GB822628A - A process for the electrolytic deposition of copper from an aqueous copper solution - Google Patents
A process for the electrolytic deposition of copper from an aqueous copper solutionInfo
- Publication number
- GB822628A GB822628A GB3216656A GB3216656A GB822628A GB 822628 A GB822628 A GB 822628A GB 3216656 A GB3216656 A GB 3216656A GB 3216656 A GB3216656 A GB 3216656A GB 822628 A GB822628 A GB 822628A
- Authority
- GB
- United Kingdom
- Prior art keywords
- copper
- diamine
- aqueous
- agent
- electrolytic deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
822,628. Electroplating with copper. METALLIC INDUSTRY N.V. Oct. 22, 1956, No. 32166/56. Class 41. Copper is electrodeposited from an aqueous copper salt solution containing at least one mol. per litre of a diamine having a boiling-point between 100‹ and 150‹ C. Examples of suitable amines are ethylene diamine, its N: Nldimethyl and -diethyl derivatives, and propylene diamine. To reduce the disadvantage of the volatility of the amine, which should be present in excess, there may be added to the bath monoamino carboxylic acids having a higher dissociation constant, e.g. glycine, α- or #-alanine, glutamic acid, or γ-aminobutyric acid. An anionic wetting-agent, e.g. sodium lauryl sulphate, may also be used. Specific examples are given employing copper sulphate, a diamine, and an amino acid together with a wetting agent to give baths of pH about 8.5 from which at 58‹ C. there was obtained a bright deposit of copper which could be nickel-plated without polishing.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL100908D NL100908C (en) | 1956-10-22 | ||
NL199518D NL199518A (en) | 1956-10-22 | ||
DE1956N0011780 DE1036003B (en) | 1956-10-22 | 1956-01-31 | Process for the electrolytic deposition of copper from aqueous copper salt solutions |
GB3216656A GB822628A (en) | 1956-10-22 | 1956-10-22 | A process for the electrolytic deposition of copper from an aqueous copper solution |
US623295A US2887442A (en) | 1956-10-22 | 1956-11-20 | Process for the electrolytic deposition of copper |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3216656A GB822628A (en) | 1956-10-22 | 1956-10-22 | A process for the electrolytic deposition of copper from an aqueous copper solution |
Publications (1)
Publication Number | Publication Date |
---|---|
GB822628A true GB822628A (en) | 1959-10-28 |
Family
ID=10334326
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3216656A Expired GB822628A (en) | 1956-10-22 | 1956-10-22 | A process for the electrolytic deposition of copper from an aqueous copper solution |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE1036003B (en) |
GB (1) | GB822628A (en) |
NL (2) | NL199518A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3775264A (en) * | 1971-11-10 | 1973-11-27 | Wire & Cable Co Ltd | Plating copper on aluminum |
US3775265A (en) * | 1970-05-25 | 1973-11-27 | Canada Wire & Cable Co Ltd | Method of plating copper on aluminum |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2411674A (en) * | 1943-03-04 | 1946-11-26 | Little Inc A | Art of electrodeposition of copper |
-
0
- NL NL100908D patent/NL100908C/xx active
- NL NL199518D patent/NL199518A/xx unknown
-
1956
- 1956-01-31 DE DE1956N0011780 patent/DE1036003B/en active Pending
- 1956-10-22 GB GB3216656A patent/GB822628A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3775265A (en) * | 1970-05-25 | 1973-11-27 | Canada Wire & Cable Co Ltd | Method of plating copper on aluminum |
US3775264A (en) * | 1971-11-10 | 1973-11-27 | Wire & Cable Co Ltd | Plating copper on aluminum |
Also Published As
Publication number | Publication date |
---|---|
NL199518A (en) | |
DE1036003B (en) | 1958-08-07 |
NL100908C (en) |
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