IT1052264B - Agente di distacco per fotoresist e procedimento per la sua produzione - Google Patents
Agente di distacco per fotoresist e procedimento per la sua produzioneInfo
- Publication number
- IT1052264B IT1052264B IT52225/75A IT5222575A IT1052264B IT 1052264 B IT1052264 B IT 1052264B IT 52225/75 A IT52225/75 A IT 52225/75A IT 5222575 A IT5222575 A IT 5222575A IT 1052264 B IT1052264 B IT 1052264B
- Authority
- IT
- Italy
- Prior art keywords
- photoresist
- procedure
- production
- release agent
- release
- Prior art date
Links
- 229920002120 photoresistant polymer Polymers 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2454399A DE2454399C2 (de) | 1974-11-16 | 1974-11-16 | Ablösemittel für Fotolacke |
Publications (1)
Publication Number | Publication Date |
---|---|
IT1052264B true IT1052264B (it) | 1981-06-20 |
Family
ID=5931004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT52225/75A IT1052264B (it) | 1974-11-16 | 1975-11-14 | Agente di distacco per fotoresist e procedimento per la sua produzione |
Country Status (8)
Country | Link |
---|---|
US (1) | US4070203A (it) |
JP (1) | JPS5911100B2 (it) |
BE (1) | BE835591A (it) |
CH (1) | CH601916A5 (it) |
DE (1) | DE2454399C2 (it) |
FR (1) | FR2291607A1 (it) |
GB (1) | GB1491577A (it) |
IT (1) | IT1052264B (it) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4169068A (en) * | 1976-08-20 | 1979-09-25 | Japan Synthetic Rubber Company Limited | Stripping liquor composition for removing photoresists comprising hydrogen peroxide |
US4165295A (en) * | 1976-10-04 | 1979-08-21 | Allied Chemical Corporation | Organic stripping compositions and method for using same |
US4242218A (en) * | 1976-11-08 | 1980-12-30 | Allied Chemical Corporation | Phenol-free photoresist stripper |
US4165294A (en) * | 1976-11-08 | 1979-08-21 | Allied Chemical Corporation | Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids |
US4215005A (en) * | 1978-01-30 | 1980-07-29 | Allied Chemical Corporation | Organic stripping compositions and method for using same |
US4190461A (en) * | 1978-03-20 | 1980-02-26 | Alpha-Omega Services, Inc. | Method for removing metallic seeds from nylon tubing used in interstitial brachytherapy |
CA1116059A (en) * | 1978-05-22 | 1982-01-12 | Allied Corporation | Phenol-free and chlorinated hydrocarbon-free photoresist stripper |
US4221674A (en) * | 1979-03-09 | 1980-09-09 | Allied Chemical Corporation | Organic sulfonic acid stripping composition and method with nitrile and fluoride metal corrosion inhibitor system |
US4187191A (en) * | 1978-07-26 | 1980-02-05 | General Motors Corporation | Photoresist stripper with dodecylsulfonic acid and chlorinated solvents |
US4414035A (en) * | 1979-05-21 | 1983-11-08 | Petrolite Corporation | Method for the removal of asphaltenic deposits |
US4664721A (en) * | 1981-12-07 | 1987-05-12 | Intercontinental Chemical Corporation | Printing screen cleaning and reclaiming compositions |
US4491530A (en) * | 1983-05-20 | 1985-01-01 | Allied Corporation | Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper |
JPS60164498U (ja) * | 1984-04-11 | 1985-10-31 | 川崎 敏明 | 船舶における昇降巻取り式帆走装置 |
JPS6235357A (ja) * | 1985-08-09 | 1987-02-16 | Tokyo Ohka Kogyo Co Ltd | ホトレジスト用剥離液 |
US5312719A (en) * | 1988-10-26 | 1994-05-17 | E. I. Du Pont De Nemours And Company | Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms |
DE3836403A1 (de) * | 1988-10-26 | 1990-05-03 | Hoechst Ag | Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen |
US4971715A (en) * | 1988-11-18 | 1990-11-20 | International Business Machines Corporation | Phenolic-free stripping composition and use thereof |
US4992108A (en) * | 1990-01-18 | 1991-02-12 | Ward Irl E | Photoresist stripping compositions |
DE4303923A1 (de) * | 1993-02-10 | 1994-08-11 | Microparts Gmbh | Verfahren zum Beseitigen von Kunststoffen aus Mikrostrukturen |
US5728664A (en) * | 1996-04-15 | 1998-03-17 | Ashland, Inc. | Photoresist stripping compositions |
KR100301680B1 (ko) | 1999-06-28 | 2001-09-22 | 주식회사 동진쎄미켐 | 네가티브 화학증폭 레지스트용 스트리퍼 조성물 |
JP5195362B2 (ja) * | 2008-12-03 | 2013-05-08 | 三菱電機株式会社 | 回路基板の製造方法および回路基板 |
JP6450366B2 (ja) | 2013-03-29 | 2019-01-09 | ライフ テクノロジーズ コーポレーション | 半導体装置を処理するための方法 |
EP3489367B1 (en) | 2015-03-05 | 2020-09-09 | Life Technologies Corporation | Surface stabilization of biosensors |
CN113172036A (zh) | 2015-03-26 | 2021-07-27 | 生命技术公司 | 用于处理半导体传感器阵列装置的方法 |
EP3997521B1 (en) * | 2019-07-11 | 2023-08-30 | Merck Patent GmbH | Photoresist remover compositions |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2607741A (en) * | 1952-08-19 | Offiol | ||
US985405A (en) * | 1907-03-30 | 1911-02-28 | Chadeloid Chemical Co | Paint or varnish remover. |
US1185641A (en) * | 1911-10-10 | 1916-06-06 | Chadeloid Chemical Co | Finish-removing process. |
US2750343A (en) * | 1952-04-12 | 1956-06-12 | Adolph J Beber | Paint brush cleaner |
US3179609A (en) * | 1958-09-25 | 1965-04-20 | Union Carbide Corp | Finish removal formulation |
US3582401A (en) * | 1967-11-15 | 1971-06-01 | Mallinckrodt Chemical Works | Photosensitive resist remover compositions and methods |
US3574123A (en) * | 1968-04-23 | 1971-04-06 | Grace W R & Co | Paint stripping composition and process |
US3592691A (en) * | 1968-07-11 | 1971-07-13 | Westinghouse Electric Corp | Photoresist removal method |
US3625763A (en) * | 1968-12-04 | 1971-12-07 | Bunker Ramo | Conformal coating stripping method and composition |
US3629004A (en) * | 1969-04-17 | 1971-12-21 | Grace W R & Co | Paint-removing method |
US3813309A (en) * | 1969-12-23 | 1974-05-28 | Ibm | Method for stripping resists from substrates |
DE2007693B2 (de) * | 1970-02-19 | 1976-12-16 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum lokalen abaetzen einer auf einem halbleiterkoerper aufgebrachten siliciumnitridschicht |
-
1974
- 1974-11-16 DE DE2454399A patent/DE2454399C2/de not_active Expired
-
1975
- 1975-10-31 GB GB45300/75A patent/GB1491577A/en not_active Expired
- 1975-11-13 US US05/631,660 patent/US4070203A/en not_active Expired - Lifetime
- 1975-11-14 BE BE161887A patent/BE835591A/xx not_active IP Right Cessation
- 1975-11-14 IT IT52225/75A patent/IT1052264B/it active
- 1975-11-14 CH CH1482275A patent/CH601916A5/xx not_active IP Right Cessation
- 1975-11-15 JP JP50137686A patent/JPS5911100B2/ja not_active Expired
- 1975-11-17 FR FR7535025A patent/FR2291607A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
US4070203A (en) | 1978-01-24 |
FR2291607A1 (fr) | 1976-06-11 |
FR2291607B3 (it) | 1977-12-16 |
GB1491577A (en) | 1977-11-09 |
CH601916A5 (it) | 1978-07-14 |
BE835591A (fr) | 1976-05-14 |
DE2454399A1 (de) | 1976-05-26 |
JPS5911100B2 (ja) | 1984-03-13 |
JPS5172503A (en) | 1976-06-23 |
DE2454399C2 (de) | 1981-09-24 |
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