GB1507752A - X-ray mask - Google Patents

X-ray mask

Info

Publication number
GB1507752A
GB1507752A GB2776375A GB2776375A GB1507752A GB 1507752 A GB1507752 A GB 1507752A GB 2776375 A GB2776375 A GB 2776375A GB 2776375 A GB2776375 A GB 2776375A GB 1507752 A GB1507752 A GB 1507752A
Authority
GB
United Kingdom
Prior art keywords
ray mask
mask
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2776375A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1507752A publication Critical patent/GB1507752A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB2776375A 1974-07-19 1975-07-01 X-ray mask Expired GB1507752A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US48985374A 1974-07-19 1974-07-19

Publications (1)

Publication Number Publication Date
GB1507752A true GB1507752A (en) 1978-04-19

Family

ID=23945535

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2776375A Expired GB1507752A (en) 1974-07-19 1975-07-01 X-ray mask

Country Status (5)

Country Link
JP (1) JPS5117672A (en)
DE (1) DE2528666C2 (en)
FR (1) FR2279135A1 (en)
GB (1) GB1507752A (en)
IT (1) IT1039152B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2233117A (en) * 1989-04-20 1991-01-02 Samsung Electronics Co Ltd X-ray mask

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142107A (en) * 1977-06-30 1979-02-27 International Business Machines Corporation Resist development control system
US4328298A (en) * 1979-06-27 1982-05-04 The Perkin-Elmer Corporation Process for manufacturing lithography masks
JPS5695770U (en) * 1979-12-20 1981-07-29
DE3529966C1 (en) * 1985-08-22 1987-01-15 Kernforschungsz Karlsruhe Process for the production of masks for X-ray depth lithography

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE568197A (en) * 1957-06-12
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2233117A (en) * 1989-04-20 1991-01-02 Samsung Electronics Co Ltd X-ray mask

Also Published As

Publication number Publication date
FR2279135A1 (en) 1976-02-13
FR2279135B1 (en) 1977-07-22
DE2528666A1 (en) 1976-01-29
DE2528666C2 (en) 1984-11-22
JPS5312793B2 (en) 1978-05-04
IT1039152B (en) 1979-12-10
JPS5117672A (en) 1976-02-12

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940701