IT8267548A0 - Procedimento ed apparecchiatura per l esposizione di uno strato di gelatina fotosensibile depositate su un substrato particolarmente per la fabbricazione di dispositivi elettronici a semiconduttori - Google Patents
Procedimento ed apparecchiatura per l esposizione di uno strato di gelatina fotosensibile depositate su un substrato particolarmente per la fabbricazione di dispositivi elettronici a semiconduttoriInfo
- Publication number
- IT8267548A0 IT8267548A0 IT8267548A IT6754882A IT8267548A0 IT 8267548 A0 IT8267548 A0 IT 8267548A0 IT 8267548 A IT8267548 A IT 8267548A IT 6754882 A IT6754882 A IT 6754882A IT 8267548 A0 IT8267548 A0 IT 8267548A0
- Authority
- IT
- Italy
- Prior art keywords
- exposing
- procedure
- manufacture
- equipment
- layer
- Prior art date
Links
- 108010010803 Gelatin Proteins 0.000 title 1
- 229920000159 gelatin Polymers 0.000 title 1
- 239000008273 gelatin Substances 0.000 title 1
- 235000019322 gelatine Nutrition 0.000 title 1
- 235000011852 gelatine desserts Nutrition 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
- A44C11/00—Watch chains; Ornamental chains
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD81229475A DD160756A3 (de) | 1981-04-24 | 1981-04-24 | Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten |
JP56154059A JPS57177144A (en) | 1981-04-24 | 1981-09-30 | Method and device for exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
IT8267548A0 true IT8267548A0 (it) | 1982-04-26 |
Family
ID=25747719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT8267548A IT8267548A0 (it) | 1981-04-24 | 1982-04-26 | Procedimento ed apparecchiatura per l esposizione di uno strato di gelatina fotosensibile depositate su un substrato particolarmente per la fabbricazione di dispositivi elettronici a semiconduttori |
Country Status (11)
Country | Link |
---|---|
US (1) | US4704348A (it) |
JP (1) | JPS57177144A (it) |
KR (1) | KR860000158B1 (it) |
CH (1) | CH651423A5 (it) |
DD (1) | DD160756A3 (it) |
DE (1) | DE3214325A1 (it) |
FR (1) | FR2504696B1 (it) |
GB (1) | GB2100453B (it) |
IT (1) | IT8267548A0 (it) |
NL (1) | NL8201726A (it) |
SU (1) | SU1238274A1 (it) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5999722A (ja) * | 1982-11-29 | 1984-06-08 | Canon Inc | 半導体焼付露光制御方法 |
DE3344280A1 (de) * | 1982-12-21 | 1984-07-05 | Texas Instruments Inc., Dallas, Tex. | Verfahren zur herstellung einer halbleitervorrichtung und vorrichtung zur durchfuehrung des verfahrens |
US4897337A (en) * | 1983-01-19 | 1990-01-30 | Tokyo Shibaura Denki Kabushiki Kaisha | Method and apparatus for forming resist pattern |
JPS59140451A (ja) * | 1983-02-01 | 1984-08-11 | Yutaka Mori | 製版カメラに依る各種印刷版または明室用フイルム等の直接製版方法 |
DE3447488A1 (de) * | 1984-10-19 | 1986-05-07 | Canon K.K., Tokio/Tokyo | Projektionseinrichtung |
JPS63259663A (ja) * | 1987-04-17 | 1988-10-26 | Fuji Photo Film Co Ltd | 画像記録装置 |
US4864356A (en) * | 1987-04-21 | 1989-09-05 | Brother Kogyo Kabushiki Kaisha | Exposure device for image recording apparatus |
US5073796A (en) * | 1987-08-31 | 1991-12-17 | Kabushiki Kaisha Toshiba | Cooling system for an apparatus with a heat generating element therein |
JPH01157527A (ja) * | 1987-12-14 | 1989-06-20 | Toshiba Corp | フォトレジストのパターン形成方法 |
DE68921687T2 (de) * | 1988-09-02 | 1995-08-03 | Canon K.K., Tokio/Tokyo | Belichtungseinrichtung. |
JPH0335542U (it) * | 1989-08-17 | 1991-04-08 | ||
JPH03139634A (ja) * | 1989-10-26 | 1991-06-13 | Brother Ind Ltd | 画像形成装置 |
US4989031A (en) * | 1990-01-29 | 1991-01-29 | Nikon Corporation | Projection exposure apparatus |
US5452052A (en) * | 1992-03-25 | 1995-09-19 | Matsushita Electric Industrial Co., Ltd. | Apparatus for exposing chemically amplified resist |
JPH0636993A (ja) * | 1992-05-21 | 1994-02-10 | Canon Inc | 露光装置及び半導体素子の製造方法 |
US5696623A (en) * | 1993-08-05 | 1997-12-09 | Fujitsu Limited | UV exposure with elongated service lifetime |
JP3387075B2 (ja) * | 1994-12-12 | 2003-03-17 | 株式会社ニコン | 走査露光方法、露光装置、及び走査型露光装置 |
DE69618501T2 (de) * | 1995-03-08 | 2002-06-13 | Matsushita Electric Industrial Co., Ltd. | Verfahren zur Herstellung eines Musters |
US6297871B1 (en) * | 1995-09-12 | 2001-10-02 | Nikon Corporation | Exposure apparatus |
US5877843A (en) * | 1995-09-12 | 1999-03-02 | Nikon Corporation | Exposure apparatus |
US6645701B1 (en) * | 1995-11-22 | 2003-11-11 | Nikon Corporation | Exposure method and exposure apparatus |
JP4011643B2 (ja) * | 1996-01-05 | 2007-11-21 | キヤノン株式会社 | 半導体製造装置 |
JPH09218519A (ja) * | 1996-02-09 | 1997-08-19 | Nikon Corp | 露光装置の環境制御方法及び装置 |
US6545746B1 (en) * | 1996-03-04 | 2003-04-08 | Nikon Corporation | Projection exposure apparatus |
KR100542414B1 (ko) * | 1996-03-27 | 2006-05-10 | 가부시키가이샤 니콘 | 노광장치및공조장치 |
JP3689510B2 (ja) * | 1996-11-15 | 2005-08-31 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
US6714278B2 (en) | 1996-11-25 | 2004-03-30 | Nikon Corporation | Exposure apparatus |
US6882403B1 (en) | 1997-04-07 | 2005-04-19 | Nikon Corporation | Lithography system and method |
AU7552498A (en) | 1997-06-10 | 1998-12-30 | Nikon Corporation | Optical device, method of cleaning the same, projection aligner, and method of producing the same |
JP4026943B2 (ja) * | 1997-09-04 | 2007-12-26 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
JPH11224839A (ja) * | 1998-02-04 | 1999-08-17 | Canon Inc | 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法 |
WO1999050892A1 (fr) * | 1998-03-31 | 1999-10-07 | Nikon Corporation | Dispositif optique et systeme d'exposition equipe du dispositif optique |
AU5529499A (en) * | 1998-09-14 | 2000-04-03 | Nikon Corporation | Exposure apparatus and its manufacturing method, and device producing method |
EP1229573A4 (en) | 1999-07-16 | 2006-11-08 | Nikon Corp | EXPOSURE METHOD AND SYSTEM |
JP2001118783A (ja) * | 1999-10-21 | 2001-04-27 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
JP2001274054A (ja) * | 2000-03-24 | 2001-10-05 | Canon Inc | 露光装置、半導体デバイス製造方法および半導体デバイス製造工場 |
JP3869999B2 (ja) | 2000-03-30 | 2007-01-17 | キヤノン株式会社 | 露光装置および半導体デバイス製造方法 |
JP2002158170A (ja) * | 2000-09-08 | 2002-05-31 | Nikon Corp | 露光装置及びデバイス製造方法 |
DE10211611A1 (de) * | 2002-03-12 | 2003-09-25 | Zeiss Carl Smt Ag | Verfahren und Vorrichtung zur Dekontamination optischer Oberflächen |
JP2004128213A (ja) * | 2002-10-02 | 2004-04-22 | Canon Inc | 温調システム及びそれを組み込んだ露光装置 |
CN1316482C (zh) * | 2002-12-19 | 2007-05-16 | 皇家飞利浦电子股份有限公司 | 照射层上斑点的方法和装置 |
EP1610361B1 (en) * | 2003-03-25 | 2014-05-21 | Nikon Corporation | Exposure system and device production method |
US7329308B2 (en) * | 2003-07-09 | 2008-02-12 | Entegris, Inc. | Air handling and chemical filtration system and method |
US20060285091A1 (en) * | 2003-07-21 | 2006-12-21 | Parekh Bipin S | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
US7384149B2 (en) * | 2003-07-21 | 2008-06-10 | Asml Netherlands B.V. | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
US7352433B2 (en) * | 2003-10-28 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2005142382A (ja) * | 2003-11-07 | 2005-06-02 | Canon Inc | 露光装置 |
US20050153424A1 (en) * | 2004-01-08 | 2005-07-14 | Derek Coon | Fluid barrier with transparent areas for immersion lithography |
JP2005353762A (ja) | 2004-06-09 | 2005-12-22 | Matsushita Electric Ind Co Ltd | 半導体製造装置及びパターン形成方法 |
US7304715B2 (en) * | 2004-08-13 | 2007-12-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2006093428A (ja) * | 2004-09-24 | 2006-04-06 | Canon Inc | 温調チャンバおよびこれを用いた露光装置 |
JP4891538B2 (ja) * | 2004-11-04 | 2012-03-07 | 株式会社日立ハイテクノロジーズ | ロードポート |
MY139184A (en) * | 2004-12-06 | 2009-08-28 | Novartis Ag | Method of drying molds |
US8692973B2 (en) | 2005-01-31 | 2014-04-08 | Nikon Corporation | Exposure apparatus and method for producing device |
EP2506289A3 (en) | 2005-01-31 | 2013-05-22 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
US8018573B2 (en) * | 2005-02-22 | 2011-09-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2007281142A (ja) * | 2006-04-05 | 2007-10-25 | Canon Inc | 露光装置及び方法、並びに、デバイス製造方法 |
WO2008024263A1 (en) * | 2006-08-18 | 2008-02-28 | Entegris, Inc | System and method for vortex condensation trapping in purge gas humidification |
US7572976B1 (en) * | 2008-02-06 | 2009-08-11 | Victor Merrill | Quick connect electrical box |
NL1036596A1 (nl) * | 2008-02-21 | 2009-08-24 | Asml Holding Nv | Re-flow and buffer system for immersion lithography. |
EP3832391A1 (en) * | 2019-12-03 | 2021-06-09 | ASML Netherlands B.V. | Clamp assembly |
CN115308999B (zh) * | 2022-10-12 | 2023-03-24 | 苏州矩阵光电有限公司 | 一种匀胶烘干一体机及匀胶烘干方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3620621A (en) * | 1969-02-12 | 1971-11-16 | Matrographics Inc | Emulsion control |
US4026653A (en) * | 1975-05-09 | 1977-05-31 | Bell Telephone Laboratories, Incorporated | Proximity printing method |
DD127137B1 (de) * | 1976-08-17 | 1979-11-28 | Elektromat Veb | Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen |
US4185202A (en) * | 1977-12-05 | 1980-01-22 | Bell Telephone Laboratories, Incorporated | X-ray lithography |
US4423137A (en) * | 1980-10-28 | 1983-12-27 | Quixote Corporation | Contact printing and etching method of making high density recording medium |
-
1981
- 1981-04-24 DD DD81229475A patent/DD160756A3/de not_active IP Right Cessation
- 1981-09-30 JP JP56154059A patent/JPS57177144A/ja active Pending
-
1982
- 1982-04-19 DE DE19823214325 patent/DE3214325A1/de not_active Withdrawn
- 1982-04-22 GB GB8211674A patent/GB2100453B/en not_active Expired
- 1982-04-23 KR KR8201833A patent/KR860000158B1/ko active
- 1982-04-23 FR FR8206998A patent/FR2504696B1/fr not_active Expired
- 1982-04-23 SU SU823431330A patent/SU1238274A1/ru active
- 1982-04-23 CH CH2488/82A patent/CH651423A5/de not_active IP Right Cessation
- 1982-04-26 NL NL8201726A patent/NL8201726A/nl not_active Application Discontinuation
- 1982-04-26 IT IT8267548A patent/IT8267548A0/it unknown
-
1985
- 1985-09-25 US US06/779,832 patent/US4704348A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2504696B1 (fr) | 1985-11-22 |
CH651423A5 (de) | 1985-09-13 |
DE3214325A1 (de) | 1983-01-27 |
SU1238274A1 (ru) | 1986-06-15 |
FR2504696A1 (fr) | 1982-10-29 |
JPS57177144A (en) | 1982-10-30 |
KR860000158B1 (ko) | 1986-02-27 |
KR840000074A (ko) | 1984-01-30 |
GB2100453A (en) | 1982-12-22 |
DD160756A3 (de) | 1984-02-29 |
NL8201726A (nl) | 1982-11-16 |
GB2100453B (en) | 1985-03-20 |
US4704348A (en) | 1987-11-03 |
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