IT943708B - PROCESS FOR THE PREPARATION OF TUBULAR BODIES CONSISTING OF A SEMICONDUCTOR MATERIAL - Google Patents

PROCESS FOR THE PREPARATION OF TUBULAR BODIES CONSISTING OF A SEMICONDUCTOR MATERIAL

Info

Publication number
IT943708B
IT943708B IT3201971A IT3201971A IT943708B IT 943708 B IT943708 B IT 943708B IT 3201971 A IT3201971 A IT 3201971A IT 3201971 A IT3201971 A IT 3201971A IT 943708 B IT943708 B IT 943708B
Authority
IT
Italy
Prior art keywords
preparation
semiconductor material
tubular bodies
bodies consisting
tubular
Prior art date
Application number
IT3201971A
Other languages
Italian (it)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT943708B publication Critical patent/IT943708B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
IT3201971A 1970-12-09 1971-12-03 PROCESS FOR THE PREPARATION OF TUBULAR BODIES CONSISTING OF A SEMICONDUCTOR MATERIAL IT943708B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702060651 DE2060651A1 (en) 1970-12-09 1970-12-09 Process for the production of tubular bodies from semiconductor material

Publications (1)

Publication Number Publication Date
IT943708B true IT943708B (en) 1973-04-10

Family

ID=5790480

Family Applications (1)

Application Number Title Priority Date Filing Date
IT3201971A IT943708B (en) 1970-12-09 1971-12-03 PROCESS FOR THE PREPARATION OF TUBULAR BODIES CONSISTING OF A SEMICONDUCTOR MATERIAL

Country Status (7)

Country Link
JP (1) JPS5240829B1 (en)
BE (1) BE776465A (en)
DE (1) DE2060651A1 (en)
FR (1) FR2117271A5 (en)
GB (1) GB1337687A (en)
IT (1) IT943708B (en)
NL (1) NL7112809A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60185931U (en) * 1984-05-18 1985-12-10 株式会社　オ−シマ box type study desk

Also Published As

Publication number Publication date
NL7112809A (en) 1972-06-13
BE776465A (en) 1972-04-04
JPS5240829B1 (en) 1977-10-14
DE2060651A1 (en) 1972-06-29
GB1337687A (en) 1973-11-21
FR2117271A5 (en) 1972-07-21

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