HK1215102A1 - 液浸構件和曝光裝置 - Google Patents

液浸構件和曝光裝置

Info

Publication number
HK1215102A1
HK1215102A1 HK16102948.1A HK16102948A HK1215102A1 HK 1215102 A1 HK1215102 A1 HK 1215102A1 HK 16102948 A HK16102948 A HK 16102948A HK 1215102 A1 HK1215102 A1 HK 1215102A1
Authority
HK
Hong Kong
Prior art keywords
liquid
exposure device
immersion member
immersion
exposure
Prior art date
Application number
HK16102948.1A
Other languages
English (en)
Inventor
Shinji Sato
Kenyo ODANAKA
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1215102A1 publication Critical patent/HK1215102A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK16102948.1A 2012-12-27 2016-03-15 液浸構件和曝光裝置 HK1215102A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261746470P 2012-12-27 2012-12-27
PCT/JP2013/084800 WO2014104159A1 (ja) 2012-12-27 2013-12-26 液浸部材及び露光装置

Publications (1)

Publication Number Publication Date
HK1215102A1 true HK1215102A1 (zh) 2016-08-12

Family

ID=51021235

Family Applications (3)

Application Number Title Priority Date Filing Date
HK16102605.5A HK1214888A1 (zh) 2012-12-27 2016-03-07 液浸構件和曝光裝置
HK19101833.8A HK1259429A1 (zh) 2012-12-27 2016-03-07 液浸構件和曝光裝置
HK16102948.1A HK1215102A1 (zh) 2012-12-27 2016-03-15 液浸構件和曝光裝置

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK16102605.5A HK1214888A1 (zh) 2012-12-27 2016-03-07 液浸構件和曝光裝置
HK19101833.8A HK1259429A1 (zh) 2012-12-27 2016-03-07 液浸構件和曝光裝置

Country Status (8)

Country Link
US (4) US9720331B2 (zh)
EP (2) EP3528050A1 (zh)
JP (3) JP6319099B2 (zh)
KR (1) KR102256768B1 (zh)
CN (2) CN108873614A (zh)
HK (3) HK1214888A1 (zh)
TW (2) TWI671599B (zh)
WO (1) WO2014104159A1 (zh)

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US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
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US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
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US11156921B2 (en) 2017-12-15 2021-10-26 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure
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JP4567651B2 (ja) * 2005-11-16 2010-10-20 エーエスエムエル ネザーランズ ビー．ブイ． 露光装置及びデバイス製造方法
KR101634894B1 (ko) 2006-01-19 2016-06-29 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 패턴 형성 장치, 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법
TWI439813B (zh) 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
JP2008034801A (ja) * 2006-06-30 2008-02-14 Canon Inc 露光装置およびデバイス製造方法
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
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US8610873B2 (en) * 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
JP2010157724A (ja) * 2008-12-29 2010-07-15 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110199591A1 (en) * 2009-10-14 2011-08-18 Nikon Corporation Exposure apparatus, exposing method, maintenance method and device fabricating method
JP2011086804A (ja) * 2009-10-16 2011-04-28 Nikon Corp 液浸部材、露光装置、露光方法、及びデバイス製造方法
JP2013053850A (ja) 2010-01-07 2013-03-21 Saitama Medical Univ 円偏光変換装置
WO2011083724A1 (ja) 2010-01-08 2011-07-14 株式会社ニコン 液浸部材、露光装置、露光方法、及びデバイス製造方法
JP2011206121A (ja) 2010-03-29 2011-10-20 Ntn Corp 歯科ハンドピース用流体動圧軸受装置および歯科ハンドピース
JP2012084879A (ja) * 2010-10-14 2012-04-26 Nikon Corp 液浸露光装置、液浸露光方法、デバイス製造方法、プログラム、及び記録媒体
JP2012138511A (ja) * 2010-12-27 2012-07-19 Nikon Corp 露光装置の制御方法、露光装置、デバイス製造方法、プログラム、及び記録媒体
JP5241862B2 (ja) * 2011-01-01 2013-07-17 キヤノン株式会社 露光装置及びデバイスの製造方法
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
JP2013236000A (ja) * 2012-05-10 2013-11-21 Nikon Corp 液浸部材、露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) * 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) * 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
US20190049855A1 (en) 2019-02-14
US9720331B2 (en) 2017-08-01
CN104995714B (zh) 2018-06-26
JP6319099B2 (ja) 2018-05-09
EP2940715B1 (en) 2018-12-26
JPWO2014104159A1 (ja) 2017-01-12
HK1214888A1 (zh) 2016-08-05
TWI671599B (zh) 2019-09-11
KR102256768B1 (ko) 2021-05-26
KR20150099777A (ko) 2015-09-01
WO2014104159A1 (ja) 2014-07-03
US9823582B2 (en) 2017-11-21
EP2940715A1 (en) 2015-11-04
JP6566073B2 (ja) 2019-08-28
US20140300875A1 (en) 2014-10-09
CN104995714A (zh) 2015-10-21
EP3528050A1 (en) 2019-08-21
TW201430504A (zh) 2014-08-01
JP2018106207A (ja) 2018-07-05
US20180052397A1 (en) 2018-02-22
HK1259429A1 (zh) 2019-11-29
JP2019185066A (ja) 2019-10-24
US10133189B2 (en) 2018-11-20
TW201832016A (zh) 2018-09-01
US20160070177A1 (en) 2016-03-10
CN108873614A (zh) 2018-11-23
EP2940715A4 (en) 2016-09-21

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20221224