HK1075070A1 - Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor - Google Patents

Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor

Info

Publication number
HK1075070A1
HK1075070A1 HK05107334A HK05107334A HK1075070A1 HK 1075070 A1 HK1075070 A1 HK 1075070A1 HK 05107334 A HK05107334 A HK 05107334A HK 05107334 A HK05107334 A HK 05107334A HK 1075070 A1 HK1075070 A1 HK 1075070A1
Authority
HK
Hong Kong
Prior art keywords
installation
evacuating
under vacuum
evacuation system
system therefor
Prior art date
Application number
HK05107334A
Other languages
English (en)
Inventor
Peter Muller
Arndt Lutz
Original Assignee
Oerlikon Leybold Vacuum Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Leybold Vacuum Gmbh filed Critical Oerlikon Leybold Vacuum Gmbh
Publication of HK1075070A1 publication Critical patent/HK1075070A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01C—ROTARY-PISTON OR OSCILLATING-PISTON MACHINES OR ENGINES
    • F01C21/00—Component parts, details or accessories not provided for in groups F01C1/00 - F01C20/00
    • F01C21/10—Outer members for co-operation with rotary pistons; Casings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/30—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members
    • F04C18/34—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members
    • F04C18/344—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members with vanes reciprocating with respect to the inner member
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D25/00—Pumping installations or systems
    • F04D25/16—Combinations of two or more pumps ; Producing two or more separate gas flows
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
HK05107334A 2001-10-11 2005-08-22 Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor HK1075070A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10150015A DE10150015A1 (de) 2001-10-11 2001-10-11 Mehrkammeranlage zur Behandlung von Gegenständen unter Vakuum, Verfahren zur Evakuierung dieser Anlage und Evakuierungssystem dafür
PCT/EP2002/010918 WO2003033761A2 (de) 2001-10-11 2002-09-28 Mehrkammervakuumanlage, verfahren und vorrichtung zu ihrer evakuierung

Publications (1)

Publication Number Publication Date
HK1075070A1 true HK1075070A1 (en) 2005-12-02

Family

ID=7702062

Family Applications (1)

Application Number Title Priority Date Filing Date
HK05107334A HK1075070A1 (en) 2001-10-11 2005-08-22 Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor

Country Status (9)

Country Link
US (1) US7156922B2 (xx)
EP (1) EP1434896B1 (xx)
JP (1) JP2005505697A (xx)
KR (1) KR100884115B1 (xx)
CN (1) CN100379894C (xx)
CA (1) CA2462934C (xx)
DE (2) DE10150015A1 (xx)
HK (1) HK1075070A1 (xx)
WO (1) WO2003033761A2 (xx)

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* Cited by examiner, † Cited by third party
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DE10150015A1 (de) * 2001-10-11 2003-04-17 Leybold Vakuum Gmbh Mehrkammeranlage zur Behandlung von Gegenständen unter Vakuum, Verfahren zur Evakuierung dieser Anlage und Evakuierungssystem dafür
AT6407U1 (de) * 2002-12-12 2003-10-27 Technoplast Kunststofftechnik Verfahren zur regelung der vakuumversorgung von kalibrierwerkzeugen
JP4218756B2 (ja) * 2003-10-17 2009-02-04 株式会社荏原製作所 真空排気装置
US7278831B2 (en) * 2003-12-31 2007-10-09 The Boc Group, Inc. Apparatus and method for control, pumping and abatement for vacuum process chambers
FR2869369B1 (fr) * 2004-04-21 2006-07-21 Alcatel Sa Pompe a vide multi-etagee, et installation de pompage comprenant une telle pompe
KR100706243B1 (ko) * 2005-02-22 2007-04-11 삼성전자주식회사 질화 텅스텐 증착 장치 및 증착 방법
CN101660135B (zh) * 2009-09-22 2011-05-25 菏泽天宇科技开发有限责任公司 一种柔性带材真空溅射预抽空处理设备
DE102010033373A1 (de) * 2010-08-04 2012-02-09 Inficon Gmbh Lecksuchgerät
CN102393468A (zh) * 2011-08-28 2012-03-28 大连齐维科技发展有限公司 多级差分抽超高真空样品传递机构
JP5808454B1 (ja) * 2014-04-25 2015-11-10 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラムおよび記録媒体
JP6608394B2 (ja) * 2014-06-27 2019-11-20 アテリエ ビスク ソシエテ アノニム 真空ポンプシステムの圧送方法および真空ポンプシステム
CN105840500A (zh) * 2015-04-02 2016-08-10 熵零股份有限公司 一种三缸共轴流体机构
JP6725389B2 (ja) * 2016-09-28 2020-07-15 キオクシア株式会社 半導体製造装置
DE202018000285U1 (de) * 2018-01-18 2019-04-23 Leybold Gmbh Vakuumpumpen-System
DE102018105142A1 (de) * 2018-03-06 2019-09-12 Schwäbische Hüttenwerke Automotive GmbH Dichtelement Vakuumpumpe
CN111441029B (zh) * 2020-04-22 2021-05-11 山西大学 用于实验制备超冷原子与分子的超高真空获取***及方法
CN111550403A (zh) * 2020-05-14 2020-08-18 天津市百利溢通电泵有限公司 一种具有预紧弹簧的多级型五滑片式潜油电泵

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Also Published As

Publication number Publication date
WO2003033761A2 (de) 2003-04-24
EP1434896B1 (de) 2010-11-17
DE50214779D1 (de) 2010-12-30
EP1434896A2 (de) 2004-07-07
CN100379894C (zh) 2008-04-09
CA2462934C (en) 2010-05-25
US7156922B2 (en) 2007-01-02
KR20050031064A (ko) 2005-04-01
CA2462934A1 (en) 2003-04-24
CN1610767A (zh) 2005-04-27
US20050000436A1 (en) 2005-01-06
KR100884115B1 (ko) 2009-02-17
WO2003033761A3 (de) 2003-09-12
DE10150015A1 (de) 2003-04-17
JP2005505697A (ja) 2005-02-24

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