GB2046463A - Process for the production of structured positive photo-lacquer layers on a substrate - Google Patents
Process for the production of structured positive photo-lacquer layers on a substrate Download PDFInfo
- Publication number
- GB2046463A GB2046463A GB8009923A GB8009923A GB2046463A GB 2046463 A GB2046463 A GB 2046463A GB 8009923 A GB8009923 A GB 8009923A GB 8009923 A GB8009923 A GB 8009923A GB 2046463 A GB2046463 A GB 2046463A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- photo
- lacquer
- substrate
- additional
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19792911503 DE2911503A1 (de) | 1979-03-23 | 1979-03-23 | Verfahren zur herstellung von strukturen aus positiv-photolackschichten ohne stoerende interferenzeffekte |
Publications (1)
Publication Number | Publication Date |
---|---|
GB2046463A true GB2046463A (en) | 1980-11-12 |
Family
ID=6066260
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8009923A Withdrawn GB2046463A (en) | 1979-03-23 | 1980-03-24 | Process for the production of structured positive photo-lacquer layers on a substrate |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS55129342A (fr) |
DE (1) | DE2911503A1 (fr) |
FR (1) | FR2452118A1 (fr) |
GB (1) | GB2046463A (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2129217A (en) * | 1982-11-01 | 1984-05-10 | Western Electric Co | Photolithography |
JPS6038821A (ja) * | 1983-08-12 | 1985-02-28 | Hitachi Ltd | エッチング方法 |
EP0522990A1 (fr) * | 1991-06-28 | 1993-01-13 | International Business Machines Corporation | Films superficiels antiréfléchissants |
WO2023177535A3 (fr) * | 2022-03-16 | 2023-11-02 | Amcor Flexibles North America, Inc. | Structures de film présentant des propriétés optiques améliorées |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19852852A1 (de) * | 1998-11-11 | 2000-05-18 | Inst Halbleiterphysik Gmbh | Lithographieverfahren zur Emitterstrukturierung von Bipolartransistoren |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1622302A1 (de) * | 1968-02-01 | 1970-10-29 | Telefunken Patent | Verfahren zum photographischen UEbertragen von Strukturen auf Halbleiterkoerper |
US3884698A (en) * | 1972-08-23 | 1975-05-20 | Hewlett Packard Co | Method for achieving uniform exposure in a photosensitive material on a semiconductor wafer |
US3982943A (en) * | 1974-03-05 | 1976-09-28 | Ibm Corporation | Lift-off method of fabricating thin films and a structure utilizable as a lift-off mask |
-
1979
- 1979-03-23 DE DE19792911503 patent/DE2911503A1/de not_active Withdrawn
-
1980
- 1980-03-17 FR FR8005899A patent/FR2452118A1/fr active Pending
- 1980-03-24 JP JP3734480A patent/JPS55129342A/ja active Pending
- 1980-03-24 GB GB8009923A patent/GB2046463A/en not_active Withdrawn
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2129217A (en) * | 1982-11-01 | 1984-05-10 | Western Electric Co | Photolithography |
JPS6038821A (ja) * | 1983-08-12 | 1985-02-28 | Hitachi Ltd | エッチング方法 |
JPH0455323B2 (fr) * | 1983-08-12 | 1992-09-03 | Hitachi Ltd | |
EP0522990A1 (fr) * | 1991-06-28 | 1993-01-13 | International Business Machines Corporation | Films superficiels antiréfléchissants |
US5744537A (en) * | 1991-06-28 | 1998-04-28 | International Business Machines Corporation | Antireflective coating films |
WO2023177535A3 (fr) * | 2022-03-16 | 2023-11-02 | Amcor Flexibles North America, Inc. | Structures de film présentant des propriétés optiques améliorées |
Also Published As
Publication number | Publication date |
---|---|
JPS55129342A (en) | 1980-10-07 |
DE2911503A1 (de) | 1980-09-25 |
FR2452118A1 (fr) | 1980-10-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |