JPS5312793B2 - - Google Patents

Info

Publication number
JPS5312793B2
JPS5312793B2 JP7574475A JP7574475A JPS5312793B2 JP S5312793 B2 JPS5312793 B2 JP S5312793B2 JP 7574475 A JP7574475 A JP 7574475A JP 7574475 A JP7574475 A JP 7574475A JP S5312793 B2 JPS5312793 B2 JP S5312793B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7574475A
Other versions
JPS5117672A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5117672A publication Critical patent/JPS5117672A/ja
Publication of JPS5312793B2 publication Critical patent/JPS5312793B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • ing And Chemical Polishing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP7574475A 1974-07-19 1975-06-23 Expired JPS5312793B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US48985374A 1974-07-19 1974-07-19

Publications (2)

Publication Number Publication Date
JPS5117672A JPS5117672A (ja) 1976-02-12
JPS5312793B2 true JPS5312793B2 (ja) 1978-05-04

Family

ID=23945535

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7574475A Expired JPS5312793B2 (ja) 1974-07-19 1975-06-23

Country Status (5)

Country Link
JP (1) JPS5312793B2 (ja)
DE (1) DE2528666C2 (ja)
FR (1) FR2279135A1 (ja)
GB (1) GB1507752A (ja)
IT (1) IT1039152B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5695770U (ja) * 1979-12-20 1981-07-29

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142107A (en) * 1977-06-30 1979-02-27 International Business Machines Corporation Resist development control system
US4328298A (en) * 1979-06-27 1982-05-04 The Perkin-Elmer Corporation Process for manufacturing lithography masks
DE3529966C1 (de) * 1985-08-22 1987-01-15 Kernforschungsz Karlsruhe Verfahren zur Herstellung von Masken fuer die Roentgentiefenlithographie
KR920010065B1 (ko) * 1989-04-20 1992-11-13 삼성전자 주식회사 X선 마스크

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE568197A (ja) * 1957-06-12
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5695770U (ja) * 1979-12-20 1981-07-29

Also Published As

Publication number Publication date
FR2279135B1 (ja) 1977-07-22
FR2279135A1 (fr) 1976-02-13
DE2528666A1 (de) 1976-01-29
GB1507752A (en) 1978-04-19
JPS5117672A (ja) 1976-02-12
IT1039152B (it) 1979-12-10
DE2528666C2 (de) 1984-11-22

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