GB2046463A - Process for the production of structured positive photo-lacquer layers on a substrate - Google Patents

Process for the production of structured positive photo-lacquer layers on a substrate Download PDF

Info

Publication number
GB2046463A
GB2046463A GB8009923A GB8009923A GB2046463A GB 2046463 A GB2046463 A GB 2046463A GB 8009923 A GB8009923 A GB 8009923A GB 8009923 A GB8009923 A GB 8009923A GB 2046463 A GB2046463 A GB 2046463A
Authority
GB
United Kingdom
Prior art keywords
layer
photo
lacquer
substrate
additional
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB8009923A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of GB2046463A publication Critical patent/GB2046463A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
GB8009923A 1979-03-23 1980-03-24 Process for the production of structured positive photo-lacquer layers on a substrate Withdrawn GB2046463A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792911503 DE2911503A1 (de) 1979-03-23 1979-03-23 Verfahren zur herstellung von strukturen aus positiv-photolackschichten ohne stoerende interferenzeffekte

Publications (1)

Publication Number Publication Date
GB2046463A true GB2046463A (en) 1980-11-12

Family

ID=6066260

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8009923A Withdrawn GB2046463A (en) 1979-03-23 1980-03-24 Process for the production of structured positive photo-lacquer layers on a substrate

Country Status (4)

Country Link
JP (1) JPS55129342A (fr)
DE (1) DE2911503A1 (fr)
FR (1) FR2452118A1 (fr)
GB (1) GB2046463A (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2129217A (en) * 1982-11-01 1984-05-10 Western Electric Co Photolithography
JPS6038821A (ja) * 1983-08-12 1985-02-28 Hitachi Ltd エッチング方法
EP0522990A1 (fr) * 1991-06-28 1993-01-13 International Business Machines Corporation Films superficiels antiréfléchissants
WO2023177535A3 (fr) * 2022-03-16 2023-11-02 Amcor Flexibles North America, Inc. Structures de film présentant des propriétés optiques améliorées

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19852852A1 (de) * 1998-11-11 2000-05-18 Inst Halbleiterphysik Gmbh Lithographieverfahren zur Emitterstrukturierung von Bipolartransistoren

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1622302A1 (de) * 1968-02-01 1970-10-29 Telefunken Patent Verfahren zum photographischen UEbertragen von Strukturen auf Halbleiterkoerper
US3884698A (en) * 1972-08-23 1975-05-20 Hewlett Packard Co Method for achieving uniform exposure in a photosensitive material on a semiconductor wafer
US3982943A (en) * 1974-03-05 1976-09-28 Ibm Corporation Lift-off method of fabricating thin films and a structure utilizable as a lift-off mask

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2129217A (en) * 1982-11-01 1984-05-10 Western Electric Co Photolithography
JPS6038821A (ja) * 1983-08-12 1985-02-28 Hitachi Ltd エッチング方法
JPH0455323B2 (fr) * 1983-08-12 1992-09-03 Hitachi Ltd
EP0522990A1 (fr) * 1991-06-28 1993-01-13 International Business Machines Corporation Films superficiels antiréfléchissants
US5744537A (en) * 1991-06-28 1998-04-28 International Business Machines Corporation Antireflective coating films
WO2023177535A3 (fr) * 2022-03-16 2023-11-02 Amcor Flexibles North America, Inc. Structures de film présentant des propriétés optiques améliorées

Also Published As

Publication number Publication date
JPS55129342A (en) 1980-10-07
DE2911503A1 (de) 1980-09-25
FR2452118A1 (fr) 1980-10-17

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)