GB812403A - Improvements in or relating to the formation of evaporated layers - Google Patents
Improvements in or relating to the formation of evaporated layersInfo
- Publication number
- GB812403A GB812403A GB2286254A GB2286254A GB812403A GB 812403 A GB812403 A GB 812403A GB 2286254 A GB2286254 A GB 2286254A GB 2286254 A GB2286254 A GB 2286254A GB 812403 A GB812403 A GB 812403A
- Authority
- GB
- United Kingdom
- Prior art keywords
- evaporation
- layer
- evaporator
- relating
- formation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000015572 biosynthetic process Effects 0.000 title 1
- 238000005755 formation reaction Methods 0.000 title 1
- 239000000463 material Substances 0.000 abstract 5
- 239000011248 coating agent Substances 0.000 abstract 3
- 238000000576 coating method Methods 0.000 abstract 3
- 238000001704 evaporation Methods 0.000 abstract 3
- 229910002850 SnCl2 Inorganic materials 0.000 abstract 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L Tin(II) chloride Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 abstract 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J Tin(IV) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 abstract 1
- 238000005452 bending Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 230000000873 masking Effects 0.000 abstract 1
- 235000011150 stannous chloride Nutrition 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Abstract
A layer of material is deposited on a surface by evaporation from discrete areas of an extended evaporator. The evaporator is made of Ta or Mo, is provided with the material by evaporation; and may be in the form of (i) a strip twisted at intervals along its length so as to provide lands in a plane normal to the width of the strip, the lands being provided with the coating material, (ii) a ring made by bending (i), and (iii) a flat ring provided with coating material on discrete areas by masking. Specifically described is the manufacture of a photo-multiplier cathode in which the glass window of an envelope is sprayed while hot with SnCl2 or SnCl4 solution and then coated with Sb by evaporation, the Sb layer being subsequently caesiated. Other coating materials mentioned are U, Se and ZnSe.
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB812403A true GB812403A (en) | 1959-04-22 |
Family
ID=1737254
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2286254A Expired GB812403A (en) | 1954-08-06 | Improvements in or relating to the formation of evaporated layers |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB812403A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2125830A (en) * | 1982-08-24 | 1984-03-14 | Mason Vactron Limited | Vacuum deposition apparatus and method |
| GB2157884A (en) * | 1981-11-30 | 1985-10-30 | Thermo Electron Corp | Photoemissive cathode for high current density photoelectron generators |
| GB2162681A (en) * | 1984-06-08 | 1986-02-05 | Philips Nv | Electron emission devices and forming work function reducing layers thereon |
-
1954
- 1954-08-06 GB GB2286254A patent/GB812403A/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2157884A (en) * | 1981-11-30 | 1985-10-30 | Thermo Electron Corp | Photoemissive cathode for high current density photoelectron generators |
| GB2125830A (en) * | 1982-08-24 | 1984-03-14 | Mason Vactron Limited | Vacuum deposition apparatus and method |
| GB2162681A (en) * | 1984-06-08 | 1986-02-05 | Philips Nv | Electron emission devices and forming work function reducing layers thereon |
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