GB8719665D0 - Exposure method - Google Patents

Exposure method

Info

Publication number
GB8719665D0
GB8719665D0 GB878719665A GB8719665A GB8719665D0 GB 8719665 D0 GB8719665 D0 GB 8719665D0 GB 878719665 A GB878719665 A GB 878719665A GB 8719665 A GB8719665 A GB 8719665A GB 8719665 D0 GB8719665 D0 GB 8719665D0
Authority
GB
United Kingdom
Prior art keywords
exposure method
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB878719665A
Other versions
GB2196132A (en
GB2196132B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP59015044A external-priority patent/JPS60162258A/en
Priority claimed from JP59024283A external-priority patent/JPS60170237A/en
Priority claimed from JP59024282A external-priority patent/JPH0758678B2/en
Priority claimed from JP59275751A external-priority patent/JPH0715875B2/en
Priority claimed from JP60003783A external-priority patent/JPS61162051A/en
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8719665D0 publication Critical patent/GB8719665D0/en
Publication of GB2196132A publication Critical patent/GB2196132A/en
Application granted granted Critical
Publication of GB2196132B publication Critical patent/GB2196132B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q7/00—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting
    • B23Q7/14—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting co-ordinated in production lines
    • B23Q7/1426—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting co-ordinated in production lines with work holders not rigidly fixed to the transport devices
    • B23Q7/1436—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting co-ordinated in production lines with work holders not rigidly fixed to the transport devices using self-propelled work holders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB08719665A 1984-02-01 1987-08-20 Exposure method and apparatus Expired GB2196132B (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP59015044A JPS60162258A (en) 1984-02-01 1984-02-01 Exposure device
JP59024283A JPS60170237A (en) 1984-02-14 1984-02-14 Method for exposure
JP59024282A JPH0758678B2 (en) 1984-02-14 1984-02-14 Exposure equipment
JP59275751A JPH0715875B2 (en) 1984-12-27 1984-12-27 Exposure apparatus and method
JP60003783A JPS61162051A (en) 1985-01-12 1985-01-12 Exposing method

Publications (3)

Publication Number Publication Date
GB8719665D0 true GB8719665D0 (en) 1987-09-30
GB2196132A GB2196132A (en) 1988-04-20
GB2196132B GB2196132B (en) 1988-12-21

Family

ID=27518395

Family Applications (2)

Application Number Title Priority Date Filing Date
GB08719665A Expired GB2196132B (en) 1984-02-01 1987-08-20 Exposure method and apparatus
GB8817065A Expired GB2204706B (en) 1984-02-01 1988-07-18 Exposure method and apparatus

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB8817065A Expired GB2204706B (en) 1984-02-01 1988-07-18 Exposure method and apparatus

Country Status (1)

Country Link
GB (2) GB2196132B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06260384A (en) * 1993-03-08 1994-09-16 Nikon Corp Method for controlling amount of exposure
DE19855106A1 (en) * 1998-11-30 2000-05-31 Zeiss Carl Fa Illumination system for VUV microlithography

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100843A (en) * 1981-12-11 1983-06-15 Minolta Camera Co Ltd Light source device for exposure
GB2155650B (en) * 1984-02-14 1988-11-16 Canon Kk Method and apparatus for exposure

Also Published As

Publication number Publication date
GB2196132A (en) 1988-04-20
GB8817065D0 (en) 1988-08-24
GB2196132B (en) 1988-12-21
GB2204706B (en) 1989-05-24
GB2204706A (en) 1988-11-16

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20050123