JP2000171601A - Antireflection film and display device - Google Patents

Antireflection film and display device

Info

Publication number
JP2000171601A
JP2000171601A JP10348529A JP34852998A JP2000171601A JP 2000171601 A JP2000171601 A JP 2000171601A JP 10348529 A JP10348529 A JP 10348529A JP 34852998 A JP34852998 A JP 34852998A JP 2000171601 A JP2000171601 A JP 2000171601A
Authority
JP
Japan
Prior art keywords
film
light
light absorbing
metal
display device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10348529A
Other languages
Japanese (ja)
Inventor
Hideaki Hanaoka
英章 花岡
Fumiaki Hisamatsu
史明 久松
Naotaka Yamashita
尚孝 山下
Masahiro Kobayashi
政広 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP10348529A priority Critical patent/JP2000171601A/en
Priority to TW088120267A priority patent/TW428107B/en
Priority to NL1013664A priority patent/NL1013664C2/en
Priority to SG9906001A priority patent/SG85155A1/en
Priority to GB9928967A priority patent/GB2344600B/en
Priority to KR1019990055368A priority patent/KR100636773B1/en
Publication of JP2000171601A publication Critical patent/JP2000171601A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/361—Coatings of the type glass/metal/inorganic compound/metal/inorganic compound/other
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3615—Coatings of the type glass/metal/other inorganic layers, at least one layer being non-metallic
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3642—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing a metal layer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an antireflection film which can control the transmittance for light in a wide range and to provide a display device having good display quality. SOLUTION: This device has features that an antireflection film is formed on the surface of a panel base body which displays an image and that the antireflection film has first and second light-absorbing films consisting of at least one kind selected from metal films, metal nitride films and metal oxide films and has a dielectric film having the refractive index between >=1.4 and <=1.9 formed between the first and second light-absorbing films. For example, an antireflection film consisting of a TiN first light-absorbing film having 10 nm thickness, an Al2O3 dielectric film having 82 nm thickness formed on the first light-absorbing film, and a TiN second light-absorbing film having 12 nm thickness formed on the dielectric film is successively formed on a panel glass of a cathode ray tube.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【０００１】[0001]

【発明の属する技術分野】本発明は反射防止膜および表
示装置に関し、さらに詳しくは、外光反射を防止する反
射防止膜および画像を表示するパネル基材の表面に反射
防止膜が形成された表示装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antireflection film and a display device, and more particularly, to an antireflection film for preventing reflection of external light and a display having an antireflection film formed on a surface of a panel substrate for displaying an image. Related to the device.

【０００２】[0002]

【従来の技術】たとえば眼鏡用レンズのように透明材料
を通して物を見るものでは、反射光が強い場合に反射像
が明瞭に現れるゴーストやフレア等と称される現象が生
じる。また、窓ガラスやショーウインドウでは周囲の
光、たとえば太陽光や照明光を鏡面反射することがあ
り、そのため映り込み現象が生じ、透明性等に支障をき
たす場合がある。これを防止するため、従来より真空蒸
着法等を用いて基材上にこの基材と屈折率が異なる材料
で構成された反射防止膜を形成することが行われてい
る。この場合、反射防止効果を最も大とするためには基
材を被覆する物質の厚みを選択することが重要であるこ
とが知られている。たとえば単層被膜においては基材よ
り低屈折率の物質を光学的膜厚を対象とする光波長の１
／４、あるいはこの奇数倍に選択することにより極小の
反射率、すなわち極大の透過率を得ることが知られてい
る。なお、ここで言う光学的膜厚とは、被膜形成材料の
屈折率とこの被膜の膜厚の積で与えられるものである。
また、基材上に複数の層膜を形成しても反射防止膜を構
成することが可能であり、この場合の層膜の膜厚の選択
に関してはいくつかの提案がされている（たとえば光学
技術コンタクト Vol.9,No.8,第１７頁（１９７１））。
これら反射防止膜は、被膜形成材料が主として無機酸化
物あるいは無機ハロゲン化物であり、一般的に可視光領
域での低い反射率と高い透過率とを兼ね備えている。2. Description of the Related Art For example, when an object is viewed through a transparent material such as a spectacle lens, a phenomenon called a ghost or a flare occurs in which a reflected image clearly appears when reflected light is strong. Further, in a window glass or a show window, ambient light, for example, sunlight or illumination light, may be specularly reflected, so that a reflection phenomenon may occur, which may hinder transparency and the like. In order to prevent this, conventionally, an antireflection film made of a material having a different refractive index from that of the base material is formed on the base material by using a vacuum evaporation method or the like. In this case, it is known that it is important to select the thickness of the substance that coats the base material in order to maximize the antireflection effect. For example, in the case of a single-layer film, a substance having a lower refractive index than that of the substrate is used for the optical wavelength of 1 for the optical film thickness.
It is known that a minimum reflectance, that is, a maximum transmittance can be obtained by selecting / 4 or an odd multiple thereof. Here, the optical film thickness is given by the product of the refractive index of the film forming material and the film thickness of this film.
Further, even if a plurality of layer films are formed on the base material, the antireflection film can be formed. In this case, some proposals have been made regarding the selection of the film thickness of the layer film (for example, optical film). Technical Contact Vol. 9, No. 8, page 17 (1971)).
These antireflection films are mainly made of inorganic oxides or inorganic halides, and generally have both low reflectance and high transmittance in the visible light region.

【０００３】ところで、ブラウン管や液晶表示装置等の
表示装置においても外光や照明光が画面内に映り込んで
画像が見えにくくなる場合があり、多くの場合、画像を
表示するパネル基材表面上にはこのような表面反射を防
止する反射防止膜が形成されている。一方、表示装置で
はその構造や用途により、たとえばコントラストを向上
させるためにパネル基材における光の透過率を広い範
囲、たとえば２０〜９２％で調整する必要がある。たと
えばブラウン管のパネルガラスや透過型プロジェクタ
（リアプロジェクタ）のアクリル樹脂で構成された前面
板等のパネル基材では、パネル基材自体の光の透過率を
変えて透過率の調整を行っている。[0003] Even in a display device such as a cathode ray tube or a liquid crystal display device, external light or illumination light may be reflected on a screen to make it difficult to see an image. Is formed with an antireflection film for preventing such surface reflection. On the other hand, in the display device, depending on its structure and application, it is necessary to adjust the light transmittance of the panel base material in a wide range, for example, 20 to 92% in order to improve the contrast. For example, in a panel substrate such as a CRT panel glass or a front plate made of an acrylic resin of a transmission type projector (rear projector), the transmittance is adjusted by changing the light transmittance of the panel substrate itself.

【０００４】しかしながら、画像を表示するパネル基材
には表示デバイスとしての機械的な強度を保つ役割があ
り、表示装置が大型化して厚くなったパネル基材の光の
透過率を変える方法としては、パネル基材を、たとえば
染色の度合いや顔料の濃度を変える等してその透過率を
変えた多種類のパネル基材を用意する必要があった。さ
らに、たとえばブラウン管のパネル基材であるパネルガ
ラスでは機械強度の関係から中央部が薄く端部が厚くな
っており、パネルガラス自身で光の透過率を調整する方
法では中央部と端部とで光の透過率が異なると言う問題
を抱えていた。とくに、近年のように画像を表示する表
示面を実質的に平面にしたブラウン管では機械的な強度
を補強するため、さらに中央部と端部の光の透過率の差
がさらに大となる。However, a panel base material for displaying an image has a role of maintaining mechanical strength as a display device, and a method of changing the light transmittance of a panel base material having a large and thick display device has been proposed. It has been necessary to prepare various types of panel base materials having different transmittances, for example, by changing the degree of dyeing or the concentration of the pigment. Further, for example, in the case of panel glass, which is a panel base material of a cathode ray tube, the central portion is thin and the edge portion is thick because of the mechanical strength, and in the method of adjusting the light transmittance by the panel glass itself, the central portion and the edge portion are different. There was a problem that the light transmittance was different. In particular, in a cathode ray tube in which a display surface for displaying an image is substantially flat as in recent years, the difference in light transmittance between the central portion and the end portion is further increased in order to reinforce mechanical strength.

【０００５】光学薄膜を利用した熱線遮断フィルムの中
には、金属薄膜を使用することによって光吸収膜を形成
して光の透過率を調整できるものがある。光吸収膜の構
成材の一例を挙げればＡｕ、Ｐｔ、Ｐｄ、Ｎｉ−Ｃｒ、
Ａｌ、Ｉｎ2 Ｏ3 −ＳｎＯ2、ＣｕＩ、ＣｕＳ等があ
る。これらの熱線遮断フィルムの可視光透過率としては
６０〜９０％のものが好ましく使用されている。このよ
うな光吸収膜を反射防止膜として応用した事例にはダー
クミラー、選択吸収ミラー、増強吸収ミラー等がある。
可視光領域での反射防止膜としてはダークミラーと称さ
れる構成が利用でき、「光学薄膜ユーザーズハンドブッ
ク（日刊工業新聞社刊）」の１６０頁には光吸収膜と誘
電体膜とを組み合わせた２層のダークミラーが記載され
ている。また、特開平９−１５６９６４号公報には、光
吸収膜としてＴｉＮ、ＺｒＮ、ＨｆＮ等の金属窒化物を
使用することにより、可視光領域の広い範囲で低反射率
が得られることが記載されている。さらに、米国特許第
５，０９１，２４４号には、光吸収膜として金属もしく
は金属窒化物を用いた４〜６層構造の反射防止膜によ
り、可視光領域での低反射率を維持しつつ光透過率調整
を可能とする記載がある。Some heat ray blocking films using an optical thin film can adjust the light transmittance by forming a light absorbing film by using a metal thin film. Au, Pt, Pd, Ni-Cr,
Al, In 2 O 3 -SnO 2 , CuI, there is CuS and the like. Those having a visible light transmittance of 60 to 90% are preferably used for these heat ray blocking films. Examples of applying such a light absorbing film as an antireflection film include a dark mirror, a selective absorption mirror, and an enhanced absorption mirror.
As an antireflection film in the visible light region, a configuration called a dark mirror can be used. On page 160 of "Optical Thin Film User's Handbook (published by Nikkan Kogyo Shimbun)", a light absorbing film and a dielectric film are combined. A two-layer dark mirror is described. Also, Japanese Patent Application Laid-Open No. 9-156964 describes that by using a metal nitride such as TiN, ZrN, or HfN as a light absorbing film, a low reflectance can be obtained in a wide range of a visible light region. I have. Further, US Pat. No. 5,091,244 discloses an antireflection film having a four to six-layer structure using a metal or a metal nitride as a light absorbing film, and maintains light reflectance in a visible light region while maintaining low reflectance. There is a description that enables transmittance adjustment.

【０００６】しかしながら、上記した光吸収膜として用
いられる物質を反射防止膜として一部に用いた場合、上
記した特開平９−１５６９６４号公報に記載された事例
の場合では、表面の反射率が十分低いのに対してパネル
基材内面からの光に対する反射率は５〜１０％と高くな
る。表示装置においてこのようなパネル基材内面からの
光を反射することは、表示文字や画像を二重に写したり
（ゴースト）輪郭をぼかしてしまう等して表示品質を著
しく劣化させる虞がある。また、上記した米国特許第
５，０９１，２４４号に記載された事例の場合では、光
の透過率を制御した上で表面反射を減らす手法について
の示唆はあるものの、表示装置において重要であるパネ
ル基材内面からの反射を低減させることの考慮がないた
め、パネル基材内面からの光の反射率が８〜２０％と大
となり、問題となる。However, when the above-mentioned substance used as the light absorbing film is partially used as the antireflection film, in the case described in JP-A-9-156964, the reflectance of the surface is not sufficient. On the other hand, the reflectance for light from the inner surface of the panel base material is as high as 5 to 10%. Reflection of such light from the inner surface of the panel base material in the display device may significantly degrade the display quality by, for example, duplicating displayed characters and images or blurring the ghost. Further, in the case of the case described in US Pat. No. 5,091,244 described above, although there is a suggestion on a method of reducing surface reflection while controlling light transmittance, a panel which is important in a display device is suggested. Since there is no consideration to reduce the reflection from the inner surface of the base material, the reflectance of light from the inner surface of the panel base material becomes as large as 8 to 20%, which is a problem.

【０００７】パネル基材内面における光の反射は、ブラ
ウン管のようなパネル基材の光の透過率が３５〜６０％
のように低い場合、内面反射光がパネル基材の中を３回
通ることにより減衰されて大きな問題とならないが、パ
ネル基材の光の透過率が６０％以上、たとえばブラウン
管のパネル基材の中では、ＥＩＡＪ ＥＤ−２１３８に
示されているクリア（透過率７５％以上）もしくはグレ
ー（透過率６０〜７５％）を使用する場合、無視できな
い程大きな問題点となる。The reflection of light on the inner surface of the panel substrate is such that the light transmittance of the panel substrate such as a CRT is 35 to 60%.
In this case, the internal reflected light is attenuated by passing through the panel substrate three times, which is not a serious problem. However, the light transmittance of the panel substrate is 60% or more, for example, the panel substrate of a cathode ray tube. Among them, when clear (transmissivity of 75% or more) or gray (transmissivity of 60 to 75%) shown in EIAJ ED-2138 is used, a serious problem that cannot be ignored.

【０００８】[0008]

【発明が解決しようとする課題】本発明の課題は、広い
範囲で光の透過率調整が可能である反射防止膜を提供す
るとともに、良好な表示品質を有する表示装置を提供す
ることである。SUMMARY OF THE INVENTION An object of the present invention is to provide an antireflection film capable of adjusting light transmittance in a wide range and a display device having good display quality.

【０００９】[0009]

【課題を解決するための手段】上記課題を解決するため
に、本発明の反射防止膜では、基材上に複数の薄膜を積
層した多層構造を有する反射防止膜において、基材上に
形成された複数の薄膜が、少なくとも金属膜、金属窒化
膜および金属酸化膜のうちの何れか１種で構成された第
１の光吸収膜と、少なくとも金属膜、金属窒化膜および
金属酸化膜のうちの何れか１種で構成された第２の光吸
収膜と、第１の光吸収膜と第２の光吸収膜との間に、屈
折率が１．４以上１．９以下である誘電体膜とを有する
ことを特徴とする。In order to solve the above-mentioned problems, an antireflection film according to the present invention is an antireflection film having a multilayer structure in which a plurality of thin films are laminated on a substrate. A plurality of thin films, a first light absorbing film formed of at least one of a metal film, a metal nitride film and a metal oxide film, and at least a metal film, a metal nitride film and a metal oxide film of the metal oxide film. A dielectric film having a refractive index of not less than 1.4 and not more than 1.9 between the second light absorbing film formed of any one of the first light absorbing film and the first light absorbing film and the second light absorbing film; And characterized in that:

【００１０】本発明の表示装置では、画像を表示するパ
ネル基材の表面上に、少なくとも金属膜、金属窒化膜お
よび金属酸化膜のうちの何れか１種で構成された第１の
光吸収膜と、少なくとも金属膜、金属窒化膜および金属
酸化膜のうちの何れか１種で構成された第２の光吸収膜
と、第１の光吸収膜と第２の光吸収膜との間に、屈折率
が１．４以上１．９以下である誘電体膜とを有する反射
防止膜が形成されていることを特徴とする。そして、パ
ネル基材の光透過率は６０％以上のものが好ましい。[0010] In the display device of the present invention, the first light absorbing film made of at least one of a metal film, a metal nitride film and a metal oxide film is formed on the surface of the panel substrate for displaying an image. And a second light absorbing film composed of at least one of a metal film, a metal nitride film, and a metal oxide film, and between the first light absorbing film and the second light absorbing film. An antireflection film having a dielectric film having a refractive index of 1.4 or more and 1.9 or less is formed. The light transmittance of the panel substrate is preferably 60% or more.

【００１１】表示装置のパネル基材にはガラスや合成樹
脂材料が用いられる。ガラスの一例を挙げればソーダガ
ラス、鉛ガラス、硬質ガラス、石英ガラス、液晶化ガラ
ス等があり、ブラウン管ではストロンチウムやバリウム
を含む珪酸ガラスが好ましく用いられ、液晶表示装置で
は無アルカリガラスが好ましく用いられる。合成樹脂材
料としては有機高分子からなる基材であればいかなるも
のを用いても良いが、透明性、屈折率、分散等の光学特
性さらに耐衝撃性、耐熱性、耐久性等の諸特性からみ
て、とくにポリメチルメタアクリレート、メチルメタク
リレートと他のアルキル（メタ）アクリレート、スチレ
ン等のビニルモノマーとの共重合体等の（メタ）アクリ
ル系樹脂、ポリカーボネート、ジエチレングリコールビ
スアリルカーボネート（ＣＲ−３９）等のポリカーボネ
ート系樹脂、（臭素化）ビスフェノールＡ型のジ（メ
タ）アクリレートの単独重合体ないし共重合体、（臭素
化）ビスフェノールＡモノ（メタ）アクリレートのウレ
タン変性モノマーの重合体および共重合体等の熱硬化性
（メタ）アクリル系樹脂、ポリエステル、とくにポリエ
チレンテレフタレート、ポリエチレンナフタレートおよ
び不飽和ポリエステル、アクリロニトリル−スチレン共
重合体、ポリ塩化ビニル、ポリウレタン、エポキシ樹脂
等が好ましい。また、耐熱性を考慮したアラミド系樹脂
の使用も可能である。フィルム状の基材としては、上記
した合成樹脂材料を伸延あるいは溶剤に希釈後、フィル
ム状に成膜して乾燥する等の工程を経て作製することが
でき、厚さは通常２５〜５００μｍ程度である。Glass or synthetic resin material is used for the panel base material of the display device. Examples of glass include soda glass, lead glass, hard glass, quartz glass, liquid crystallized glass, and the like. Silica glass containing strontium and barium is preferably used for a cathode ray tube, and non-alkali glass is preferably used for a liquid crystal display device. . As the synthetic resin material, any material may be used as long as it is a substrate made of an organic polymer, but from the viewpoint of optical properties such as transparency, refractive index, and dispersion, and various properties such as impact resistance, heat resistance, and durability. In particular, (meth) acrylic resins such as polymethyl methacrylate, copolymers of methyl methacrylate with other alkyl (meth) acrylates and vinyl monomers such as styrene, polycarbonate, diethylene glycol bisallyl carbonate (CR-39), etc. Polycarbonate resins, homopolymers or copolymers of (brominated) bisphenol A type di (meth) acrylate, polymers and copolymers of (brominated) bisphenol A mono (meth) acrylate urethane-modified monomer, etc. Thermoset (meth) acrylic resin, polyester, especially polyethylene Tallates, polyethylene naphthalate, and unsaturated polyesters, acrylonitrile - styrene copolymers, polyvinyl chloride, polyurethane, epoxy resins and the like are preferable. It is also possible to use an aramid resin in consideration of heat resistance. As a film-shaped substrate, the above synthetic resin material can be produced through a process of elongating or diluting it in a solvent, forming a film and drying the film, and the thickness is usually about 25 to 500 μm. is there.

【００１２】表示装置のパネル基材が合成樹脂材料で構
成される場合の表面は、特公昭５０−２８０９２号公
報、特公昭５０−２８４４６号公報、特公昭５１−２４
３６８号公報、特開昭５２−１１２６９８号公報、特公
昭５７−２７３５号公報に開示されているようなハード
コート等の被膜材料で被覆されているものであっても良
い。またパネル基材が合成樹脂材料で構成される場合、
無機物からなる反射防止膜の下層に存在する被覆材料に
よって、付着性、硬度、耐薬品性、耐久性、染色性等の
諸特性を向上させることも可能である。ハードコートの
膜厚は、通常３〜２０μｍ程度である。さらに表示装置
のパネル基材は、カーボンブラック等の顔料や染料等に
より着色されたものでも良く、この場合特公平７−３６
０４４号公報に開示されているように、特定の波長の光
を選択的に吸収する選択吸収フィルタとして用いること
も可能である。When the panel base material of the display device is made of a synthetic resin material, the surface of the display device is disclosed in Japanese Patent Publication No. 50-28092, Japanese Patent Publication No. 50-28446, and Japanese Patent Publication No. 51-24.
It may be coated with a coating material such as a hard coat as disclosed in JP-A-368-368, JP-A-52-112698, and JP-B-57-2735. If the panel base is made of synthetic resin material,
Various properties such as adhesion, hardness, chemical resistance, durability, and dyeing properties can be improved by a coating material present below the inorganic antireflection film. The thickness of the hard coat is usually about 3 to 20 μm. Further, the panel base material of the display device may be colored with a pigment or a dye such as carbon black.
As disclosed in Japanese Patent No. 044, it is also possible to use as a selective absorption filter for selectively absorbing light of a specific wavelength.

【００１３】光吸収膜を含む反射防止膜の形成には、真
空蒸着法、イオンプレーティング法、スパッタリング法
等に代表される各種ＰＶＤ(Physical Vapor Deposition
)法がある。このＰＶＤ法に適する光吸収膜用の材料の
一例を挙げればＡｕ、Ｐｔ、Ｐｄ、Ｆｅ、Ｆｅ−Ｎｉ、
Ｎｉ−Ｃｒ、Ｎｉ−Ｖ、Ａｌ、Ａｇ、Ｃｒ、Ｆｅ−Ｃ
ｒ、Ｃｕ、Ｔｉ、Ｚｒ、Ｈｆ等の金属およびその窒化物
や酸化物がある。また、誘電体膜の構成材の一例を挙げ
ればＳｉＯ2 、ＳｉＯ、Ｓｉ3 Ｎ4 、Ａｌ2 Ｏ3、Ｚｒ
Ｏ2 、ＴｉＯ2 、Ｔａ2 Ｏ5 、ＴａＨｆ2 、ＴｉＯ、Ｔ
ｉ2 Ｏ3 、ＨｆＯ2 、ＺｎＯ、Ｉｎ2 Ｏ3 、Ｉｎ2 Ｏ3
／ＳｎＯ2 、Ｙ2 Ｏ3 、Ｙｂ2 Ｏ3 、Ｓｂ2 Ｏ3 、Ｍｇ
Ｏ、ＣｅＯ2 等の無機酸化物および無機窒化物がある。For forming an antireflection film including a light absorption film, various kinds of PVD (Physical Vapor Deposition) represented by a vacuum evaporation method, an ion plating method, a sputtering method and the like are used.
) There is a law. Au, Pt, Pd, Fe, Fe-Ni, Au, Pt, Pd,
Ni-Cr, Ni-V, Al, Ag, Cr, Fe-C
There are metals such as r, Cu, Ti, Zr, Hf, and nitrides and oxides thereof. Further, examples of constituent materials of the dielectric film include SiO 2 , SiO, Si 3 N 4 , Al 2 O 3 , and Zr.
O 2 , TiO 2 , Ta 2 O 5 , TaHf 2 , TiO, T
i 2 O 3 , HfO 2 , ZnO, In 2 O 3 , In 2 O 3
/ SnO 2 , Y 2 O 3 , Yb 2 O 3 , Sb 2 O 3 , Mg
There are inorganic oxides and inorganic nitrides such as O and CeO 2 .

【００１４】また、反射防止膜の中に、特開昭５９−１
６５００１号公報や特開平９−１５６９６４号公報に開
示されているように、光吸収膜の酸化を防止する酸化バ
リア層を挿入しても良い。この場合の酸化バリア層を構
成する材料としては、各種の金属および金属窒化物、た
とえばＳｉ3 Ｎ4 、ＡｌＮ等を用いることができる。こ
の酸化バリア層は光学的には不必要な層であり、反射防
止特性の劣化を防止するため２０ｎｍ以下の膜厚である
ことが好ましい。さらにパネル基材が合成樹脂材料であ
る場合には、パネル基材と反射防止膜との密着性を向上
させるために、米国特許第２，６２８，９２７号や特公
平３−８１１２１号公報に開示されているように、Ｓｉ
Ｏ2 や金属酸化物および硫化物を反射防止膜の第１層
（接着剤層）として極めて薄く形成しても良い。Further, in the anti-reflection film, JP-A-59-1
As disclosed in JP-A-65001 and JP-A-9-156964, an oxidation barrier layer for preventing oxidation of the light absorbing film may be inserted. In this case, as a material constituting the oxidation barrier layer, various metals and metal nitrides such as Si 3 N 4 and AlN can be used. This oxidation barrier layer is an optically unnecessary layer, and preferably has a thickness of 20 nm or less in order to prevent deterioration of the antireflection characteristics. Further, when the panel substrate is a synthetic resin material, it is disclosed in U.S. Pat. No. 2,628,927 and Japanese Patent Publication No. 3-81121 in order to improve the adhesion between the panel substrate and the antireflection film. As has been described,
O 2 , metal oxides and sulfides may be formed very thin as the first layer (adhesive layer) of the antireflection film.

【００１５】上述した手段によれば、最小限の層数で良
好な反射防止機能を有する反射防止膜の提供が可能であ
り、この反射防止膜を画像を表示するパネル基材表面に
形成した表示装置では、従来のように光の透過率を変え
た多種類のパネル基材を用意する必要がなく、広い範囲
で光の透過率を調整することができる。また、表示装置
の機械強度に関わらず、画像を表示するパネル基材表面
全面に均一な光の透過率を得ることができるので、内面
反射によるゴーストやフレア等が発生せず、良好な表示
品質を有する表示装置の提供が可能となる。According to the above-mentioned means, it is possible to provide an anti-reflection film having a good anti-reflection function with a minimum number of layers, and a display in which this anti-reflection film is formed on the surface of a panel substrate for displaying an image. In the apparatus, it is not necessary to prepare various types of panel base materials having different light transmittances as in the related art, and the light transmittance can be adjusted in a wide range. In addition, regardless of the mechanical strength of the display device, uniform light transmittance can be obtained over the entire surface of the panel base material for displaying images, so that ghosts and flares due to internal reflection do not occur, and good display quality is obtained. Can be provided.

【００１６】[0016]

【発明の実施の形態】本発明は基材上に複数の薄膜を積
層した多層構造を有する反射防止膜および画像を表示す
るパネル基材の表面上に複数の薄膜を積層した多層構造
を有する反射防止膜が形成された表示装置に適用するこ
とができる。以下、本発明を適用した具体的な一例とし
て、パネル基材として表示面の中央部における厚さが１
２ｍｍであるブラウン管用パネルガラス（クリアガラス
ＥＩＡＪ Ｈ−８６０１）の表面上に反射防止膜を形成
した事例の実施例について説明する。なお、本発明がこ
れに限定されないことは言うまでもない。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an antireflection film having a multilayer structure in which a plurality of thin films are laminated on a substrate, and a reflection film having a multilayer structure in which a plurality of thin films are laminated on the surface of a panel substrate for displaying an image. The present invention can be applied to a display device provided with a protective film. Hereinafter, as a specific example to which the present invention is applied, as a panel base material, the thickness at the center of the display surface is 1
An example in which an anti-reflection film is formed on the surface of a 2 mm CRT panel glass (clear glass EIAJ H-8601) will be described. Needless to say, the present invention is not limited to this.

【００１７】実施例１ 本実施例は、ブラウン管用パネルガラス上に順次、厚さ
１０ｎｍのＴｉＮで構成された第１の光吸収膜、この第
１の光吸収膜上に屈折率がほぼ１．７である厚さ８２ｎ
ｍのＡｌ2 Ｏ3 で構成された誘電体膜、この誘電体膜上
に厚さ１２ｎｍのＴｉＮで構成された第２の光吸収膜、
この第２の光吸収膜上に厚さ９０ｎｍのＳｉＯ2 で構成
された誘電体膜を形成し、４層の反射防止膜を形成した
事例である。Embodiment 1 In this embodiment, a first light absorbing film made of TiN having a thickness of 10 nm is sequentially formed on a panel glass for a cathode ray tube, and a refractive index of approximately 1.10 nm is formed on the first light absorbing film. 82 n thick
a dielectric film made of Al 2 O 3 m, a second light absorbing film made of TiN having a thickness of 12 nm on the dielectric film,
This is an example in which a dielectric film made of SiO 2 having a thickness of 90 nm is formed on the second light absorbing film, and four antireflection films are formed.

【００１８】比較例１ 本比較例は、ブラウン管用パネルガラス上に順次、厚さ
１０ｎｍのＴｉＮで構成された第１の光吸収膜、この第
１の光吸収膜上に屈折率がほぼ１．４である厚さ８７ｎ
ｍのＳｉＯ2 で構成された誘電体膜を形成し、２層の反
射防止膜を形成した事例である。すなわち、第２の光吸
収膜を形成しない事例である。Comparative Example 1 In this comparative example, a first light absorbing film made of TiN having a thickness of 10 nm was sequentially formed on a panel glass for a cathode ray tube, and a refractive index of approximately 1.0 nm was formed on the first light absorbing film. Thickness 87n which is 4
This is an example in which a dielectric film composed of m 2 SiO 2 was formed, and a two-layer antireflection film was formed. That is, this is a case where the second light absorbing film is not formed.

【００１９】比較例２ 本比較例は、ブラウン管用パネルガラス上に順次、厚さ
１９．９ｎｍのＴｉＮで構成された第１の光吸収膜、こ
の第１の光吸収膜上に屈折率がほぼ２．６である厚さ３
０ｎｍのＴｉＯ2 で構成された誘電体膜、この誘電体膜
上に厚さ６．７ｎｍのＴｉＮで構成された第２の光吸収
膜、この第２の光吸収膜上に厚さ８２．２ｎｍのＳｉＯ
2 で構成された誘電体膜を形成し、４層の反射防止膜を
形成した事例である。すなわち、第１の光吸収膜と第２
の光吸収膜との間に形成された誘電体膜の屈折率が１．
９超の事例である。Comparative Example 2 In this comparative example, a first light-absorbing film composed of 19.9 nm-thick TiN was sequentially formed on a CRT panel glass, and the refractive index of the first light-absorbing film was almost equal to that of the first light-absorbing film. Thickness 3 which is 2.6
A dielectric film composed of 0 nm TiO 2 , a second light absorbing film composed of 6.7 nm thick TiN on this dielectric film, and a 82.2 nm thickness on this second light absorbing film SiO
This is an example in which a dielectric film composed of 2 was formed and a four-layer antireflection film was formed. That is, the first light absorbing film and the second light absorbing film
The refractive index of the dielectric film formed between the light absorbing film and the light absorbing film is 1.
More than 9 cases.

【００２０】上記した実施例１、比較例１，２の反射防
止膜を計算機によりシュミレーションした結果を表１に
示す。このときの膜材料の複素屈折率は、複素屈折率＝
（ｎ−ｉｋ）として下記の表２に示した数値を用いた。
なお、誘電体においてはｋ＝０となる。Table 1 shows the results of simulating the anti-reflection films of Example 1 and Comparative Examples 1 and 2 by a computer. The complex refractive index of the film material at this time is represented by the complex refractive index =
The values shown in Table 2 below were used as (n-ik).
Note that k = 0 for a dielectric.

【００２１】[0021]

【表１】 [Table 1]

【００２２】[0022]

【表２】 [Table 2]

【００２３】表１から明らかなように、本発明を適用し
た実施例１における表面反射の視感反射率は０．１％、
内面反射の視感反射率は０．８％、波長５４６ｎｍの光
における透過率は５３％であり、表示装置としての要求
を満足する良好な結果を示した。これに対して、比較例
１，２における表面反射の視感反射率は０．１％と低く
抑えられているものの、内面反射の視感反射率が比較例
１では６．６％、比較例２では１６．８％と高く、表示
装置としての要求を満足する結果を示さなかった。As apparent from Table 1, the luminous reflectance of surface reflection in Example 1 to which the present invention was applied was 0.1%,
The luminous reflectance of the internal reflection was 0.8%, and the transmittance for light having a wavelength of 546 nm was 53%, showing a good result satisfying the requirements as a display device. On the other hand, the luminous reflectance of surface reflection in Comparative Examples 1 and 2 was suppressed to as low as 0.1%, but the luminous reflectance of internal reflection was 6.6% in Comparative Example 1, and the luminous reflectance of Comparative Example 1 was In No. 2, the result was as high as 16.8%, and did not show the result satisfying the requirement as the display device.

【００２４】図１は、パネル基材としての透明ガラス上
に厚さ１０ｎｍのＴｉＮで構成された光吸収膜、この光
吸収膜上に１／４波長膜の誘電体膜、この誘電体膜上に
厚さ１２ｎｍのＴｉＮで構成された光吸収膜、この光吸
収膜上に厚さ９０ｎｍのＳｉＯ2 で構成された誘電体膜
を順次形成した反射防止膜において、誘電体膜を構成す
る誘電体の屈折率を変化させて表面反射および内面反射
の視感反射率を計算したグラフである。パネル基材をガ
ラスや合成樹脂材料とした場合の表面反射および内面反
射は、４〜６％程度である。表示装置に求められる反射
防止効果の一つの基準として、ヨーロッパ規格のＴＵＶ
があり、これを満たすためには視感反射率は少なくとも
２％以下に抑える必要がある(テレビジョン学会技術報
告、Vol.19,No.2 (1995))。上記したシュミレーション
結果においても、表面および内面の反射率が同時に２％
以下となるためには誘電体膜の屈折率は１．４以上１．
９以下の範囲にある必要があり、好ましくは１．５以上
１．８以下の範囲にあることが判る。FIG. 1 shows a light absorbing film composed of 10 nm thick TiN on transparent glass as a panel substrate, a 1/4 wavelength film dielectric film on this light absorbing film, and a 1/4 wavelength film on this dielectric film. A light absorption film made of TiN having a thickness of 12 nm, and an antireflection film formed by sequentially forming a dielectric film made of SiO 2 having a thickness of 90 nm on the light absorption film. 5 is a graph in which the luminous reflectance of surface reflection and internal reflection is calculated by changing the refractive index of the luminous flux. Surface reflection and internal reflection when the panel base material is made of glass or a synthetic resin material is about 4 to 6%. One standard of anti-reflection effect required for display devices is European standard TUV
In order to satisfy this, the luminous reflectance must be suppressed to at least 2% or less (Technical Report of the Institute of Television Engineers of Japan, Vol. 19, No. 2 (1995)). According to the above simulation results, the reflectance of the surface and the inner surface is 2% at the same time.
In order for the refractive index to be less than or equal to 1.4, the refractive index of the dielectric film should be 1.4 or more.
It is found that it is necessary to be within a range of 9 or less, preferably within a range of 1.5 or more and 1.8 or less.

【００２５】[0025]

【発明の効果】本発明の反射防止膜によれば、最小限の
層数で良好な反射防止機能を有する反射防止膜の提供が
可能となる。そしてこの反射防止膜を画像を表示するパ
ネル基材表面に形成した表示装置には、以下のような効
果がある。 （１）従来のように光の透過率を変えた多種類のパネル
基材を用意する必要がなく、広い範囲で光の透過率を調
整することができる。 （２）内面反射によるゴーストやフレア等が発生せず、
良好な表示品質を有する表示装置の提供が可能となる。 （３）表示装置の機械強度に関わらず、画像を表示する
パネル基材表面全面に均一な光透過率を得ることができ
る。According to the antireflection film of the present invention, it is possible to provide an antireflection film having a good antireflection function with a minimum number of layers. The display device in which the antireflection film is formed on the surface of the panel base material for displaying an image has the following effects. (1) There is no need to prepare various types of panel base materials having different light transmittances as in the related art, and the light transmittance can be adjusted in a wide range. (2) No ghost or flare due to internal reflection occurs,
A display device having good display quality can be provided. (3) Irrespective of the mechanical strength of the display device, a uniform light transmittance can be obtained over the entire surface of the panel substrate on which an image is displayed.

【図面の簡単な説明】[Brief description of the drawings]

【図１】 本発明の反射防止膜を構成する、２層の光吸
収膜間に形成された誘電体膜の屈折率の変化に対して、
表面反射および内面反射が変化する様子を示したグラフ
である。FIG. 1 shows the relationship between a change in the refractive index of a dielectric film formed between two light absorbing films constituting an antireflection film of the present invention.
It is the graph which showed a mode that surface reflection and internal reflection changed.

フロントページの続き (72)発明者 小林 政広 東京都品川区北品川６丁目７番35号 ソニ ー株式会社内 Ｆターム(参考） 2K009 AA07 CC02 CC03 CC14 Continued on the front page (72) Inventor Masahiro Kobayashi 6-35, Kita-Shinagawa, Shinagawa-ku, Tokyo Sony Corporation F-term (reference) 2K009 AA07 CC02 CC03 CC14

Claims (3)

【特許請求の範囲】[Claims] 【請求項１】 基材上に複数の薄膜を積層した多層構造
を有する反射防止膜において、 前記薄膜が、 少なくとも金属膜、金属窒化膜および金属酸化膜のうち
の何れか１種で構成された第１の光吸収膜と、 少なくとも金属膜、金属窒化膜および金属酸化膜のうち
の何れか１種で構成された第２の光吸収膜と、 前記第１の光吸収膜と前記第２の光吸収膜との間に、屈
折率が１．４以上１．９以下である誘電体膜とを有する
ことを特徴とする反射防止膜。1. An antireflection film having a multilayer structure in which a plurality of thin films are stacked on a substrate, wherein the thin film is formed of at least one of a metal film, a metal nitride film, and a metal oxide film. A first light absorbing film, a second light absorbing film composed of at least one of a metal film, a metal nitride film, and a metal oxide film; the first light absorbing film and the second light absorbing film; An antireflection film, comprising a dielectric film having a refractive index of 1.4 or more and 1.9 or less between the light absorbing film and the light absorbing film. 【請求項２】 画像を表示するパネル基材の表面上に、 少なくとも金属膜、金属窒化膜および金属酸化膜のうち
の何れか１種で構成された第１の光吸収膜と、 少なくとも金属膜、金属窒化膜および金属酸化膜のうち
の何れか１種で構成された第２の光吸収膜と、 前記第１の光吸収膜と前記第２の光吸収膜との間に、屈
折率が１．４以上１．９以下である誘電体膜とを有する
反射防止膜が形成されていることを特徴とする表示装
置。2. A first light absorbing film composed of at least one of a metal film, a metal nitride film and a metal oxide film on a surface of a panel substrate for displaying an image, and at least a metal film. A second light absorbing film made of any one of a metal nitride film and a metal oxide film; and a refractive index between the first light absorbing film and the second light absorbing film. A display device, comprising an antireflection film having a dielectric film having a thickness of 1.4 or more and 1.9 or less. 【請求項３】 前記パネル基材の光透過率が６０％以上
であることを特徴とする請求項２に記載の表示装置。3. The display device according to claim 2, wherein the light transmittance of the panel base material is 60% or more.
JP10348529A 1998-12-08 1998-12-08 Antireflection film and display device Pending JP2000171601A (en)

Priority Applications (6)

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JP10348529A JP2000171601A (en) 1998-12-08 1998-12-08 Antireflection film and display device
TW088120267A TW428107B (en) 1998-12-08 1999-11-19 Anti-reflection film and display device
NL1013664A NL1013664C2 (en) 1998-12-08 1999-11-24 Anti-reflective film and image display device.
SG9906001A SG85155A1 (en) 1998-12-08 1999-11-30 Anti-reflection film and display device
GB9928967A GB2344600B (en) 1998-12-08 1999-12-07 Anti-reflection film and display device
KR1019990055368A KR100636773B1 (en) 1998-12-08 1999-12-07 Anti-reflection film and display device

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GB9928967D0 (en) 2000-02-02
GB2344600B (en) 2001-09-26
KR20000047951A (en) 2000-07-25
TW428107B (en) 2001-04-01
GB2344600A (en) 2000-06-14
NL1013664A1 (en) 2000-06-13
KR100636773B1 (en) 2006-10-23
NL1013664C2 (en) 2007-04-24

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