CN218554956U - Cleaning equipment after sand blasting - Google Patents
Cleaning equipment after sand blasting Download PDFInfo
- Publication number
- CN218554956U CN218554956U CN202221874382.7U CN202221874382U CN218554956U CN 218554956 U CN218554956 U CN 218554956U CN 202221874382 U CN202221874382 U CN 202221874382U CN 218554956 U CN218554956 U CN 218554956U
- Authority
- CN
- China
- Prior art keywords
- area
- washing
- tank
- cleaning
- quick
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model provides a cleaning device after sand blasting, which comprises a frame, a feeding area, an alkaline washing area, an acid washing area and a discharging area, wherein the feeding area, the alkaline washing area, the acid washing area and the discharging area are sequentially arranged in the frame; the loading area is provided with a loading assembly for loading the silicon wafers subjected to sand blasting, the loading assembly is provided with a plurality of groups of placing positions for placing the wafer baskets, the alkaline washing area is provided with a plurality of alkaline washing grooves for alkaline washing of the silicon wafers, the acid washing area is provided with a plurality of acid washing grooves for acid washing of the silicon wafers subjected to the alkaline washing, the blanking area is provided with a blanking groove for blanking the silicon wafers subjected to the acid washing, and a plurality of groups of blanking assemblies for placing the wafer baskets are arranged in the blanking groove; two manipulators for controlling the wafer basket to carry out alkali washing operation and acid washing operation are arranged in the rack; the other group of manipulators is arranged in the pickling area and is used for grabbing a wafer basket in the alkali-pickling area to carry out silicon wafer pickling operation. The utility model discloses will wait to wash the silicon chip by the manual work and put into equipment material loading district, the automatic alkali, the sour cleaning work who snatchs and accomplish each cell body of manipulator, have the manipulator to snatch the unloading after the washing is accomplished, accomplish whole washing flow.
Description
Technical Field
The utility model belongs to the technical field of the silicon chip processing sets up and makes, especially, relate to a cleaning equipment behind sandblast.
Background
The sand blasting machine process is a method for forming soft damage on the back of a silicon wafer by adopting mortar formed by mixing granular substances (such as Al2O 3) with certain particle sizes and water and driving the mortar to perform sand blasting on the silicon wafer on a moving conveyor belt by utilizing air pressure; after the sand blasting process, the residual mortar on the surface of the silicon wafer needs to be cleaned before the acid etching.
At present, when silicon wafers to be cleaned are fed, the conventional feeding assembly cannot complete the feeding of a large number of silicon wafers, so that the production requirements of the subsequent alkali and acid washing procedures are difficult to meet; therefore, this patent application has designed cleaning equipment after the sandblast.
SUMMERY OF THE UTILITY MODEL
In view of this, the utility model aims at providing a cleaning equipment behind sandblast to solve the material loading that the big batch silicon chip of material loading subassembly can't be accomplished, lead to subsequent alkali, pickling process to be difficult to satisfy the production demand.
In order to achieve the above purpose, the technical scheme of the utility model is realized like this:
a cleaning device after sand blasting comprises a rack, a feeding area, an alkaline washing area, an acid washing area and a discharging area which are sequentially arranged in the rack; the loading area is provided with a loading assembly for loading the silicon wafers subjected to sand blasting, the loading assembly is provided with a plurality of groups of placing positions for placing the wafer baskets, the alkaline washing area is provided with a plurality of alkaline washing grooves for alkaline washing of the silicon wafers, the acid washing area is provided with a plurality of acid washing grooves for acid washing of the silicon wafers subjected to the alkaline washing, the blanking area is provided with a blanking groove for blanking the silicon wafers subjected to the acid washing, and a plurality of groups of blanking assemblies for placing the wafer baskets are arranged in the blanking groove;
two groups of mechanical arms are arranged in the rack, wherein one mechanical arm is arranged in the alkali washing area and is used for grabbing a wafer basket in the feeding area to carry out alkali washing operation on the silicon wafer; and the other manipulator is arranged in the pickling area and used for grabbing a wafer basket in the alkaline washing area to carry out silicon wafer pickling operation.
Furthermore, the feeding assembly comprises an outer groove body and an inner groove body arranged in the outer groove body, the outer groove body is fixedly arranged in the rack through a support, a supporting plate used for bearing the sheet basket is fixedly arranged in the inner groove body, a plurality of bearing positions are arranged on the supporting plate, and a plurality of through notches which are arranged in parallel are arranged on the supporting plate;
the lifting mechanism is used for sinking the sheet basket at the feeding port into the inner groove body and is fixedly arranged on the inner wall of the rack;
still be provided with moving mechanism in the frame, the last fixed bearing mechanism that is provided with of moving mechanism, bearing mechanism set up in the inside groove body, and moving mechanism drive bearing mechanism moves along running through the notch for the piece basket of placing on elevating system is transported to the position of bearing of layer board.
Further, the up end of outer cell body is higher than the up end of interior cell body, forms the overflow cavity between interior cell body and the outer cell body, and the bottom of overflow cavity sets up filtering hole board, and the bottom of outer cell body is equipped with the delivery port, and the delivery port is discharged the waste liquid through outer discharge pipe, and interior cell body up end border is provided with a plurality of overflow breachs, is provided with the water inlet on the outer cell body lateral wall, and the water inlet passes through the delivery port of the external water pump of inlet channel.
Furthermore, the supporting plate is arranged along the length direction of the inner groove body, a plurality of first positioning blocks for positioning the sheet basket are arranged on the supporting plate, the number of the first positioning blocks in each group is four, and the four first positioning blocks are matched to form a bearing position for positioning the sheet basket;
the first positioning block is correspondingly arranged at the edge position of the through notch.
Furthermore, the lifting mechanism comprises a bracket and a driving unit for driving the bracket to vertically lift, the bracket comprises a base plate, two vertical plates are fixedly arranged at the bottom end of the base plate, the two vertical plates are arranged in parallel, a transverse plate is arranged between the two vertical plates, the transverse plate is positioned above the supporting plate, U-shaped notches corresponding to the through notches in number are formed in the transverse plate, a plurality of groups of second positioning blocks used for positioning the positioning piece basket are further arranged on the transverse plate, the number of the second positioning blocks in each group is four, the four second positioning blocks are matched with each other to form a bearing position of the positioning piece basket, and the second positioning blocks are correspondingly arranged at the edge positions of the U-shaped notches;
a side plate is fixedly arranged at the bottom end of one side of the base plate, and a gap is reserved between the side plate and one of the vertical plates;
the driving unit comprises a first air cylinder, a first guide rail and a first sliding block, the first air cylinder is fixedly arranged on the inner wall of the rack, the driving end of the first air cylinder is fixedly connected with the base plate, the first guide rail is also fixedly arranged on the inner wall of the rack, the first sliding block is arranged on the first guide rail in a sliding mode, and the first sliding block is fixedly connected with the side plate.
Furthermore, the supporting mechanism comprises a plurality of bearing frames, the bearing frames are of concave structures, a plurality of supporting tables for supporting the wafer basket are fixedly arranged on the upper end face of each bearing frame, and the supporting tables are correspondingly arranged in the through notches;
the two cylinders are fixedly arranged on the supporting plate, the supporting plate is fixedly arranged on a sliding support of the moving mechanism, the driving end of the second cylinder is fixedly connected with the bottom end of the bearing frame, a fixed base is fixedly arranged on the supporting plate, a guide rod is fixedly arranged on the fixed base, a linear bearing is sleeved on the guide rod, the linear bearing is fixedly arranged at the bottom end of the bearing frame, and the bearing frame moves up and down along the guide rod through the linear bearing.
Further, the alkali washing area comprises an alkali liquor washing tank I, an alkali liquor washing tank II, a quick discharge washing tank I, an SC-1 liquid medicine washing tank and a quick discharge washing tank II which are sequentially arranged;
the alkali liquor cleaning tank I, the alkali liquor cleaning tank II and the SC-1 liquid medicine cleaning tank are identical in structure, the alkali liquor cleaning tank I and the alkali liquor cleaning tank II are used for cleaning large-particle pollutants on the surface of the silicon wafer, and the SC-1 liquid medicine cleaning tank is used for cleaning organic pollutants on the surface of the silicon wafer;
the quick-discharge flushing tank I and the quick-discharge flushing tank II are identical in structure, the quick-discharge flushing tank I is used for cleaning alkali liquor cleaning agent remaining on the surface of the silicon wafer, the quick-discharge cleaning tank II is used for cleaning SC-1 liquid medicine remaining on the surface of the silicon wafer, and quick-discharge valves are mounted in the quick-discharge flushing tank I and the quick-discharge flushing tank II and used for quickly discharging the solution in the tank body to a waste liquid pipeline.
Further, the pickling area comprises an SC-2 liquid medicine cleaning tank, a quick-discharge flushing tank III, an overflow tank and a spin dryer which are sequentially arranged;
the SC-2 liquid medicine cleaning tank is used for cleaning metal ions and mortar residues on the surface of the silicon wafer;
the quick-discharge flushing tank III is used for cleaning the SC-2 liquid medicine left on the surface of the silicon wafer;
the overflow groove is used for cleaning small particle pollutants remained on the surface of the silicon wafer, and the spin dryer is used for drying the silicon wafer.
Furthermore, an acid-base partition door is arranged between the alkali washing area and the acid washing area, and a lifter for controlling the acid-base partition door is arranged in the rack.
Furthermore, the outside of frame is equipped with closed shell, is equipped with the material loading mouth that corresponds with the material loading subassembly on the curb plate of shell, is equipped with the feed opening that corresponds with the unloading subassembly on the opposite curb plate of shell, and the shell front end corresponds each region and all is provided with visual window, and a plurality of air cleaner and air exit are installed to the top of shell.
Compared with the prior art, a cleaning equipment after sandblast have following beneficial effect:
the cleaning equipment after sand blasting of the utility model manually puts the silicon wafers to be cleaned into the feeding area of the equipment, the mechanical arm automatically grabs and completes the alkali and acid cleaning work of each tank body, and the mechanical arm grabs and discharges after cleaning is completed, thereby completing the whole cleaning process;
utilize the whole bearing mechanism of the moving mechanism drive that sets up in the frame to remove to the U type breach position of bracket along interior groove body length direction, the cylinder drive bears the upward movement of frame, it will place the piece basket jacking on the bracket to order about the brace table that bears on the frame, piece basket after the jacking is under moving mechanism's drive, move to on each locating piece station of layer board, the cylinder falls back, the piece basket accuracy that will place on the brace table is placed on the layer board, above-mentioned process in proper order, the piece basket of a plurality of stations is placed on the completion bracket, thereby accomplish big batch silicon wafer material loading work.
Drawings
The accompanying drawings, which form a part hereof, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the invention without undue limitation. In the drawings:
fig. 1 is a schematic view of an overall structure of a post-blasting cleaning apparatus according to an embodiment of the present invention;
fig. 2 is a front view of a post-sandblasting cleaning apparatus according to an embodiment of the present invention;
fig. 3 is a configuration diagram of an internal tank of a post-sandblasting cleaning apparatus according to an embodiment of the present invention;
fig. 4 is a schematic structural view of a feeding assembly according to an embodiment of the present invention;
fig. 5 is a side view of a part of a detail of the feeding assembly according to the embodiment of the present invention;
fig. 6 is a schematic structural view of a supporting plate, a moving mechanism and a supporting mechanism according to an embodiment of the present invention;
fig. 7 is a schematic structural view of a lifting mechanism according to an embodiment of the present invention.
Description of reference numerals:
1. a frame; 2. a feeding assembly; 21. an outer tank body; 211. a water outlet; 22. an inner tank body; 23. a support; 24. a support plate; 241. the notch is penetrated; 242. a first positioning block; 25. a lifting mechanism; 251. a substrate; 252. a vertical plate; 253. a transverse plate; 254. a U-shaped notch; 255. a second positioning block; 256. a side plate; 257. a first cylinder; 258. a first guide rail; 259. a first sliding block; 26. a moving mechanism; 27. a support mechanism; 271. a carrier; 272. a support table; 273. a second air cylinder; 274. a support plate; 275. a fixed seat; 276. a guide bar; 277. a linear bearing; 28. a filter orifice plate; 3. a tablet basket; 4. a housing; 41. a feeding port; 42. a visual window; 43. an air filter; 44. an air outlet.
Detailed Description
It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are used merely for convenience of description and for simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
Referring to fig. 1 to 3, a post-blasting cleaning apparatus includes a frame 1, and a feeding area, an alkaline cleaning area, an acid cleaning area, and a discharging area sequentially disposed in the frame 1; the feeding area is provided with a feeding assembly 2 for feeding the silicon wafers subjected to sand blasting, the feeding assembly 2 is provided with a plurality of groups of placing positions for placing the wafer baskets 3, the alkaline washing area is provided with a plurality of alkaline washing grooves for performing alkaline washing on the silicon wafers, the acid washing area is provided with a plurality of acid washing grooves for performing acid washing on the silicon wafers subjected to the alkaline washing, the blanking area is provided with a blanking groove for blanking the silicon wafers subjected to the acid washing, and a plurality of groups of blanking assemblies for placing the wafer baskets 3 are arranged in the blanking groove;
two groups of mechanical arms are arranged in the rack 1, wherein one mechanical arm is arranged in the alkaline washing area and is used for grabbing a wafer basket 3 in the feeding area to carry out alkaline washing operation on the silicon wafer; the other manipulator is arranged in the pickling area and is used for grabbing the wafer basket 3 in the alkaline washing area to carry out silicon wafer pickling operation; the manipulator overall structure who adopts among this technical scheme is leading cantilever type, utilizes linear guide, lead screw nut and rack and pinion's form, through servo motor control, and this manipulator and drive mode are technical means that technical staff is familiar with in this field, and this patent application does not improve it, so no longer do not describe in excess any more.
The equipment is internally provided with a controller, the controller is connected with each mechanism to realize the matching operation among the mechanisms, and the feeding, alkali washing and acid washing work of the silicon wafer is completed.
The equipment is mainly used for meeting the actual requirement of cleaning the silicon wafer after sand blasting of a customer site, the surface of the silicon wafer contains a large amount of organic matters, metal particles and sand blasting residues after a sand blasting process is carried out, and due to the fact that the cleaning solution is contained in the feeding area, feeding operation is carried out on the silicon wafer in water, drying and hardening of residual mortar on the surface of the silicon wafer can be effectively prevented, and the situation that the surface of the silicon wafer is not easy to clean in a follow-up process is avoided.
After the silicon wafers are cleaned by the liquid medicines of the SC-1 and SC-2 equipment, pollutants are reduced to be below a standard, the silicon wafers to be cleaned are manually placed into a feeding area of the equipment, a mechanical arm automatically grabs and finishes the cleaning work of each tank body, and after the cleaning is finished, the mechanical arm grabs and discharges the silicon wafers to finish the whole cleaning process.
As shown in fig. 4 and 5, the feeding assembly 2 includes an outer tank 21 and an inner tank 22 disposed in the outer tank 21, the outer tank 21 is fixedly mounted in the frame 1 through a bracket 23, a supporting plate 24 for supporting the sheet basket 3 is fixedly disposed in the inner tank 22, the supporting plate 24 is provided with a plurality of supporting positions, the supporting plate 24 is provided with a plurality of through notches 241 arranged in parallel, the number of the through notches 241 is set according to actual conditions in the field, and further description is omitted in this patent application;
the lifting mechanism 25 is used for sinking the sheet basket 3 at the feeding port 41 into the inner groove body 22, and the lifting mechanism 25 is fixedly arranged on the inner wall of the rack 1;
the rack 1 is further provided with a moving mechanism 26, the moving mechanism 26 is fixedly provided with a supporting mechanism 27, the supporting mechanism 27 is arranged in the inner groove body 22, and the moving mechanism 26 drives the supporting mechanism 27 to move along the through notch 241 and is used for transferring the sheet basket 3 placed on the lifting mechanism 25 to the bearing position of the supporting plate 24.
The up end of outer cell body 21 is higher than the up end of interior cell body 22, form the overflow cavity between interior cell body 22 and the outer cell body 21, the bottom of overflow cavity sets up filtering hole board 28, the bottom of outer cell body 21 is equipped with delivery port 211, delivery port 211 discharges the waste liquid through outer discharge pipe, interior cell body 22 up end border is provided with a plurality of overflow breachs, be provided with the water inlet on the outer cell body 21 lateral wall, the water inlet passes through the delivery port 211 of the external water pump of inlet channel, valve is all installed in water inlet and delivery port 211 department for control liquid injection volume and water yield.
The cleaning solution of overflow flows into to the overflow cavity in the interior cell body 22 through the overflow breach that sets up, and the filter orifice plate 28 of setting in the overflow cavity effectively filters impurity, and the waste liquid of overflow is discharged through the outer pipeline of the delivery port 211 essence that 21 bottoms of outer cell body set up, when needing to pour water into the cell body, opens the water pump, flows into to carrying out the silicon chip and washes in the cell body from the water inlet through the inlet channel.
Still be provided with two level sensor in the interior cell body 22, the top position of cell body including level sensor sets up for carry out full water and detect, when the liquid level is too high, the suggestion operation workman controls the notes liquid volume of inlet tube, and the bottom position of cell body including another level sensor sets up is used for carrying out the drainage and detects, detects whether arrange to the greatest extent the liquid in the cell body, and level sensor does not demonstrate in the drawing.
The supporting plate 24 is arranged along the length direction of the inner groove body 22, a plurality of first positioning blocks 242 for positioning the sheet basket 3 are arranged on the supporting plate 24, the number of the first positioning blocks 242 in each group is four, and the four first positioning blocks 242 are matched to form a bearing position for positioning the sheet basket 3;
the first positioning block 242 is correspondingly arranged at the edge position of the through notch 241;
through set up multiunit locating piece 242 on layer board 24, form the support to a plurality of piece baskets 3 and carry the station, play the location fixed to piece basket 3 bottom.
As shown in fig. 7, the lifting mechanism 25 includes a bracket and a driving unit for driving the bracket to vertically lift, the bracket includes a base plate 251, two vertical plates 252 are fixedly disposed at the bottom end of the base plate 251, the two vertical plates 252 are disposed in parallel, a transverse plate 253 is disposed between the two vertical plates 252, a reinforcing plate for improving the strength of the transverse plate 253 is further disposed between the two vertical plates 252, the transverse plate 253 is located above the supporting plate 24, U-shaped notches 254 corresponding to the number of the through notches 241 are disposed on the transverse plate 253, a plurality of sets of positioning blocks two 255 for positioning the sheet basket 3 are further disposed on the transverse plate 253, the number of each set of positioning blocks two 255 is four, the four positioning blocks two 255 are cooperatively disposed to form bearing positions of the positioning sheet basket 3, and the positioning blocks two 255 are correspondingly disposed at edge positions of the U-shaped notches 254;
a side plate 256 is fixedly arranged at the bottom end of one side of the base plate 251, a gap is reserved between the side plate 256 and one of the risers 252 to form a passage through which the supporting mechanism 27 passes, the movement of the carrier frame 271 is not influenced by the arrangement of the bracket, and the sheet basket 3 which is transferred and placed on the bracket by the carrier frame 271 is not hindered;
the driving unit comprises a cylinder I257, a guide rail I258 and a sliding block I259, wherein the cylinder I257 is fixedly arranged on the inner wall of the machine frame 1, the driving end of the cylinder I257 is fixedly connected with the base plate 251, the guide rail I258 is also fixedly arranged on the inner wall of the machine frame 1, the sliding block I259 is slidably arranged on the guide rail I258, and the sliding block I259 is fixedly connected with the side plate 256.
Drive unit drive bracket rises to material loading 41 positions, and control manipulator puts piece basket 3 to the support that forms on the bracket on the position that bears, treats that piece basket 3 places the back, and drive unit orders about the bracket and moves down to the internal cell body 22 in, and at this moment, operating personnel passes through moving mechanism 26 and bearing mechanism 27 work, accomplishes the transportation to piece basket 3 to the silicon chip cleaning work of follow-up process.
As shown in fig. 6, the supporting mechanism 27 includes two supporting frames 271, the two supporting frames 271 adopted in the present embodiment are in a zigzag structure, the upper end surface of each supporting frame 271 is fixedly provided with two supporting tables 272 supporting the wafer basket 3, the supporting tables 272 are correspondingly arranged in the through notches 241, and the supporting tables 272 perform reciprocating motion along the through notches 241 for carrying the wafer basket 3 containing the silicon wafer;
the two air cylinders 273 are correspondingly driven to drive the two bearing frames 271 to move up and down, the two air cylinders 273 are fixedly arranged on the supporting plate 274, the supporting plate 274 is fixedly arranged on a sliding support of the moving mechanism 26, the driving ends of the two air cylinders 273 are fixedly connected with the bottom ends of the bearing frames 271, fixing seats 275 are fixedly arranged on the supporting plate 274, guide rods 276 are fixedly arranged on the fixing seats 275, linear bearings 277 are sleeved on the guide rods 276, the linear bearings 277 are fixedly arranged at the bottom ends of the bearing frames 271, the bearing frames 271 move up and down along the guide rods 276 through the linear bearings 277, the moving mechanism 26 can be solved by means of existing mature technologies, for example, a motor drives the sliding blocks to move along guide rails, and the supporting plate 274 is installed on the sliding blocks, so that the horizontal movement of the bearing frames 271 is realized.
Utilize the moving mechanism 26 that sets up in frame 1 to drive whole supporting mechanism 27 and move to the U type breach 254 position of bracket along interior cell 22 length direction, cylinder drive bears the upward movement of frame 271, order to order about a supporting bench 272 on bearing frame 271 and will place the piece basket 3 jacking on the bracket, piece basket 3 after the jacking is under moving mechanism 26's drive, move to on each locating piece station of layer board 24, the cylinder falls back, the piece basket 3 that will place on supporting bench 272 is accurately placed on layer board 24, above-mentioned process in proper order, the piece basket 3 that accomplishes a plurality of stations on the bracket is placed, thereby accomplish big batch silicon wafer feeding work.
The alkali washing area comprises an alkali liquor washing tank I, an alkali liquor washing tank II, a quick-discharge washing tank I, an SC-1 liquid medicine washing tank and a quick-discharge washing tank II which are sequentially arranged;
the alkali liquor cleaning tank I, the alkali liquor cleaning tank II and the SC-1 liquid medicine cleaning tank are identical in structure, the alkali liquor cleaning tank I and the alkali liquor cleaning tank II are used for cleaning large-particle pollutants on the surface of the silicon wafer, and the SC-1 liquid medicine cleaning tank is used for cleaning organic pollutants on the surface of the silicon wafer;
the first quick-discharge flushing tank and the second quick-discharge flushing tank are identical in structure, the first quick-discharge flushing tank is used for cleaning alkali liquor cleaning agent remained on the surface of the silicon wafer, the second quick-discharge cleaning tank is used for cleaning SC-1 liquid medicine remained on the surface of the silicon wafer, and quick-discharge valves are arranged in the first quick-discharge flushing tank and the second quick-discharge flushing tank and used for quickly discharging the solution in the tank body to a waste liquid pipeline;
as shown in fig. 3, the first lye cleaning tank (as shown in fig. 1), the second lye cleaning tank (as shown in fig. 2), the first quick-draining flushing tank (as shown in fig. 3, QDR), the SC-1 liquid cleaning tank (as shown in fig. 4, SC-1) and the second quick-draining flushing tank (as shown in fig. 5, QDR) provided in this patent application are well-established technologies commonly used in the industry, and are not improved in this patent application, and therefore will not be further described.
The pickling area comprises an SC-2 liquid medicine cleaning tank, a quick-discharge flushing tank III, an overflow tank and a spin dryer which are sequentially arranged;
the SC-2 liquid medicine cleaning tank is used for cleaning metal ions and mortar residues on the surface of the silicon wafer;
the quick-discharge flushing tank III is used for cleaning the SC-2 liquid medicine left on the surface of the silicon wafer;
the overflow groove is used for cleaning small particle pollutants remained on the surface of the silicon wafer, and the spin dryer is used for drying the silicon wafer;
the SC-2 liquor cleaning tank (shown as the No. 6 SC-2 tank), the quick-discharge flushing tank III (shown as the No. 7 QDR tank), the overflow tank (shown as the No. 8 DI overflow tank), the drying machine (shown as the No. 9 drying machine) and the blanking assembly arranged in the blanking tank are all mature equipment commonly used in the industry field, and the SC-2 liquor cleaning tank is not improved in the patent application, so that the SC-2 liquor cleaning tank is not further described.
An acid-base partition door is further arranged between the alkali washing area and the acid washing area, an elevator for controlling the acid-base partition door is arranged in the rack 1, and the elevator can be solved by utilizing the existing mature technical means, such as the existing screw rod and chain type elevator, so that redundant description is not repeated.
The above description is only a preferred embodiment of the present invention, and should not be taken as limiting the invention, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. The utility model provides a cleaning equipment after sandblast which characterized in that: comprises a rack (1), and a feeding area, an alkaline washing area, an acid washing area and a discharging area which are sequentially arranged in the rack (1); the feeding area is provided with a feeding assembly (2) for feeding the silicon wafers subjected to sand blasting, a plurality of groups of placing positions for placing the wafer baskets (3) are arranged on the feeding assembly (2), the alkaline washing area is provided with a plurality of alkaline washing grooves for performing alkaline washing on the silicon wafers, the acid washing area is provided with a plurality of acid washing grooves for performing acid washing on the silicon wafers subjected to the alkaline washing, the blanking area is provided with a blanking groove for blanking the silicon wafers subjected to the acid washing, and a plurality of groups of blanking assemblies for placing the wafer baskets (3) are arranged in the blanking groove;
two manipulators are arranged in the rack (1), wherein one manipulator is arranged in the alkali washing area and is used for grabbing the wafer basket (3) in the feeding area to carry out alkali washing operation on the silicon wafer; the other manipulator is arranged in the pickling area and is used for grabbing a wafer basket (3) in the alkaline washing area to carry out silicon wafer pickling operation.
2. The post-blast cleaning apparatus according to claim 1, characterized in that: the feeding assembly (2) comprises an outer groove body (21) and an inner groove body (22) arranged in the outer groove body (21), the outer groove body (21) is fixedly installed in the rack (1) through a support (23), a supporting plate (24) used for bearing the sheet basket (3) is fixedly arranged in the inner groove body (22), a plurality of bearing positions are arranged on the supporting plate (24), and a plurality of through notches (241) which are arranged in parallel are arranged on the supporting plate (24);
the sheet basket (3) at the feeding port (41) is sunk into the inner groove body (22) through the lifting mechanism (25), and the lifting mechanism (25) is fixedly arranged on the inner wall of the rack (1);
the rack (1) is further provided with a moving mechanism (26), the moving mechanism (26) is fixedly provided with a supporting mechanism (27), the supporting mechanism (27) is arranged in the inner trough body (22), and the moving mechanism (26) drives the supporting mechanism (27) to move along the through notch (241) and is used for transferring the sheet basket (3) placed on the lifting mechanism (25) to a bearing position of the supporting plate (24).
3. The post-blast cleaning apparatus according to claim 2, characterized in that: the up end of outer cell body (21) is higher than the up end of interior cell body (22), forms the overflow cavity between interior cell body (22) and the outer cell body (21), and the bottom of overflow cavity sets up filtering pore board (28), and the bottom of outer cell body (21) is equipped with delivery port (211), and delivery port (211) are discharged the waste liquid through arranging the pipeline outward, and interior cell body (22) up end border is provided with a plurality of overflow breach, is provided with the water inlet on outer cell body (21) lateral wall, and the water inlet passes through delivery port (211) of the external water pump of inlet channel.
4. The post-blast cleaning apparatus according to claim 3, characterized in that: the supporting plate (24) is arranged along the length direction of the inner groove body (22), a plurality of first positioning blocks (242) for positioning the sheet baskets (3) are arranged on the supporting plate (24), the number of the first positioning blocks (242) in each group is four, and the four first positioning blocks (242) are matched to form a bearing position for positioning the sheet baskets (3);
the first positioning block (242) is correspondingly arranged at the edge position of the through notch (241).
5. The post-blast cleaning apparatus according to claim 3, characterized in that: the lifting mechanism (25) comprises a bracket and a driving unit for driving the bracket to vertically lift, the bracket comprises a base plate (251), two vertical plates (252) are fixedly arranged at the bottom end of the base plate (251), the two vertical plates (252) are arranged in parallel, a transverse plate (253) is arranged between the two vertical plates (252), the transverse plate (253) is positioned above the supporting plate (24), U-shaped notches (254) with the number corresponding to that of the through notches (241) are formed in the transverse plate (253), a plurality of groups of positioning blocks II (255) used for positioning the sheet basket (3) are further arranged on the transverse plate (253), the number of each group of positioning blocks II (255) is four, the four positioning blocks II (255) are matched to form bearing positions of the positioning sheet basket (3), and the positioning blocks II (255) are correspondingly arranged at the edge positions of the U-shaped notches (254);
a side plate (256) is fixedly arranged at the bottom end of one side of the base plate (251), and a gap is reserved between the side plate (256) and one of the vertical plates (252);
the driving unit comprises a first air cylinder (257), a first guide rail (258) and a first sliding block (259), wherein the first air cylinder (257) is fixedly arranged on the inner wall of the rack (1), the driving end of the first air cylinder (257) is fixedly connected with the base plate (251), the first guide rail (258) is also fixedly arranged on the inner wall of the rack (1), the first sliding block (259) is slidably arranged on the first guide rail (258), and the first sliding block (259) is fixedly connected with the side plate (256).
6. The post-blast cleaning apparatus according to claim 5, wherein: the supporting mechanism (27) comprises a bearing frame (271), the number of the bearing frame (271) is multiple, the bearing frame (271) is of a concave structure, a plurality of supporting tables (272) used for supporting the wafer basket (3) are fixedly arranged on the upper end face of the bearing frame (271), and the supporting tables (272) are correspondingly arranged in the through notches (241);
still include cylinder two (273), the quantity of cylinder two (273) corresponds with the quantity that bears frame (271), cylinder two (273) is fixed to be set up on backup pad (274), backup pad (274) are fixed to be set up on the sliding support of moving mechanism (26), the drive end of cylinder two (273) and the bottom fixed connection who bears frame (271), fixed fixing base (275) that is provided with on backup pad (274), fixed guide bar (276) that is provided with on fixing base (275), the cover is equipped with linear bearing (277) on guide bar (276), linear bearing (277) are fixed to be set up in the bottom that bears frame (271), bear frame (271) and reciprocate along guide bar (276) through linear bearing (277).
7. The post-blast cleaning apparatus according to claim 6, characterized in that: the alkali washing area comprises an alkali liquor washing tank I, an alkali liquor washing tank II, a quick-discharge washing tank I, an SC-1 liquid medicine washing tank and a quick-discharge washing tank II which are sequentially arranged;
the alkali liquor cleaning tank I, the alkali liquor cleaning tank II and the SC-1 liquid medicine cleaning tank are identical in structure, the alkali liquor cleaning tank I and the alkali liquor cleaning tank II are used for cleaning large-particle pollutants on the surface of the silicon wafer, and the SC-1 liquid medicine cleaning tank is used for cleaning organic pollutants on the surface of the silicon wafer;
the quick-discharge flushing tank I and the quick-discharge flushing tank II are identical in structure, the quick-discharge flushing tank I is used for cleaning alkali liquor cleaning agent remaining on the surface of the silicon wafer, the quick-discharge cleaning tank II is used for cleaning SC-1 liquid medicine remaining on the surface of the silicon wafer, and quick-discharge valves are mounted in the quick-discharge flushing tank I and the quick-discharge flushing tank II and used for quickly discharging the solution in the tank body to a waste liquid pipeline.
8. The post-blast cleaning apparatus of claim 7, wherein: the pickling area comprises an SC-2 liquid medicine cleaning tank, a quick-discharge flushing tank III, an overflow tank and a spin dryer which are sequentially arranged;
the SC-2 liquid medicine cleaning tank is used for cleaning metal ions and mortar residues on the surface of the silicon wafer;
the quick-discharge flushing tank III is used for cleaning the SC-2 liquid medicine left on the surface of the silicon wafer;
the overflow groove is used for cleaning small particle pollutants remained on the surface of the silicon chip, and the spin dryer is used for drying the silicon chip.
9. The post-blast cleaning apparatus according to claim 1, characterized in that: an acid-base partition door is arranged between the alkali washing area and the acid washing area, and a lifter for controlling the acid-base partition door is arranged in the frame (1).
10. The post-blast cleaning apparatus according to claim 1, characterized in that: the outer side of the frame (1) is provided with a closed shell (4), a side plate (256) of the shell (4) is provided with a feeding port (41) corresponding to the feeding component (2), the other side plate (256) of the shell (4) is provided with a discharging port corresponding to the discharging component, the front end of the shell (4) is provided with a visible window (42) corresponding to each region, and the top end of the shell (4) is provided with a plurality of air filters (43) and an air outlet (44).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221874382.7U CN218554956U (en) | 2022-07-11 | 2022-07-11 | Cleaning equipment after sand blasting |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221874382.7U CN218554956U (en) | 2022-07-11 | 2022-07-11 | Cleaning equipment after sand blasting |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218554956U true CN218554956U (en) | 2023-03-03 |
Family
ID=85307963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221874382.7U Active CN218554956U (en) | 2022-07-11 | 2022-07-11 | Cleaning equipment after sand blasting |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218554956U (en) |
-
2022
- 2022-07-11 CN CN202221874382.7U patent/CN218554956U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103008305B (en) | Full-automatic cylinder barrel washing machine | |
| CN112474555A (en) | Ultrasonic cleaning system for mobile phone screen cover plate | |
| CN112609222A (en) | Washing and drying integrated electroplating device | |
| CN112247805A (en) | Burnishing device is used in valve manufacturing | |
| CN210207858U (en) | Pickling device of secondary silicon material | |
| CN218554956U (en) | Cleaning equipment after sand blasting | |
| CN203061523U (en) | Full-automatic cylinder barrel cleaning machine | |
| CN202427675U (en) | Multistage bubble cleaning machine | |
| CN114273311A (en) | Automatic cleaning machine and workpiece cleaning method | |
| CN109985849A (en) | A kind of engine cylinder body cleaning system | |
| CN115261828B (en) | Optical insert nickel plating device based on motion balance principle | |
| KR20130111150A (en) | Apparatus for processing substrate | |
| CN114274055B (en) | Pipe device capable of feeding and discharging in shot blasting and derusting manner and using method | |
| CN114733832B (en) | Gear manufacturing and cleaning device | |
| KR20200051469A (en) | Apparatus for changing chemical filter | |
| CN217616569U (en) | Heat exchange tube cleaning device | |
| KR100621427B1 (en) | Apparatus for cleaning chip of faucet | |
| CN212683935U (en) | Liftable silicon chip storage device | |
| CN107983700A (en) | A kind of thin-wall bush automatic flushing device | |
| CN214976105U (en) | Glass cleaning and drying device | |
| CN212329122U (en) | Ultrasonic cleaning device suitable for iron casting cleaning | |
| CN212476900U (en) | Tubular product internal surface acid dip pickle | |
| CN211027337U (en) | Metal roller core cleaning mechanism | |
| CN221063671U (en) | Master disk cleaning device | |
| KR20200051471A (en) | Apparatus for changing chemical filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |