GB2196132B - Exposure method and apparatus - Google Patents
Exposure method and apparatusInfo
- Publication number
- GB2196132B GB2196132B GB08719665A GB8719665A GB2196132B GB 2196132 B GB2196132 B GB 2196132B GB 08719665 A GB08719665 A GB 08719665A GB 8719665 A GB8719665 A GB 8719665A GB 2196132 B GB2196132 B GB 2196132B
- Authority
- GB
- United Kingdom
- Prior art keywords
- exposure method
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q7/00—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting
- B23Q7/14—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting co-ordinated in production lines
- B23Q7/1426—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting co-ordinated in production lines with work holders not rigidly fixed to the transport devices
- B23Q7/1436—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting co-ordinated in production lines with work holders not rigidly fixed to the transport devices using self-propelled work holders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59015044A JPS60162258A (en) | 1984-02-01 | 1984-02-01 | Exposure device |
JP59024283A JPS60170237A (en) | 1984-02-14 | 1984-02-14 | Method for exposure |
JP59024282A JPH0758678B2 (en) | 1984-02-14 | 1984-02-14 | Exposure equipment |
JP59275751A JPH0715875B2 (en) | 1984-12-27 | 1984-12-27 | Exposure apparatus and method |
JP60003783A JPS61162051A (en) | 1985-01-12 | 1985-01-12 | Exposing method |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8719665D0 GB8719665D0 (en) | 1987-09-30 |
GB2196132A GB2196132A (en) | 1988-04-20 |
GB2196132B true GB2196132B (en) | 1988-12-21 |
Family
ID=27518395
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08719665A Expired GB2196132B (en) | 1984-02-01 | 1987-08-20 | Exposure method and apparatus |
GB8817065A Expired GB2204706B (en) | 1984-02-01 | 1988-07-18 | Exposure method and apparatus |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8817065A Expired GB2204706B (en) | 1984-02-01 | 1988-07-18 | Exposure method and apparatus |
Country Status (1)
Country | Link |
---|---|
GB (2) | GB2196132B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06260384A (en) * | 1993-03-08 | 1994-09-16 | Nikon Corp | Method for controlling amount of exposure |
DE19855106A1 (en) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Illumination system for VUV microlithography |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58100843A (en) * | 1981-12-11 | 1983-06-15 | Minolta Camera Co Ltd | Light source device for exposure |
GB2155650B (en) * | 1984-02-14 | 1988-11-16 | Canon Kk | Method and apparatus for exposure |
-
1987
- 1987-08-20 GB GB08719665A patent/GB2196132B/en not_active Expired
-
1988
- 1988-07-18 GB GB8817065A patent/GB2204706B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB2204706B (en) | 1989-05-24 |
GB8719665D0 (en) | 1987-09-30 |
GB2204706A (en) | 1988-11-16 |
GB8817065D0 (en) | 1988-08-24 |
GB2196132A (en) | 1988-04-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4925541B1 (en) | Electrodeionization apparatus and method | |
EP0153750A3 (en) | Radiographic method and apparatus | |
GB2127067B (en) | Well completion method and apparatus | |
DE3275934D1 (en) | Laser-activated chemical-depositing method and apparatus | |
GB2160126B (en) | Developing method and apparatus | |
EP0175561A3 (en) | Dry-etching method and apparatus therefor | |
KR960016175B1 (en) | Exposing method and apparatus thereof | |
DE3479683D1 (en) | Span adjusting method and apparatus | |
PT75426A (en) | Method and filter-thickening apparatus | |
HK12494A (en) | Developing method and apparatus | |
JPS57185060A (en) | Copying method and apparatus | |
GB2131001B (en) | Currency-dispensing method and apparatus | |
ZA828951B (en) | Toning apparatus and method | |
GB8307963D0 (en) | Method and apparatus | |
GB2192467B (en) | Method and apparatus for exposure | |
EP0164981A3 (en) | Perimetric method and apparatus | |
GB2129356B (en) | Billet-shearing method and apparatus | |
EP0151808A3 (en) | Improved currency-dispensing method and apparatus | |
GB2155647B (en) | Exposure method and apparatus | |
GB2126441B (en) | Positioning method and apparatus therefor | |
DE3465935D1 (en) | Printing method and apparatus | |
EP0151288A3 (en) | Filter apparatus and method | |
GB2204706B (en) | Exposure method and apparatus | |
GB2169813B (en) | Compost-making apparatus and method | |
JPS57161735A (en) | Copying method and apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PE20 | Patent expired after termination of 20 years |
Effective date: 20050123 |