HK1153825A1 - Pellicle container - Google Patents
Pellicle containerInfo
- Publication number
- HK1153825A1 HK1153825A1 HK11107875.2A HK11107875A HK1153825A1 HK 1153825 A1 HK1153825 A1 HK 1153825A1 HK 11107875 A HK11107875 A HK 11107875A HK 1153825 A1 HK1153825 A1 HK 1153825A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- pellicle container
- pellicle
- container
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Packaging Frangible Articles (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Buffer Packaging (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009183033A JP2011034020A (en) | 2009-08-06 | 2009-08-06 | Pellicle storage container |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1153825A1 true HK1153825A1 (en) | 2012-04-05 |
Family
ID=43763126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK11107875.2A HK1153825A1 (en) | 2009-08-06 | 2011-07-29 | Pellicle container |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2011034020A (en) |
KR (1) | KR20110014951A (en) |
CN (1) | CN101995764B (en) |
HK (1) | HK1153825A1 (en) |
TW (1) | TWI388475B (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011095586A (en) * | 2009-10-30 | 2011-05-12 | Shin-Etsu Chemical Co Ltd | Pellicle and method of manufacturing the same |
JP5586560B2 (en) * | 2011-10-28 | 2014-09-10 | 信越化学工業株式会社 | Pellicle container |
JP5586559B2 (en) * | 2011-10-28 | 2014-09-10 | 信越化学工業株式会社 | Pellicle container |
JP2014009020A (en) * | 2012-06-29 | 2014-01-20 | Sekisui Plastics Co Ltd | Packaging material and packaging body |
US10139725B2 (en) | 2013-03-27 | 2018-11-27 | Asml Netherlands B.V. | Lithographic apparatus |
JP5984187B2 (en) * | 2013-04-22 | 2016-09-06 | 信越化学工業株式会社 | Pellicle and photomask assembly |
CN103449025A (en) * | 2013-09-10 | 2013-12-18 | 昆山市巴城镇顺拓工程机械配件厂 | Tray fixing clamp for semiconductor component |
JP6320309B2 (en) | 2015-01-19 | 2018-05-09 | 信越化学工業株式会社 | Pellicle storage container |
JP2016151633A (en) * | 2015-02-17 | 2016-08-22 | 信越化学工業株式会社 | Pellicle-housing container |
JP6275067B2 (en) * | 2015-02-24 | 2018-02-07 | 信越化学工業株式会社 | Pellicle storage container |
JP6351178B2 (en) * | 2015-07-13 | 2018-07-04 | 信越化学工業株式会社 | Pellicle storage container and pellicle removal method |
KR20220140650A (en) | 2015-12-14 | 2022-10-18 | 에이에스엠엘 네델란즈 비.브이. | A membrane for euv lithography |
CA3233586A1 (en) | 2015-12-14 | 2017-06-22 | Asml Netherlands B.V. | A membrane assembly |
JP6604651B2 (en) * | 2016-02-22 | 2019-11-13 | 信越化学工業株式会社 | Pellicle storage container |
JP6357218B2 (en) * | 2016-12-28 | 2018-07-11 | 積水化成品工業株式会社 | Packing material and package |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3408000B2 (en) * | 1994-11-28 | 2003-05-19 | 菱電セミコンダクタシステムエンジニアリング株式会社 | Pellicle peeling method |
JPH0955354A (en) * | 1995-08-14 | 1997-02-25 | Shin Etsu Polymer Co Ltd | Pellicle housing container |
JP3919260B2 (en) * | 1996-07-05 | 2007-05-23 | 信越ポリマー株式会社 | Pellicle storage container |
JPH10114389A (en) * | 1996-10-07 | 1998-05-06 | Nikon Corp | Pellicle container |
JPH10114388A (en) * | 1996-10-07 | 1998-05-06 | Nikon Corp | Pellicle container |
JPH10198022A (en) * | 1997-01-07 | 1998-07-31 | Shin Etsu Chem Co Ltd | Pellicle housing container |
JPH1124240A (en) * | 1997-07-07 | 1999-01-29 | Shin Etsu Chem Co Ltd | Pellicle housing method and pellicle housing container |
JPH1149267A (en) * | 1997-08-01 | 1999-02-23 | Tenshiyou Denki Kogyo Kk | Liquid crystal plate carrying container |
JP2003216303A (en) * | 2001-11-13 | 2003-07-31 | Alps Electric Co Ltd | Input device |
JP2003243496A (en) * | 2002-02-15 | 2003-08-29 | Dainippon Printing Co Ltd | Substrate storage case |
JP3868401B2 (en) * | 2003-06-25 | 2007-01-17 | 株式会社スズセイ | Grip part structure of writing instruments |
JP4236535B2 (en) * | 2003-07-31 | 2009-03-11 | 旭化成エレクトロニクス株式会社 | Large pellicle storage container |
JP4455950B2 (en) * | 2004-07-28 | 2010-04-21 | 三菱電線工業株式会社 | Cleat |
JP4391435B2 (en) * | 2005-03-22 | 2009-12-24 | 信越化学工業株式会社 | Pellicle storage container |
JP2007065583A (en) * | 2005-09-02 | 2007-03-15 | Shin Etsu Chem Co Ltd | Method for housing pellicle into pellicle container, method for taking out pellicle from pellicle container, method for transporting and storing pellicle, method for packaging pellicle container housing pellicle, and method for opening pellicle container housing pellicle |
JP2007328226A (en) * | 2006-06-09 | 2007-12-20 | Shin Etsu Chem Co Ltd | Pellicle storage container and method for manufacturing the same |
JP4736972B2 (en) * | 2006-06-22 | 2011-07-27 | パナソニック株式会社 | Multi-directional operation switch |
JP2008158116A (en) * | 2006-12-22 | 2008-07-10 | Asahi Kasei Electronics Co Ltd | Pellicle frame |
JP4889510B2 (en) * | 2007-01-16 | 2012-03-07 | 信越化学工業株式会社 | Application method of adhesive to inner surface of pellicle frame |
JP5269438B2 (en) * | 2007-03-13 | 2013-08-21 | 旭化成イーマテリアルズ株式会社 | Protective film for large pellicle and storage method for large pellicle |
KR101191055B1 (en) * | 2007-07-06 | 2012-10-15 | 아사히 가세이 이-매터리얼즈 가부시키가이샤 | Frame of large pellicle and grasping method of frame |
JP4930850B2 (en) * | 2007-10-04 | 2012-05-16 | Necカシオモバイルコミュニケーションズ株式会社 | Waterproof structure and housing of electronic equipment |
JP5051840B2 (en) * | 2007-11-22 | 2012-10-17 | 信越化学工業株式会社 | Method for storing a pellicle in a pellicle storage container |
JP5133229B2 (en) * | 2008-12-05 | 2013-01-30 | 信越ポリマー株式会社 | Pellicle storage container |
JP2011031978A (en) * | 2009-08-05 | 2011-02-17 | Shin Etsu Polymer Co Ltd | Large-sized precision substrate storage container |
-
2009
- 2009-08-06 JP JP2009183033A patent/JP2011034020A/en active Pending
-
2010
- 2010-05-17 KR KR1020100045920A patent/KR20110014951A/en not_active Application Discontinuation
- 2010-07-21 CN CN2010102350162A patent/CN101995764B/en not_active Expired - Fee Related
- 2010-07-26 TW TW099124595A patent/TWI388475B/en active
-
2011
- 2011-07-29 HK HK11107875.2A patent/HK1153825A1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI388475B (en) | 2013-03-11 |
TW201105555A (en) | 2011-02-16 |
JP2011034020A (en) | 2011-02-17 |
KR20110014951A (en) | 2011-02-14 |
CN101995764B (en) | 2013-01-23 |
CN101995764A (en) | 2011-03-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20210721 |