GB1337687A - Production of tubular bodies of semiconductor material - Google Patents
Production of tubular bodies of semiconductor materialInfo
- Publication number
- GB1337687A GB1337687A GB5567971A GB5567971A GB1337687A GB 1337687 A GB1337687 A GB 1337687A GB 5567971 A GB5567971 A GB 5567971A GB 5567971 A GB5567971 A GB 5567971A GB 1337687 A GB1337687 A GB 1337687A
- Authority
- GB
- United Kingdom
- Prior art keywords
- carrier
- tubular body
- annular
- semi
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
1337687 Silicon SIEMENS AG 1 Dec 1971 [9 Dec 1970] 55679/71 Heading C1A A tubular body of semi-conductor material, e.g. silicon, is produced by heating a rod-shaped or tubular body of carbon in a reaction gas which will deposit the said semi-conductor on the carrier, and removing the carrier from the tubular body, at least one annular zone of the cylindrical surface of said carrier being heated to a temperature different from that of the remainder of said surface such that an annular thickening of the tubular body is produced at said annular part. The thickening may be located at one end of the tubular body or at an intended point of division of the tube intermediate its ends. The annular zone may be produced by a reduction of the wall thickness of the carrier, the outer diameter remaining constant as in Fig. 1. The carbon carrier 1 is connected electrically by a carbon or graphite bridge element 2 to an inner rod 3, the carrier 1 and rod 3 being connected to electrodes 7 and 6 respectively. Alternatively the carrier may be of constant wall thickness but the inner rod 3 may have a zone of reduced diameter. An insulating cooling gas may be passed along the annular space between the inner rod 3 and the carrier 1. The tube so-formed may, after removal of the carrier, be used as a treatment vessel for semi-conductor bodies, e.g. wafers, which may be placed inside the tube.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19702060651 DE2060651A1 (en) | 1970-12-09 | 1970-12-09 | Process for the production of tubular bodies from semiconductor material |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1337687A true GB1337687A (en) | 1973-11-21 |
Family
ID=5790480
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5567971A Expired GB1337687A (en) | 1970-12-09 | 1971-12-01 | Production of tubular bodies of semiconductor material |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS5240829B1 (en) |
BE (1) | BE776465A (en) |
DE (1) | DE2060651A1 (en) |
FR (1) | FR2117271A5 (en) |
GB (1) | GB1337687A (en) |
IT (1) | IT943708B (en) |
NL (1) | NL7112809A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60185931U (en) * | 1984-05-18 | 1985-12-10 | 株式会社 オ−シマ | box type study desk |
-
1970
- 1970-12-09 DE DE19702060651 patent/DE2060651A1/en active Pending
-
1971
- 1971-09-17 NL NL7112809A patent/NL7112809A/xx unknown
- 1971-12-01 GB GB5567971A patent/GB1337687A/en not_active Expired
- 1971-12-02 FR FR7143208A patent/FR2117271A5/fr not_active Expired
- 1971-12-03 IT IT3201971A patent/IT943708B/en active
- 1971-12-09 JP JP9913771A patent/JPS5240829B1/ja active Pending
- 1971-12-09 BE BE776465A patent/BE776465A/en unknown
Also Published As
Publication number | Publication date |
---|---|
NL7112809A (en) | 1972-06-13 |
BE776465A (en) | 1972-04-04 |
JPS5240829B1 (en) | 1977-10-14 |
DE2060651A1 (en) | 1972-06-29 |
IT943708B (en) | 1973-04-10 |
FR2117271A5 (en) | 1972-07-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |