IT1039152B - X-RAY LITHOGRAPHIC MASK - Google Patents

X-RAY LITHOGRAPHIC MASK

Info

Publication number
IT1039152B
IT1039152B IT2458175A IT2458175A IT1039152B IT 1039152 B IT1039152 B IT 1039152B IT 2458175 A IT2458175 A IT 2458175A IT 2458175 A IT2458175 A IT 2458175A IT 1039152 B IT1039152 B IT 1039152B
Authority
IT
Italy
Prior art keywords
lithographic mask
ray lithographic
ray
mask
lithographic
Prior art date
Application number
IT2458175A
Other languages
Italian (it)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1039152B publication Critical patent/IT1039152B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • ing And Chemical Polishing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
IT2458175A 1974-07-19 1975-06-20 X-RAY LITHOGRAPHIC MASK IT1039152B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US48985374A 1974-07-19 1974-07-19

Publications (1)

Publication Number Publication Date
IT1039152B true IT1039152B (en) 1979-12-10

Family

ID=23945535

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2458175A IT1039152B (en) 1974-07-19 1975-06-20 X-RAY LITHOGRAPHIC MASK

Country Status (5)

Country Link
JP (1) JPS5312793B2 (en)
DE (1) DE2528666C2 (en)
FR (1) FR2279135A1 (en)
GB (1) GB1507752A (en)
IT (1) IT1039152B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142107A (en) * 1977-06-30 1979-02-27 International Business Machines Corporation Resist development control system
US4328298A (en) * 1979-06-27 1982-05-04 The Perkin-Elmer Corporation Process for manufacturing lithography masks
JPS5695770U (en) * 1979-12-20 1981-07-29
DE3529966C1 (en) * 1985-08-22 1987-01-15 Kernforschungsz Karlsruhe Process for the production of masks for X-ray depth lithography
KR920010065B1 (en) * 1989-04-20 1992-11-13 삼성전자 주식회사 X-ray mask

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE568197A (en) * 1957-06-12
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process

Also Published As

Publication number Publication date
FR2279135A1 (en) 1976-02-13
DE2528666C2 (en) 1984-11-22
JPS5312793B2 (en) 1978-05-04
JPS5117672A (en) 1976-02-12
GB1507752A (en) 1978-04-19
FR2279135B1 (en) 1977-07-22
DE2528666A1 (en) 1976-01-29

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