ITMI20010995A0 - Dispensatori di cesio e processo per il loro uso - Google Patents

Dispensatori di cesio e processo per il loro uso

Info

Publication number
ITMI20010995A0
ITMI20010995A0 IT2001MI000995A ITMI20010995A ITMI20010995A0 IT MI20010995 A0 ITMI20010995 A0 IT MI20010995A0 IT 2001MI000995 A IT2001MI000995 A IT 2001MI000995A IT MI20010995 A ITMI20010995 A IT MI20010995A IT MI20010995 A0 ITMI20010995 A0 IT MI20010995A0
Authority
IT
Italy
Prior art keywords
ceisum
dispensers
ceisum dispensers
Prior art date
Application number
IT2001MI000995A
Other languages
English (en)
Inventor
Claudio Boffito
Luca Toia
Lorena Cattaneo
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Getters Spa filed Critical Getters Spa
Priority to IT2001MI000995A priority Critical patent/ITMI20010995A1/it
Publication of ITMI20010995A0 publication Critical patent/ITMI20010995A0/it
Priority to TW091108362A priority patent/TWI284001B/zh
Priority to CNB028023765A priority patent/CN100459219C/zh
Priority to AT02735976T priority patent/ATE322744T1/de
Priority to AU2002309256A priority patent/AU2002309256A1/en
Priority to CA002430941A priority patent/CA2430941C/en
Priority to DE60210478T priority patent/DE60210478T2/de
Priority to KR1020037000536A priority patent/KR100742424B1/ko
Priority to JP2002590432A priority patent/JP4087715B2/ja
Priority to PCT/IT2002/000301 priority patent/WO2002093664A2/en
Priority to EP02735976A priority patent/EP1419542B1/en
Priority to MYPI20021724A priority patent/MY132034A/en
Publication of ITMI20010995A1 publication Critical patent/ITMI20010995A1/it
Priority to US10/465,004 priority patent/US6753648B2/en
Priority to US10/842,352 priority patent/US20040206205A1/en
Priority to HK05100342.0A priority patent/HK1068495A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/30—Doping active layers, e.g. electron transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
IT2001MI000995A 2001-05-15 2001-05-15 Dispensatori di cesio e processo per il loro uso ITMI20010995A1 (it)

Priority Applications (15)

Application Number Priority Date Filing Date Title
IT2001MI000995A ITMI20010995A1 (it) 2001-05-15 2001-05-15 Dispensatori di cesio e processo per il loro uso
TW091108362A TWI284001B (en) 2001-05-15 2002-04-23 Cesium dispensers and process for the use thereof
EP02735976A EP1419542B1 (en) 2001-05-15 2002-05-07 Method for dispensing cesium and its use in the manufacture of oled screens
DE60210478T DE60210478T2 (de) 2001-05-15 2002-05-07 Verfahren zur spendung von caesium und ihre verwendung zur herstellung von bildschirmen von typ "oled"
PCT/IT2002/000301 WO2002093664A2 (en) 2001-05-15 2002-05-07 Cesium dispensers and process for the use thereof
AU2002309256A AU2002309256A1 (en) 2001-05-15 2002-05-07 Cesium dispensers and process for the use thereof
CA002430941A CA2430941C (en) 2001-05-15 2002-05-07 Cesium dispensers and process for the use thereof
CNB028023765A CN100459219C (zh) 2001-05-15 2002-05-07 铯释放器及其使用方法
KR1020037000536A KR100742424B1 (ko) 2001-05-15 2002-05-07 세슘 디스펜서 및 세슘 디스펜서의 사용 방법
JP2002590432A JP4087715B2 (ja) 2001-05-15 2002-05-07 セシウム供給装置及びその使用方法
AT02735976T ATE322744T1 (de) 2001-05-15 2002-05-07 VERFAHREN ZUR SPENDUNG VON CAESIUM UND IHRE VERWENDUNG ZUR HERSTELLUNG VON BILDSCHIRMEN VON TYP ßOLEDß
MYPI20021724A MY132034A (en) 2001-05-15 2002-05-13 Cesium dispensers and process for the use thereof.
US10/465,004 US6753648B2 (en) 2001-05-15 2003-06-19 Cesium dispensers and process for the use thereof
US10/842,352 US20040206205A1 (en) 2001-05-15 2004-05-10 Cesium mixtures and use thereof
HK05100342.0A HK1068495A1 (en) 2001-05-15 2005-01-13 Cesium dispensers and process for the use thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT2001MI000995A ITMI20010995A1 (it) 2001-05-15 2001-05-15 Dispensatori di cesio e processo per il loro uso

Publications (2)

Publication Number Publication Date
ITMI20010995A0 true ITMI20010995A0 (it) 2001-05-15
ITMI20010995A1 ITMI20010995A1 (it) 2002-11-15

Family

ID=11447659

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2001MI000995A ITMI20010995A1 (it) 2001-05-15 2001-05-15 Dispensatori di cesio e processo per il loro uso

Country Status (14)

Country Link
US (2) US6753648B2 (it)
EP (1) EP1419542B1 (it)
JP (1) JP4087715B2 (it)
KR (1) KR100742424B1 (it)
CN (1) CN100459219C (it)
AT (1) ATE322744T1 (it)
AU (1) AU2002309256A1 (it)
CA (1) CA2430941C (it)
DE (1) DE60210478T2 (it)
HK (1) HK1068495A1 (it)
IT (1) ITMI20010995A1 (it)
MY (1) MY132034A (it)
TW (1) TWI284001B (it)
WO (1) WO2002093664A2 (it)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20010995A1 (it) * 2001-05-15 2002-11-15 Getters Spa Dispensatori di cesio e processo per il loro uso
EP1406116A1 (en) 2001-05-17 2004-04-07 Daikin Industries, Ltd. Nonlinear optical material containing fluoropolymer
ITMI20021904A1 (it) * 2002-09-06 2004-03-07 Getters Spa Elemento accessorio per dispensatori di metalli alcalini
EP1585159A4 (en) * 2003-01-17 2006-12-13 Hamamatsu Photonics Kk ALKALI METAL PRODUCTION AGENTS, ALKALI METAL PRODUCERS, PHOTOELECTRIC SURFACE, ELECTRON EMISSION SURFACE SECONDARY, ELECTRON TUBE, METHOD FOR PRODUCING A PHOTO ELECTRIC SURFACE, METHOD FOR PRODUCING A SECONDARY ELECTRON EMISSION SURFACE AND METHOD FOR PRODUCING AN ELECTRON TUBE
US7772771B2 (en) 2003-01-17 2010-08-10 Hamamatsu Photonics K.K. Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturing secondary electron emission surface, and method for manufacturing electron tube
US7474051B2 (en) 2003-01-17 2009-01-06 Hamamatsu Photonics K.K. Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturing secondary electron emission surface, and method for manufacturing electron tube
JP4312555B2 (ja) * 2003-09-18 2009-08-12 富士フイルム株式会社 真空蒸着用ルツボおよび蛍光体シート製造装置
ITMI20041736A1 (it) 2004-09-10 2004-12-10 Getters Spa Miscele per l'evaporazione del litio e dispensatori di litio
EP1648042B1 (en) * 2004-10-07 2007-05-02 Novaled AG A method for doping a semiconductor material with cesium
ITMI20042279A1 (it) * 2004-11-24 2005-02-24 Getters Spa Sistema dispensatore di metalli alcalini in grado di dispensare quantita' elevate di metalli
US7625601B2 (en) * 2005-02-04 2009-12-01 Eastman Kodak Company Controllably feeding organic material in making OLEDs
US20060269656A1 (en) * 2005-05-26 2006-11-30 Eastman Kodak Company Reducing contamination in OLED processing systems
EP1780816B1 (en) 2005-11-01 2020-07-01 Novaled GmbH A method for producing an electronic device with a layer structure and an electronic device
EP1939320B1 (de) 2005-12-07 2013-08-21 Novaled AG Verfahren zum Abscheiden eines Aufdampfmaterials
EP1806795B1 (de) 2005-12-21 2008-07-09 Novaled AG Organisches Bauelement
ITMI20060444A1 (it) 2006-03-13 2007-09-14 Getters Spa Uso di composizioni magnesio-rame per l'evaporazione di magnesio e dispensatori di magnesio
TWI353677B (en) 2006-03-21 2011-12-01 Novaled Ag Method for preparing doped organic semiconductor m
AT502678B1 (de) 2006-03-24 2007-05-15 Alvatec Alkali Vacuum Technolo Alkalimetall- oder erdalkalimetall- verdampferquelle
KR101315610B1 (ko) * 2006-09-22 2013-10-10 파마시클릭스, 인코포레이티드 브루톤 티로신 키나제 억제제
ITMI20061872A1 (it) * 2006-09-29 2008-03-30 Getters Spa SCHERMO ELETTROLUMINECìSCENTE ORGANICO E PROCESSO PER LA SUA PRODUZIONE
ITMI20070301A1 (it) * 2007-02-16 2008-08-17 Getters Spa Supporti comprendenti materiali getter e sorgenti di metalli alcalini o alcalino-terrosi per sistemi di termoregolazione basati su effetto tunnel
ITMI20112051A1 (it) * 2011-11-11 2013-05-12 Getters Spa Composizione organico-inorganica per il rilascio in fase vapore di metalli alcalini ed alcalino-terrosi
US9491802B2 (en) * 2012-02-17 2016-11-08 Honeywell International Inc. On-chip alkali dispenser
ITMI20131171A1 (it) 2013-07-11 2015-01-11 Getters Spa Erogatore migliorato di vapori metallici
WO2015097894A1 (ja) * 2013-12-27 2015-07-02 パイオニア株式会社 発光素子及び発光素子の製造方法
CN105483397B (zh) * 2015-11-26 2017-12-26 北京有色金属研究总院 一种低温可控放铯的铯释放剂和其所用释放器的制备方法
USD814314S1 (en) * 2016-10-07 2018-04-03 S.C. Johnson & Son, Inc. Cartridge
USD821224S1 (en) * 2016-10-07 2018-06-26 S. C. Johnson & Son, Inc. Cartridge
CN110444463B (zh) * 2019-08-12 2020-11-10 电子科技大学 一种微电流铯离子源

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US2117735A (en) * 1936-10-01 1938-05-17 Rca Corp Getter
US2424512A (en) * 1944-08-08 1947-07-22 Nat Res Corp Production of alkali metals and their oxides
US3096211A (en) * 1959-03-31 1963-07-02 Emi Ltd Alkali metal generators
US3203901A (en) * 1962-02-15 1965-08-31 Porta Paolo Della Method of manufacturing zirconiumaluminum alloy getters
NL6716941A (it) * 1966-12-13 1968-06-14
DE1945508B2 (de) 1968-09-13 1971-06-09 Vorrichtung zum freisetzen von metalldaempfen
NL6913692A (it) * 1968-09-13 1970-03-17
US3658713A (en) * 1968-11-12 1972-04-25 Tokyo Shibaura Electric Co Alkali metal generating agents
US3663121A (en) * 1969-05-24 1972-05-16 Getters Spa Generation of metal vapors
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US4275330A (en) * 1979-03-08 1981-06-23 General Electric Company Electric discharge lamp having a cathode with cesium metal oxide
IT1115156B (it) * 1979-04-06 1986-02-03 Getters Spa Leghe zr-fe per l'assorbimento di idrogeno a basse temperature
US4233936A (en) * 1979-05-08 1980-11-18 Rca Corporation Alkali metal dispenser
AU2993384A (en) * 1983-06-29 1986-01-02 Stauffer Chemical Company Preparation of polyphosphides using potassium graphite intercalate
IT1173866B (it) * 1984-03-16 1987-06-24 Getters Spa Metodo perfezionato per fabbricare dispositivi getter non evarobili porosi e dispositivi getter cosi' prodotti
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JPH06231727A (ja) * 1993-02-03 1994-08-19 Fuji Photo Film Co Ltd 閃光放電管用陰極材及びその製造方法
WO1995005191A1 (en) 1993-08-13 1995-02-23 Uab Research Foundation METHODS AND COMPOSITIONS FOR STIMULATING AND INHIBITING TGF-β ACTIVITY
JPH0978058A (ja) 1995-09-08 1997-03-25 Pioneer Electron Corp 有機エレクトロルミネッセンス素子
DE69729394T2 (de) 1996-11-29 2005-06-02 Idemitsu Kosan Co. Ltd. Organische elektrolumineszente Vorrichtung
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JP3266573B2 (ja) * 1998-04-08 2002-03-18 出光興産株式会社 有機エレクトロルミネッセンス素子
JPH11329347A (ja) * 1998-05-08 1999-11-30 Erebamu:Kk 放電ランプ及びその製造方法
ITMI20010995A1 (it) * 2001-05-15 2002-11-15 Getters Spa Dispensatori di cesio e processo per il loro uso

Also Published As

Publication number Publication date
EP1419542A2 (en) 2004-05-19
US6753648B2 (en) 2004-06-22
EP1419542B1 (en) 2006-04-05
WO2002093664A3 (en) 2003-02-06
DE60210478D1 (de) 2006-05-18
JP2004532932A (ja) 2004-10-28
CA2430941C (en) 2009-12-29
TWI284001B (en) 2007-07-11
HK1068495A1 (en) 2005-04-29
WO2002093664A2 (en) 2002-11-21
JP4087715B2 (ja) 2008-05-21
US20040206205A1 (en) 2004-10-21
KR20030038666A (ko) 2003-05-16
AU2002309256A1 (en) 2002-11-25
ITMI20010995A1 (it) 2002-11-15
WO2002093664A8 (en) 2003-03-06
KR100742424B1 (ko) 2007-07-24
CN1531839A (zh) 2004-09-22
CA2430941A1 (en) 2002-11-21
ATE322744T1 (de) 2006-04-15
US20040001916A1 (en) 2004-01-01
CN100459219C (zh) 2009-02-04
DE60210478T2 (de) 2006-10-05
MY132034A (en) 2007-09-28

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