GB2353649B - A method for improving focusing of an image to be projected onto a semiconductor wafer in a semiconductor manufacturing process - Google Patents

A method for improving focusing of an image to be projected onto a semiconductor wafer in a semiconductor manufacturing process

Info

Publication number
GB2353649B
GB2353649B GB0009095A GB0009095A GB2353649B GB 2353649 B GB2353649 B GB 2353649B GB 0009095 A GB0009095 A GB 0009095A GB 0009095 A GB0009095 A GB 0009095A GB 2353649 B GB2353649 B GB 2353649B
Authority
GB
United Kingdom
Prior art keywords
image
manufacturing process
projected onto
semiconductor wafer
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0009095A
Other versions
GB2353649A (en
GB0009095D0 (en
Inventor
James Thompson
Shane Patrick Geary
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heenar Research Ltd
Original Assignee
Analog Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IE1999/0781A external-priority patent/IE83663B1/en
Priority claimed from IES990721 external-priority patent/IES990721A2/en
Application filed by Analog Research and Development Ltd filed Critical Analog Research and Development Ltd
Publication of GB0009095D0 publication Critical patent/GB0009095D0/en
Publication of GB2353649A publication Critical patent/GB2353649A/en
Application granted granted Critical
Publication of GB2353649B publication Critical patent/GB2353649B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB0009095A 1999-08-24 2000-04-13 A method for improving focusing of an image to be projected onto a semiconductor wafer in a semiconductor manufacturing process Expired - Fee Related GB2353649B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IE1999/0781A IE83663B1 (en) 1999-08-24 A method for improving focusing of an image to be projected onto a semiconductor wafer in a semiconductor manufacturing process
IES990721 IES990721A2 (en) 1999-08-24 1999-08-24 A method for improving focusing of an image to be projected onto a semiconductor wafer in a semiconductor manufacturing process

Publications (3)

Publication Number Publication Date
GB0009095D0 GB0009095D0 (en) 2000-05-31
GB2353649A GB2353649A (en) 2001-02-28
GB2353649B true GB2353649B (en) 2003-10-29

Family

ID=26320261

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0009095A Expired - Fee Related GB2353649B (en) 1999-08-24 2000-04-13 A method for improving focusing of an image to be projected onto a semiconductor wafer in a semiconductor manufacturing process

Country Status (1)

Country Link
GB (1) GB2353649B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5690785A (en) * 1995-03-13 1997-11-25 Yamaha Corporation Lithography control on uneven surface
US5744814A (en) * 1997-03-24 1998-04-28 Nec Corporation Method and apparatus for scanning exposure having thickness measurements of a film surface
US5748323A (en) * 1997-01-23 1998-05-05 Advanced Micro Devices Method and apparatus for wafer-focusing

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5690785A (en) * 1995-03-13 1997-11-25 Yamaha Corporation Lithography control on uneven surface
US5748323A (en) * 1997-01-23 1998-05-05 Advanced Micro Devices Method and apparatus for wafer-focusing
US5744814A (en) * 1997-03-24 1998-04-28 Nec Corporation Method and apparatus for scanning exposure having thickness measurements of a film surface

Also Published As

Publication number Publication date
GB2353649A (en) 2001-02-28
GB0009095D0 (en) 2000-05-31

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)

Free format text: REGISTERED BETWEEN 20100624 AND 20100630

PCNP Patent ceased through non-payment of renewal fee

Effective date: 20190413