IN2014MN00872A - - Google Patents

Info

Publication number
IN2014MN00872A
IN2014MN00872A IN872MUN2014A IN2014MN00872A IN 2014MN00872 A IN2014MN00872 A IN 2014MN00872A IN 872MUN2014 A IN872MUN2014 A IN 872MUN2014A IN 2014MN00872 A IN2014MN00872 A IN 2014MN00872A
Authority
IN
India
Prior art keywords
chemical injection
percentage
quality index
water quality
injection percentage
Prior art date
Application number
Inventor
Takahiro Konishi
Shinji Okubo
Kei Hattori
Yutaka Gojo
Original Assignee
Asahi Kasei Chemicals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Chemicals Corp filed Critical Asahi Kasei Chemicals Corp
Publication of IN2014MN00872A publication Critical patent/IN2014MN00872A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/008Control or steering systems not provided for elsewhere in subclass C02F
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • C02F1/5209Regulation methods for flocculation or precipitation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/001Processes for the treatment of water whereby the filtration technique is of importance
    • C02F1/004Processes for the treatment of water whereby the filtration technique is of importance using large scale industrial sized filters
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/28Treatment of water, waste water, or sewage by sorption
    • C02F1/283Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/44Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/001Upstream control, i.e. monitoring for predictive control
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/003Downstream control, i.e. outlet monitoring, e.g. to check the treating agents, such as halogens or ozone, leaving the process
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/005Processes using a programmable logic controller [PLC]
    • C02F2209/006Processes using a programmable logic controller [PLC] comprising a software program or a logic diagram
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/02Temperature
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/06Controlling or monitoring parameters in water treatment pH
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/07Alkalinity
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/11Turbidity

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Separation Of Suspended Particles By Flocculating Agents (AREA)
  • Control Of Non-Electrical Variables (AREA)

Abstract

A chemical injection controller (1) corrects the chemical injection percentage based on the difference between the measurement of the water quality index of treated water by operating a chemical injection pump based on a preset chemical injection percentage and the target value of the water quality index and calculates the optimal chemical injection percentage. Next the optimal chemical injection percentage is set as the target variable and at least one water quality index of raw water is set as the control variable then multiple regression analysis is conducted to derive the equation for calculating the basic chemical injection percentage corresponding to the water quality index. Next the measured value of the water quality index of raw water is given to the calculation equation to calculate the basic chemical injection percentage corresponding to the water quality index. Next the basic chemical injection percentage is corrected based on the measured value of the water quality index of the treated water by operating the chemical injection pump based on the basic chemical injection percentage and a new chemical injection percentage is calculated and output as the controllable factor of the chemical injection pump and given to the calculation of the optimal chemical injection percentage.
IN872MUN2014 2011-10-28 2012-10-24 IN2014MN00872A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011236741A JP5840456B2 (en) 2011-10-28 2011-10-28 Chemical injection control method and chemical injection control device
PCT/JP2012/077473 WO2013062003A1 (en) 2011-10-28 2012-10-24 Chemical injection control method and chemical injection controller

Publications (1)

Publication Number Publication Date
IN2014MN00872A true IN2014MN00872A (en) 2015-04-17

Family

ID=48167830

Family Applications (1)

Application Number Title Priority Date Filing Date
IN872MUN2014 IN2014MN00872A (en) 2011-10-28 2012-10-24

Country Status (10)

Country Link
US (1) US9517954B2 (en)
EP (1) EP2772467A4 (en)
JP (1) JP5840456B2 (en)
KR (1) KR101684035B1 (en)
CN (1) CN103889900A (en)
AU (1) AU2012330493A1 (en)
CA (1) CA2850099A1 (en)
IN (1) IN2014MN00872A (en)
SG (1) SG11201400951VA (en)
WO (1) WO2013062003A1 (en)

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CN107073369A (en) * 2014-09-11 2017-08-18 三菱重工业株式会社 Water treatment facilities and method for treating water
JP6632498B2 (en) * 2016-09-09 2020-01-22 株式会社日立プラントサービス Water treatment system and water treatment method
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JP6069570B1 (en) * 2016-09-14 2017-02-01 環境電子株式会社 Automatic water quality monitoring device
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JP6848726B2 (en) * 2017-06-30 2021-03-24 王子ホールディングス株式会社 Water treatment equipment and water treatment method
CN110709354A (en) * 2017-12-01 2020-01-17 三菱重工业株式会社 Medication administration control device, water treatment system, medication administration control method, and program
JP6982759B2 (en) * 2018-02-13 2021-12-17 三菱重工パワー環境ソリューション株式会社 Water treatment system
JP7086658B2 (en) * 2018-03-19 2022-06-20 東芝インフラシステムズ株式会社 Water treatment system and water treatment method
JP6977953B2 (en) * 2018-03-22 2021-12-08 住友重機械エンバイロメント株式会社 Water quality condition determination device
FR3083868B1 (en) * 2018-07-13 2020-07-17 Suez Groupe METHOD FOR DETERMINING A COAGULANT DOSE FOR THE TREATMENT OF RAW WATER
CN113039160A (en) * 2018-11-14 2021-06-25 凯米拉公司 Measuring and controlling organics in wastewater streams
KR102012888B1 (en) * 2019-01-24 2019-08-21 (주)하나엔텍 Water clutch system of pool
JP7258606B2 (en) * 2019-03-06 2023-04-17 株式会社東芝 Control device, control method and computer program
JP6609391B1 (en) * 2019-03-20 2019-11-20 株式会社 日立産業制御ソリューションズ Prediction model creation device, prediction model creation method, and prediction model creation program
JP7303101B2 (en) * 2019-12-23 2023-07-04 株式会社クボタ Model generation device, estimation device, model generation method and estimation method
JP7003165B2 (en) * 2020-01-15 2022-01-20 株式会社東芝 Coagulation treatment system, coagulation treatment method, computer program and coagulation treatment control device
JP7030924B1 (en) 2020-10-02 2022-03-07 菅機械工業株式会社 Automatic jar test device and turbid water treatment method using it
FI20216014A1 (en) * 2021-09-30 2023-03-31 Kemira Oyj A method and apparatus for water treatment
CN114956294B (en) * 2022-06-14 2024-02-09 山东新日电气设备有限公司 Intelligent dosing system and method based on artificial neural network
KR102592025B1 (en) * 2023-04-21 2023-10-20 주식회사 가람 An automatic control method for treatment of wastewater with heavy metal

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Also Published As

Publication number Publication date
WO2013062003A1 (en) 2013-05-02
CN103889900A (en) 2014-06-25
US9517954B2 (en) 2016-12-13
JP2013094686A (en) 2013-05-20
KR101684035B1 (en) 2016-12-07
US20140277746A1 (en) 2014-09-18
AU2012330493A1 (en) 2014-06-12
CA2850099A1 (en) 2013-05-02
JP5840456B2 (en) 2016-01-06
EP2772467A1 (en) 2014-09-03
EP2772467A4 (en) 2015-07-08
KR20140053344A (en) 2014-05-07
SG11201400951VA (en) 2014-08-28

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