HK1215327A1 - 液浸部件及曝光裝置 - Google Patents
液浸部件及曝光裝置Info
- Publication number
- HK1215327A1 HK1215327A1 HK16102986.4A HK16102986A HK1215327A1 HK 1215327 A1 HK1215327 A1 HK 1215327A1 HK 16102986 A HK16102986 A HK 16102986A HK 1215327 A1 HK1215327 A1 HK 1215327A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- liquid
- exposure device
- immersion member
- immersion
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261746497P | 2012-12-27 | 2012-12-27 | |
PCT/JP2013/084758 WO2014104139A1 (ja) | 2012-12-27 | 2013-12-25 | 液浸部材及び露光装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1215327A1 true HK1215327A1 (zh) | 2016-08-19 |
Family
ID=51021216
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK16102124.7A HK1214404A1 (zh) | 2012-12-27 | 2016-02-25 | 液體浸入元件和曝光設備 |
HK16102986.4A HK1215327A1 (zh) | 2012-12-27 | 2016-03-15 | 液浸部件及曝光裝置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK16102124.7A HK1214404A1 (zh) | 2012-12-27 | 2016-02-25 | 液體浸入元件和曝光設備 |
Country Status (8)
Country | Link |
---|---|
US (6) | US9651873B2 (zh) |
EP (2) | EP3309821B1 (zh) |
JP (3) | JP6319098B2 (zh) |
KR (1) | KR102229741B1 (zh) |
CN (2) | CN109375473B (zh) |
HK (2) | HK1214404A1 (zh) |
TW (3) | TWI645264B (zh) |
WO (1) | WO2014104139A1 (zh) |
Families Citing this family (19)
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---|---|---|---|---|
EP2506289A3 (en) * | 2005-01-31 | 2013-05-22 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
NL2005655A (en) | 2009-12-09 | 2011-06-14 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
US9256137B2 (en) * | 2011-08-25 | 2016-02-09 | Nikon Corporation | Exposure apparatus, liquid holding method, and device manufacturing method |
NL2009692A (en) | 2011-12-07 | 2013-06-10 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
US9268231B2 (en) | 2012-04-10 | 2016-02-23 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
US9323160B2 (en) | 2012-04-10 | 2016-04-26 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium |
US9823580B2 (en) | 2012-07-20 | 2017-11-21 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
US9494870B2 (en) | 2012-10-12 | 2016-11-15 | Nikon Corporation | Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
US9568828B2 (en) | 2012-10-12 | 2017-02-14 | Nikon Corporation | Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
US9651873B2 (en) | 2012-12-27 | 2017-05-16 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
US9720331B2 (en) | 2012-12-27 | 2017-08-01 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
JP6369472B2 (ja) | 2013-10-08 | 2018-08-08 | 株式会社ニコン | 液浸部材、露光装置及び露光方法、並びにデバイス製造方法 |
US10095129B2 (en) * | 2014-07-04 | 2018-10-09 | Asml Netherlands B.V. | Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus |
JP2017538159A (ja) * | 2014-12-19 | 2017-12-21 | エーエスエムエル ネザーランズ ビー.ブイ. | 流体取扱構造、リソグラフィ装置及びデバイス製造方法 |
WO2017121547A1 (en) * | 2016-01-13 | 2017-07-20 | Asml Netherlands B.V. | Fluid handling structure and lithographic apparatus |
CN113156772A (zh) * | 2016-09-12 | 2021-07-23 | Asml荷兰有限公司 | 用于光刻设备的流体处理结构及浸没光刻设备 |
KR102412406B1 (ko) | 2016-12-14 | 2022-06-22 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 디바이스 제조 방법 |
US11156921B2 (en) | 2017-12-15 | 2021-10-26 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure |
CN112684665B (zh) * | 2020-12-25 | 2024-06-25 | 浙江启尔机电技术有限公司 | 一种浸液供给回收装置 |
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CN1244021C (zh) | 1996-11-28 | 2006-03-01 | 株式会社尼康 | 光刻装置和曝光方法 |
USRE40043E1 (en) | 1997-03-10 | 2008-02-05 | Asml Netherlands B.V. | Positioning device having two object holders |
US6897963B1 (en) | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
US6208407B1 (en) | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
WO2001035168A1 (en) | 1999-11-10 | 2001-05-17 | Massachusetts Institute Of Technology | Interference lithography utilizing phase-locked scanning beams |
US6452292B1 (en) | 2000-06-26 | 2002-09-17 | Nikon Corporation | Planar motor with linear coil arrays |
KR100815222B1 (ko) | 2001-02-27 | 2008-03-19 | 에이에스엠엘 유에스, 인크. | 리소그래피 장치 및 적어도 하나의 레티클 상에 형성된 적어도 두 개의 패턴으로부터의 이미지로 기판 스테이지 상의 필드를 노출시키는 방법 |
TW529172B (en) | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
JP2005536775A (ja) | 2002-08-23 | 2005-12-02 | 株式会社ニコン | 投影光学系、フォトリソグラフィ方法および露光装置、並びに露光装置を用いた方法 |
KR101381538B1 (ko) | 2003-02-26 | 2014-04-04 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
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EP2261742A3 (en) * | 2003-06-11 | 2011-05-25 | ASML Netherlands BV | Lithographic apparatus and device manufacturing method. |
EP1498778A1 (en) * | 2003-06-27 | 2005-01-19 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4288426B2 (ja) | 2003-09-03 | 2009-07-01 | 株式会社ニコン | 液浸リソグラフィのための流体の供給装置及び方法 |
CN100490064C (zh) * | 2003-09-29 | 2009-05-20 | 株式会社尼康 | 曝光装置、曝光方法以及器件制造方法 |
US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
EP3318928A1 (en) | 2004-06-09 | 2018-05-09 | Nikon Corporation | Exposure apparatus and method for producing a device |
JP2006113533A (ja) * | 2004-08-03 | 2006-04-27 | Nikon Corp | 投影光学系、露光装置、および露光方法 |
EP3048485B1 (en) * | 2004-08-03 | 2017-09-27 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
KR101506100B1 (ko) * | 2004-09-17 | 2015-03-26 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
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JP5005226B2 (ja) | 2005-01-31 | 2012-08-22 | 株式会社ニコン | 露光装置及びデバイス製造方法、液体保持方法 |
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JP4567651B2 (ja) * | 2005-11-16 | 2010-10-20 | エーエスエムエル ネザーランズ ビー.ブイ. | 露光装置及びデバイス製造方法 |
KR101634894B1 (ko) | 2006-01-19 | 2016-06-29 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 패턴 형성 장치, 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법 |
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JP2008034801A (ja) * | 2006-06-30 | 2008-02-14 | Canon Inc | 露光装置およびデバイス製造方法 |
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US8237911B2 (en) | 2007-03-15 | 2012-08-07 | Nikon Corporation | Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine |
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JP2010135794A (ja) * | 2008-12-04 | 2010-06-17 | Nikon Corp | 露光装置、露光方法、及びデバイス製造方法 |
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JP2010157724A (ja) * | 2008-12-29 | 2010-07-15 | Nikon Corp | 露光装置、露光方法、及びデバイス製造方法 |
NL2005655A (en) * | 2009-12-09 | 2011-06-14 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
WO2011083724A1 (ja) | 2010-01-08 | 2011-07-14 | 株式会社ニコン | 液浸部材、露光装置、露光方法、及びデバイス製造方法 |
JP2011165798A (ja) * | 2010-02-08 | 2011-08-25 | Nikon Corp | 露光装置、露光装置で使用される方法、デバイス製造方法、プログラム、及び記録媒体 |
EP2381310B1 (en) | 2010-04-22 | 2015-05-06 | ASML Netherlands BV | Fluid handling structure and lithographic apparatus |
NL2006615A (en) * | 2010-05-11 | 2011-11-14 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
NL2007182A (en) * | 2010-08-23 | 2012-02-27 | Asml Netherlands Bv | Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method. |
JP2012084879A (ja) * | 2010-10-14 | 2012-04-26 | Nikon Corp | 液浸露光装置、液浸露光方法、デバイス製造方法、プログラム、及び記録媒体 |
US20120162619A1 (en) * | 2010-12-27 | 2012-06-28 | Nikon Corporation | Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium |
JP2012138511A (ja) * | 2010-12-27 | 2012-07-19 | Nikon Corp | 露光装置の制御方法、露光装置、デバイス製造方法、プログラム、及び記録媒体 |
JP5241862B2 (ja) * | 2011-01-01 | 2013-07-17 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
NL2009271A (en) | 2011-09-15 | 2013-03-18 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
WO2013100114A1 (ja) | 2011-12-28 | 2013-07-04 | 株式会社ニコン | 露光装置、露光方法、デバイス製造方法、液体回収方法、プログラム、及び記録媒体 |
US9323160B2 (en) | 2012-04-10 | 2016-04-26 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium |
US9268231B2 (en) * | 2012-04-10 | 2016-02-23 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
AR086047A1 (es) | 2012-04-24 | 2013-11-13 | Sergio Martin Carabajal | Anteojo con computadora incorporada |
JP2013236000A (ja) * | 2012-05-10 | 2013-11-21 | Nikon Corp | 液浸部材、露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体 |
US9823580B2 (en) | 2012-07-20 | 2017-11-21 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
US9494870B2 (en) | 2012-10-12 | 2016-11-15 | Nikon Corporation | Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
US9568828B2 (en) | 2012-10-12 | 2017-02-14 | Nikon Corporation | Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
US9720331B2 (en) | 2012-12-27 | 2017-08-01 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
US9651873B2 (en) * | 2012-12-27 | 2017-05-16 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
-
2013
- 2013-12-19 US US14/134,999 patent/US9651873B2/en active Active
- 2013-12-25 CN CN201811255979.1A patent/CN109375473B/zh active Active
- 2013-12-25 WO PCT/JP2013/084758 patent/WO2014104139A1/ja active Application Filing
- 2013-12-25 CN CN201380073365.0A patent/CN105144342B/zh active Active
- 2013-12-25 EP EP17191297.5A patent/EP3309821B1/en active Active
- 2013-12-25 EP EP13867519.4A patent/EP2940714B1/en active Active
- 2013-12-25 JP JP2014554512A patent/JP6319098B2/ja active Active
- 2013-12-25 KR KR1020157019504A patent/KR102229741B1/ko active IP Right Grant
- 2013-12-26 TW TW107102722A patent/TWI645264B/zh active
- 2013-12-26 TW TW107135325A patent/TWI686679B/zh active
- 2013-12-26 TW TW102148425A patent/TWI631426B/zh active
-
2015
- 2015-06-18 US US14/743,430 patent/US9823583B2/en active Active
-
2016
- 2016-02-25 HK HK16102124.7A patent/HK1214404A1/zh not_active IP Right Cessation
- 2016-03-15 HK HK16102986.4A patent/HK1215327A1/zh not_active IP Right Cessation
-
2017
- 2017-04-13 US US15/486,976 patent/US9904184B2/en active Active
- 2017-10-17 US US15/786,026 patent/US10095127B2/en active Active
-
2018
- 2018-04-03 JP JP2018071597A patent/JP6601527B2/ja active Active
- 2018-09-27 US US16/144,034 patent/US10423080B2/en active Active
-
2019
- 2019-09-20 US US16/577,113 patent/US20200012201A1/en not_active Abandoned
- 2019-10-10 JP JP2019186811A patent/JP2020003828A/ja active Pending
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20221225 |