HK1249193A1 - 曝光裝置及曝光方法、以及平面顯示器製造方法 - Google Patents
曝光裝置及曝光方法、以及平面顯示器製造方法Info
- Publication number
- HK1249193A1 HK1249193A1 HK18108662.0A HK18108662A HK1249193A1 HK 1249193 A1 HK1249193 A1 HK 1249193A1 HK 18108662 A HK18108662 A HK 18108662A HK 1249193 A1 HK1249193 A1 HK 1249193A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- exposure
- flat
- panel display
- display manufacturing
- exposure device
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/465—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015195270 | 2015-09-30 | ||
PCT/JP2016/078799 WO2017057560A1 (ja) | 2015-09-30 | 2016-09-29 | 露光装置及び露光方法、並びにフラットパネルディスプレイ製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1249193A1 true HK1249193A1 (zh) | 2018-10-26 |
Family
ID=58423976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK18108662.0A HK1249193A1 (zh) | 2015-09-30 | 2018-07-04 | 曝光裝置及曝光方法、以及平面顯示器製造方法 |
Country Status (7)
Country | Link |
---|---|
US (3) | US10268121B2 (zh) |
JP (3) | JP6727556B2 (zh) |
KR (1) | KR20180059812A (zh) |
CN (2) | CN113900361B (zh) |
HK (1) | HK1249193A1 (zh) |
TW (2) | TWI760169B (zh) |
WO (1) | WO2017057560A1 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6885335B2 (ja) * | 2015-09-30 | 2021-06-16 | 株式会社ニコン | 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに物体の移動方法 |
WO2017057560A1 (ja) | 2015-09-30 | 2017-04-06 | 株式会社ニコン | 露光装置及び露光方法、並びにフラットパネルディスプレイ製造方法 |
KR102296327B1 (ko) | 2016-09-30 | 2021-09-01 | 가부시키가이샤 니콘 | 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법 |
DE102018210989A1 (de) * | 2018-07-04 | 2020-01-09 | Dr. Johannes Heidenhain Gmbh | Messeinrichtung für eine Spindel oder einen Rundtisch |
US11960211B2 (en) | 2021-07-09 | 2024-04-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Optical lithography system and method of using the same |
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JPH08293456A (ja) * | 1995-04-24 | 1996-11-05 | Canon Inc | 露光装置 |
JPH10318791A (ja) * | 1997-05-14 | 1998-12-04 | Sony Precision Technol Inc | スケール装置 |
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TWI739510B (zh) * | 2014-03-28 | 2021-09-11 | 日商尼康股份有限公司 | 曝光裝置、平板顯示器之製造方法及元件製造方法 |
WO2017057560A1 (ja) * | 2015-09-30 | 2017-04-06 | 株式会社ニコン | 露光装置及び露光方法、並びにフラットパネルディスプレイ製造方法 |
WO2017057577A1 (ja) * | 2015-09-30 | 2017-04-06 | 株式会社ニコン | 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法 |
WO2017057465A1 (ja) * | 2015-09-30 | 2017-04-06 | 株式会社ニコン | 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに計測方法 |
CN108139685B (zh) * | 2015-09-30 | 2020-12-04 | 株式会社尼康 | 曝光装置、平面显示器的制造方法、组件制造方法、及曝光方法 |
-
2016
- 2016-09-29 WO PCT/JP2016/078799 patent/WO2017057560A1/ja active Application Filing
- 2016-09-29 CN CN202111202524.5A patent/CN113900361B/zh active Active
- 2016-09-29 CN CN201680057941.6A patent/CN108139683B/zh active Active
- 2016-09-29 JP JP2017543551A patent/JP6727556B2/ja active Active
- 2016-09-29 KR KR1020187009704A patent/KR20180059812A/ko not_active Application Discontinuation
- 2016-09-29 US US15/763,637 patent/US10268121B2/en active Active
- 2016-09-30 TW TW110112203A patent/TWI760169B/zh active
- 2016-09-30 TW TW105131971A patent/TWI726918B/zh active
-
2018
- 2018-07-04 HK HK18108662.0A patent/HK1249193A1/zh unknown
-
2019
- 2019-03-08 US US16/297,161 patent/US10656529B2/en active Active
-
2020
- 2020-04-29 US US16/861,971 patent/US11187987B2/en active Active
- 2020-07-01 JP JP2020114338A patent/JP2020173472A/ja active Pending
-
2021
- 2021-10-06 JP JP2021164508A patent/JP2022003411A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
CN108139683A (zh) | 2018-06-08 |
TWI760169B (zh) | 2022-04-01 |
CN113900361A (zh) | 2022-01-07 |
JP2022003411A (ja) | 2022-01-11 |
KR20180059812A (ko) | 2018-06-05 |
JPWO2017057560A1 (ja) | 2018-07-19 |
US10268121B2 (en) | 2019-04-23 |
TW202129223A (zh) | 2021-08-01 |
WO2017057560A1 (ja) | 2017-04-06 |
US20200264516A1 (en) | 2020-08-20 |
CN113900361B (zh) | 2024-02-09 |
US10656529B2 (en) | 2020-05-19 |
JP2020173472A (ja) | 2020-10-22 |
TW201721086A (zh) | 2017-06-16 |
CN108139683B (zh) | 2021-11-05 |
US20190025708A1 (en) | 2019-01-24 |
US11187987B2 (en) | 2021-11-30 |
US20190204752A1 (en) | 2019-07-04 |
TWI726918B (zh) | 2021-05-11 |
JP6727556B2 (ja) | 2020-07-22 |
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