JP2000059082A - Electromagnetic wave filter - Google Patents

Electromagnetic wave filter

Info

Publication number
JP2000059082A
JP2000059082A JP10223048A JP22304898A JP2000059082A JP 2000059082 A JP2000059082 A JP 2000059082A JP 10223048 A JP10223048 A JP 10223048A JP 22304898 A JP22304898 A JP 22304898A JP 2000059082 A JP2000059082 A JP 2000059082A
Authority
JP
Japan
Prior art keywords
electromagnetic wave
layer
wave filter
silver
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10223048A
Other languages
Japanese (ja)
Inventor
Toshiaki Anzaki
利明 安崎
Etsuo Ogino
悦男 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP10223048A priority Critical patent/JP2000059082A/en
Priority to TW088112321A priority patent/TW428043B/en
Priority to KR1019990031932A priority patent/KR20000017060A/en
Publication of JP2000059082A publication Critical patent/JP2000059082A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073Shielding materials
    • H05K9/0094Shielding materials being light-transmitting, e.g. transparent, translucent
    • H05K9/0096Shielding materials being light-transmitting, e.g. transparent, translucent for television displays, e.g. plasma display panel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20Constructional details
    • H01J11/34Vessels, containers or parts thereof, e.g. substrates
    • H01J11/44Optical arrangements or shielding arrangements, e.g. filters, black matrices, light reflecting means or electromagnetic shielding means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20Constructional details
    • H01J2211/34Vessels, containers or parts thereof, e.g. substrates
    • H01J2211/44Optical arrangements or shielding arrangements, e.g. filters or lenses
    • H01J2211/446Electromagnetic shielding means; Antistatic means

Abstract

PROBLEM TO BE SOLVED: To obtain infrared-ray shielding capability and high visible light transmittivity by making an electromagnetic wave shielding film by depositing a dielectric layer, having a specified refractive index and a layer using silver as a main ingredient alternately from the transparent substrate side, with the thickness of the layer using silver as the main ingredient set to a specified value, to obtain a specified sheet resistance and near infrared-ray transmittivity. SOLUTION: An electromagnetic wave shielding film 2, coating the surface of a glass substrate 5, is adhered to a resin film 4 through an adhesive layer 3. In the periphery of the glass substrate 5, is bars 8 made of silver paste and a black ceramic pattern 9 are formed. In this case, the electromagnetic wave shielding film 2 is a nine-layer laminate made by depositing a dielectric layer 10, having a refractive index of 1.7-2.7 for 550 nm wavelength and a layer 11 using silver as the main ingredient alternately from the transparent substrate side, with the thickness of the layer 11 using silver as the main ingredient being set to 5-20 nm. Thereby, the sheet resistance of the electromagnetic wave shielding film 2 can be set to 2 Ω/(square) or below and an infrared-ray transmittivity at wavelength 850 nm set to 15% or below. Accordingly, electromagnetic waves and near-infrared rays can be prevented from coming flying in.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プラズマディスプ
レイパネルの前面に設置して、プラズマ放電により放出
される電磁波をカットするのに好適に用いられる電磁波
フィルタに関し、必要とする電磁波遮断性とともに、高
い可視光線透過率と低い近赤外線透過率を併せ有し、か
つ実用に耐える耐久性を有する電磁波フィルタに関す
る。また本発明は、陰極線管(CRT)やフィールドエ
ミッションディスプレイ(FED)が放出する電磁波を
カットするのにも用いることもできる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electromagnetic wave filter which is installed on the front surface of a plasma display panel and is preferably used for cutting electromagnetic waves emitted by plasma discharge. The present invention relates to an electromagnetic wave filter having both visible light transmittance and low near-infrared light transmittance and having durability that can withstand practical use. The present invention can also be used to cut electromagnetic waves emitted from a cathode ray tube (CRT) or a field emission display (FED).

【0002】[0002]

【従来の技術】ガラス板の如き透明基板の主表面上に電
磁波遮断膜が被覆された可視域で透明な電磁波フィルタ
としては、基板側から誘電体層と金属層とがこの順に交
互に積層された電磁波フィルタが知られている。この目
的のために用いられる電磁波遮断膜は、電磁波の遮断を
行うために導電性の(小さい面積抵抗を有する)物質を
基板上に被覆したものが用いられる。そして高い可視光
線透過率を確保しながら低い抵抗を有する導電体層とし
て、透明金属酸化物で例示できる誘電体薄膜層と銀の薄
膜層との積層体が知られている。
2. Description of the Related Art As a visible electromagnetic wave transparent electromagnetic wave filter in which an electromagnetic wave shielding film is coated on a main surface of a transparent substrate such as a glass plate, a dielectric layer and a metal layer are alternately laminated in this order from the substrate side. Known electromagnetic wave filters are known. As the electromagnetic wave shielding film used for this purpose, a film in which a conductive material (having a small sheet resistance) is coated on a substrate in order to block electromagnetic waves is used. As a conductor layer having low resistance while securing high visible light transmittance, a laminate of a dielectric thin film layer and a silver thin film layer, which can be exemplified by a transparent metal oxide, is known.

【0003】特開平5−42624号公報には、銀層を
誘電体層ではさんだ構造の熱線遮断膜が被覆されたガラ
ス板が開示されており、銀層を保護する誘電体層として
酸化亜鉛層と酸化錫層の2層以上の積層体を用いたもの
が開示され、この熱線遮断膜は、窓や電子部品に用いら
れて電磁波遮断膜として使用できることが記載されてい
る。
Japanese Patent Application Laid-Open No. Hei 5-42624 discloses a glass plate coated with a heat ray blocking film having a structure in which a silver layer is sandwiched between dielectric layers. A zinc oxide layer is used as a dielectric layer for protecting the silver layer. And a laminate using two or more layers of a tin oxide layer are disclosed, and it is described that this heat ray shielding film can be used as an electromagnetic wave shielding film for windows and electronic components.

【0004】特開平9−85893号公報のガラス板上
に被覆されている積層体は、金属層としてパラジウムを
0.3原子%以上含有させた銀層を用いること、誘電体
層として酸化亜鉛層にアルミニウム等の金属を添加させ
てその内部応力を低減させて銀層との密着性を向上させ
ることが記載されており、耐湿熱性が改善された5層構
成(銀層が2層)の積層体が開示されている。
A laminate coated on a glass plate disclosed in Japanese Patent Application Laid-Open No. 9-85893 uses a silver layer containing 0.3 atomic% or more of palladium as a metal layer, and a zinc oxide layer as a dielectric layer. To improve the adhesion to the silver layer by reducing the internal stress by adding a metal such as aluminum to the laminate, and to form a five-layer structure (two silver layers) with improved wet heat resistance. The body is disclosed.

【0005】特開平8−104547号公報には、断熱
複層ガラスの熱線遮断膜として、酸化錫層および酸化亜
鉛層を誘電体層とし、銀層を金属層とする5層構成(銀
層が2層)の積層体が開示されており、ガラス窓として
の透過色および反射色を無彩色にするための誘電体層の
厚みを調整することが記載されている。
[0005] Japanese Patent Application Laid-Open No. Hei 8-104547 discloses a five-layer structure in which a tin oxide layer and a zinc oxide layer are used as a dielectric layer and a silver layer is used as a metal layer as a heat ray blocking film of a heat insulating double glass. A two-layer laminate is disclosed, in which the thickness of a dielectric layer for adjusting the transmission color and reflection color of a glass window to an achromatic color is described.

【0006】[0006]

【発明が解決しようとする課題】プラズマディスプレイ
パネルは大型の画像表示装置として知られているが、そ
の高輝度の表示を実現するために強力なプラズマ放電を
必要とする。このため放電領域からプラズマディスプレ
イパネルの前方に向かって、電磁波とともに近赤外線が
放出され、放出される電磁波が人体に悪影響を及ぼす恐
れがあるとされ、一方放出される近赤外線がプラズマデ
ィスプレイパネルの近くにある家電製品のリモコン受光
部で検知され、そのスイッチを誤動作させるという問題
点があった。
The plasma display panel is known as a large-sized image display device, but requires a strong plasma discharge in order to realize a high-luminance display. For this reason, it is considered that near infrared rays are emitted together with electromagnetic waves from the discharge region toward the front of the plasma display panel, and the emitted electromagnetic waves may adversely affect the human body. However, there is a problem that the switch is malfunctioned when it is detected by the remote control light receiving section of the home appliance.

【0007】上記目的を達成するために、プラズマディ
スプレイパネル前面に電磁波遮断性能を有する透明体を
設けることが提案されており、そのために誘電体層と銀
層を交互に積層した電磁波フィルタをプラズマディスプ
レイの前面に貼り付けることが検討されている。このよ
うな電磁波フィルタとしては、 1)電磁波遮断能がある、 2)家電品のリモコンスイッチの遠隔通信に用いられる
近赤外線域(800〜900nm)の波長の電磁波の透
過率が小さく、周辺家電品の誤動作防止能がある、 3)明るい画像表示を維持するために可視光線透過率が
高い、 4)空気中に暴露された状態で使用されるので、耐湿熱
性などの耐久性能がある、 という性能が同時に要求される。
In order to achieve the above object, it has been proposed to provide a transparent body having electromagnetic wave shielding performance in front of the plasma display panel. For this purpose, an electromagnetic wave filter in which dielectric layers and silver layers are alternately laminated is provided on a plasma display panel. It is being considered to attach it to the front of the camera. Examples of such an electromagnetic wave filter include: 1) an electromagnetic wave blocking ability; 2) a small transmittance of electromagnetic waves having a wavelength in the near infrared region (800 to 900 nm) used for remote communication of a remote control switch of home electric appliances; 3) High visible light transmittance to maintain a bright image display. 4) Durability such as moisture and heat resistance because it is used while exposed to air. Are required at the same time.

【0008】ここで、上記2)と3)の性能を同時に満
足させるには、可視域で高透過、近赤外域で低透過の特
性、すなわち可視域と近赤外域の境界で急速に透過率が
低くなる電磁波遮断膜を設計することにより、本発明の
課題を解決する着想を得たのである。
Here, in order to simultaneously satisfy the above-mentioned performances 2) and 3), characteristics of high transmission in the visible region and low transmission in the near-infrared region, that is, the transmittance is rapidly increased at the boundary between the visible region and the near-infrared region. By designing an electromagnetic wave shielding film that reduces the noise, the idea of solving the problem of the present invention was obtained.

【0009】特開平5−42624号公報に記載のガラ
ス板上の熱線遮断膜は、保護層となるべき誘電体層を酸
化亜鉛層と酸化錫層の2層以上の積層体としているの
で、耐湿熱性で代表される耐久性は優れているが、銀を
1層としているので電磁波遮断能が十分でなく、プラズ
マディスプレイの前面に用いても近赤外域の透過率が高
く、上記のリモコンの誤動作を防止することができな
い。
The heat-ray shielding film on a glass plate described in Japanese Patent Application Laid-Open No. Hei 5-42624 has a moisture resistance because a dielectric layer to be a protective layer is a laminate of two or more layers of a zinc oxide layer and a tin oxide layer. Although the durability typified by thermal properties is excellent, the electromagnetic wave shielding ability is not sufficient due to the single layer of silver, and the transmittance in the near infrared region is high even when used on the front of a plasma display. Can not be prevented.

【0010】特開平9−85893号公報のガラス板上
に被覆されている積層体は、金属層としてパラジウムを
0.3原子%以上含有させた銀層を用いたこと、誘電体
層として酸化亜鉛層にアルミニウム等の金属を添加させ
てその内部応力を低減させ、銀層との密着性を向上させ
たことにより耐湿熱性が改善されているが、銀層を2層
(全5層)構成としているため、プラズマディスプレイ
パネルとして要求される上記2)と3)の要求特性を得
ることは困難である。
The laminated body coated on a glass plate disclosed in JP-A-9-85893 uses a silver layer containing 0.3 atomic% or more of palladium as a metal layer and zinc oxide as a dielectric layer. The moisture and heat resistance is improved by adding a metal such as aluminum to the layer to reduce its internal stress and improve the adhesion to the silver layer. However, the silver layer is composed of two layers (all five layers). Therefore, it is difficult to obtain the required characteristics 2) and 3) required for a plasma display panel.

【0011】特開平8−104547号公報に開示され
ている熱線遮断膜は銀層を2層とする5層構成の積層体
であるので、前述の通り、上記2)と3)の要求特性を
得ることは困難である。
The heat-ray shielding film disclosed in Japanese Patent Application Laid-Open No. 8-104547 is a laminate having a five-layer structure having two silver layers. It is difficult to get.

【0012】本発明は、プラズマディスプレイパネルの
前面から放出される電磁波およびリモコンスイッチ制御
用の赤外線を遮断する機能と高い可視光線透過率を維持
しつつ、実用的な耐久性を有する電磁波フィルタを提供
することを目的とする。
The present invention provides a practically durable electromagnetic wave filter while maintaining a function of blocking electromagnetic waves emitted from the front of a plasma display panel and infrared rays for controlling a remote control switch and a high visible light transmittance. The purpose is to do.

【0013】[0013]

【課題を解決するための手段】上記課題を解決するため
に、本発明は鋭意研究した結果、まず銀主成分層につい
ては4層に分割すること、銀層にパラジウムを所定範囲
量添加することにより、プラズマディスプレイパネルの
前面に設置して用いる電磁波フィルタとして必要な電磁
波遮断能を有する抵抗値、近赤外域での低い透過率およ
び実用的な耐湿熱性が得られることを見出したことによ
りなされたものである。
Means for Solving the Problems In order to solve the above-mentioned problems, the present invention has been studied intensively. As a result, the silver main layer is divided into four layers, and palladium is added to the silver layer in a predetermined range. It has been made possible to obtain a resistance value having an electromagnetic wave blocking ability necessary for an electromagnetic wave filter used by being installed on the front surface of a plasma display panel, a low transmittance in a near-infrared region, and practical moist heat resistance. Things.

【0014】本発明の請求項1は、透明基板の一方の面
に電磁波遮断膜が被覆された電磁波遮断板と、前記電磁
波遮断膜面に設けられた保護膜とを有する電磁波フィル
タであって、前記電磁波遮断膜を、透明基板側から55
0nmの波長における屈折率が1.7〜2.7の誘電体
層と銀主成分層をこの順に交互に積層した9層の積層体
とし、前記銀主成分層の厚みを5〜20nmとすること
により、前記電磁波遮断膜のシート抵抗を2Ω/□以
下、かつ、波長850nmにおける近赤外線透過率を1
5%以下としたことを特徴とするプラズマディスプレイ
パネル用の電磁波フィルタである。
According to a first aspect of the present invention, there is provided an electromagnetic wave filter comprising: an electromagnetic wave shielding plate in which one surface of a transparent substrate is coated with an electromagnetic wave shielding film; and a protective film provided on the surface of the electromagnetic wave shielding film. The electromagnetic wave shielding film is placed 55 mm from the transparent substrate side.
A dielectric layer having a refractive index of 1.7 to 2.7 at a wavelength of 0 nm and a silver main layer are alternately stacked in this order to form a nine-layer laminate, and the thickness of the silver main layer is 5 to 20 nm. Thereby, the sheet resistance of the electromagnetic wave shielding film is 2Ω / □ or less and the near-infrared transmittance at a wavelength of 850 nm is 1
An electromagnetic wave filter for a plasma display panel, wherein the filter is set to 5% or less.

【0015】誘電体層は、550nmの波長の屈折率が
1.7〜2.7の透明金属酸化物が用いられる。誘電体
の屈折率が1.7未満であると電磁波フィルタとしての
反射率が高くなり、2.7を越える金属酸化物の層は、
その積層をするにあたり透明基板の高温の加熱を必要と
し、銀主成分層の酸化劣化をもたらす。したがって誘電
体層の厚みは、1.7〜2.7であることを必要とす
る。
As the dielectric layer, a transparent metal oxide having a refractive index of 1.7 to 2.7 at a wavelength of 550 nm is used. When the refractive index of the dielectric is less than 1.7, the reflectivity as an electromagnetic wave filter increases, and the metal oxide layer exceeding 2.7 has
The lamination requires high-temperature heating of the transparent substrate, which results in oxidative deterioration of the silver main component layer. Therefore, the thickness of the dielectric layer needs to be 1.7 to 2.7.

【0016】また、銀主成分層は、銀単独の層では実用
的な耐候性(とりわけ耐湿熱性)が十分でないので、銀
にパラジウム、金、ニッケル、チタニウムなどの金属を
銀の比抵抗を大きく減じない範囲で添加することができ
る。とりわけ、パラジウムは、それが少量添加されるこ
とにより、電磁波遮断膜の耐湿熱性が実用的なレベルに
向上するので好ましい。
Further, since the silver main layer is not sufficient in practical weather resistance (especially wet heat resistance) with a layer containing only silver, a metal such as palladium, gold, nickel and titanium is added to silver to increase the specific resistance of silver. It can be added in a range that does not decrease. Above all, palladium is preferable, because addition of a small amount thereof improves the moist heat resistance of the electromagnetic wave shielding film to a practical level.

【0017】また、銀主成分層の各厚みは、5〜20n
mとされる。この理由は、5nm未満であると、電磁波
遮断能を確保するために必要とする低いシート抵抗を得
るのが困難になるからであり、20nmを越えると電磁
波フィルタとしての反射率が高く、また透過率が低くな
るからである。
The thickness of the silver main component layer is 5 to 20 n.
m. The reason is that if it is less than 5 nm, it becomes difficult to obtain a low sheet resistance required for securing the electromagnetic wave shielding ability. If it exceeds 20 nm, the reflectance as an electromagnetic wave filter is high, This is because the rate decreases.

【0018】本発明の請求項2の電磁波フィルタは、請
求項1において、添加金属をパラジウムとし、パラジウ
ムを銀に対して原子%で0.1以上0.5未満の範囲内
で含有されることを特徴とする。パラジウムの下限値
は、電磁波遮断膜の実用的な耐湿熱性を十分に確保する
ために定められ、上限値はリモコンスイッチの誤動作を
防ぐために必要な近赤外域の遮断能を十分に確保するこ
とから定められる。
According to a second aspect of the present invention, there is provided the electromagnetic wave filter according to the first aspect, wherein the additive metal is palladium, and the palladium is contained in a range of 0.1 to less than 0.5 in atomic% with respect to silver. It is characterized by. The lower limit of palladium is determined in order to sufficiently secure the practical moisture and heat resistance of the electromagnetic wave shielding film, and the upper limit is determined to sufficiently secure the near-infrared blocking ability required to prevent malfunction of the remote control switch. Determined.

【0019】本発明者は、高輝度のプラズマディスプレ
イパネルから発生する近赤外線を85%以上(15%以
下の透過率)遮断することにより上記の目的が達成され
ることを実用試験から見いだし、またこの遮断能は銀層
のパラジウム含有量が増加すると低下することを見いだ
した。
The present inventor has found from practical tests that the above object is achieved by blocking near infrared rays generated from a high-brightness plasma display panel by 85% or more (transmittance of 15% or less). This blocking ability was found to decrease with increasing palladium content of the silver layer.

【0020】パラジウムの含有量は、上記のように電磁
波遮断膜の耐湿熱性の向上と近赤外線遮断能の向上に対
してトレードオフの関係にある。上記二つの性能を実用
的にバランス良く確保する上で、その下限値は0.10
原子%が好ましく、さらに0.3原子%が好ましく、ま
たその上限値は0.45原子%以下が好ましく、0.4
原子%とするのがさらに好ましい。
As described above, the content of palladium is in a trade-off relationship between the improvement of the moisture and heat resistance of the electromagnetic wave shielding film and the improvement of the near-infrared ray shielding ability. To ensure the above two performances in a practically balanced manner, the lower limit is 0.10.
Atomic%, more preferably 0.3 atomic%, and the upper limit thereof is preferably 0.45 atomic% or less.
More preferably, it is set to atomic%.

【0021】本発明の請求項3の電磁波フィルタは、5
50nmの波長における透過率が50%以上となるよう
に、銀主成分層および誘電体層の厚みを調整したことを
特徴とする。そのために上記銀主成分層を4層に分割す
るとともに、銀層を挟んで積層される誘電体層の550
nmの波長における屈折率を1.7〜2.7として、そ
れらの厚みが調整される。銀主成分層の厚みを上記範囲
内で薄めに選定することにより、可視光線透過率をより
高くすることができ、また銀主成分各層の厚みを互いに
近づけ、かつ最適化することにより可視光線透過率を高
くすることができる。
According to a third aspect of the present invention, there is provided an electromagnetic wave filter comprising:
The thickness of the silver main layer and the dielectric layer is adjusted so that the transmittance at a wavelength of 50 nm is 50% or more. For this purpose, the silver main layer is divided into four layers, and 550 of the dielectric layers laminated with the silver layer interposed therebetween.
Assuming that the refractive index at a wavelength of nm is 1.7 to 2.7, their thickness is adjusted. By selecting the thickness of the silver main component layer to be thin within the above range, the visible light transmittance can be further increased, and the thickness of the silver main component layers can be made closer to each other, and by optimizing the visible light transmission. Rate can be increased.

【0022】本発明の請求項4の電磁波フィルタは、請
求項1〜3において、透明基板側から見たときの反射色
調を、色度座標a*、b*の値が−1<a*<4、−8<
*<1となるように、さらに誘電体層および銀主成分
層の厚みを調整したことを特徴とする。ここで、a*
*はCealab色座標系の2軸である。
According to a fourth aspect of the present invention, in the electromagnetic wave filter according to the first to third aspects, the reflection color tone when viewed from the transparent substrate side is such that the values of the chromaticity coordinates a * and b * are -1 <a * <. 4, -8 <
The thickness of the dielectric layer and the silver main layer is further adjusted so that b * <1. Where a * ,
b * is two axes of the Celab color coordinate system.

【0023】各誘電体層の厚みとその厚み比率および銀
主成分の各層の厚みを、可視光線域の広い帯域で反射率
が低くなるようにして選定し、また、その反射の中心波
長を可視域の中心に合わせることで、反射色調を上記の
色座標で表される色調が目立たない色に調整される。と
くに赤みの色調が強くならないように調整されるのが好
ましい。
The thickness of each dielectric layer and its thickness ratio and the thickness of each layer composed mainly of silver are selected such that the reflectance is low in a wide band of visible light, and the center wavelength of the reflection is set to be visible. By adjusting to the center of the area, the reflection color tone is adjusted to a color in which the color tone represented by the above color coordinates is inconspicuous. It is particularly preferable to adjust the color tone so that the reddish color tone does not become strong.

【0024】本発明の請求項5の電磁波フィルタは、請
求項3または4において、銀主成分層の各層の厚みを7
〜17nmとしたことを特徴とする。可視光線透過率が
高いことを重視し、その値を50%より十分に高くする
には銀主成分層の厚みを17nm以下とするのが好まし
く、さらに14nm以下とすることにより可視光線透過
率を60%以上の高い透過率にすることができる。一
方、近赤外線の透過率を十分に低くすることおよびシー
ト抵抗値を十分に低くして電磁波遮断能を大きくする観
点から、7nm以上とするのが好ましく、さらに9nm
以上とするのが好ましい。
According to a fifth aspect of the present invention, there is provided the electromagnetic wave filter according to the third or fourth aspect, wherein each of the silver main component layers has a thickness of 7 mm.
1717 nm. Emphasis is placed on the high visible light transmittance, and in order to make the value sufficiently higher than 50%, the thickness of the silver main component layer is preferably 17 nm or less, and the visible light transmittance is further reduced by 14 nm or less. High transmittance of 60% or more can be obtained. On the other hand, from the viewpoint of sufficiently reducing the transmittance of near-infrared rays and increasing the electromagnetic wave blocking ability by sufficiently reducing the sheet resistance value, the thickness is preferably 7 nm or more, and more preferably 9 nm.
It is preferable to make the above.

【0025】本発明の請求項6の電磁波フィルタは、請
求項1〜5のいずれかにおいて、銀主成分層の合計厚み
を30〜70nmとしたことを特徴とする。銀主成分層
の合計厚みが30nmより薄くなると、電磁波遮断能お
よび赤外線遮断能が漸次低下していくので好ましくな
い。また、銀主成分層の合計厚みが70nmより厚くな
っていくと、銀主成分層の光吸収により可視光線透過率
が低下していき、明るい画像を得ることが困難になるの
で好ましくない。
According to a sixth aspect of the present invention, there is provided the electromagnetic wave filter according to any one of the first to fifth aspects, wherein the total thickness of the silver main layer is 30 to 70 nm. When the total thickness of the silver main component layer is less than 30 nm, the electromagnetic wave shielding ability and the infrared ray shielding ability gradually decrease, which is not preferable. On the other hand, if the total thickness of the silver main component layer is greater than 70 nm, the visible light transmittance is reduced due to the light absorption of the silver main component layer, which makes it difficult to obtain a bright image.

【0026】本発明の請求項7の電磁波フィルタは、請
求項5または6において、銀主成分層の厚み比率を透明
基板側から順に、9〜11:10〜13:10〜13:
9〜11にしたことを特徴とする。可視光線の透過率を
高くし、かつ可視光線の反射率を低く抑える観点から、
銀主成分層の厚み比率を上記範囲に選定するのが好まし
い。
According to a seventh aspect of the present invention, in the electromagnetic wave filter according to the fifth or sixth aspect, the thickness ratio of the silver main component layer is set in the order from 9 to 11:10 to 13:10 to 13:
9-11. From the viewpoint of increasing the transmittance of visible light and reducing the reflectance of visible light,
It is preferable to select the thickness ratio of the silver main component layer within the above range.

【0027】本発明の請求項8の電磁波フィルタは、請
求項3〜7のいずれかにおいて、透明基板に最も近い誘
電体層の厚みを42nm±10nmとし、誘電体層の厚
み比率を透明基板側から順に44±4:82±8:79
±8:82±8:42±4の範囲に選定したことを特徴
とする。
The electromagnetic wave filter according to claim 8 of the present invention is the electromagnetic wave filter according to any one of claims 3 to 7, wherein the thickness of the dielectric layer closest to the transparent substrate is 42 nm ± 10 nm, and the ratio of the thickness of the dielectric layer to the transparent substrate is From 44 ± 4: 82 ± 8: 79
± 8: 82 ± 8: 42 ± 4.

【0028】銀主成分層と同じように各誘電体層の厚み
およびその比率は、可視光線の透過率および反射率に影
響し、さらに反射色に強く影響する。透明基板側に最も
近い誘電体層の厚みおよび各誘電体層の厚みの比率を上
記範囲内にすることにより、波長550nmにおける透
過率を高くし(本発明では可視光線透過率も高くな
る)、反射率を低く抑えるとともに、電磁波フィルタの
反射色を、目立たない実用的に有用な範囲である−1<
*<4、−8<b*<1の範囲内にすることができる。
As in the case of the silver main layer, the thickness and ratio of each dielectric layer affect the transmittance and reflectance of visible light, and further strongly affect the color of reflection. By setting the thickness of the dielectric layer closest to the transparent substrate side and the ratio of the thickness of each dielectric layer within the above range, the transmittance at a wavelength of 550 nm is increased (the visible light transmittance is also increased in the present invention), The reflectance is kept low, and the reflection color of the electromagnetic wave filter is inconspicuous and practically useful range of -1 <
a * <4, −8 <b * <1.

【0029】透明基板に最も近い誘電体層の厚みは、そ
の他の誘電体層の厚みがそれ自身の厚みと関係して定め
られるので、その設定は重要である。透過帯域及び反射
防止帯域を可視光域のほぼ中央にマッチングさせ、電磁
波フィルタとして要求される高い透過率、低い反射率お
よび反射色調とし有用なものとするために、透明基板に
最も近い誘電体層の厚みは42nm±10nmとするの
が好ましい。
The setting of the thickness of the dielectric layer closest to the transparent substrate is important because the thickness of the other dielectric layers is determined in relation to its own thickness. The dielectric layer closest to the transparent substrate in order to match the transmission band and the antireflection band to almost the center of the visible light region, and to be useful with high transmittance, low reflectance and reflection color required for an electromagnetic wave filter. Is preferably 42 nm ± 10 nm.

【0030】誘電体層の厚みが上記範囲を超えて厚くな
ると透過帯域及び反射防止帯域の中心波長は長波長側へ
シフトし、一方上記範囲を超えて薄くなると透過帯域及
び反射防止帯域の中心波長は短波長側へシフトしてしま
うので、本発明の目的の一つである可視光域は高透過で
あることと近赤外線遮断能が高いことの両者を満たすこ
とが困難になる。
When the thickness of the dielectric layer exceeds the above range, the center wavelengths of the transmission band and the antireflection band shift to longer wavelengths, whereas when the thickness of the dielectric layer exceeds the above range, the center wavelengths of the transmission band and the antireflection band increase. Is shifted to the shorter wavelength side, so that it is difficult to satisfy both of the object of the present invention, that is, high transmission of the visible light region and high near infrared blocking ability.

【0031】550nmの波長における透過率は、明る
い画像表示を損なわないために50%以上とするのが好
ましい。そのために上記銀主成分層を4層に分割すると
ともに、銀層を挟んで積層される誘電体層の550nm
の波長における屈折率を1.7〜2.7として、それら
の厚みが調整される。
The transmittance at a wavelength of 550 nm is preferably 50% or more so as not to impair a bright image display. For this purpose, the silver main component layer is divided into four layers, and the dielectric layer 550 nm
With the refractive index at the wavelength of 1.7 to 2.7, their thicknesses are adjusted.

【0032】本発明の請求項9は、請求項1〜8のいず
れかにおいて、さらに透明基板から最も遠くに積層され
た誘電体層上に、さらに銀主成分層および誘電体層を積
層した電磁波遮断フィルタである。さらに追加する銀主
成分層および誘電体層の厚みを選定して、5つに分割さ
れた銀主成分層および6つに分割された誘電体層とする
ことにより、さらに電磁波遮断能の大きい、たとえばシ
ート抵抗が1Ω/□以下の電磁波フィルタとすることが
できる。
A ninth aspect of the present invention is the electromagnetic wave according to any one of the first to eighth aspects, wherein the silver main component layer and the dielectric layer are further laminated on the dielectric layer laminated farthest from the transparent substrate. It is a cutoff filter. By further selecting the thickness of the silver main component layer and the dielectric layer to be added and forming the silver main component layer divided into five and the dielectric layer divided into six, the electromagnetic wave shielding ability is further increased. For example, an electromagnetic wave filter having a sheet resistance of 1Ω / □ or less can be used.

【0033】本発明に用いられる誘電体層は550nm
の波長における屈折率が1.7〜2.7の誘電体が用い
られる。それらの誘電体としては、酸化亜鉛、酸化錫、
酸化インジウム、酸化チタニウム、酸化ジルコニウム、
五酸化タンタル等の金属酸化物が例示できる。またこれ
らの混合物も用いることができる。たとえば酸化亜鉛と
酸化インジウムの混合物、ITOを用いることができ
る。これらの透明金属酸化物の2種以上を積層して多層
構成の誘電体層とすることができる。
The dielectric layer used in the present invention has a thickness of 550 nm.
A dielectric material having a refractive index of 1.7 to 2.7 at the wavelength described above is used. Zinc oxide, tin oxide,
Indium oxide, titanium oxide, zirconium oxide,
Examples thereof include metal oxides such as tantalum pentoxide. Also, a mixture of these can be used. For example, a mixture of zinc oxide and indium oxide, or ITO can be used. Two or more of these transparent metal oxides can be laminated to form a multilayer dielectric layer.

【0034】なかでも導電性である酸化亜鉛は、銀主成
分層に下地として積層すると、酸化亜鉛の結晶格子のピ
ッチが銀のそれと非常に近いため比抵抗の低い(結晶性
の高い)銀の膜成長に適しているので好ましい。また酸
化亜鉛は、雰囲気中の銀に対する腐食性ガスに含まれる
硫黄成分などを吸着して硫黄成分の銀層への直接到達を
妨げ、銀層を保護するので好ましい。また、酸化亜鉛に
アルミニウムやガリウムなどの金属を少量含有させた酸
化亜鉛主成分層は、導電性が増加するので、また後述す
る成膜時において利点があるので好ましい。
In particular, when zinc oxide, which is conductive, is laminated as a base layer on a silver main layer, the pitch of the crystal lattice of zinc oxide is very close to that of silver, so that zinc oxide having low specific resistance (high crystallinity) is used. It is preferable because it is suitable for film growth. Zinc oxide is also preferable because it adsorbs a sulfur component contained in a corrosive gas for silver in the atmosphere and prevents the sulfur component from directly reaching the silver layer, thereby protecting the silver layer. In addition, a zinc oxide main component layer in which zinc oxide contains a small amount of metal such as aluminum or gallium is preferable because conductivity increases and there is an advantage in film formation described later.

【0035】酸化錫やインジウムと亜鉛の複合酸化物
は、導電性があり、かつ非晶質の膜とすることができる
ので腐食性ガスに対するガスバリヤ性が高く、電磁波遮
断膜の耐湿熱性を向上させるので好ましい。これらは大
気などの環境中の腐食性ガスたとえばH2S、SO2、N
x、HClなどから銀層を保護する点でも好ましい。
The composite oxide of tin oxide or indium and zinc is conductive and can be formed into an amorphous film, so that it has a high gas barrier property against corrosive gases and improves the wet heat resistance of the electromagnetic wave shielding film. It is preferred. These are corrosive gases such as H 2 S, SO 2 , N
O x, it is also preferable in view to protect the silver layer or the like HCl.

【0036】上記理由から、本発明の誘電体層につい
て、その最表面層または各層を酸化錫と酸化亜鉛あるい
は酸化錫とアルミニウム含有酸化亜鉛(ZAOと略記す
る)の2層構成とするのが好ましい。この場合、銀層に
下地として接する膜を酸化亜鉛系の膜とするのが上記結
晶格子の関係から好ましい。
For the above reasons, it is preferable that the outermost layer or each layer of the dielectric layer of the present invention has a two-layer structure of tin oxide and zinc oxide or tin oxide and aluminum-containing zinc oxide (abbreviated as ZAO). . In this case, it is preferable that the film in contact with the silver layer as a base be a zinc oxide-based film in view of the above crystal lattice.

【0037】本発明に用いられる保護膜は、電磁波遮断
膜を大気雰囲気の外部環境から化学的、物理的に保護す
る目的で設けられる。保護膜として樹脂フィルムが例示
できる。この樹脂フィルムの550nmの波長における
屈折率は、電磁波遮断膜との界面反射光の整合性の観点
から1.58〜1.70とするのが好ましい。屈折率が
1.70を越すと、このフィルムと電磁波遮断膜との屈
折率差が大きくなり、この界面で起きる光の反射が強く
なり、電磁波フィルタの透過率を大きく下げてしまうの
で好ましくなく、1.58より小さいとフィルタの使用
者側から見た反射色が中性色から大きく外れてしまうの
で外観上好ましくない。
The protective film used in the present invention is provided for the purpose of chemically and physically protecting the electromagnetic wave shielding film from the external environment such as the atmosphere. A resin film can be exemplified as the protective film. The refractive index of the resin film at a wavelength of 550 nm is preferably 1.58 to 1.70 from the viewpoint of matching of the interface reflection light with the electromagnetic wave shielding film. If the refractive index exceeds 1.70, the refractive index difference between this film and the electromagnetic wave shielding film becomes large, and the reflection of light occurring at this interface becomes strong, so that the transmittance of the electromagnetic wave filter is greatly reduced. If the ratio is smaller than 1.58, the reflection color viewed from the user side of the filter greatly deviates from the neutral color, which is not preferable in appearance.

【0038】樹脂フィルムの厚さは、5μm〜5mmの
広い範囲のものが用いられる。本発明に用いることので
きるフィルムの材質としては、PET(ポリエチレンテ
レフタレート)やPE(ポリエステル)、TAC(トリ
アセチルセルロース)、PW(ポリウレタン)を例示で
きる。
The thickness of the resin film ranges from 5 μm to 5 mm. Examples of the material of the film that can be used in the present invention include PET (polyethylene terephthalate), PE (polyester), TAC (triacetyl cellulose), and PW (polyurethane).

【0039】本発明では、上記の樹脂フィルムを電磁波
遮断膜に接着剤で接着させるが、粘着層を介して接着す
るのが好ましい。粘着層としては、アクリル樹脂系粘着
層が耐久性がよいことから好ましい。
In the present invention, the above resin film is adhered to the electromagnetic wave shielding film with an adhesive, but is preferably adhered via an adhesive layer. As the adhesive layer, an acrylic resin-based adhesive layer is preferable because of its high durability.

【0040】この粘着層の厚さは、20〜500μmと
するのが好ましい。20μmより薄いと、貼り付ける時
に異物を噛み込んだときに生じる段差を吸収しづらくな
り、目視で判別出来る製品欠陥を生じやすくなるからで
ある。また500μmより厚いと外部環境からの水分の
浸入などを抑制し難くなるため、電磁波遮断膜の耐久性
を損ねることになるからである。
The thickness of the adhesive layer is preferably 20 to 500 μm. If the thickness is less than 20 μm, it is difficult to absorb a step generated when a foreign substance is caught at the time of sticking, and it is easy to cause a product defect that can be visually identified. On the other hand, if the thickness is more than 500 μm, it becomes difficult to suppress intrusion of moisture from the external environment, and the durability of the electromagnetic wave shielding film is impaired.

【0041】保護膜の第2のタイプとしては、透明金属
酸化物層を用いることができる。この場合、電磁波遮断
膜表面上に直接金属酸化物が被覆される。用いることが
できる金属酸化物としては、二酸化珪素、酸化アルミニ
ウム等が例示できる。またこのときの厚みは、約1μm
またはそれ以上の厚みとするのが、耐湿熱性や耐摩耗性
等について十分な機能を確保する上で好ましい。
As the second type of the protective film, a transparent metal oxide layer can be used. In this case, the metal oxide is directly coated on the surface of the electromagnetic wave shielding film. Examples of the metal oxide that can be used include silicon dioxide and aluminum oxide. The thickness at this time is about 1 μm
Alternatively, the thickness is preferably larger than that in order to ensure sufficient functions with respect to wet heat resistance, abrasion resistance, and the like.

【0042】本発明に用いることのできる透明基板とし
ては、ソーダライムシリカ組成のガラスや硼珪酸ガラ
ス、無アルカリガラスなどの公知のガラス板、PET、
アクリル(PMMA)、TACなどのプラスチック板を
例示することができる。
Examples of the transparent substrate that can be used in the present invention include known glass plates such as glass having a soda lime silica composition, borosilicate glass, and alkali-free glass, PET, and the like.
A plastic plate such as acrylic (PMMA) or TAC can be exemplified.

【0043】本発明の誘電体層、銀主成分層および金属
酸化物の保護膜は、公知の真空成膜法で成膜される。と
りわけスパッタリングによる成膜が好ましい。誘電体層
のうちでもアルミニウム含有酸化亜鉛(ZAOと略記)
の層は、酸化アルミニウムを数%含有する酸化亜鉛の微
粉末焼結体をターゲットとする直流スパッタリングで安
定放電状態下で成膜できるので好ましい。また二酸化珪
素等の膜厚が厚い保護膜の成膜については、公知のツイ
ンマグ(TWIN−MAG)方式のスパッタリング法が
高速に膜を堆積できるので好んで用いられる。
The dielectric layer, silver main layer and metal oxide protective film of the present invention are formed by a known vacuum film forming method. In particular, film formation by sputtering is preferable. Among the dielectric layers, aluminum-containing zinc oxide (abbreviated as ZAO)
Is preferred because it can be formed under a stable discharge state by DC sputtering using a fine powder sintered body of zinc oxide containing several percent of aluminum oxide. For forming a thick protective film such as silicon dioxide, a well-known twin-mag (TWIN-MAG) sputtering method is preferably used because the film can be deposited at a high speed.

【0044】成膜は通常室温で行うことができ、また銀
の結晶性を飛躍的に改善するため約300℃以下の温度
で適時基板を加熱しながら行ってもよい。また、室温で
成膜をした後、得られた電磁波遮断膜を大気中または窒
素雰囲気中で約300℃までの温度で加熱処理を施すこ
とにより、誘電体層中の光吸収を解消し、かつ銀層の比
抵抗を飛躍的に改善することができる。
Film formation can be carried out usually at room temperature, or may be carried out while heating the substrate at a temperature of about 300 ° C. or less as appropriate in order to dramatically improve the crystallinity of silver. Further, after the film is formed at room temperature, the obtained electromagnetic wave shielding film is subjected to a heat treatment at a temperature of up to about 300 ° C. in the air or a nitrogen atmosphere to eliminate light absorption in the dielectric layer, and The specific resistance of the silver layer can be dramatically improved.

【0045】本発明においては、電磁波遮断膜の表面、
樹脂フィルムの外側表面あるいは内側表面、透明基板の
電磁波遮断膜を被覆しない表面などに反射防止処理を施
して可視光線透過率をさらに向上させることができる。
In the present invention, the surface of the electromagnetic wave shielding film,
An antireflection treatment can be applied to the outer surface or the inner surface of the resin film, the surface of the transparent substrate that is not coated with the electromagnetic wave shielding film, and the like to further improve the visible light transmittance.

【0046】また可視光色補正用の色つきフィルムを用
いることにより、透過色調を無色に近づけることができ
る。
By using a colored film for correcting visible light color, the transmission color tone can be made closer to colorless.

【0047】[0047]

【発明の実施の形態】図1は、本発明の電磁波フィルタ
1の一実施例の断面図で、ガラス板5の表面に被覆され
た電磁波遮断膜2は、粘着層3によって樹脂フィルム4
と接着され、大気中に触れないように保護されている。
ガラス板5の周辺部には、ガラス板5の表面と電磁波遮
断膜2の間の一部に設けられた銀ペーストからなるアー
ス取り出し用のバスバー8が設けられている。また、バ
スバー8をガラス板5側から見ても見えないようにする
ために黒色セラミックパターン9がガラス板5の表面に
設けられている。
FIG. 1 is a sectional view of an embodiment of an electromagnetic wave filter 1 according to the present invention. An electromagnetic wave shielding film 2 coated on the surface of a glass plate 5 has a resin film 4 covered with an adhesive layer 3.
And is protected from touching the atmosphere.
At the periphery of the glass plate 5, there is provided a bus bar 8 for extracting the ground made of silver paste provided on a part between the surface of the glass plate 5 and the electromagnetic wave shielding film 2. Further, a black ceramic pattern 9 is provided on the surface of the glass plate 5 so that the bus bar 8 is invisible even when viewed from the glass plate 5 side.

【0048】図2は、本発明の電磁波遮断膜の層構成を
説明するための断面図で、ガラス板5の上に被覆された
電磁波遮断膜2は、誘電体層10と銀主成分層11とが
交互に被覆された積層体となっている。誘電体層は所定
範囲の屈折率を有する透明金属酸化物またはそれらの混
合物の単層体、あるいは2種以上の金属酸化物の層の多
層積層体として構成される。本発明においては、誘電体
層と銀主成分層の間に、可視光線透過率を大きく低下さ
せない範囲で銀以外の金属からなる、たとえばチタン等
の金属層を適時耐久性の向上や色調の調整などの目的の
ために介在させてもよい。
FIG. 2 is a cross-sectional view for explaining the layer structure of the electromagnetic wave shielding film of the present invention. The electromagnetic wave shielding film 2 coated on the glass plate 5 is composed of a dielectric layer 10 and a silver main layer 11. Are alternately coated. The dielectric layer is formed as a single layer of a transparent metal oxide having a predetermined range of refractive index or a mixture thereof, or as a multilayer of two or more metal oxide layers. In the present invention, between the dielectric layer and the silver main layer, a metal layer made of a metal other than silver, such as titanium, for example, in a range that does not significantly reduce the visible light transmittance, is improved in durability and color tone in a timely manner. It may be interposed for such a purpose.

【0049】図3は、本発明の電磁波フィルタ1の使用
状態を説明する概略断面図である。電磁波フィルタ1は
プラズマディスプレイパネル6の前面に筐体7により保
持され固定される。図4は実施例1で得られたサンプル
の分光透過率特性であり、図5は実施例1で得られたサ
ンプルの分光反射率特性である。
FIG. 3 is a schematic sectional view for explaining a use state of the electromagnetic wave filter 1 of the present invention. The electromagnetic wave filter 1 is held and fixed to a front surface of the plasma display panel 6 by a housing 7. FIG. 4 shows the spectral transmittance characteristics of the sample obtained in Example 1, and FIG. 5 shows the spectral reflectance characteristics of the sample obtained in Example 1.

【0050】以下に本発明を実施例と比較例により説明
する。 表1〜表4の説明 ・ガラス板:厚み2mmのソーダライムシリカ組成のフ
ロートガラス板 ・ZAO:6重量%のアルミニウムを含有する酸化亜鉛
層 ・AgPd0.4:銀に対してパラジウムを0.4原子
%含有する銀主成分層 ・( )内の数値は厚みで、電磁波遮断膜はnm単位、
粘着層および保護膜はμm単位で表示。 ・第1、第3、第5、第7、第9層目の誘電体層の多層
構成は、透明基板に近い順に上から下へ記載した。
Hereinafter, the present invention will be described with reference to Examples and Comparative Examples. Description of Tables 1 to 4 Glass plate: float glass plate with soda lime silica composition having a thickness of 2 mm ZAO: zinc oxide layer containing 6% by weight of aluminum AgPd0.4: 0.4 palladium to silver Atomic% -containing silver main component layer ・ The value in parentheses is the thickness, the electromagnetic wave shielding film is in nm,
The adhesive layer and protective film are indicated in μm units. -The multilayer structure of the first, third, fifth, seventh, and ninth dielectric layers is described from top to bottom in order of proximity to the transparent substrate.

【0051】表5の説明 ・シート抵抗:四端子法抵抗計で測定し、2Ω/□以下
を○、2Ω/□を越えるものを×で表示。 ・近赤外線透過率:波長850nmにおける透過率で表
示し、15%以下を○、15%を越えるものを×で表示 ・耐湿熱性:温度60℃、湿度90%に維持して目視で
ヒロックやピンホール、曇りなどの発生が認められた時
間で表示し、500時間以上を○、500時間未満を×
で表示
Description of Table 5 Sheet resistance: Measured by a four-terminal method resistance meter, and 2Ω / □ or less is indicated by ○, and one exceeding 2Ω / □ is indicated by ×. -Near-infrared transmittance: expressed as transmittance at a wavelength of 850 nm, ○ indicates less than 15%, and x indicates that exceeds 15%.-Moisture and heat resistance: visually observed hillocks and pins at a temperature of 60 ° C. and a humidity of 90%. Indicated by the time when the occurrence of a hole, cloudiness, etc. was observed. ○: 500 hours or more, ×: less than 500 hours
Display with

【0052】表6の説明 ・光透過率:450nm、550nm、650nmにお
ける透過率を分光光度計で測定。いずれの波長でも50
%以上を○、それ以外を×で表示。 ・色調:透過光およびガラス面側入射光によるCeal
ab色座標系のa*,b*各2軸の値。−1<a*<4か
つ−8<b*<1であるものを○、それ以外を×で表示
した。
Description of Table 6: Light transmittance: transmittance at 450 nm, 550 nm, and 650 nm was measured with a spectrophotometer. 50 at any wavelength
% Or more is indicated by ○, and others are indicated by ×.・ Color: Ceal due to transmitted light and light incident on the glass surface side
Values of two axes a * and b * in the ab color coordinate system. Those in which -1 <a * <4 and -8 <b * <1 were indicated by ○, and others were indicated by x.

【0053】実施例1 2mm厚の透明ガラス板上に、表1の実施例1の欄に示
した積層体をインライン型スパッタリング装置で成膜し
た。このときSnO2はSnメタルターゲットの酸素と
の反応性スパッタリングで、ZAO層はZn(94重量
%)Al(6重量%)のメタルターゲットの酸素との反
応性スパッタリングで、銀主成分層はAg(99.6重
量%)Pd(0.4重量%)のメタルターゲットのアル
ゴンガスによるスパッタリングで、表1に示した所定の
膜厚に室温で成膜した。その後この積層膜を大気中20
0℃にて30分熱処理を行い、誘電体層の光吸収を解消
し、かつ銀層の結晶性を向上させた。さらに、その表面
に粘着層を有したAR(反射防止)処理つきPETフィ
ルムを貼り付け、電磁波遮断膜の保護とガラスの割れ飛
散防止を行った。以上により製造した4つに分割された
銀主成分層と5つに分割された誘電体層からなる電磁波
フィルタ(4・5タイプと記す)の各特性を表5と表6
に示す。
Example 1 A laminate shown in the column of Example 1 in Table 1 was formed on a transparent glass plate having a thickness of 2 mm by an in-line type sputtering apparatus. At this time, SnO 2 is reactive sputtering with oxygen of a Sn metal target, the ZAO layer is reactive sputtering with oxygen of a Zn (94% by weight) Al (6% by weight) metal target, and the silver main layer is Ag. (99.6% by weight) Pd (0.4% by weight) was sputtered with an argon gas on a metal target to form a film having a predetermined thickness shown in Table 1 at room temperature. After that, this laminated film is exposed to air
A heat treatment was performed at 0 ° C. for 30 minutes to eliminate the light absorption of the dielectric layer and improve the crystallinity of the silver layer. Further, a PET film having an AR (anti-reflection) treatment having an adhesive layer on its surface was adhered to protect the electromagnetic wave shielding film and prevent the glass from being scattered and scattered. Tables 5 and 6 show the characteristics of the electromagnetic wave filter (referred to as the 4.5 type) composed of the silver main component layer divided into four and the dielectric layer divided into five manufactured as described above.
Shown in

【0054】このサンプルのシート抵抗、近赤外線透過
率および耐湿熱性は、いずれも電磁波フィルタとして良
好で○評価であった。また透過率、反射率、色調のいず
れの光学特性についても良好で、電磁波フィルタとして
○評価であった。また、このサンプルの分光透過率およ
び分光反射率特性を図4、図5に示す。反射率は可視域
の広帯域で低いことが分かる。
The sheet resistance, near-infrared transmittance and wet heat resistance of this sample were all favorable as electromagnetic filters, and were evaluated as ○. Further, all of the optical characteristics such as transmittance, reflectance, and color tone were good, and the electromagnetic wave filter was evaluated as ○. 4 and 5 show the spectral transmittance and spectral reflectance characteristics of this sample. It can be seen that the reflectance is low over a wide band in the visible region.

【0055】実施例2および実施例3 実施例1とは、銀主成分層のパラジウム含有量、誘電体
層の積層の仕方およびその厚みを変えた以外は同じよう
にして電磁波フィルタ(4・5タイプ)のサンプルを作
成した。このサンプルの積層構成を表1に、得られた特
性を表5と表6に示す。これらのサンプルのシート抵
抗、近赤外線透過率および耐湿熱性は、いずれも電磁波
フィルタとして良好で○評価であった。また透過率、色
調のいずれの光学特性についても良好で、電磁波フィル
タとして○評価であった。
Embodiments 2 and 3 The electromagnetic wave filters (4.5) were produced in the same manner as in Embodiment 1 except that the palladium content of the silver main layer, the method of laminating the dielectric layers and the thickness thereof were changed. Type) sample was created. Table 1 shows the laminated structure of this sample, and Tables 5 and 6 show the obtained characteristics. The sheet resistance, near-infrared transmittance and wet heat resistance of these samples were all good as electromagnetic filters, and were evaluated as ○. In addition, the optical characteristics of both transmittance and color tone were good, and the electromagnetic wave filter was evaluated as ○.

【0056】実施例1〜実施例3で得られた電磁波フィ
ルタは、電磁波遮断膜の積層体を多層光学膜のコンピュ
ータ計算プログラムを用いて計算して得たもののなか
で、本発明の目的に最も好ましいと考えられる特性を有
する例である。シート抵抗、耐湿熱性で表せる耐久性に
ついての実用要求特性を満足し、また可視域の光学特性
もプラズマディスプレイの明るい表示を大きく低下させ
ず、反射色調も良好であることが分かる。
The electromagnetic wave filters obtained in Examples 1 to 3 are the most suitable for the object of the present invention, among the ones obtained by calculating a laminate of electromagnetic wave shielding films using a computer calculation program for a multilayer optical film. This is an example having characteristics considered to be preferable. It can be seen that the sheet material satisfies the practical requirements for durability expressed by sheet resistance and moist heat resistance, and that the optical characteristics in the visible region do not significantly reduce bright display of the plasma display, and that the reflection color tone is good.

【0057】実施例4 実施例1と同じ方法で、表2に示す銀主成分層の厚みを
比較的薄い膜構成の電磁波フィルタ(4・5タイプ)の
サンプルを作成した。表5および表6に示すように、赤
外線透過率および耐湿熱性は、いずれも電磁波フィルタ
として良好で○評価であった。また透過率、色調のいず
れの光学特性についても良好で、電磁波フィルタとして
実用的に要求される特性を有することが分かる。
Example 4 In the same manner as in Example 1, samples of an electromagnetic wave filter (4.5 type) having a relatively thin silver main layer as shown in Table 2 were prepared. As shown in Tables 5 and 6, both the infrared transmittance and the moist heat resistance were good as an electromagnetic wave filter and evaluated as ○. Further, it is understood that the optical characteristics of both the transmittance and the color tone are good, and it has the characteristics practically required as an electromagnetic wave filter.

【0058】実施例5 実施例1と同じ方法で、表2に示す膜構成の電磁波フィ
ルタ(4・5タイプ)のサンプルを作成した。このサン
プルの銀主成分層は厚目に設定されたものである。この
サンプルのシート抵抗、近赤外線透過率および耐湿熱性
は、いずれも電磁波フィルタとして良好で○評価であっ
た。また透過率、反射率、色調のいずれの光学特性につ
いても良好で、電磁波フィルタとして実用的に要求され
る特性を有することが分かる。
Example 5 In the same manner as in Example 1, samples of electromagnetic wave filters (4.5 type) having the film configurations shown in Table 2 were prepared. The silver main component layer of this sample was set to be thick. The sheet resistance, near-infrared transmittance and wet heat resistance of this sample were all good as an electromagnetic wave filter and evaluated as ○. In addition, the optical characteristics such as transmittance, reflectance, and color tone are good, and it can be seen that they have characteristics that are practically required as an electromagnetic wave filter.

【0059】実施例6 実施例1と同じ方法で、表2に示す膜構成のサンプルの
電磁波フィルタ(4・5タイプ)のサンプルを作成し
た。このサンプルの誘電体層は厚目に設定したものであ
る。表5および表6に示すように、サンプルのシート抵
抗、近赤外線透過率および耐湿熱性は、いずれも電磁波
フィルタとして良好で○評価であった。また透過率、反
射率、色調のいずれの光学特性についても良好で、電磁
波フィルタとして実用的に要求される特性を有すること
が分かる。
Example 6 In the same manner as in Example 1, samples of the electromagnetic filter (4.5 type) having the film configurations shown in Table 2 were prepared. The dielectric layer of this sample was set thick. As shown in Tables 5 and 6, the sheet resistance, near-infrared transmittance, and wet heat resistance of the samples were all favorable as electromagnetic filters, and were evaluated as ○. In addition, the optical characteristics such as transmittance, reflectance, and color tone are good, and it can be seen that they have characteristics that are practically required as an electromagnetic wave filter.

【0060】実施例7 実施例1と同じ方法で、表2に示す膜構成の電磁波フィ
ルタ(4・5タイプ)のサンプルを作成した。このサン
プルの誘電体層の厚みは薄目に設定したものである。表
5および表6に示すように、このサンプルのシート抵
抗、近赤外線透過率および耐湿熱性は、いずれも電磁波
フィルタとして良好で○評価であった。また透過率、反
射率、色調のいずれの光学特性についても良好で、電磁
波フィルタとして実用的に要求される特性を有すること
が分かる。
Example 7 In the same manner as in Example 1, samples of the electromagnetic wave filters (4.5 types) having the film configurations shown in Table 2 were prepared. The thickness of the dielectric layer of this sample was set to be thin. As shown in Tables 5 and 6, the sheet resistance, near-infrared transmittance, and wet heat resistance of this sample were all good as an electromagnetic wave filter and evaluated as ○. In addition, the optical characteristics such as transmittance, reflectance, and color tone are good, and it can be seen that they have characteristics that are practically required as an electromagnetic wave filter.

【0061】実施例8 表2に示す膜構成からなる11層からなる電磁波フィル
タ(5・6タイプ)のサンプルを作成した。表5および
表6に示すように、このサンプルのシート抵抗、近赤外
線透過率および耐湿熱性は、いずれも電磁波フィルタと
して良好で○評価であった。また透過率、反射率、色調
のいずれの光学特性についても良好で、電磁波フィルタ
として実用的に要求される特性を有することが分かる。
Example 8 A sample of an electromagnetic wave filter (5.6 type) composed of 11 layers having the film configurations shown in Table 2 was prepared. As shown in Tables 5 and 6, the sheet resistance, near-infrared transmittance, and wet heat resistance of this sample were all good as an electromagnetic wave filter and evaluated as ○. In addition, the optical characteristics such as transmittance, reflectance, and color tone are good, and it can be seen that they have characteristics that are practically required as an electromagnetic wave filter.

【0062】実施例9 実施例1の誘電体層および銀主成分層の積層構成(同一
膜厚)で、銀に含有させるパラジウム量を変えて850
nmの波長における透過率を測定した結果を表7に示
す。表7からパラジウム含有量が増加すると、850n
mの透過率が大きくなり近赤外線の遮断能が低下するこ
とがることが分かった。一方、耐湿熱性は、パラジウム
含有量が増加するとよくなることが分かった。
Example 9 In the laminated structure (the same film thickness) of the dielectric layer and the silver main layer of Example 1, the amount of palladium contained in silver was changed to 850.
Table 7 shows the measurement results of the transmittance at the wavelength of nm. As can be seen from Table 7, when the palladium content increases, 850 n
It has been found that the transmittance of m increases and the ability to block near infrared rays decreases. On the other hand, it was found that the moist heat resistance improved as the palladium content increased.

【0063】以上から、近赤外線の遮断能と耐湿熱性の
両者をバランス良く確保するパラジウム含有量があるこ
とが判明した。上記二つの性能を実用的にバランス良く
確保するためには、銀主成分中に含有させるパラジウム
量は銀に対して0.10原子%以上が好ましく、さらに
0.3原子%以上が好ましい。またその上限値は0.4
5原子%以下が好ましく、0.4原子%以下とするのが
さらに好ましい。
From the above, it has been found that there is a palladium content that ensures both a near-infrared ray blocking ability and a wet heat resistance in a well-balanced manner. In order to ensure the above two performances in a practically balanced manner, the amount of palladium contained in the silver main component is preferably at least 0.10 atomic%, more preferably at least 0.3 atomic%, based on silver. The upper limit is 0.4
It is preferably at most 5 atomic%, more preferably at most 0.4 atomic%.

【0064】[0064]

【表1】 ================================= 構成 実施例1 実施例2 実施例3 実施例4 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 透明基板 カ゛ラス板 カ゛ラス板 カ゛ラス板 カ゛ラス板 第1層 SnO2(34) ZAO(41) SnO2(36) SnO2(34) ZAO(7) ZAO(8) ZAO(7) 第2層 AgPd0.4(10) AgPd0.4(11) AgPd0.3(12) AgPd0.4(7) 第3層 ZAO(7) ZAO(76) ZAO(8) ZAO(7) SnO2(62) SnO2(66) SnO2(62) ZAO(7) ZAO(8) ZAO(7) 第4層 AgPd0.4(11) AgPd0.4(12) AgPd0.3(13 AgPd0.4(8) 第5層 ZAO(7) ZAO(76) ZAO(8) ZAO(7) SnO2(60) SnO2(63) SnO2(60) ZAO(7) ZAO(8) ZAO(7) 第6層 AgPd0.4(11) AgPd0.4(12) AgPd0.3(13)AgPd0.4(8) 第7層 ZAO(7) ZAO(76) ZAO(8) ZAO(7) SnO2(62) SnO2(66) SnO2(62) ZAO(7) ZAO(8) ZAO(7) 第8層 AgPd0.4(10) AgPd0.4(11) AgPd0.3(12)AgPd0.4(7) 第9層 ZAO(7) ZAO(39) ZAO(8) ZAO(7) SnO2(32) SnO2(34) SnO2(32) 粘着層 (50) (100) (100) (50) 保護膜 PET(50) PET(75) PET(50) PET(50) ==================================[Table 1] ================================ Configuration Example 1 Example 2 Example 3 Example 4 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− Transparent substrate Glass plate Glass plate Glass plate Glass plate First layer SnO 2 (34 ) ZAO (41) SnO 2 (36) SnO 2 (34) ZAO (7) ZAO (8) ZAO (7) Second layer AgPd0.4 (10) AgPd0.4 (11) AgPd0.3 (12) AgPd0. 4 (7) the third layer ZAO (7) ZAO (76) ZAO (8) ZAO (7) SnO 2 (62) SnO 2 (66) SnO 2 (62) ZAO (7) ZAO (8) ZAO (7) 4th layer AgPd0.4 (11) AgPd0.4 (12) AgPd0.3 (13 AgPd0.4 (8) 5th layer ZAO (7) ZAO (76) ZAO (8) ZAO (7) SnO 2 (60) SnO 2 (63) SnO 2 (60) ZAO (7) ZAO (8) ZAO (7) 6th layer AgPd0.4 (11) AgPd0.4 (12) AgPd0.3 (13) AgPd0.4 (8) 7 layers ZAO (7) ZAO (76) ZAO (8) ZAO (7) SnO 2 (62) SnO 2 (66) SnO 2 (62) ZAO (7) ZAO (8) ZAO (7) 8th layer AgPd0.4 (10) AgPd0.4 (11) AgPd0.3 (12) AgPd0.4 (7) 9th layer ZAO (7) ZAO (39) ZAO (8) ZAO (7) SnO 2 (32) SnO 2 (34) SnO 2 (32) Adhesive layer (50) (100) (100) (50) Protective film PET (50 ) PET (75) PET (50) PET (50) ====================================

【0065】[0065]

【表2】 ================================ 構成 実施例5 実施例6 実施例7 実施例8 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 透明基板 カ゛ラス板 カ゛ラス板 カ゛ラス板 カ゛ラス板 第1層 SnO2(34) SnO2(40) SnO2(26) SnO2(28) ZAO(7) ZAO(12) ZAO(6) ZAO(9) 第2層 AgPd0.4(17) AgPd0.4(10) AgPd0.4(10)AgPd0.4(9) 第3層 ZAO(7) ZAO(8) ZAO(5) ZAO(8) SnO2(62) SnO2(73) SnO2(45) SnO2(51) ZAO(7) ZAO(8) ZAO(5) ZAO(8) 第4層 AgPd0.4(19) AgPd0.4(11) AgPd0.4(11)AgPd0.4(9) 第5層 ZAO(7) ZAO(8) ZAO(5) ZAO(7) SnO2(60) SnO2(71) SnO2(44) SnO2(73) ZAO(7) ZAO(8) ZAO(5) ZAO(7) 第6層 AgPd0.4(19) AgPd0.4(11) AgPd0.4(11)AgPd0.4(9) 第7層 ZAO(7) ZAO(8) ZAO(5) ZAO(8) SnO2(62) SnO2(73) SnO2(45) SnO2(50) ZAO(7) ZAO(8) ZAO(5) ZAO(8) 第8層 AgPd0.4(17) AgPd0.4(10) AgPd0.4(10)AgPd0.4(10) 第9層 ZAO(7) ZAO(8) ZAO(5) ZAO(9) SnO2(32) SnO2(38) SnO2(23) SnO2(57) ZAO(9) 第10層 AgPd0.4(9) 第11層 ZAO(9) SnO2(28) 粘着層 (50) (50) (50) なし 保護膜 PET(50) PET(50) PET(50) SiO2(1) ==================================Table 2 =============================== Configuration Example 5 Example 6 Example 7 Example 8- −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− Transparent substrate Glass plate Glass plate Glass plate Glass plate First layer SnO 2 (34) SnO 2 (40) SnO 2 (26) SnO 2 (28) ZAO (7) ZAO (12) ZAO (6) ZAO (9) Second layer AgPd0.4 (17) AgPd0.4 (10) AgPd0.4 (10 ) AgPd0.4 (9) a third layer ZAO (7) ZAO (8) ZAO (5) ZAO (8) SnO 2 (62) SnO 2 (73) SnO 2 (45) SnO 2 (51) ZAO (7) ZAO (8) ZAO (5) ZAO (8) 4th layer AgPd0.4 (19) AgPd0.4 (11) AgPd0.4 (11) AgPd0.4 (9) 5th layer ZAO (7) ZAO (8) ZAO (5) ZAO (7) SnO 2 (60) SnO 2 (71) SnO 2 (44) SnO 2 (73) ZAO (7) ZAO (8) ZAO (5) ZAO (7) 6th layer AgPd0.4 (19) AgPd0.4 (11) AgPd0.4 (11) AgPd0.4 (9) 7th layer ZAO (7) ZAO 8) ZAO (5) ZAO ( 8) SnO 2 (62) SnO 2 (73) SnO 2 (45) SnO 2 (50) ZAO (7) ZAO (8) ZAO (5) ZAO (8) the eighth layer AgPd0 .4 (17) AgPd0.4 (10) AgPd0.4 (10) AgPd0.4 (10) ninth layer ZAO (7) ZAO (8) ZAO (5) ZAO (9) SnO 2 (32) SnO 2 ( 38) SnO 2 (23) SnO 2 (57) ZAO (9) 10th layer AgPd0.4 (9) 11th layer ZAO (9) SnO 2 (28) Adhesive layer (50) (50) (50) None Protection Film PET (50) PET (50) PET (50) SiO 2 (1) ===================================== ==

【0066】[0066]

【表3】 ================================= 構成 比較例1 比較例2 比較例3 比較例4 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 透明基板 カ゛ラス板 カ゛ラス板 カ゛ラス板 カ゛ラス板 電磁波遮断膜 第1層 SnO2(34) SnO2(34) SnO2(34) SnO2(34) ZAO(7) ZAO(7) ZAO(7) ZAO(7) 第2層 AgPd1.0(10) AgPd0.05(10) AgPd0.4(8) AgPd0.4(4) 第3層 ZAO(7) ZAO(7) ZAO(7) ZAO(7) SnO2(62) SnO2(62) SnO2(50) SnO2(62) ZAO(7) ZAO(7) ZAO(7) ZAO(7) 第4層 AgPd1.0(11) AgPd0.05(11) AgPd0.4(9) AgPd0.4(4) 第5層 ZAO(7) ZAO(7) ZAO(7) ZAO(7) SnO2(60) SnO2(60) SnO2(52) SnO2(60) ZAO(7) ZAO(7) ZAO(7) ZAO(7) 第6層 AgPd1.0(11) AgPd0.05(11) AgPd0.4(7) AgPd0.4(4) 第7層 ZAO(7) ZAO(7) ZAO(7) ZAO(7) SnO2(62) SnO2(62) SnO2(35) SnO2(62) ZAO(7) ZAO(7) ZAO(7) 第8層 AgPd1.0(10) AgPd0.05(10) AgPd0.4(4) 第9層 ZAO(7) ZAO(7) ZAO(7) SnO2(32) SnO2(32) SnO2(32) 粘着層 (50) (50) (50) (50) 保護膜 PET(50) PET(75) PET(50) PET(50) =================================[Table 3] ================================ Configuration Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− Transparent substrate Glass plate Glass plate Glass plate Glass plate Electromagnetic wave shielding film First layer SnO 2 (34) SnO 2 (34) SnO 2 (34) SnO 2 (34) ZAO (7) ZAO (7) ZAO (7) ZAO (7) Second layer AgPd1.0 (10) AgPd0.05 (10) AgPd0.4 (8) AgPd0.4 (4) a third layer ZAO (7) ZAO (7) ZAO (7) ZAO (7) SnO 2 (62) SnO 2 (62) SnO 2 (50) SnO 2 (62 ) ZAO (7) ZAO (7) ZAO (7) ZAO (7) 4th layer AgPd1.0 (11) AgPd0.05 (11) AgPd0.4 (9) AgPd0.4 (4) 5th layer ZAO (7) ) ZAO (7) ZAO (7) ZAO (7) SnO 2 (60) SnO 2 (60) SnO 2 (52) SnO 2 (60) ZAO (7) ZAO (7) ZAO (7) ZAO (7) Six layers AgPd1.0 (11) AgPd0.05 (11) AgPd0.4 (7) AgPd0. 4 (4) 7th layer ZAO (7) ZAO (7) ZAO (7) ZAO (7) SnO 2 (62) SnO 2 (62) SnO 2 (35) SnO 2 (62) ZAO (7) ZAO (7 ) ZAO (7) 8th layer AgPd1.0 (10) AgPd0.05 (10) AgPd0.4 (4) 9th layer ZAO (7) ZAO (7) ZAO (7) SnO 2 (32) SnO 2 (32 ) SnO 2 (32) Adhesive layer (50) (50) (50) (50) Protective film PET (50) PET (75) PET (50) PET (50) ============= =====================

【0067】[0067]

【表4】 ============================ 構成 比較例5 比較例6 比較例7 −−−−−−−−−−−−−−−−−−−−−−−−−−−− 透明基板 カ゛ラス板 カ゛ラス板 カ゛ラス板 電磁波遮断膜 第1層 SnO2(34) SnO2(48) SnO2(21) ZAO(7) ZAO(14) ZAO(5) 第2層 AgPd0.4(22) AgPd0.4(10) AgPd0.4(10) 第3層 ZAO(7) ZAO(10) ZAO(4) SnO2(62) SnO2(98) SnO2(36) ZAO(7) ZAO(10) ZAO(4) 第4層 AgPd0.4(24) AgPd0.4(11) AgPd0.4(11) 第5層 ZAO(7) ZAO(10) ZAO(4) SnO2(60) SnO2(95) SnO2(35) ZAO(7) ZAO(10) ZAO(4) 第6層 AgPd0.4(24) AgPd0.4(11) AgPd0.4(11) 第7層 ZAO(7) ZAO(10 ZAO(4) SnO2(60) SnO2(98) SnO2(36) ZAO(7) ZAO(10) ZAO(4) 第8層 AgPd0.4(22) AgPd0.4(10) AgPd0.4(10) 第9層 ZAO(7) ZAO(10) ZAO(4) SnO2(32) SnO2(46) SnO2(18) 粘着層 (50) (50) (50) 保護膜 PET(50) PET(75) PET(50) ============================[Table 4] ============================ Configuration Comparative Example 5 Comparative Example 6 Comparative Example 7 −−−−−−−−−− −−−−−−−−−−−−−−−−−−−− Transparent substrate Glass plate Glass plate Glass plate Electromagnetic wave shielding film First layer SnO 2 (34) SnO 2 (48) SnO 2 (21) ZAO (7) ZAO (14) ZAO (5) a second layer AgPd0.4 (22) AgPd0.4 (10) AgPd0.4 (10) a third layer ZAO (7) ZAO (10) ZAO (4) SnO 2 ( 62) SnO 2 (98) SnO 2 (36) ZAO (7) ZAO (10) ZAO (4) 4th layer AgPd0.4 (24) AgPd0.4 (11) AgPd0.4 (11) 5th layer ZAO ( 7) ZAO (10) ZAO (4) SnO 2 (60) SnO 2 (95) SnO 2 (35) ZAO (7) ZAO (10) ZAO (4) 6th layer AgPd0.4 (24) AgPd0.4 ( 11) AgPd0.4 (11) 7th layer ZAO (7) ZAO (10 ZAO (4) SnO 2 (60) SnO 2 (98) SnO 2 (36) ZAO (7) ZAO (10) ZAO (4) the 8-layer AgPd0.4 (22) AgPd0.4 (10) AgPd0.4 (10) No. Layer ZAO (7) ZAO (10) ZAO (4) SnO 2 (32) SnO 2 (46) SnO 2 (18) adhesive layer (50) (50) (50) protective film PET (50) PET (75) PET (50) ===========================

【0068】[0068]

【表5】 ============================= 電磁波遮断能、 赤外線遮断能 膜の耐湿熱性 例 シート抵抗 850nmの透過率 劣化状態 (Ω/□) (%) (時間) −−−−−−−−−−−−−−−−−−−−−−−−−−−−− 実施例1 1.5(○) 9(○) 840(○) 実施例2 1.3(○) 8(○) 720(○) 実施例3 1.2(○) 7(○) 672(○) 実施例4 2.0(○) 15(○) 624(○) 実施例5 0.9(○) 3(○) 1224(○) 実施例6 1.4(○) 14(○) 864(○) 実施例7 1.6(○) 7(○) 816(○) 実施例8 −−−−−−−−−−−−−−−−−−−−−−−−−−−−− 比較例1 1.8(×) 22(×) 912(○) 比較例2 1.3(○) 7(○) 384(○) 比較例3 2.5(×) 12(○) 672(○) 比較例4 4.2(×) 51(×) 504(○) 比較例5 0.8(○) 2(○) 1248(○) 比較例6 1.4(○) 17(×) 864(○) 比較例7 1.7(○) 6(×) 672(○) =============================[Table 5] ============================= Electromagnetic wave shielding ability, infrared shielding ability Moisture / heat resistance of film Example Sheet resistance 850 nm transmission Rate Deterioration state (Ω / □) (%) (Time) −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− Example 1 1.5 ( ○) 9 (○) 840 (○) Example 2 1.3 (○) 8 (○) 720 (○) Example 3 1.2 (○) 7 (○) 672 (○) Example 4 2.0 (○) 15 (○) 624 (○) Example 5 0.9 (○) 3 (○) 1224 (○) Example 6 1.4 (○) 14 (○) 864 (○) Example 7 1. 6 (○) 7 (○) 816 (○) Example 8 ----------------------------------------------------------------------------------------- Comparative Example 1 1.8 (×) 22 (×) 912 (○) Comparative Example 2 1.3 (○) 7 ( ) 384 (O) Comparative Example 3 2.5 (X) 12 (O) 672 (O) Comparative Example 4 4.2 (X) 51 (X) 504 (O) Comparative Example 5 0.8 (O) 2 ( ○) 1248 (○) Comparative Example 6 1.4 (○) 17 (×) 864 (○) Comparative Example 7 1.7 (○) 6 (×) 672 (○) =========== ===================

【0069】[0069]

【表6】 ============================== 可視域の光学特性 例 光透過率(%) カ゛ラス面反射色 透過色 450nm 550nm 650nm a*/b**/b* −−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 実施例1 56 63 57 1.0/-2.5 -4.5/6.3 実施例2 55 64 53 2.0/-1.7 -3.9/3.2 実施例3 55 60 52 0.9/-3.0 -4.0/5.1 実施例4 70 72 70 0.2/-0.1 -0.1/0.2 実施例5 51 61 50 2.9/-5.2 -6.1/3.0 実施例6 50 62 61 -0.5/-6.0 1.0/2.0 実施例7 63 62 50 2.5/0.2 -4.0/-2.0 実施例8 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 比較例1 66 68 61 0.5/-2.4 -3.3/5.0 比較例2 58 68 61 2.1/-3.0 -6.5/3.1 比較例3 66 68 61 3.0/-0.3 -2.0/0.1 比較例4 76 82 80 0.1/-0.2 -0.2/0.1 比較例5 41 48 40 5.0/-4.5 -8.5/0.5 比較例6 39 60 63 -0.8/-8.1 2.0/1.0 比較例7 59 56 38 4.1/0.5 -4.1/-3.2 ===============================[Table 6] ============================== Optical Characteristics in the Visible Region Example Light Transmittance (%) Glass Reflection Color Transmission color 450 nm 550 nm 650 nm a * / b * a * / b * --------------------------------------------------------------------------------------------------------------------- Example 1 56 63 57 1.0 / -2.5 -4.5 / 6.3 Example 2 55 64 53 2.0 / -1.7 -3.9 / 3.2 Example 3 55 60 52 0.9 / -3.0 -4.0 / 5.1 Example 4 70 72 70 0.2 / -0.1 -0.1 / 0.2 Example 5 51 61 50 2.9 / -5.2 -6.1 / 3.0 Example 6 50 62 61 -0.5 / -6.0 1.0 / 2.0 Example 7 63 62 50 2.5 / 0.2 -4.0 / -2.0 Example 8 ------ −−−−−−−−−−−−−−−−−−−−−−−−−−−− Comparative Example 1 66 68 61 0.5 / -2.4 -3.3 / 5.0 Comparative Example 2 58 68 61 2.1 / − 3.0 -6.5 / 3.1 Comparative Example 3 66 68 61 3.0 / -0.3 -2.0 / 0.1 Comparative Example 4 76 82 80 0.1 / -0.2 -0.2 / 0.1 Comparative Example 5 41 48 40 5.0 / -4.5 -8.5 / 0.5 Comparative Example 6 39 60 63 -0.8 / -8.1 2. 0 / 1.0 Comparative Example 7 59 56 38 4.1 / 0.5 -4.1 / -3.2 ==================================

【0070】[0070]

【表7】 ================================== 銀主成分層中のパラ 850nmの波長 耐湿熱性 ジウム含有量(原子%) における透過率(%) (時間) −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 0 3.7 192 0.1 6.0 504 0.3 11.7 600 0.4 13.7 768 0.45 14.2 792 0.5 15.0 792 1.0 22.0 1200 2.0 27.0 1512 ==================================[Table 7] ================================= Wavelength of para 850 nm in silver main component layer Transmittance (%) at the content of atium (atomic%) (time) ------------------------------------ 0 3.7 192 0.1 6.0 504 0.3 11.7 600 0.4 13.7 768 0.45 14.2 792 0.5 15.0 792 1.0 22.0 1200 2.0 27.0 1512 ==================================

【0071】比較例1 実施例1と同様の方法で、表3に示す積層構成の電磁波
フィルタ(4・5タイプ)の比較サンプルを作成した。
得られた比較サンプルの特性を表5および表6に示す。
このサンプルは、銀主成分層に1原子%のパラジウムを
含有するものである。シート抵抗は1.8Ω/□と小さ
い値を有するが、850nmにおける透過率(この値が
小さいことは近赤外線遮断能が大きいことを意味する)
は22%と大きく、実用的に要求される特性を有してい
なかった。これは、後述する銀層にパラジウムが多く含
有するために電磁波遮断能は良好であるが、近赤外線の
遮断能が低下したためと考えられた。
Comparative Example 1 In the same manner as in Example 1, a comparative sample of an electromagnetic wave filter (4.5 type) having a laminated structure shown in Table 3 was prepared.
Tables 5 and 6 show the properties of the obtained comparative samples.
In this sample, the silver main layer contains 1 atomic% of palladium. Although the sheet resistance has a small value of 1.8 Ω / □, the transmittance at 850 nm (a small value means a large near-infrared ray blocking ability).
Was as large as 22%, and did not have the properties required for practical use. This is considered to be because the silver layer described later contains a large amount of palladium and thus has a good electromagnetic wave shielding ability, but the near infrared shielding ability is reduced.

【0072】比較例2 実施例1と同様の方法で、表3に示す積層構成の電磁波
フィルタの比較サンプルを作成した。得られたサンプル
の特性を表5および表6に示す。このサンプルは、銀主
成分層のパラジウム含有量が0.05原子%である。シ
ート抵抗および近赤外線透過率は良好であったが、銀層
の耐久性を向上させるパラジウム量が少ないために、耐
湿熱性テストでは384時間という短い時間で電磁波遮
断膜の劣化が認められ、電磁波フィルタとしての実用的
な強度を有していないことが分かる。
Comparative Example 2 In the same manner as in Example 1, comparative samples of the electromagnetic wave filter having the laminated structure shown in Table 3 were prepared. Tables 5 and 6 show the characteristics of the obtained samples. In this sample, the palladium content of the silver main layer was 0.05 atomic%. Although the sheet resistance and the near-infrared transmittance were good, the amount of palladium for improving the durability of the silver layer was small. Therefore, in the wet heat resistance test, the electromagnetic wave shielding film was deteriorated in a short time of 384 hours, and the electromagnetic wave filter was confirmed. It does not have practical strength.

【0073】比較例3 実施例1と同様の方法で、表3に示す積層構成の電磁波
フィルタの比較サンプルを作成した。得られたサンプル
の特性を表5および表6に示す。このサンプルの積層構
成は、3・4タイプである。近赤外線の遮断能は12%
と実用的に要求される特性を有しているが、シート抵抗
が2.5Ω/□であり、電磁波遮断能が十分と言えず、
実用的に要求される電磁波フィルタではなかった。
Comparative Example 3 In the same manner as in Example 1, comparative samples of the electromagnetic wave filter having the laminated structure shown in Table 3 were prepared. Tables 5 and 6 show the characteristics of the obtained samples. The laminated configuration of this sample is a 3.4 type. 12% near infrared blocking ability
However, the sheet resistance is 2.5Ω / □, and the electromagnetic wave shielding ability is not sufficient.
It was not a practically required electromagnetic wave filter.

【0074】比較例4 実施例1と同様の方法で、表3に示す積層構成の電磁波
フィルタの比較サンプルを作成した。得られたサンプル
の特性を表5および表6に示す。このサンプルは、銀主
成分層の厚みが4nmと薄いので、近赤外透過率が高く
またシート抵抗も4.2Ω/□と大きな値であり、近赤
外線遮断能、電磁波遮断能とも実用的に要求される特性
を備えていなかった。
Comparative Example 4 In the same manner as in Example 1, comparative samples of the electromagnetic wave filter having the laminated structure shown in Table 3 were prepared. Tables 5 and 6 show the characteristics of the obtained samples. This sample has a high near-infrared transmittance and a large sheet resistance of 4.2 Ω / □ because the thickness of the silver main component layer is as thin as 4 nm. It did not have the required characteristics.

【0075】比較例5 実施例1と同様の方法で、表3に示す積層構成の電磁波
フィルタの比較サンプルを作成した。得られたサンプル
の特性を表5および表6に示す。このサンプルは、銀主
成分層の厚みが22〜24nmと厚いので、近赤外線の
遮断能が高く(透過率が2%と低い)電磁波遮断能も良
好(シート抵抗が0.8Ω/□と低い)であったが、5
50nmの波長での透過率が50%未満であり、実用的
に要求される特性を備えていなかった。
Comparative Example 5 In the same manner as in Example 1, comparative samples of the electromagnetic wave filter having the laminated structure shown in Table 3 were prepared. Tables 5 and 6 show the characteristics of the obtained samples. In this sample, since the thickness of the silver main component layer is as thick as 22 to 24 nm, the ability to block near-infrared rays is high (the transmittance is as low as 2%), and the electromagnetic wave blocking ability is also good (the sheet resistance is as low as 0.8 Ω / □). ), But 5
The transmittance at a wavelength of 50 nm was less than 50%, and did not have the characteristics required for practical use.

【0076】比較例6 実施例1と同様の方法で、表3に示す積層構成の電磁波
フィルタの比較サンプルを作成した。得られたサンプル
の特性を表5および表6に示す。このサンプルは、銀主
成分層の厚みが好適な範囲内に設定されたことにより、
電磁波遮断能は良好(シート抵抗が1.4Ω/□と低
い)であったが、誘電体層の厚みが厚く設定されたの
で、可視域での透過率バランスが悪くなった。すなわ
ち、650nmでの波長(可視域の長波長側で赤色に相
当)で透過率が高く、短波長側(青色に相当)で低い特
性を示していた。そのため可視域での透過率分布の影響
を受けて850nmの波長の透過率が低下せず、850
nmの透過率が17%と高くなり、近赤外線遮断能が実
用的に要求される特性を備えなくなってしまった。ま
た、反射色調の数値が示すように目立つ色調を呈してい
た。
Comparative Example 6 In the same manner as in Example 1, comparative samples of the electromagnetic wave filter having the laminated structure shown in Table 3 were prepared. Tables 5 and 6 show the characteristics of the obtained samples. In this sample, the thickness of the silver main component layer was set within a suitable range,
Although the electromagnetic wave shielding ability was good (the sheet resistance was as low as 1.4Ω / □), the transmittance balance in the visible region was poor because the thickness of the dielectric layer was set to be large. That is, the transmittance was high at the wavelength of 650 nm (corresponding to red on the long wavelength side in the visible region) and low at the short wavelength side (corresponding to blue). Therefore, the transmittance at the wavelength of 850 nm does not decrease due to the influence of the transmittance distribution in the visible region.
The transmittance in nm was as high as 17%, and the near-infrared ray blocking ability was not provided with the characteristics required for practical use. Further, as shown by the numerical value of the reflection color tone, the color tone was conspicuous.

【0077】比較例7 実施例1と同様の方法で、表3に示す積層構成の電磁波
フィルタの比較サンプルを作成した。得られたサンプル
の特性を表5および表6に示す。このサンプルは、銀主
成分層の厚みが好適な範囲内に設定されて、電磁波遮断
能は良好(シート抵抗が1.4Ω/□と低い)であった
が、比較例6とは逆に誘電体層の厚みが薄く設定された
ので、可視域での透過率バランスが悪くなった。すなわ
ち450nm(可視域の短波長側で青色に相当)での波
長で透過率が高く、長波長(赤色)側で低い特性を示
し、反射色調が目立つ色になってしまった。
COMPARATIVE EXAMPLE 7 In the same manner as in Example 1, comparative samples of the electromagnetic wave filter having the laminated structure shown in Table 3 were prepared. Tables 5 and 6 show the characteristics of the obtained samples. In this sample, the thickness of the silver main component layer was set within a suitable range, and the electromagnetic wave shielding ability was good (the sheet resistance was as low as 1.4 Ω / □). Since the thickness of the body layer was set to be thin, the transmittance balance in the visible region was poor. That is, the transmittance was high at a wavelength of 450 nm (corresponding to blue on the short wavelength side in the visible region), the characteristics were low on the long wavelength (red) side, and the reflection color tone became conspicuous.

【0078】上記の実施例および比較例に示すように、
本願発明の実施例は、プラズマディスプレイの前面に設
置される電磁波フィルタに要求される近赤外線遮断能、
可視光域の光学特性のいずれも○評価であった。また、
人体に有害な電磁波は、導電物質により遮蔽されること
は知られており、電磁波遮断にはおよそ数Ω/□程度の
低抵抗が必要とされる。上記実施例ではいずれも2Ω/
□以下のシート抵抗を有するので、電磁遮断能について
も実用的な性能を有していることが分かる。
As shown in the above Examples and Comparative Examples,
The embodiment of the present invention is a near-infrared cutoff required for an electromagnetic wave filter installed on the front of a plasma display,
All of the optical characteristics in the visible light range were evaluated as ○. Also,
It is known that electromagnetic waves harmful to the human body are shielded by a conductive material, and a low resistance of about several Ω / □ is required for blocking electromagnetic waves. In each of the above embodiments, 2Ω /
□ Since it has the following sheet resistance, it can be seen that it has a practical performance with respect to the electromagnetic shielding ability.

【0079】[0079]

【発明の効果】本発明の電磁波フィルタは、その電磁波
遮断膜が透明基板側から550nmの波長における屈折
率を所定範囲の誘電体層と銀主成分層をこの順に交互に
積層した9積層体とし、銀主成分層の厚みを5〜20n
mとすることにより、電磁波遮断膜のシート抵抗を2Ω
/□以下で、かつ波長850nmにおける近赤外線透過
率を15%以下としている。
The electromagnetic wave filter of the present invention has a nine-layer structure in which a dielectric layer and a silver main layer having a predetermined range of refractive index at a wavelength of 550 nm from the transparent substrate side are alternately laminated in this order from the transparent substrate side. The thickness of the silver main component layer is 5 to 20 n
m, the sheet resistance of the electromagnetic wave shielding film is 2Ω.
/ □ or less and the near-infrared transmittance at a wavelength of 850 nm is 15% or less.

【0080】これにより本発明の電磁波フィルタをプラ
ズマディスプレイパネルの前面に設置すると、プラズマ
放電により発生する電磁波や近赤外線がパネル前面方向
に飛来してくるのを防止でき、プラズマディスプレイパ
ネルの近傍に設置された電気製品のリモコンスイッチが
誤動作するのを防止することができる。
Thus, when the electromagnetic wave filter of the present invention is installed in front of the plasma display panel, electromagnetic waves and near-infrared rays generated by plasma discharge can be prevented from flying toward the front of the panel, and installed near the plasma display panel. It is possible to prevent the remote control switch of the electrical product from malfunctioning.

【0081】また、本発明の銀主成分層にはパラジウム
が所定量含有されることにより、赤外線遮断能を低下さ
せることなく実用的な耐湿熱性強度を有するようにする
ことができる。
Further, by containing a predetermined amount of palladium in the silver main component layer of the present invention, it is possible to have a practical wet-heat resistance strength without lowering the infrared shielding ability.

【0082】さらに、本発明の電磁波フィルタは、銀主
成分層および屈折率が選定された誘電体層の厚みを所定
範囲に調整されることにより、色調が目立つことなく、
かつ可視光線の透過率が高い電磁波フィルタになる。こ
れにより画像表示の明るさを大きく低下させることがな
い。
Further, in the electromagnetic wave filter of the present invention, the color tone is not noticeable by adjusting the thickness of the silver main component layer and the dielectric layer whose refractive index is selected within a predetermined range.
In addition, the electromagnetic wave filter has a high visible light transmittance. As a result, the brightness of the image display is not significantly reduced.

【0083】[0083]

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例の断面図である。FIG. 1 is a sectional view of one embodiment of the present invention.

【図2】本発明の電磁波遮断膜の層構成を説明するため
の断面図である。
FIG. 2 is a cross-sectional view for explaining a layer configuration of an electromagnetic wave shielding film of the present invention.

【図3】本発明の使用状態を説明するための断面図であ
る。
FIG. 3 is a sectional view for explaining a use state of the present invention.

【図4】実施例1で得られたサンプルの分光透過特性図
である。
FIG. 4 is a graph showing the spectral transmission characteristics of the sample obtained in Example 1.

【図5】実施例1で得られたサンプルの分光反射特性図
である。
FIG. 5 is a spectral reflection characteristic diagram of a sample obtained in Example 1.

【符号の説明】[Explanation of symbols]

1:電磁波フィルタ 2:電磁波遮断膜 3:粘着層 4:PETフィルム 5:ガラス板 6:プラズマディスプレイパネル 7:筐体 8:バスバー 9:黒色セラミックパターン 10:誘電体層 11:銀主成分層 1: electromagnetic wave filter 2: electromagnetic wave shielding film 3: adhesive layer 4: PET film 5: glass plate 6: plasma display panel 7: housing 8: bus bar 9: black ceramic pattern 10: dielectric layer 11: silver main layer

Claims (16)

【特許請求の範囲】[Claims] 【請求項1】 透明基板の一方の面に電磁波遮断膜が被
覆された電磁波遮断板と、前記電磁波遮断膜面に設けら
れた保護膜とを有する電磁波フィルタであって、前記電
磁波遮断膜を、透明基板側から550nmの波長におけ
る屈折率が1.7〜2.7の誘電体層と銀主成分層をこ
の順に交互に積層した9層の積層体とし、前記銀主成分
層の厚みを5〜20nmとすることにより、前記電磁波
遮断膜のシート抵抗を2Ω/□以下、かつ、波長850
nmにおける近赤外線透過率を15%以下としたことを
特徴とするプラズマディスプレイパネル用の電磁波フィ
ルタ。
An electromagnetic wave filter comprising: an electromagnetic wave shielding plate in which one surface of a transparent substrate is coated with an electromagnetic wave shielding film; and a protective film provided on the electromagnetic wave shielding film surface, wherein the electromagnetic wave shielding film includes: A nine-layer laminate in which a dielectric layer having a refractive index of 1.7 to 2.7 at a wavelength of 550 nm from the transparent substrate side and a silver main component layer are alternately laminated in this order, and the thickness of the silver main component layer is 5 By setting the thickness to 20 nm, the sheet resistance of the electromagnetic wave shielding film is 2Ω / □ or less, and the wavelength is 850.
An electromagnetic wave filter for a plasma display panel, wherein a near-infrared transmittance in nm is 15% or less.
【請求項2】 前記銀主成分層は、銀に対して0.1原
子%以上0.5原子%未満のパラジウムを含有させたこ
とを特徴とする請求項1に記載のプラズマディスプレイ
パネル用の電磁波フィルタ。
2. The plasma display panel according to claim 1, wherein the silver main component layer contains 0.1 to 0.5 atomic% of palladium based on silver. Electromagnetic wave filter.
【請求項3】 波長550nmにおける透過率が50%
以上となるように、前記銀主成分層および前記誘電体層
の厚みを調整したことを特徴とする請求項1または2に
記載のプラズマディスプレイパネル用の電磁波フィル
タ。
3. The transmittance at a wavelength of 550 nm is 50%.
3. The electromagnetic wave filter for a plasma display panel according to claim 1, wherein the thicknesses of the silver main component layer and the dielectric layer are adjusted as described above.
【請求項4】 前記透明基板側から見たときの反射色調
を、色度座標a*、b*の値が−1<a*<4、−8<b*
<1となるように、銀主成分層および誘電体層の厚みを
調整したことを特徴とする請求項1〜3のいずれかに記
載のプラズマディスプレイパネル用の電磁波フィルタ。
4. The reflection color tone when viewed from the transparent substrate side is such that the values of the chromaticity coordinates a * and b * are −1 <a * <4, −8 <b *.
The electromagnetic wave filter for a plasma display panel according to any one of claims 1 to 3, wherein the thickness of the silver main component layer and the thickness of the dielectric layer are adjusted so as to be <1.
【請求項5】 前記銀主成分層の各層の厚みを、7〜1
7nmとしたことを特徴とする請求項3または4のいず
れかに記載のプラズマディスプレイパネル用の電磁波フ
ィルタ。
5. The thickness of each layer of the silver main component layer is 7 to 1
The electromagnetic wave filter for a plasma display panel according to claim 3, wherein the thickness of the electromagnetic wave filter is 7 nm.
【請求項6】 前記銀主成分層の合計厚みを30〜70
nmとしたことを特徴とする請求項1〜5のいずれかに
記載のプラズマディスプレイパネル用の電磁波フィル
タ。
6. The total thickness of the silver main component layer is from 30 to 70.
The electromagnetic wave filter for a plasma display panel according to any one of claims 1 to 5, wherein the diameter is set to nm.
【請求項7】 前記銀主成分層の厚み比率を透明基板側
から順に、9〜11:10〜13:10〜13:9〜1
1としたことを特徴とする請求項5または6に記載のプ
ラズマディスプレイパネル用の電磁波フィルタ。
7. The thickness ratio of the silver main component layer in the order from 9 to 11:10 to 13:10 to 13: 9 to 1 from the transparent substrate side.
7. The electromagnetic wave filter for a plasma display panel according to claim 5, wherein the filter is set to 1.
【請求項8】 前記透明基板に最も近い誘電体層の厚み
を42nm±10nmとし、各誘電体層の厚み比率を透
明基板側から順に44±4:82±8:79±8:82
±8:42±4としたことを特徴とする請求項3〜7の
いずれかに記載のプラズマディスプレイパネル用の電磁
波フィルタ。
8. The thickness of the dielectric layer closest to the transparent substrate is 42 nm ± 10 nm, and the thickness ratio of each dielectric layer is 44 ± 4: 82 ± 8: 79 ± 8: 82 in order from the transparent substrate side.
The electromagnetic wave filter for a plasma display panel according to any one of claims 3 to 7, wherein ± 8: 42 ± 4.
【請求項9】 透明基板から最も遠くに積層された誘電
体層上に、さらに銀主成分層および透明誘電体層をこの
順に積層したことを特徴とする請求項1〜8のいずれか
に記載のプラズマディスプレイパネル用の電磁波フィル
タ。
9. The method according to claim 1, wherein a silver main component layer and a transparent dielectric layer are further laminated in this order on the dielectric layer laminated farthest from the transparent substrate. Electromagnetic filter for plasma display panels.
【請求項10】 前記誘電体層を酸化亜鉛主成分層とし
たことを特徴とする請求項1〜9のいずれかに記載のプ
ラズマディスプレイパネル用の電磁波フィルタ。
10. The electromagnetic wave filter for a plasma display panel according to claim 1, wherein said dielectric layer is a zinc oxide main component layer.
【請求項11】 前記誘電体層を、酸化錫主成分層と酸
化亜鉛主成分層の多層積層体とし、銀主成分層に接する
層を酸化亜鉛主成分層としたことを特徴とする請求項1
〜10のいずれかに記載のプラズマディスプレイパネル
用の電磁波フィルタ。
11. The method according to claim 1, wherein the dielectric layer is a multilayer laminate of a tin oxide main layer and a zinc oxide main layer, and a layer in contact with the silver main layer is a zinc oxide main layer. 1
An electromagnetic wave filter for a plasma display panel according to any one of claims 10 to 10.
【請求項12】 前記誘電体層の最外層を酸化錫層とし
たことを特徴とする請求項11に記載のプラズマディス
プレイパネル用の電磁波フィルタ。
12. The electromagnetic wave filter for a plasma display panel according to claim 11, wherein an outermost layer of said dielectric layer is a tin oxide layer.
【請求項13】 前記保護膜が、550nmの波長にお
ける屈折率が1.59〜1.69の樹脂フィルムである
ことを特徴とする請求項1〜12のいずれかに記載のプ
ラズマディスプレイパネル用の電磁波フィルタ。
13. The plasma display panel according to claim 1, wherein the protective film is a resin film having a refractive index of 1.59 to 1.69 at a wavelength of 550 nm. Electromagnetic wave filter.
【請求項14】 前記保護膜は、厚みが20〜500μ
mの粘着剤で電磁波遮断膜に貼り付けられていることを
特徴とする請求項13に記載のプラズマディスプレイパ
ネル用の電磁波フィルタ。
14. The protective film has a thickness of 20 to 500 μm.
14. The electromagnetic wave filter for a plasma display panel according to claim 13, wherein the electromagnetic wave filter is attached to the electromagnetic wave shielding film with an adhesive of m.
【請求項15】 前記透明基板の周辺部で、かつ、前記
電磁波遮断膜と透明基板の間に、銀ペースト焼結体のア
ース電極を形成したことを特徴とする請求項1〜14の
いずれかに記載のプラズマディスプレイパネル用の電磁
波フィルタ。
15. An earth electrode of a silver paste sintered body is formed around the transparent substrate and between the electromagnetic wave shielding film and the transparent substrate. 2. The electromagnetic wave filter for a plasma display panel according to claim 1.
【請求項16】 前記アース電極と透明基板の間に、透
明基板側から見たときに前記アース電極を隠すように黒
色セラミックパターンを形成したことを特徴とする請求
項15に記載のプラズマディスプレイパネル用の電磁波
フィルタ。
16. The plasma display panel according to claim 15, wherein a black ceramic pattern is formed between the ground electrode and the transparent substrate so as to hide the ground electrode when viewed from the transparent substrate side. For electromagnetic wave filters.
JP10223048A 1998-08-06 1998-08-06 Electromagnetic wave filter Withdrawn JP2000059082A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP10223048A JP2000059082A (en) 1998-08-06 1998-08-06 Electromagnetic wave filter
TW088112321A TW428043B (en) 1998-08-06 1999-07-20 An electromagnetic wave filter for a plasma display panel
KR1019990031932A KR20000017060A (en) 1998-08-06 1999-08-04 Electromagnetic wave filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10223048A JP2000059082A (en) 1998-08-06 1998-08-06 Electromagnetic wave filter

Publications (1)

Publication Number Publication Date
JP2000059082A true JP2000059082A (en) 2000-02-25

Family

ID=16792029

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10223048A Withdrawn JP2000059082A (en) 1998-08-06 1998-08-06 Electromagnetic wave filter

Country Status (3)

Country Link
JP (1) JP2000059082A (en)
KR (1) KR20000017060A (en)
TW (1) TW428043B (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000158578A (en) * 1998-11-26 2000-06-13 Mitsui Chemicals Inc Transparent laminate and filter for display using it
WO2002023895A1 (en) * 2000-09-18 2002-03-21 Nippon Sheet Glass Co., Ltd. Display filter substrate, and display device
WO2005020655A1 (en) * 2003-08-25 2005-03-03 Asahi Glass Company, Limited Electromagnetic shielding multilayer body and display using same
WO2006059448A1 (en) * 2004-11-30 2006-06-08 Asahi Glass Company, Limited Electroconductive laminate, and electromagnetic wave shielding film and protective plate for plasma display
JP2007150323A (en) * 2003-08-25 2007-06-14 Asahi Glass Co Ltd Electromagnetic wave shielding laminate and display device using same
JP2009058959A (en) * 2007-08-29 2009-03-19 Samsung Corning Precision Glass Co Ltd Filter for display unit
JP2012500499A (en) * 2008-08-21 2012-01-05 ガーディアン・インダストリーズ・コーポレーション Plasma display panel having EMI filter without frame and / or manufacturing method of said plasma display

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100541380B1 (en) * 2002-12-20 2006-01-11 주식회사 일진옵텍 Thin film structure for reflecting both ultraviolet and infrared rays
KR100844826B1 (en) * 2006-11-13 2008-07-08 엘지전자 주식회사 Plasma Display Apparatus
KR20200114823A (en) * 2019-03-29 2020-10-07 삼성전자주식회사 Display apparatus

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000158578A (en) * 1998-11-26 2000-06-13 Mitsui Chemicals Inc Transparent laminate and filter for display using it
WO2002023895A1 (en) * 2000-09-18 2002-03-21 Nippon Sheet Glass Co., Ltd. Display filter substrate, and display device
JP2010034577A (en) * 2003-08-25 2010-02-12 Asahi Glass Co Ltd Electromagnetic wave shielding laminate display employing the same
WO2005020655A1 (en) * 2003-08-25 2005-03-03 Asahi Glass Company, Limited Electromagnetic shielding multilayer body and display using same
KR101027610B1 (en) 2003-08-25 2011-04-06 아사히 가라스 가부시키가이샤 Electromagnetic shielding multilayer body and display using same
KR100726747B1 (en) 2003-08-25 2007-06-11 아사히 가라스 가부시키가이샤 Electromagnetic shielding multilayer body and display using same
JP2007150323A (en) * 2003-08-25 2007-06-14 Asahi Glass Co Ltd Electromagnetic wave shielding laminate and display device using same
US7771850B2 (en) 2003-08-25 2010-08-10 Asahi Glass Company, Limited Electromagnetic wave shielding laminate and display device employing it
JP2006186309A (en) * 2004-11-30 2006-07-13 Asahi Glass Co Ltd Conductive laminate, electromagnetic wave shielding film for plasma display, and protective plate for plasma display
EP1819210A4 (en) * 2004-11-30 2009-07-01 Asahi Glass Co Ltd Electroconductive laminate, and electromagnetic wave shielding film and protective plate for plasma display
EP1819210A1 (en) * 2004-11-30 2007-08-15 Asahi Glass Company, Limited Electroconductive laminate, and electromagnetic wave shielding film and protective plate for plasma display
WO2006059448A1 (en) * 2004-11-30 2006-06-08 Asahi Glass Company, Limited Electroconductive laminate, and electromagnetic wave shielding film and protective plate for plasma display
US8040062B2 (en) 2004-11-30 2011-10-18 Asahi Glass Company, Limited Electroconductive laminate, and electromagnetic wave shielding film and protective plate for plasma display
KR101270784B1 (en) * 2004-11-30 2013-06-04 아사히 가라스 가부시키가이샤 Electroconductive laminate, and electromagnetic wave shielding film and protective plate for plasma display
JP2009058959A (en) * 2007-08-29 2009-03-19 Samsung Corning Precision Glass Co Ltd Filter for display unit
JP2012500499A (en) * 2008-08-21 2012-01-05 ガーディアン・インダストリーズ・コーポレーション Plasma display panel having EMI filter without frame and / or manufacturing method of said plasma display

Also Published As

Publication number Publication date
TW428043B (en) 2001-04-01
KR20000017060A (en) 2000-03-25

Similar Documents

Publication Publication Date Title
US6316110B1 (en) Electromagnetic wave filter for plasma display panel
JP4666087B2 (en) Protection plate for plasma display
US8147975B2 (en) Plasma display panel including frameless EMI filter, and/or method of making the same
JP4114429B2 (en) Laminates and structures
KR20110013447A (en) Plasma display panel including tcc emi filter, and/or method of making the same
TWI583807B (en) Schichtsystem eines transparenten substrats sowie verfahren zur herstellung eines schichtsystems
EP3396454B1 (en) Reflective transparent screen
EP2641458B1 (en) Plasma display panel including emi filter, and / or method of making the same
JP2000059082A (en) Electromagnetic wave filter
WO2003037056A1 (en) Substrate with electromagnetic shield film
JP4355327B2 (en) Protection plate for plasma display
JP2006313918A5 (en)
JP3924849B2 (en) Transparent conductive film and electromagnetic wave shielding filter using the same
JP3924846B2 (en) Transparent conductive film
JP2005072255A (en) Electromagnetic wave shielding sheet for plasma display and method of manufacturing the same
JP2006243757A (en) Protective plate for plasma display and manufacturing method thereof
JP2006133799A (en) Protective plate for plasma display and manufacturing method thereof
JPH11130472A (en) Heat ray shielding glass
JP2003327451A (en) Laminated body and structural body
JP2006163428A (en) Protective plate for plasma display and method for producing the same
JP2004264350A (en) Front filter
JP2000141536A (en) Laminated body
JP2000141532A (en) Laminated body and its manufacture

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050411

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20061212