワーク通過開口を設置 ワーク通過開口部に堰を設置 各槽毎にパスボツクスへの処理液移送用連通パイプ又
は、予備槽、移送ポンプを設けるける。
Processing tank A work passage opening is provided in the direction of movement of the tank side wall. A weir is provided at the work passage opening.

【0010】堰 動作は両槽とも液面、又は同圧
力時作動する。
In the weir operation, both tanks operate at the liquid level or at the same pressure.

【0011】パスボツクス 処理槽間に設け、オートドレンを有する。A pass box is provided between the processing tanks and has an auto drain.

【0012】移載コンベアー 可変速移動、リフト機構を設ける。Transfer conveyor A variable speed moving and lifting mechanism is provided.

【0013】[0013]

【実施例】実施例は図面を参照して説明すると、ワーク
は処理槽を通過する状態を図示、図1は平面図、図2は
側面図、図3は断面図である ワークはハンガーの上にまたいで、載せて有る。15ワ
ークが3の移載機のポジション1でワークを 5 のハ
ンガーより上げる、3の1ポジションより 3の2ポジ
ション移動、ゲート1の堰4を閉じ、6のオートドレン
を開き入り口パスボツクスへ11の連通菅を経て処理液
を流入する、流入完了でパスボツクスと処理槽が同圧力
となり、ゲート2の4堰を開く、移載機は2ポジション
より3ポジションへ移動、10のハンガーに載せる。完
了後ゲート2の堰4を閉じて、5のオートドレンを開き
9を経て13に処理液を下部受け槽に自然落差排出、ゲ
ート1の堰4を開き、以後繰り返しとする。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a plan view, FIG. 2 is a side view, and FIG. 3 is a sectional view of a work on a hanger. It is on the straddle. 15 works raise the work from the hanger of 5 in position 1 of 3 transfer machines, move 2 positions of 3 from 1 position of 3 and close the weir 4 of the gate 1, open the automatic drain of 6 and move the 11 to the entrance pass box. The processing solution flows through the communication tube. When the flow is completed, the pass box and the processing tank have the same pressure, and the four weirs of the gate 2 are opened. The transfer machine is moved from the second position to the third position and is mounted on the ten hangers. After the completion, the weir 4 of the gate 2 is closed, the automatic drain of 5 is opened, the processing liquid is naturally drained to the lower receiving tank via 9 through 13, and the weir 4 of the gate 1 is opened.

【0014】処理槽はワークを3個のみ記入したが、処
理時間により異なり、通常20〜30個程度のワーク数
となる。処理槽内は搬送コンベアーで槽出口の移載機3
の1ポジションに到達すると入り口と同様の動作により
次工程まで移動する
Although only three workpieces are entered in the processing tank, the number of workpieces is usually about 20 to 30 depending on the processing time. Inside the processing tank, a transfer conveyor 3
When one position is reached, it moves to the next process by the same operation as the entrance

【0015】従来のオーバーフロー方式の液流速による
抵抗を無くして移送する事により大型ワーク連続水平処
理を可能とした。
[0015] Continuous horizontal processing of a large workpiece is made possible by eliminating the resistance due to the liquid flow rate of the conventional overflow system and transferring the workpiece.

【0016】13へ排出させた処理液は 従来常設の濾
過ポンプで処理槽へ汲み上げる。通常ハンガー移送スピ
ードは1ピツチ/20秒程度で、オートドレン、連通パ
イプの口径を大きくすることにより、1サイクルを規定
時間内に完了する事を可能とした。
The processing liquid discharged to 13 is pumped up to a processing tank by a conventional permanent filtration pump. Normally, the hanger transfer speed is about 1 pitch / 20 seconds, and one cycle can be completed within a specified time by increasing the diameter of the auto drain and the communication pipe.

【0017】[0017]

【発明の効果】【The invention's effect】

【0018】 搬送装置が連続処理のためフレーム製造
コスト削減
[0018] Frame manufacturing cost reduction due to continuous processing of the transfer device

【0019】 処理槽より持ち上げ移動しないので排気
設備が小さい
The exhaust equipment is small because it is not lifted and moved from the processing tank

【0020】 処理液の汲みだし分の削減[0020] Reduction of the amount of pumping of the processing liquid

【0021】 排水処理設備が小さい[0021] Wastewater treatment equipment is small

【0022】 装置、及び現地据付工事費が軽減出来
る.
[0022] Equipment and on-site installation costs can be reduced.

【0023】 維持管理費の軽減Reduction of maintenance costs

【0024】[0024]

【図面の簡単な説明】[Brief description of the drawings]

【図1】 水平移送の実施の形態を示す平面図であ
る。
FIG. 1 is a plan view showing an embodiment of horizontal transfer.

【図2】 水平移送の実施の形態を示す側面図であ
る。
FIG. 2 is a side view showing an embodiment of horizontal transfer.

【図3】 水平移送の実施の形態を示す断面図であ
る。
FIG. 3 is a sectional view showing an embodiment of horizontal transfer.

【符号の説明】[Explanation of symbols]

【図1〜3共通】1 堰(閉の状態) 2 搬送コンベアー位置を示す 3 移載機 4 堰(開の状態) 5 入口パスボツクス、オートドレン 6 オートドレン−1 7 オートドレン−2 8 出口パスボツクス、オートドレン 9 処理槽液面 10 コンベアーハンガー 11 連通パイプ 12 槽間仕切板、兼堰ガイド 13 下部受槽 14 ワーク通過、開口部 15 ワーク 16 堰用止水プレート 17 処理槽架台[Common to Figs. 1-3] 1 Weir (closed) 2 Shows conveyor position 3 Transfer machine 4 Weir (open) 5 Inlet pass box, auto drain 6 Auto drain-1 7 Auto drain-2 8 Outlet pass box , Auto drain 9 treatment tank liquid level 10 conveyor hanger 11 communication pipe 12 tank partition plate, weir guide 13 lower receiving tank 14 work passage, opening 15 work 16 weir stop water plate 17 treatment tank base

───────────────────────────────────────────────────── フロントページの続き (72)発明者 須藤 進 神奈川県横浜市保土ヶ谷区岡沢町239番地 の6 Fターム(参考) 4K022 DB15  ────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Susumu Suto 239F, 239 Okazawacho, Hodogaya-ku, Yokohama-shi, Kanagawa 6F term (reference) 4K022 DB15

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 表面処理(メツキ)処理を横送りのみで
処理する装置
1. An apparatus for performing a surface treatment (meshing) treatment only by a lateral feed.
【請求項2】 処理液を次の処理方向側に移動させ、前
後処理槽を同圧力にして槽間の間仕切(以後堰という)
への処理液による面圧抵抗をを無くした状態で堰を開き
(以後堰開という)、処理物(以後ワークという)を移
動させる処理方法
2. The processing solution is moved to the next processing direction, and the pre-processing and post-processing tanks are kept at the same pressure to partition between the tanks (hereinafter referred to as a weir).
Processing method in which a weir is opened (hereinafter referred to as a weir opening) in a state where the surface pressure resistance due to the processing liquid to the surface is eliminated, and a processed material (hereinafter referred to as a work) is moved.
【請求項3】 処理槽の液移動は処理槽と、前後のの槽
(以後パスボツクスという)の底面を連通パイプで接続
し、オートドレンを開閉する事により、次の槽に自然流
入させ前後槽とパスボツクスの液面を同一圧力にする。
又、次工程が回収を必要とするときは予備槽を設け、回
収液を入れ替える事も可能となり、回収液を処理槽への
補給として使用する。
3. The liquid transfer in the processing tank is performed by connecting the bottom of the processing tank and the front and rear tanks (hereinafter referred to as pass boxes) with a communication pipe, and opening and closing an auto drain to naturally flow into the next tank. And the liquid level of the pass box are set to the same pressure.
Further, when the next step requires recovery, a spare tank is provided, and the recovery liquid can be exchanged, and the recovery liquid is used as a supply to the processing tank.
【請求項4】 同一圧力(同一液面)時作動堰を作動さ
せ処理物を移動させる。
4. An operating weir is operated at the same pressure (the same liquid level) to move the processing object.
【請求項5】 処理物は移動後、パスボツクスの底面の
ドレンバルブを開き処理液排出、パスボツクス出口の堰
を開き処理物を移動する。
5. After the processing object is moved, the drain valve on the bottom of the pass box is opened to discharge the processing liquid, and the weir at the exit of the pass box is opened to move the processing object.
【請求項6】 堰、は処理槽の出口開口部より大きい強
度のある板で作り流入処理液の圧力に耐える条件で構成
する。
6. The weir is made of a plate having a strength greater than the outlet opening of the processing tank, and is constructed under conditions that can withstand the pressure of the inflowing processing liquid.
【請求項7】 堰は強度のある材料の為、処理液の止水
が十分得ることが出来ない為、堰の止水側に柔軟性のあ
る、泊状の薄い素材を取り付け隙間より流出する1液を
自己の水圧により止水する。
7. Since the weir is a strong material, it is not possible to obtain a sufficient water stoppage of the processing liquid. Therefore, a flexible, stay-like thin material is attached to the water stop side of the weir and flows out from the gap. One liquid is stopped by its own water pressure.
【請求項8】 パスボツクスより排出された処理液は下
部受け槽よりポンプで処理槽に移送する。
8. The processing liquid discharged from the pass box is transferred from the lower receiving tank to the processing tank by a pump.
【請求項9】 堰は処理液組成により作動時、未使用
時、真空圧、空圧により密着する。
9. The weir is in close contact with the weir according to the composition of the processing liquid when operating, when not in use, and under vacuum or pneumatic pressure.
JP2001168841A 2001-04-27 2001-04-27 Horizontally movable plating equipment, and other horizontally moving method Pending JP2002327296A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001168841A JP2002327296A (en) 2001-04-27 2001-04-27 Horizontally movable plating equipment, and other horizontally moving method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001168841A JP2002327296A (en) 2001-04-27 2001-04-27 Horizontally movable plating equipment, and other horizontally moving method

Publications (1)

Publication Number Publication Date
JP2002327296A true JP2002327296A (en) 2002-11-15

Family

ID=19010994

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001168841A Pending JP2002327296A (en) 2001-04-27 2001-04-27 Horizontally movable plating equipment, and other horizontally moving method

Country Status (1)

Country Link
JP (1) JP2002327296A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007113066A (en) * 2005-10-20 2007-05-10 C Uyemura & Co Ltd Dipping apparatus
JP2010121185A (en) * 2008-11-20 2010-06-03 C Uyemura & Co Ltd Method of controlling treating liquid by treating liquid apparatus
CN101724883B (en) * 2008-10-23 2014-01-08 上村工业株式会社 Valve device for tanks of processing solution
CN110959051A (en) * 2017-07-25 2020-04-03 上村工业株式会社 Work holding jig and plating apparatus
CN116254586A (en) * 2023-05-15 2023-06-13 苏州晶洲装备科技有限公司 Electroplating device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007113066A (en) * 2005-10-20 2007-05-10 C Uyemura & Co Ltd Dipping apparatus
JP4704181B2 (en) * 2005-10-20 2011-06-15 上村工業株式会社 Immersion processing equipment
CN101724883B (en) * 2008-10-23 2014-01-08 上村工业株式会社 Valve device for tanks of processing solution
KR101573939B1 (en) 2008-10-23 2015-12-02 우에무라 고교 가부시키가이샤 Gate apparatus of processing solution tank
JP2010121185A (en) * 2008-11-20 2010-06-03 C Uyemura & Co Ltd Method of controlling treating liquid by treating liquid apparatus
CN110959051A (en) * 2017-07-25 2020-04-03 上村工业株式会社 Work holding jig and plating apparatus
CN116254586A (en) * 2023-05-15 2023-06-13 苏州晶洲装备科技有限公司 Electroplating device
CN116254586B (en) * 2023-05-15 2023-08-04 苏州晶洲装备科技有限公司 Electroplating device

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