HK1035435A1 - Electromagnetic alignment and scanning apparatus - Google Patents

Electromagnetic alignment and scanning apparatus

Info

Publication number
HK1035435A1
HK1035435A1 HK01101436A HK01101436A HK1035435A1 HK 1035435 A1 HK1035435 A1 HK 1035435A1 HK 01101436 A HK01101436 A HK 01101436A HK 01101436 A HK01101436 A HK 01101436A HK 1035435 A1 HK1035435 A1 HK 1035435A1
Authority
HK
Hong Kong
Prior art keywords
scanning apparatus
electromagnetic alignment
alignment
electromagnetic
scanning
Prior art date
Application number
HK01101436A
Other languages
English (en)
Inventor
Akimitsu Ebihara
Thomas Novak
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1035435A1 publication Critical patent/HK1035435A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Atmospheric Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Toxicology (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Position Or Direction (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Machine Tool Units (AREA)
HK01101436A 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus HK1035435A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26699994A 1994-06-27 1994-06-27

Publications (1)

Publication Number Publication Date
HK1035435A1 true HK1035435A1 (en) 2001-11-23

Family

ID=23016891

Family Applications (12)

Application Number Title Priority Date Filing Date
HK01101434A HK1035433A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103149A HK1025841A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101432A HK1035431A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101436A HK1035435A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101433A HK1035432A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103152A HK1025842A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103151A HK1026767A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103150A HK1026766A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101431A HK1035430A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103148A HK1025840A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101430A HK1032291A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK98115706A HK1017824A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus

Family Applications Before (3)

Application Number Title Priority Date Filing Date
HK01101434A HK1035433A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103149A HK1025841A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101432A HK1035431A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus

Family Applications After (8)

Application Number Title Priority Date Filing Date
HK01101433A HK1035432A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103152A HK1025842A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103151A HK1026767A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103150A HK1026766A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101431A HK1035430A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103148A HK1025840A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101430A HK1032291A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK98115706A HK1017824A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus

Country Status (4)

Country Link
JP (6) JP3800616B2 (xx)
KR (7) KR100281853B1 (xx)
GB (13) GB2329518B (xx)
HK (12) HK1035433A1 (xx)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69629087T2 (de) * 1995-05-30 2004-04-22 Asml Netherlands B.V. Positionierungsgerät mit einem referenzrahmen für ein messsystem
JP3659529B2 (ja) * 1996-06-06 2005-06-15 キヤノン株式会社 露光装置およびデバイス製造方法
JPH10521A (ja) * 1996-06-07 1998-01-06 Nikon Corp 支持装置
US5821981A (en) * 1996-07-02 1998-10-13 Gerber Systems Corporation Magnetically preloaded air bearing motion system for an imaging device
US6222614B1 (en) * 1996-12-06 2001-04-24 Nikon Corporation Exposure elements with a cable-relaying support
WO1998028665A1 (en) * 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
JP3626504B2 (ja) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ ２個の物品ホルダを有する位置決め装置
EP1450208A1 (en) * 1997-03-10 2004-08-25 ASML Netherlands B.V. Lithographic apparatus having two object holders
US20010003028A1 (en) 1997-09-19 2001-06-07 Nikon Corporation Scanning Exposure Method
AU9095798A (en) 1997-09-19 1999-04-12 Nikon Corporation Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby
JP4164905B2 (ja) * 1997-09-25 2008-10-15 株式会社ニコン 電磁力モータ、ステージ装置および露光装置
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
WO1999025011A1 (fr) * 1997-11-12 1999-05-20 Nikon Corporation Appareil d'exposition par projection
KR20010043861A (ko) * 1998-06-17 2001-05-25 오노 시게오 노광방법 및 장치
US6252234B1 (en) * 1998-08-14 2001-06-26 Nikon Corporation Reaction force isolation system for a planar motor
US6307284B1 (en) * 1998-09-16 2001-10-23 Canon Kabushiki Kaisha Positioning apparatus, information recording/reproducing apparatus, and inspection apparatus
EP1248288A1 (en) 1999-12-16 2002-10-09 Nikon Corporation Exposure method and exposure apparatus
EP1111469B1 (en) * 1999-12-21 2007-10-17 ASML Netherlands B.V. Lithographic apparatus with a balanced positioning system
TWI264617B (en) 1999-12-21 2006-10-21 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
US6836093B1 (en) * 1999-12-21 2004-12-28 Nikon Corporation Exposure method and apparatus
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
EP1128216B1 (en) 2000-02-21 2008-11-26 Sharp Kabushiki Kaisha Precision stage device
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
KR100387243B1 (ko) * 2000-06-26 2003-06-12 삼성전자주식회사 초소형 정보저장기기용 ｘ-ｙ 스테이지 전자 구동 장치 및그 코일 제작 방법
JP2002170765A (ja) * 2000-12-04 2002-06-14 Nikon Corp ステージ装置及び露光装置
JP4021158B2 (ja) * 2001-04-27 2007-12-12 株式会社新川 半導体製造装置におけるｘｙテーブル
JP2002343706A (ja) * 2001-05-18 2002-11-29 Nikon Corp ステージ装置及びステージの駆動方法、露光装置及び露光方法、並びにデバイス及びその製造方法
US6788385B2 (en) 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
KR100391000B1 (ko) * 2001-06-30 2003-07-12 주식회사 하이닉스반도체 반도체 노광 장치
ES2285634T3 (es) * 2002-03-12 2007-11-16 Hamamatsu Photonics K. K. Metodo para dividir un siustrato.
KR100937318B1 (ko) * 2002-12-02 2010-01-18 두산인프라코어 주식회사 머시닝센터 이송축의 직각도 조정장치
CN100514581C (zh) * 2002-12-09 2009-07-15 Acm研究公司 晶片卡盘和抛光/电镀托座之间的测量对准
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TW201809801A (zh) 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
KR101547037B1 (ko) 2003-12-15 2015-08-24 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 노광 방법
JP4586367B2 (ja) * 2004-01-14 2010-11-24 株式会社ニコン ステージ装置及び露光装置
TWI437618B (zh) 2004-02-06 2014-05-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
JP5130714B2 (ja) * 2004-04-09 2013-01-30 株式会社ニコン 移動体の駆動方法、ステージ装置、露光装置、露光方法、及びデバイス製造方法
EP1780786A4 (en) 2004-06-07 2009-11-25 Nikon Corp STAGE DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD
KR101187611B1 (ko) 2004-09-01 2012-10-08 가부시키가이샤 니콘 기판 홀더, 스테이지 장치, 및 노광 장치
JP4541849B2 (ja) * 2004-11-22 2010-09-08 キヤノン株式会社 位置決め装置
US7557529B2 (en) 2005-01-11 2009-07-07 Nikon Corporation Stage unit and exposure apparatus
US7456935B2 (en) * 2005-04-05 2008-11-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table
EP1881521B1 (en) 2005-05-12 2014-07-23 Nikon Corporation Projection optical system, exposure apparatus and exposure method
US7292317B2 (en) * 2005-06-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
US7675201B2 (en) * 2006-07-25 2010-03-09 Asml Netherlands B.V. Lithographic apparatus with planar motor driven support
JP5141979B2 (ja) * 2006-09-29 2013-02-13 株式会社ニコン ステージ装置および露光装置
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP4554715B2 (ja) * 2009-02-24 2010-09-29 ファナック株式会社 ケーブルクランプまたは中継する構造を備えた直線駆動装置
WO2010131485A1 (ja) * 2009-05-15 2010-11-18 株式会社ニコン 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法
JP5651035B2 (ja) * 2011-02-09 2015-01-07 株式会社ソディック 移動装置
CN102887341A (zh) * 2011-07-22 2013-01-23 大银微***股份有限公司 悬臂式平台的横梁预拉模组
CN103522079B (zh) * 2013-09-29 2016-01-06 天津大学 双弹簧预紧柔性解耦直线电机定位平台
US9878386B2 (en) 2013-10-31 2018-01-30 Foundation Of Soongsil University-Industry Cooperation Eccentric electrode for electric discharge machining, method of manufacturing the same, and micro electric discharge machining apparatus including the same
CN103824792A (zh) * 2014-02-28 2014-05-28 上海和辉光电有限公司 一种储藏柜及控制方法
JP5912143B2 (ja) * 2014-03-04 2016-04-27 株式会社新川 ボンディング装置
JP6379612B2 (ja) * 2014-04-11 2018-08-29 株式会社ニコン 移動体装置及び露光装置、並びにデバイス製造方法
CN107664920B (zh) * 2016-07-29 2019-04-12 上海微电子装备（集团）股份有限公司 电磁导轨装置
JP2019529970A (ja) * 2016-09-09 2019-10-17 エーエスエムエル ホールディング エヌ．ブイ． リソグラフィ装置及びサポート構造背景
CN110328405B (zh) * 2019-08-09 2020-09-22 佛山市镭科智能设备有限公司 一种型材的夹持控制方法
CN114043260B (zh) * 2022-01-13 2022-04-26 上海隐冠半导体技术有限公司 位移装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5208497A (en) * 1989-04-17 1993-05-04 Sharp Kabushiki Kaisha Linear driving apparatus
NL9100407A (nl) * 1991-03-07 1992-10-01 Philips Nv Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
JPH0529442A (ja) * 1991-07-18 1993-02-05 Toshiba Corp テ−ブル装置
US5285142A (en) * 1993-02-09 1994-02-08 Svg Lithography Systems, Inc. Wafer stage with reference surface
JPH07260472A (ja) * 1994-03-22 1995-10-13 Nikon Corp ステージ装置の直交度測定方法
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
JPH08229759A (ja) * 1995-02-24 1996-09-10 Canon Inc 位置決め装置並びにデバイス製造装置及び方法

Also Published As

Publication number Publication date
JP2006258817A (ja) 2006-09-28
JP3804786B2 (ja) 2006-08-02
GB2329520B (en) 1999-06-02
GB2329519B (en) 1999-06-02
KR100281856B1 (ko) 2001-02-15
GB2329518B (en) 1999-06-02
GB2329067B (en) 1999-06-02
JP2003197519A (ja) 2003-07-11
GB2325564B (en) 1999-03-24
GB2329522B (en) 1999-06-02
HK1025842A1 (en) 2000-11-24
JP3800616B2 (ja) 2006-07-26
JP2003197518A (ja) 2003-07-11
GB2329520A (en) 1999-03-24
GB9512659D0 (en) 1995-08-23
GB9817493D0 (en) 1998-10-07
JP4687911B2 (ja) 2011-05-25
GB2329521B (en) 1999-06-02
JP2003158073A (ja) 2003-05-30
HK1026767A1 (en) 2000-12-22
HK1017824A1 (en) 1999-11-26
GB9817492D0 (en) 1998-10-07
GB2290658B (en) 1999-03-24
GB2325563B (en) 1999-03-24
HK1035433A1 (en) 2001-11-23
GB2325566B (en) 1999-03-31
GB2329519A (en) 1999-03-24
GB2290658A (en) 1996-01-03
GB2329521A (en) 1999-03-24
GB2329517B (en) 1999-06-02
HK1035431A1 (en) 2001-11-23
GB9825844D0 (en) 1999-01-20
GB9817491D0 (en) 1998-10-07
GB2329067A (en) 1999-03-10
GB2325566A (en) 1998-11-25
GB2329518A (en) 1999-03-24
GB9817494D0 (en) 1998-10-07
JP2007242034A (ja) 2007-09-20
GB9817490D0 (en) 1998-10-07
KR100281853B1 (ko) 2001-04-02
HK1035430A1 (en) 2001-11-23
HK1025840A1 (en) 2000-11-24
KR100281857B1 (ko) 2001-02-15
KR100281858B1 (ko) 2001-02-15
GB2325563A (en) 1998-11-25
JP3804787B2 (ja) 2006-08-02
HK1025841A1 (en) 2000-11-24
GB2325565B (en) 1999-03-31
GB2329516A (en) 1999-03-24
JP4135188B2 (ja) 2008-08-20
HK1032291A1 (en) 2001-07-13
GB2325564A (en) 1998-11-25
KR100281855B1 (ko) 2001-02-15
KR960002519A (ko) 1996-01-26
JP3804785B2 (ja) 2006-08-02
GB2325565A (en) 1998-11-25
GB2329517A (en) 1999-03-24
HK1035432A1 (en) 2001-11-23
GB2329516B (en) 1999-06-02
KR100281859B1 (ko) 2001-02-15
JPH0863231A (ja) 1996-03-08
HK1026766A1 (en) 2000-12-22
GB2329522A (en) 1999-03-24
KR100281860B1 (ko) 2001-02-15

Similar Documents

Publication Publication Date Title
GB2290658B (en) Electromagnetic alignment and scanning apparatus
GB2328280B (en) Scanning apparatus and methods
GB9503695D0 (en) Alignment apparatus and method
GB9423045D0 (en) Turn up and alignment apparatus
GB2270604B (en) Scanning method and apparatus
GB2295517B (en) Facsimile apparatus and methods
GB2302186B (en) Scanning apparatus and method
HK1014054A1 (en) Image forming apparatus and image fixing apparatus
HK1035434A1 (en) Electromagnetic alignment and scanning apparatus
GB9410430D0 (en) Scanning apparatus and method
GB9411468D0 (en) Scanning apparatus
GB9308616D0 (en) Scanning method and apparatus
HK1004344A1 (en) Scanning arrangement and method

Legal Events

Date Code Title Description
PF Patent in force
PE Patent expired

Effective date: 20150620