HK1215327A1 - 液浸部件及曝光裝置 - Google Patents

液浸部件及曝光裝置

Info

Publication number
HK1215327A1
HK1215327A1 HK16102986.4A HK16102986A HK1215327A1 HK 1215327 A1 HK1215327 A1 HK 1215327A1 HK 16102986 A HK16102986 A HK 16102986A HK 1215327 A1 HK1215327 A1 HK 1215327A1
Authority
HK
Hong Kong
Prior art keywords
liquid
exposure device
immersion member
immersion
exposure
Prior art date
Application number
HK16102986.4A
Other languages
English (en)
Inventor
佐藤真路
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1215327A1 publication Critical patent/HK1215327A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK16102986.4A 2012-12-27 2016-03-15 液浸部件及曝光裝置 HK1215327A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261746497P 2012-12-27 2012-12-27
PCT/JP2013/084758 WO2014104139A1 (ja) 2012-12-27 2013-12-25 液浸部材及び露光装置

Publications (1)

Publication Number Publication Date
HK1215327A1 true HK1215327A1 (zh) 2016-08-19

Family

ID=51021216

Family Applications (2)

Application Number Title Priority Date Filing Date
HK16102124.7A HK1214404A1 (zh) 2012-12-27 2016-02-25 液體浸入元件和曝光設備
HK16102986.4A HK1215327A1 (zh) 2012-12-27 2016-03-15 液浸部件及曝光裝置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
HK16102124.7A HK1214404A1 (zh) 2012-12-27 2016-02-25 液體浸入元件和曝光設備

Country Status (8)

Country Link
US (6) US9651873B2 (zh)
EP (2) EP3309821B1 (zh)
JP (3) JP6319098B2 (zh)
KR (1) KR102229741B1 (zh)
CN (2) CN109375473B (zh)
HK (2) HK1214404A1 (zh)
TW (3) TWI645264B (zh)
WO (1) WO2014104139A1 (zh)

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US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
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Also Published As

Publication number Publication date
TWI645264B (zh) 2018-12-21
US9651873B2 (en) 2017-05-16
TWI631426B (zh) 2018-08-01
US9904184B2 (en) 2018-02-27
CN109375473B (zh) 2021-06-11
US20200012201A1 (en) 2020-01-09
JP2020003828A (ja) 2020-01-09
KR20150099803A (ko) 2015-09-01
US9823583B2 (en) 2017-11-21
US20170219941A1 (en) 2017-08-03
US20140285781A1 (en) 2014-09-25
KR102229741B1 (ko) 2021-03-18
TW201905605A (zh) 2019-02-01
EP2940714A4 (en) 2016-07-06
EP2940714A1 (en) 2015-11-04
US20160077447A1 (en) 2016-03-17
JP2018136561A (ja) 2018-08-30
JP6319098B2 (ja) 2018-05-09
CN109375473A (zh) 2019-02-22
TWI686679B (zh) 2020-03-01
TW201435517A (zh) 2014-09-16
US10095127B2 (en) 2018-10-09
CN105144342A (zh) 2015-12-09
EP2940714B1 (en) 2017-09-20
US20190025716A1 (en) 2019-01-24
EP3309821A1 (en) 2018-04-18
EP3309821B1 (en) 2020-01-29
CN105144342B (zh) 2018-12-04
JP6601527B2 (ja) 2019-11-06
US10423080B2 (en) 2019-09-24
JPWO2014104139A1 (ja) 2017-01-12
HK1214404A1 (zh) 2016-07-22
WO2014104139A1 (ja) 2014-07-03
TW201818162A (zh) 2018-05-16
US20180039189A1 (en) 2018-02-08

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PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20221225