IT8922268A0 - Apparecchiatura per impedire l'annebbiamento di un wafer di semi-conduttore - Google Patents
Apparecchiatura per impedire l'annebbiamento di un wafer di semi-conduttoreInfo
- Publication number
- IT8922268A0 IT8922268A0 IT22268A IT2226889A IT8922268A0 IT 8922268 A0 IT8922268 A0 IT 8922268A0 IT 22268 A IT22268 A IT 22268A IT 2226889 A IT2226889 A IT 2226889A IT 8922268 A0 IT8922268 A0 IT 8922268A0
- Authority
- IT
- Italy
- Prior art keywords
- semi
- equipment
- conductor wafer
- preventing fogging
- fogging
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/60—Simultaneously removing sulfur oxides and nitrogen oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Treating Waste Gases (AREA)
- Filtering Materials (AREA)
- Elimination Of Static Electricity (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63278587A JP2736662B2 (ja) | 1988-11-04 | 1988-11-04 | 半導体ウェーハの曇防止装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
IT8922268A0 true IT8922268A0 (it) | 1989-11-03 |
IT8922268A1 IT8922268A1 (it) | 1991-05-03 |
IT1236657B IT1236657B (it) | 1993-03-25 |
Family
ID=17599340
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT02226889A IT1236657B (it) | 1988-11-04 | 1989-11-03 | Apparecchiatura per impedire l'annebbiamento di un wafer di semi-conduttore |
Country Status (5)
Country | Link |
---|---|
US (2) | US5039321A (it) |
JP (1) | JP2736662B2 (it) |
KR (1) | KR950011558B1 (it) |
DE (1) | DE3936540A1 (it) |
IT (1) | IT1236657B (it) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5626820A (en) * | 1988-12-12 | 1997-05-06 | Kinkead; Devon A. | Clean room air filtering |
US6340381B1 (en) * | 1991-12-02 | 2002-01-22 | Ebara Research Co., Ltd. | Method and apparatus for the preparation of clean gases |
JP3320730B2 (ja) | 1992-12-02 | 2002-09-03 | 株式会社荏原製作所 | 清浄気体の調製方法および調製装置 |
US5922105A (en) * | 1992-12-02 | 1999-07-13 | Ebara Research Co., Ltd. | Method and apparatus for the preparation of clean gases |
US5514196A (en) * | 1993-02-04 | 1996-05-07 | Tokyo Electron Limited | Air cleaning apparatus |
JP3334929B2 (ja) * | 1993-02-04 | 2002-10-15 | 東京エレクトロン株式会社 | 熱処理装置 |
US5685895A (en) * | 1994-08-10 | 1997-11-11 | Nikon Corporation | Air cleaning apparatus used for an exposure apparatus |
US5833726A (en) * | 1995-05-26 | 1998-11-10 | Extraction System, Inc. | Storing substrates between process steps within a processing facility |
TW363903B (en) * | 1996-03-11 | 1999-07-11 | Memc Electronic Materials Spa | Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machine |
GB9614849D0 (en) * | 1996-07-15 | 1996-09-04 | Boc Group Plc | Processes for the scubbing of noxious substances |
JP3405439B2 (ja) | 1996-11-05 | 2003-05-12 | 株式会社荏原製作所 | 固体表面の清浄化方法 |
US6156107A (en) * | 1996-11-13 | 2000-12-05 | Tokyo Electron Limited | Trap apparatus |
JP3991375B2 (ja) * | 1996-11-13 | 2007-10-17 | 東京エレクトロン株式会社 | トラップ装置 |
JP3559133B2 (ja) * | 1997-01-31 | 2004-08-25 | 大日本スクリーン製造株式会社 | 熱処理装置および基板処理装置 |
US5972078A (en) * | 1997-07-31 | 1999-10-26 | Fsi International, Inc. | Exhaust rinse manifold for use with a coating apparatus |
KR19990027844A (ko) * | 1997-09-30 | 1999-04-15 | 윤종용 | 반도체장비의 공기유입장치 및 이를 이용한 화학물 오염 제거방법 |
WO2000007696A1 (fr) * | 1998-08-05 | 2000-02-17 | Toray Industries, Inc. | Appareil de filtrage chimique et systeme d'epuration de gaz |
DE19835538A1 (de) * | 1998-08-06 | 2000-02-10 | Meissner & Wurst | Reinraum |
CA2341184A1 (en) | 1998-08-20 | 2000-03-02 | Extraction Systems, Inc. | Filters employing porous strongly acidic polymers |
US6273100B1 (en) | 1998-08-27 | 2001-08-14 | Micron Technology, Inc. | Surface cleaning apparatus and method |
US6572457B2 (en) | 1998-09-09 | 2003-06-03 | Applied Surface Technologies | System and method for controlling humidity in a cryogenic aerosol spray cleaning system |
US6123617A (en) * | 1998-11-02 | 2000-09-26 | Seh-America, Inc. | Clean room air filtering system |
JP2001141274A (ja) * | 1999-11-12 | 2001-05-25 | Daikin Ind Ltd | クリーンルーム |
US7540901B2 (en) * | 2000-05-05 | 2009-06-02 | Entegris, Inc. | Filters employing both acidic polymers and physical-adsorption media |
EP1357998B1 (en) * | 2000-05-05 | 2014-12-03 | Entegris, Inc. | Filters employing both acidic polymers and physical-adsorption media |
US6897165B2 (en) * | 2001-06-06 | 2005-05-24 | Matsushita Electric Industrial Co., Ltd. | Environmental control equipment/method of developing apparatus for developing light-exposed resist film with developer in wafer treating chamber |
DE10143628A1 (de) * | 2001-09-06 | 2003-03-27 | M & W Zander Facility Eng Gmbh | Anlage und Verfahren zur Abluftaufbereitung, insbesondere bei Reinraumanlagen |
TW509097U (en) * | 2002-01-18 | 2002-11-01 | Ritdisplay Corp | Transporting device for evaporation |
AU2003228672A1 (en) * | 2002-04-22 | 2003-11-03 | Jane Homan | Modular biosafety containment apparatus and system |
US7077843B2 (en) * | 2002-06-24 | 2006-07-18 | Lanx, Llc | Cervical plate |
KR100474577B1 (ko) * | 2002-07-06 | 2005-03-08 | 삼성전자주식회사 | 청정 공기 덕트 및 청정실용 공기 제공 장치 |
US6843833B2 (en) * | 2003-06-16 | 2005-01-18 | Powerchip Semiconductor Corp. | Front opening unified pod and associated method for preventing outgassing pollution |
US20050089455A1 (en) * | 2003-10-24 | 2005-04-28 | Marganski Paul J. | Gas-using facility including portable dry scrubber system and/or over-pressure control arrangement |
TWI417130B (zh) * | 2006-07-13 | 2013-12-01 | Entegris Inc | 過濾系統 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51111471A (en) * | 1975-03-24 | 1976-10-01 | Fmc Corp | Method and apparatus for purifying nitrogen dioxide |
JPS5213473A (en) * | 1975-07-24 | 1977-02-01 | Mitsubishi Heavy Ind Ltd | Treatment process for exhaust gases |
US4059504A (en) * | 1976-07-21 | 1977-11-22 | The Lummus Company | Hydrotreating of pyrolysis gasoline |
JPS5383171A (en) * | 1976-12-28 | 1978-07-22 | Nippon Kokan Kk <Nkk> | Air purifying apparatus |
JPS5833013B2 (ja) * | 1978-05-24 | 1983-07-16 | 大成建設株式会社 | 大気汚染物質の除去方法 |
JPS5539224A (en) * | 1978-09-11 | 1980-03-19 | Ono Gijutsu Kenkyusho:Kk | Air cleaner with connector |
US4374813A (en) * | 1980-05-14 | 1983-02-22 | Koch Engineering Company, Inc. | Reverse-jet scrubber apparatus and method |
JPS6071830A (ja) * | 1983-09-29 | 1985-04-23 | Hitachi Plant Eng & Constr Co Ltd | 組替式局所環境制御室 |
JPS60125233A (ja) * | 1983-12-08 | 1985-07-04 | Mitsui Toatsu Chem Inc | 排ガスの高度処理方法 |
US4630530A (en) * | 1984-05-09 | 1986-12-23 | Travel-Aire, Inc. | Filtering systems for buses |
JPS62131131A (ja) * | 1985-12-03 | 1987-06-13 | Hitachi Plant Eng & Constr Co Ltd | トンネルクリ−ンル−ムの緊急安全装置 |
US4684510A (en) * | 1985-12-20 | 1987-08-04 | Hewlett-Packard Company | Method and apparatus for prevention of atmospheric corrosion of electronic equipment |
US4737173A (en) * | 1986-07-03 | 1988-04-12 | Amway Corporation | Room air treatment system |
JPS63256116A (ja) * | 1987-04-13 | 1988-10-24 | Ii L:Kk | 超純度エア−の製造方法 |
JPH01224022A (ja) * | 1988-03-04 | 1989-09-07 | Kanebo Ltd | 多孔質濾材 |
-
1988
- 1988-11-04 JP JP63278587A patent/JP2736662B2/ja not_active Expired - Fee Related
-
1989
- 1989-10-27 KR KR1019890015556A patent/KR950011558B1/ko not_active IP Right Cessation
- 1989-10-31 US US07/429,733 patent/US5039321A/en not_active Expired - Lifetime
- 1989-11-02 DE DE3936540A patent/DE3936540A1/de not_active Withdrawn
- 1989-11-03 IT IT02226889A patent/IT1236657B/it active IP Right Grant
-
1991
- 1991-05-31 US US07/708,206 patent/US5122170A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE3936540A1 (de) | 1990-05-23 |
IT1236657B (it) | 1993-03-25 |
JPH02125413A (ja) | 1990-05-14 |
KR900008635A (ko) | 1990-06-03 |
KR950011558B1 (ko) | 1995-10-06 |
US5122170A (en) | 1992-06-16 |
IT8922268A1 (it) | 1991-05-03 |
US5039321A (en) | 1991-08-13 |
JP2736662B2 (ja) | 1998-04-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
0001 | Granted | ||
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19971129 |