JP2000171605A - Antireflection film and display device - Google Patents
Antireflection film and display deviceInfo
- Publication number
- JP2000171605A JP2000171605A JP10348530A JP34853098A JP2000171605A JP 2000171605 A JP2000171605 A JP 2000171605A JP 10348530 A JP10348530 A JP 10348530A JP 34853098 A JP34853098 A JP 34853098A JP 2000171605 A JP2000171605 A JP 2000171605A
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- film
- light
- refractive index
- wavelength
- metal
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は反射防止膜および表
示装置に関し、さらに詳しくは、外光反射を防止する反
射防止膜および画像を表示するパネル基材の表面に反射
防止膜が形成された表示装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antireflection film and a display device, and more particularly, to an antireflection film for preventing reflection of external light and a display having an antireflection film formed on a surface of a panel substrate for displaying an image. Related to the device.
【０００２】[0002]
【従来の技術】たとえば眼鏡用レンズのように透明材料
を通して物を見るものでは、反射光が強い場合に反射像
が明瞭に現れるゴーストやフレア等と称される現象が生
じる。また、窓ガラスやショーウインドウでは周囲の
光、たとえば太陽光や照明光を鏡面反射することがあ
り、そのため映り込み現象が生じ、透明性等に支障をき
たす場合がある。これを防止するため、従来より真空蒸
着法等を用いて基材上にこの基材と屈折率が異なる材料
で構成された反射防止膜を形成することが行われてい
る。この場合、反射防止効果を最も大とするためには基
材を被覆する物質の厚みを選択することが重要であるこ
とが知られている。たとえば単層被膜においては基材よ
り低屈折率の物質を光学的膜厚を対象とする光波長の１
／４、あるいはこの奇数倍に選択することにより極小の
反射率、すなわち極大の透過率を得ることが知られてい
る。なお、ここで言う光学的膜厚とは、被膜形成材料の
屈折率とこの被膜の膜厚の積で与えられるものである。
また、基材上に複数の層膜を形成しても反射防止膜を構
成することが可能であり、この場合の層膜の膜厚の選択
に関してはいくつかの提案がされている（たとえば光学
技術コンタクト Vol.9,No.8,第１７頁（１９７１））。
これら反射防止膜は、被膜形成材料が主として無機酸化
物あるいは無機ハロゲン化物であり、一般的に可視光領
域での低い反射率と高い透過率とを兼ね備えている。2. Description of the Related Art For example, when an object is viewed through a transparent material such as a spectacle lens, a phenomenon called a ghost or a flare occurs in which a reflected image clearly appears when reflected light is strong. Further, in a window glass or a show window, ambient light, for example, sunlight or illumination light, may be specularly reflected, so that a reflection phenomenon may occur, which may hinder transparency and the like. In order to prevent this, conventionally, an antireflection film made of a material having a different refractive index from that of the base material is formed on the base material by using a vacuum evaporation method or the like. In this case, it is known that it is important to select the thickness of the substance that coats the base material in order to maximize the antireflection effect. For example, in the case of a single-layer film, a substance having a lower refractive index than that of the substrate is used for the optical wavelength of 1 for the optical film thickness.
It is known that a minimum reflectance, that is, a maximum transmittance can be obtained by selecting / 4 or an odd multiple thereof. Here, the optical film thickness is given by the product of the refractive index of the film forming material and the film thickness of this film.
Further, even if a plurality of layer films are formed on the base material, the antireflection film can be formed. In this case, some proposals have been made regarding the selection of the film thickness of the layer film (for example, optical film). Technical Contact Vol. 9, No. 8, page 17 (1971)).
These antireflection films are mainly made of inorganic oxides or inorganic halides, and generally have both low reflectance and high transmittance in the visible light region.
【０００３】ところで、ブラウン管や液晶表示装置等の
表示装置においても、外光や照明光が画面内に映り込ん
で画像が見えにくくなる場合があり、多くの場合、画像
を表示するパネル基材表面上にはこのような表面反射を
防止する反射防止膜が形成されている。一方、表示装置
ではその構造や用途により、たとえばコントラストを向
上させるためにパネル基材における光の透過率を広い範
囲、たとえば２０〜９２％で調整する必要がある。たと
えばブラウン管のパネルガラスや透過型プロジェクタ
（リアプロジェクタ）のアクリル樹脂で構成された前面
板等のパネル基材では、パネル基材自体の光の透過率を
変えて透過率の調整を行っている。[0003] Even in a display device such as a cathode ray tube or a liquid crystal display device, an image may be difficult to see due to external light or illumination light reflected on the screen. An anti-reflection film for preventing such surface reflection is formed thereon. On the other hand, in the display device, depending on its structure and application, it is necessary to adjust the light transmittance of the panel base material in a wide range, for example, 20 to 92% in order to improve the contrast. For example, in a panel substrate such as a CRT panel glass or a front plate made of an acrylic resin of a transmission type projector (rear projector), the transmittance is adjusted by changing the light transmittance of the panel substrate itself.
【０００４】しかしながら、画像を表示するパネル基材
には表示デバイスとしての機械的な強度を保つ役割があ
り、表示装置が大型化して厚くなったパネル基材の光の
透過率を変える方法としては、パネル基材を、たとえば
染色の度合いや顔料の濃度を変える等してその透過率を
変えた多種類のパネル基材を用意する必要があった。さ
らに、たとえばブラウン管のパネル基材であるパネルガ
ラスでは機械強度の関係から中央部が薄く端部が厚くな
っており、パネルガラス自身で光の透過率を調整する方
法では中央部と端部とで光の透過率が異なると言う問題
を抱えていた。とくに、近年のように画像を表示する表
示面を実質的に平面にしたブラウン管では機械的な強度
を補強するため、さらに中央部と端部の光の透過率の差
がさらに大となる。However, a panel base material for displaying an image has a role of maintaining mechanical strength as a display device, and a method of changing the light transmittance of a panel base material having a large and thick display device has been proposed. It has been necessary to prepare various types of panel base materials having different transmittances, for example, by changing the degree of dyeing or the concentration of the pigment. Further, for example, in the case of panel glass, which is a panel base material of a cathode ray tube, the central portion is thin and the edge portion is thick because of the mechanical strength, and in the method of adjusting the light transmittance by the panel glass itself, the central portion and the edge portion are different. There was a problem that the light transmittance was different. In particular, in a cathode ray tube in which a display surface for displaying an image is substantially flat as in recent years, the difference in light transmittance between the central portion and the end portion is further increased in order to reinforce mechanical strength.
【０００５】光学薄膜を利用した熱線遮断フィルムの中
には、金属薄膜を使用することによって光吸収膜を形成
し、光の透過率を調整できるものがある。光吸収膜の構
成材の一例を挙げればＡｕ、Ｐｔ、Ｐｄ、Ｎｉ−Ｃｒ、
Ａｌ、Ｉｎ2 Ｏ3 −ＳｎＯ2、ＣｕＩ、ＣｕＳ等があ
る。これらの熱線遮断フィルムの可視光透過率としては
６０〜９０％のものが好ましく使用されている。このよ
うな光吸収膜を反射防止膜として応用した事例にはダー
クミラー、選択吸収ミラー、増強吸収ミラー等がある。
可視光領域での反射防止膜としてはダークミラーと称さ
れる構成が利用でき、「光学薄膜ユーザーズハンドブッ
ク（日刊工業新聞社刊）」の１６０頁には光吸収膜と誘
電体膜とを組み合わせた２層のダークミラーが記載され
ている。また、特開平９−１５６９６４号公報には、光
吸収膜としてＴｉＮ、ＺｒＮ、ＨｆＮ等の金属窒化物を
使用することにより、可視光領域の広い範囲で低反射率
が得られることが記載されている。さらに、米国特許第
５，０９１，２４４号には、光吸収膜として金属もしく
は金属窒化物を用いた４〜６層構造の反射防止膜によ
り、可視光領域での低反射率を維持しつつ光透過率調整
を可能とする記載がある。[0005] Among heat ray blocking films using an optical thin film, there is a film in which a light absorbing film is formed by using a metal thin film so that light transmittance can be adjusted. Au, Pt, Pd, Ni-Cr,
Al, In 2 O 3 -SnO 2 , CuI, there is CuS and the like. Those having a visible light transmittance of 60 to 90% are preferably used for these heat ray blocking films. Examples of applying such a light absorbing film as an antireflection film include a dark mirror, a selective absorption mirror, and an enhanced absorption mirror.
As an antireflection film in the visible light region, a configuration called a dark mirror can be used. On page 160 of "Optical Thin Film User's Handbook (published by Nikkan Kogyo Shimbun)", a light absorbing film and a dielectric film are combined. A two-layer dark mirror is described. Also, Japanese Patent Application Laid-Open No. 9-156964 describes that by using a metal nitride such as TiN, ZrN, or HfN as a light absorbing film, a low reflectance can be obtained in a wide range of a visible light region. I have. Further, US Pat. No. 5,091,244 discloses an antireflection film having a four to six-layer structure using a metal or a metal nitride as a light absorbing film, and maintains light reflectance in a visible light region while maintaining low reflectance. There is a description that enables transmittance adjustment.
【０００６】しかしながら、上記した光吸収膜として用
いられる物質を反射防止膜として一部に用いた場合、上
記した特開平９−１５６９６４号公報に記載された事例
の場合では、表面の反射率が十分低いのに対してパネル
基材内面からの光に対する反射率は５〜１０％と高くな
る。表示装置においてこのようなパネル基材内面からの
光を反射することは、表示文字や画像を二重に写したり
（ゴースト）輪郭をぼかしてしまう等して表示品質を著
しく劣化させる虞がある。また、上記した米国特許第
５，０９１，２４４号に記載された事例の場合では、光
の透過率を制御した上で表面反射を減らす手法について
の示唆はあるものの、表示装置において重要であるパネ
ル基材内面からの反射を低減させることの考慮がないた
め、パネル基材内面からの光の反射率が８〜２０％と大
となり、問題となる。However, when the above-mentioned substance used as the light absorbing film is partially used as the antireflection film, in the case described in JP-A-9-156964, the reflectance of the surface is not sufficient. On the other hand, the reflectance for light from the inner surface of the panel base material is as high as 5 to 10%. Reflection of such light from the inner surface of the panel base material in the display device may significantly degrade the display quality by, for example, duplicating displayed characters and images or blurring the ghost. Further, in the case of the case described in US Pat. No. 5,091,244 described above, although there is a suggestion on a method of reducing surface reflection while controlling light transmittance, a panel which is important in a display device is suggested. Since there is no consideration to reduce the reflection from the inner surface of the base material, the reflectance of light from the inner surface of the panel base material becomes as large as 8 to 20%, which is a problem.
【０００７】パネル基材内面における光の反射は、ブラ
ウン管のようなパネル基材の光の透過率が３５〜６０％
のように低い場合、内面反射光がパネル基材の中を３回
通ることにより減衰されて大きな問題とならないが、パ
ネル基材の光の透過率が６０％以上、たとえばブラウン
管のパネル基材の中では、ＥＩＡＪ ＥＤ−２１３８に
示されているクリア（透過率７５％以上）もしくはグレ
ー（透過率６０〜７５％）を使用する場合、無視できな
い程大きな問題点となる。The reflection of light on the inner surface of the panel substrate is such that the light transmittance of the panel substrate such as a CRT is 35 to 60%.
In this case, the internal reflected light is attenuated by passing through the panel substrate three times, which is not a serious problem. However, the light transmittance of the panel substrate is 60% or more, for example, the panel substrate of a cathode ray tube. Among them, when clear (transmissivity of 75% or more) or gray (transmissivity of 60 to 75%) shown in EIAJ ED-2138 is used, a serious problem that cannot be ignored.
【０００８】[0008]
【発明が解決しようとする課題】本発明の課題は、広い
範囲で光の透過率調整が可能である反射防止膜を提供す
るとともに、良好な表示品質を有する表示装置を提供す
ることである。SUMMARY OF THE INVENTION An object of the present invention is to provide an antireflection film capable of adjusting light transmittance in a wide range and a display device having good display quality.
【０００９】[0009]
【課題を解決するための手段】上記課題を解決するため
に、本発明の反射防止膜では、基材上に複数の薄膜を積
層した多層構造を有する反射防止膜において、基材上に
形成される複数の薄膜が、少なくとも金属膜、金属窒化
膜および金属酸化膜のうちの何れか１種で構成された第
１の光吸収膜と、少なくとも金属膜、金属窒化膜および
金属酸化膜のうちの何れか１種で構成された第２の光吸
収膜と、第１の光吸収膜と第２の光吸収膜との間に形成
された誘電体膜とを有し、この誘電体膜が、２層の低屈
折率層と、この２層の低屈折率層の間に形成された高屈
折率層とを有することを特徴とする。In order to solve the above-mentioned problems, an antireflection film according to the present invention is an antireflection film having a multilayer structure in which a plurality of thin films are laminated on a substrate. A plurality of thin films formed of at least one of a metal film, a metal nitride film, and a metal oxide film, and at least a metal film, a metal nitride film, and a metal oxide film. A second light-absorbing film made of any one of them, and a dielectric film formed between the first light-absorbing film and the second light-absorbing film; It is characterized by having two low refractive index layers and a high refractive index layer formed between the two low refractive index layers.
【００１０】本発明の表示装置では、画像を表示するパ
ネル基材の表面上に、少なくとも金属膜、金属窒化膜お
よび金属酸化膜のうちの何れか１種で構成された第１の
光吸収膜と、少なくとも金属膜、金属窒化膜および金属
酸化膜のうちの何れか１種で構成された第２の光吸収膜
と、第１の光吸収膜と第２の光吸収膜との間に形成され
た誘電体膜とを有する反射防止膜が形成され、２層の光
吸収膜の間に形成された誘電体膜が、２層の低屈折率層
と、この２層の低屈折率層の間に形成された高屈折率層
とを有することを特徴とする。[0010] In the display device of the present invention, the first light absorbing film made of at least one of a metal film, a metal nitride film and a metal oxide film is formed on the surface of the panel substrate for displaying an image. And a second light absorbing film made of at least one of a metal film, a metal nitride film and a metal oxide film, and formed between the first light absorbing film and the second light absorbing film. An anti-reflection film having a dielectric film formed is formed, and the dielectric film formed between the two light absorbing films is formed of two low refractive index layers and two low refractive index layers. And a high refractive index layer formed therebetween.
【００１１】そして上記した反射防止膜および表示装置
の望ましい実施態様としては、２層の低屈折率層の光学
的膜厚が何れも可視光領域における波長のほぼ３／３２
であり、高屈折率層の光学的膜厚が前記の波長のほぼ１
／１６であり、且つこれらの合計の膜厚が前記の波長の
ほぼ１／４のものである。In a preferred embodiment of the above-described antireflection film and display device, the optical thickness of each of the two low refractive index layers is approximately 3/32 of the wavelength in the visible light region.
And the optical thickness of the high refractive index layer is approximately 1
/ 16, and the total thickness of these is approximately １ ／ of the wavelength.
【００１２】表示装置のパネル基材には、ガラスや合成
樹脂材料が用いられる。ガラスの一例を挙げればソーダ
ガラス、鉛ガラス、硬質ガラス、石英ガラス、液晶化ガ
ラス等があり、ブラウン管ではストロンチウムやバリウ
ムを含む珪酸ガラスが好ましく用いられ、液晶表示装置
では無アルカリガラスが好ましく用いられる。合成樹脂
材料としては有機高分子からなる基材であればいかなる
ものを用いても良いが、透明性、屈折率、分散等の光学
特性さらに耐衝撃性、耐熱性、耐久性等の諸特性からみ
て、とくにポリメチルメタアクリレート、メチルメタク
リレートと他のアルキル（メタ）アクリレート、スチレ
ン等のビニルモノマーとの共重合体等の（メタ）アクリ
ル系樹脂、ポリカーボネート、ジエチレングリコールビ
スアリルカーボネート（ＣＲ−３９）等のポリカーボネ
ート系樹脂、（臭素化）ビスフェノールＡ型のジ（メ
タ）アクリレートの単独重合体ないし共重合体、（臭素
化）ビスフェノールＡモノ（メタ）アクリレートのウレ
タン変性モノマーの重合体および共重合体等の熱硬化性
（メタ）アクリル系樹脂、ポリエステル、とくにポリエ
チレンテレフタレート、ポリエチレンナフタレートおよ
び不飽和ポリエステル、アクリロニトリル−スチレン共
重合体、ポリ塩化ビニル、ポリウレタン、エポキシ樹脂
等が好ましい。また、耐熱性を考慮したアラミド系樹脂
の使用も可能である。フィルム状の基材としては、上記
した合成樹脂材料を伸延あるいは溶剤に希釈後、フィル
ム状に成膜して乾燥する等の工程を経て作製することが
でき、厚さは通常２５〜５００μｍ程度である。Glass or a synthetic resin material is used for the panel base material of the display device. Examples of glass include soda glass, lead glass, hard glass, quartz glass, liquid crystallized glass, and the like. Silica glass containing strontium and barium is preferably used for a cathode ray tube, and non-alkali glass is preferably used for a liquid crystal display device. . As the synthetic resin material, any material may be used as long as it is a substrate made of an organic polymer, but from the viewpoint of optical properties such as transparency, refractive index, and dispersion, and various properties such as impact resistance, heat resistance, and durability. In particular, (meth) acrylic resins such as polymethyl methacrylate, copolymers of methyl methacrylate with other alkyl (meth) acrylates and vinyl monomers such as styrene, polycarbonate, diethylene glycol bisallyl carbonate (CR-39), etc. Polycarbonate resins, homopolymers or copolymers of (brominated) bisphenol A type di (meth) acrylate, polymers and copolymers of (brominated) bisphenol A mono (meth) acrylate urethane-modified monomer, etc. Thermoset (meth) acrylic resin, polyester, especially polyethylene Tallates, polyethylene naphthalate, and unsaturated polyesters, acrylonitrile - styrene copolymers, polyvinyl chloride, polyurethane, epoxy resins and the like are preferable. It is also possible to use an aramid resin in consideration of heat resistance. As a film-shaped substrate, the above synthetic resin material can be produced through a process of elongating or diluting it in a solvent, forming a film and drying the film, and the thickness is usually about 25 to 500 μm. is there.
【００１３】表示装置のパネル基材が合成樹脂材料で構
成される場合の表面は、特公昭５０−２８０９２号公
報、特公昭５０−２８４４６号公報、特公昭５１−２４
３６８号公報、特開昭５２−１１２６９８号公報、特公
昭５７−２７３５号公報に開示されているようなハード
コート等の被膜材料で被覆されているものであっても良
い。またパネル基材が合成樹脂材料で構成される場合、
無機物からなる反射防止膜の下層に存在する被覆材料に
よって、付着性、硬度、耐薬品性、耐久性、染色性等の
諸特性を向上させることも可能である。ハードコートの
膜厚は、通常３〜２０μｍ程度である。さらに表示装置
のパネル基材は、カーボンブラック等の顔料や染料等に
より着色されたものでも良く、この場合特公平７−３６
０４４号公報に開示されているように、特定の波長の光
を選択的に吸収する選択吸収フィルタとして用いること
も可能である。When the panel substrate of the display device is made of a synthetic resin material, the surface of the display device is disclosed in Japanese Patent Publication No. 50-28092, Japanese Patent Publication No. 50-28446, and Japanese Patent Publication No. 51-24.
It may be coated with a coating material such as a hard coat as disclosed in JP-A-368-368, JP-A-52-112698, and JP-B-57-2735. If the panel base is made of synthetic resin material,
Various properties such as adhesion, hardness, chemical resistance, durability, and dyeing properties can be improved by a coating material present below the inorganic antireflection film. The thickness of the hard coat is usually about 3 to 20 μm. Further, the panel base material of the display device may be colored with a pigment or a dye such as carbon black.
As disclosed in Japanese Patent No. 044, it is also possible to use as a selective absorption filter for selectively absorbing light of a specific wavelength.
【００１４】光吸収膜を含む反射防止膜の形成には、真
空蒸着法、イオンプレーティング法、スパッタリング法
等に代表される各種ＰＶＤ(Physical Vapor Deposition
)法がある。このＰＶＤ法に適する光吸収膜用の材料の
一例を挙げればＡｕ、Ｐｔ、Ｐｄ、Ｆｅ、Ｆｅ−Ｎｉ、
Ｎｉ−Ｃｒ、Ｎｉ−Ｖ、Ａｌ、Ａｇ、Ｃｒ、Ｆｅ−Ｃ
ｒ、Ｃｕ、Ｔｉ、Ｚｒ、Ｈｆ等の金属およびその窒化物
や酸化物がある。また、誘電体膜の構成材の一例を挙げ
ればＳｉＯ2 、ＳｉＯ、Ｓｉ3 Ｎ4 、Ａｌ2 Ｏ3、Ｚｒ
Ｏ2 、ＴｉＯ2 、Ｔａ2 Ｏ5 、ＴａＨｆ2 、ＴｉＯ、Ｔ
ｉ2 Ｏ3 、ＨｆＯ2 、ＺｎＯ、Ｉｎ2 Ｏ3 、Ｉｎ2 Ｏ3
／ＳｎＯ2 、Ｙ2 Ｏ3 、Ｙｂ2 Ｏ3 、Ｓｂ2 Ｏ3 、Ｍｇ
Ｏ、ＣｅＯ2 等の無機酸化物および無機窒化物がある。For forming the antireflection film including the light absorbing film, various kinds of PVD (Physical Vapor Deposition) represented by a vacuum deposition method, an ion plating method, a sputtering method and the like are used.
) There is a law. Au, Pt, Pd, Fe, Fe-Ni, Au, Pt, Pd,
Ni-Cr, Ni-V, Al, Ag, Cr, Fe-C
There are metals such as r, Cu, Ti, Zr, Hf, and nitrides and oxides thereof. Further, examples of constituent materials of the dielectric film include SiO 2 , SiO, Si 3 N 4 , Al 2 O 3 , and Zr.
O 2 , TiO 2 , Ta 2 O 5 , TaHf 2 , TiO, T
i 2 O 3 , HfO 2 , ZnO, In 2 O 3 , In 2 O 3
/ SnO 2 , Y 2 O 3 , Yb 2 O 3 , Sb 2 O 3 , Mg
There are inorganic oxides and inorganic nitrides such as O and CeO 2 .
【００１５】また、反射防止膜の中に、特開昭５９−１
６５００１号公報や特開平９−１５６９６４号公報に開
示されているように、光吸収膜の酸化を防止する酸化バ
リア層を挿入しても良い。この場合の酸化バリア層を構
成する材料としては、各種の金属および金属窒化物、た
とえばＳｉ3 Ｎ4 、ＡｌＮ等を用いることができる。こ
の酸化バリア層は光学的には不必要な層であり、反射防
止特性の劣化を防止するため２０ｎｍ以下の膜厚である
ことが好ましい。さらにパネル基材が合成樹脂材料であ
る場合には、パネル基材と反射防止膜との密着性を向上
させるために、米国特許第２，６２８，９２７号や特公
平３−８１１２１号公報に開示されているように、Ｓｉ
Ｏ2 や金属酸化物および硫化物を反射防止膜の第１層
（接着剤層）として極めて薄く形成しても良い。Further, in the antireflection film, Japanese Patent Application Laid-Open No.
As disclosed in JP-A-65001 and JP-A-9-156964, an oxidation barrier layer for preventing oxidation of the light absorbing film may be inserted. In this case, as a material constituting the oxidation barrier layer, various metals and metal nitrides such as Si 3 N 4 and AlN can be used. This oxidation barrier layer is an optically unnecessary layer, and preferably has a thickness of 20 nm or less in order to prevent deterioration of the antireflection characteristics. Further, when the panel substrate is a synthetic resin material, it is disclosed in U.S. Pat. No. 2,628,927 and Japanese Patent Publication No. 3-81121 in order to improve the adhesion between the panel substrate and the antireflection film. As has been described,
O 2 , metal oxides and sulfides may be formed very thin as the first layer (adhesive layer) of the antireflection film.
【００１６】上述した手段によれば、最小限の層数で良
好な反射防止機能を有する反射防止膜の提供が可能であ
り、この反射防止膜を画像を表示するパネル基材表面に
形成した表示装置では、従来のように光の透過率を変え
た多種類のパネル基材を用意する必要がなく、広い範囲
で光の透過率を調整することができる。また、表示装置
の機械強度に関わらず、画像を表示するパネル基材表面
全面に均一な透過率を得ることができるので、内面反射
によるゴーストやフレア等が発生せず、良好な表示品質
を有する表示装置の提供が可能となる。According to the above-described means, it is possible to provide an anti-reflection film having a good anti-reflection function with a minimum number of layers, and a display in which this anti-reflection film is formed on the surface of a panel substrate for displaying an image In the apparatus, it is not necessary to prepare various types of panel base materials having different light transmittances as in the related art, and the light transmittance can be adjusted in a wide range. Also, regardless of the mechanical strength of the display device, a uniform transmittance can be obtained on the entire surface of the panel base material for displaying an image, so that ghosts and flares due to internal reflection do not occur, and good display quality is obtained. A display device can be provided.
【００１７】[0017]
【発明の実施の形態】本発明は基材上に複数の薄膜を積
層した多層構造を有する反射防止膜および画像を表示す
るパネル基材の表面上に複数の薄膜を積層した多層構造
を有する反射防止膜が形成された表示装置に適用するこ
とができる。以下、本発明を適用した具体的な一例とし
て、パネル基材として表示面の中央部における厚さが１
２ｍｍであるブラウン管用パネルガラス（クリアガラス
ＥＩＡＪ Ｈ−８６０１）の表面上に反射防止膜を形成
した事例の実施例について説明する。なお、本発明がこ
れに限定されないことは言うまでもない。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an antireflection film having a multilayer structure in which a plurality of thin films are laminated on a substrate, and a reflection film having a multilayer structure in which a plurality of thin films are laminated on the surface of a panel substrate for displaying an image. The present invention can be applied to a display device provided with a protective film. Hereinafter, as a specific example to which the present invention is applied, as a panel base material, the thickness at the center of the display surface is 1
An example in which an anti-reflection film is formed on the surface of a 2 mm CRT panel glass (clear glass EIAJ H-8601) will be described. Needless to say, the present invention is not limited to this.
【００１８】実施例１ 本実施例は、ブラウン管用パネルガラス上に順次、厚さ
１０ｎｍのＴｉＮで構成された第１の光吸収膜、この第
１の光吸収膜上に厚さ３３ｎｍのＳｉＯ2 で構成された
低屈折率の誘電体膜、この低屈折率の誘電体膜上に厚さ
１５ｎｍのＳｎＯ2 で構成された高屈折率の誘電体膜、
この高屈折率の誘電体膜上に厚さ３３ｎｍのＳｉＯ2 で
構成された低屈折率の誘電体膜、この低屈折率の誘電体
膜上に厚さ１２ｎｍのＴｉＮで構成された第２の光吸収
膜、この第２の光吸収膜上に厚さ８８ｎｍのＳｉＯ2 で
構成された誘電体膜を形成し、６層の反射防止膜を形成
した事例である。なお、低屈折率の誘電体膜（Ｓｉ
Ｏ2 ）の膜厚３３ｎｍは可視光領域の波長、たとえば５
１０ｎｍのほぼ３／３２の光学的膜厚に相当し、高屈折
率の誘電体膜（ＳｎＯ2 ）の膜厚１５ｎｍは前記した波
長のほぼ１／１６の光学的膜厚に相当し、これらの合計
の膜厚は前記した波長のほぼ１／４となっていることが
望ましい。この膜厚において表面反射および内面反射の
何れも低く抑えることが可能となる。Embodiment 1 In this embodiment, a first light-absorbing film composed of TiN having a thickness of 10 nm is sequentially formed on a panel glass for a cathode ray tube, and a SiO 2 film having a thickness of 33 nm is formed on the first light-absorbing film. A low-refractive-index dielectric film composed of: a high-refractive-index dielectric film composed of SnO 2 having a thickness of 15 nm on the low-refractive-index dielectric film;
A low-refractive-index dielectric film made of SiO 2 having a thickness of 33 nm on the high-refractive-index dielectric film, and a second film made of TiN having a thickness of 12 nm on this low-refractive-index dielectric film. This is an example in which a dielectric film made of SiO 2 having a thickness of 88 nm is formed on the light absorbing film and the second light absorbing film, and six antireflection films are formed. Note that a low refractive index dielectric film (Si
The thickness of O 2 ) of 33 nm is a wavelength in the visible light region, for example, 5 nm.
An optical film thickness of about 3/32 of 10 nm corresponds to an optical film thickness of 15 / nm for a high refractive index dielectric film (SnO 2 ), which corresponds to an optical film thickness of about 1/16 of the above-mentioned wavelength. It is desirable that the total film thickness is approximately １ ／ of the above-mentioned wavelength. At this film thickness, both surface reflection and internal reflection can be suppressed to a low level.
【００１９】比較例１ 本比較例は、ブラウン管用パネルガラス上に順次、厚さ
１０ｎｍのＴｉＮで構成された第１の光吸収膜、この第
１の光吸収膜上に厚さ８７ｎｍのＳｉＯ2 で構成された
誘電体膜を形成し、２層の反射防止膜を形成した事例で
ある。すなわち、第２の光吸収膜を形成せず且つ誘電体
膜が、２層の低屈折率層と、この２層の低屈折率層の間
に形成された高屈折率層とを有しない事例である。Comparative Example 1 In this comparative example, a first light absorbing film composed of 10 nm thick TiN was sequentially formed on a CRT panel glass, and a 87 nm thick SiO 2 film was formed on the first light absorbing film. This is an example in which a dielectric film composed of is formed and a two-layer antireflection film is formed. That is, a case where the second light absorption film is not formed and the dielectric film does not include two low refractive index layers and a high refractive index layer formed between the two low refractive index layers. It is.
【００２０】比較例２ 本比較例は、ブラウン管用パネルガラス上に順次、厚さ
１９．９ｎｍのＴｉＮで構成された第１の光吸収膜、こ
の第１の光吸収膜上に厚さ３０ｎｍのＴｉＯ2で構成さ
れた誘電体膜、この誘電体膜上に厚さ６．７ｎｍのＴｉ
Ｎで構成された第２の光吸収膜、この第２の光吸収膜上
に厚さ８２．２ｎｍのＳｉＯ2 で構成された誘電体膜を
形成し、４層の反射防止膜を形成した事例である。すな
わち、第１の光吸収膜と第２の光吸収膜との間に形成さ
れた誘電体膜が、２層の低屈折率層と、この２層の低屈
折率層の間に形成された高屈折率層とを有しない事例で
ある。Comparative Example 2 In this comparative example, a first light absorbing film made of TiN having a thickness of 19.9 nm was sequentially formed on a panel glass for a cathode ray tube, and a 30 nm thick light absorbing film was formed on the first light absorbing film. Dielectric film composed of TiO 2 , 6.7 nm thick Ti on this dielectric film
Example in which a second light absorbing film made of N, a dielectric film made of SiO 2 having a thickness of 82.2 nm is formed on the second light absorbing film, and four antireflection films are formed. It is. That is, the dielectric film formed between the first light absorbing film and the second light absorbing film was formed between the two low refractive index layers and the two low refractive index layers. This is an example in which a high refractive index layer is not provided.
【００２１】上記した実施例１、比較例１，２の反射防
止膜を計算機によりシュミレーションした結果を表１に
示す。このときの膜材料の複素屈折率は、複素屈折率＝
（ｎ−ｉｋ）として下記の表２に示した数値を用いた。
なお、誘電体においてはｋ＝０となる。Table 1 shows the results of simulating the antireflection films of Example 1 and Comparative Examples 1 and 2 by a computer. The complex refractive index of the film material at this time is represented by the complex refractive index =
The values shown in Table 2 below were used as (n-ik).
Note that k = 0 for a dielectric.
【００２２】[0022]
【表１】 [Table 1]
【００２３】[0023]
【表２】 [Table 2]
【００２４】表１から明らかなように、本発明を適用し
た実施例１における表面反射の視感反射率は０．２％、
内面反射の視感反射率は０．６％、波長５４６ｎｍの光
における透過率は５２％であり、表示装置としての要求
を満足する良好な結果を示した。これに対して、比較例
１，２における表面反射の視感反射率は０．１％と低く
抑えられているものの、内面反射の視感反射率が比較例
１では６．６％、比較例２では１６．８％と高く、表示
装置としての要求を満足する結果を示さなかった。As is clear from Table 1, the luminous reflectance of surface reflection in Example 1 to which the present invention was applied was 0.2%,
The luminous reflectance of the internal reflection was 0.6%, and the transmittance for light having a wavelength of 546 nm was 52%, showing a good result satisfying the requirements as a display device. On the other hand, the luminous reflectance of surface reflection in Comparative Examples 1 and 2 was suppressed to as low as 0.1%, but the luminous reflectance of internal reflection was 6.6% in Comparative Example 1, and the luminous reflectance of Comparative Example 1 was In No. 2, the result was as high as 16.8%, and did not show the result satisfying the requirement as the display device.
【００２５】[0025]
【発明の効果】本発明の反射防止膜によれば、最小限の
層数で良好な反射防止機能を有する反射防止膜の提供が
可能となる。そしてこの反射防止膜を画像を表示するパ
ネル基材表面に形成した表示装置には、以下のような効
果がある。 （１）従来のように光透過率を変えた多種類のパネル基
材を用意する必要がなく、広い範囲で光の透過率を調整
することができる。 （２）内面反射によるゴーストやフレア等が発生せず、
良好な表示品質を有する表示装置の提供が可能となる。 （３）表示装置の機械強度に関わらず、画像を表示する
パネル基材表面全面に均一な光の透過率を得ることがで
きる。According to the antireflection film of the present invention, it is possible to provide an antireflection film having a good antireflection function with a minimum number of layers. The display device in which the antireflection film is formed on the surface of the panel base material for displaying an image has the following effects. (1) It is not necessary to prepare various types of panel base materials having different light transmittances as in the related art, and the light transmittance can be adjusted in a wide range. (2) No ghost or flare due to internal reflection occurs,
A display device having good display quality can be provided. (3) Irrespective of the mechanical strength of the display device, a uniform light transmittance can be obtained over the entire surface of the panel substrate on which an image is displayed.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 小林 政広 東京都品川区北品川６丁目７番35号 ソニ ー株式会社内 Ｆターム(参考） 2K009 AA07 CC02 CC03 CC14 ────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Masahiro Kobayashi F-term (reference) 2K009 AA07 CC02 CC03 CC14 within 6-35 Kita Shinagawa, Shinagawa-ku, Tokyo
Claims (4)
を有する反射防止膜において、 前記薄膜が、 少なくとも金属膜、金属窒化膜および金属酸化膜のうち
の何れか１種で構成された第１の光吸収膜と、 少なくとも金属膜、金属窒化膜および金属酸化膜のうち
の何れか１種で構成された第２の光吸収膜と、 前記第１の光吸収膜と前記第２の光吸収膜との間に形成
された誘電体膜とを有し、 前記誘電体膜が、 ２層の低屈折率層と、 前記２層の低屈折率層の間に形成された高屈折率層とを
有することを特徴とする反射防止膜。1. An antireflection film having a multilayer structure in which a plurality of thin films are stacked on a substrate, wherein the thin film is formed of at least one of a metal film, a metal nitride film, and a metal oxide film. A first light absorbing film, a second light absorbing film composed of at least one of a metal film, a metal nitride film, and a metal oxide film; the first light absorbing film and the second light absorbing film; A dielectric film formed between the light-absorbing film and the light-absorbing film, wherein the dielectric film comprises two low-refractive-index layers; and a high-refractive-index formed between the two low-refractive-index layers. An anti-reflection film comprising:
何れも可視光領域における波長のほぼ３／３２であり、 前記高屈折率層の光学的膜厚が、前記波長のほぼ１／１
６であり、 且つ前記２層の低屈折率層の光学的膜厚と前記高屈折率
層の光学的膜厚との和が前記波長のほぼ１／４であるこ
とを特徴とする請求項１に記載の反射防止膜。2. An optical film thickness of the two low refractive index layers,
Each is approximately 3/32 of the wavelength in the visible light region, and the optical thickness of the high refractive index layer is approximately 1/1 of the wavelength.
The sum of the optical thickness of the two low refractive index layers and the optical thickness of the high refractive index layer is approximately 1/4 of the wavelength. 2. The antireflection film according to 1.
の何れか１種で構成された第１の光吸収膜と、 少なくとも金属膜、金属窒化膜および金属酸化膜のうち
の何れか１種で構成された第２の光吸収膜と、 前記第１の光吸収膜と前記第２の光吸収膜との間に形成
された誘電体膜とを有する反射防止膜が形成され、 前記誘電体膜が、 ２層の低屈折率層と、 前記２層の低屈折率層の間に形成された高屈折率層とを
有することを特徴とする表示装置。3. A first light-absorbing film composed of at least one of a metal film, a metal nitride film and a metal oxide film on a surface of a panel substrate for displaying an image, and at least a metal film. A second light absorbing film formed of any one of a metal nitride film and a metal oxide film; and a dielectric formed between the first light absorbing film and the second light absorbing film. An anti-reflection film having a body film is formed, and the dielectric film has two low-refractive-index layers and a high-refractive-index layer formed between the two low-refractive-index layers. Characteristic display device.
何れも可視光領域における波長のほぼ３／３２であり、 前記高屈折率層の光学的膜厚が、前記波長のほぼ１／１
６であり、 且つ前記２層の低屈折率層の光学的膜厚と前記高屈折率
層の光学的膜厚との和が前記波長のほぼ１／４であるこ
とを特徴とする請求項３に記載の表示装置。4. An optical film thickness of the two low refractive index layers,
Each is approximately 3/32 of the wavelength in the visible light region, and the optical thickness of the high refractive index layer is approximately 1/1 of the wavelength.
6. The sum of the optical thickness of the two low refractive index layers and the optical thickness of the high refractive index layer is approximately ４ of the wavelength. The display device according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10348530A JP2000171605A (en) | 1998-12-08 | 1998-12-08 | Antireflection film and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10348530A JP2000171605A (en) | 1998-12-08 | 1998-12-08 | Antireflection film and display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000171605A true JP2000171605A (en) | 2000-06-23 |
Family
ID=18397638
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10348530A Pending JP2000171605A (en) | 1998-12-08 | 1998-12-08 | Antireflection film and display device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000171605A (en) |
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