FR2452118A1 - Procede pour fabriquer des structures formees de couches de laque photosensible positive sans effets d'interferences nuisibles - Google Patents

Procede pour fabriquer des structures formees de couches de laque photosensible positive sans effets d'interferences nuisibles

Info

Publication number
FR2452118A1
FR2452118A1 FR8005899A FR8005899A FR2452118A1 FR 2452118 A1 FR2452118 A1 FR 2452118A1 FR 8005899 A FR8005899 A FR 8005899A FR 8005899 A FR8005899 A FR 8005899A FR 2452118 A1 FR2452118 A1 FR 2452118A1
Authority
FR
France
Prior art keywords
photosensitive lacquer
positive photosensitive
interference effects
harmful interference
structures formed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
FR8005899A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2452118A1 publication Critical patent/FR2452118A1/fr
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laminated Bodies (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PROCEDE POUR FABRIQUER DES STRUCTURES FORMEES DE COUCHES DE LAQUE PHOTOSENSIBLE POSITIVE SANS EFFETS D'INTERFERENCES NUISIBLES. SELON CE PROCEDE, POUR REDUIRE L'EFFET DE L'INJECTION PAR COUPLAGE D'INTENSITE, VARIABLE, LORS DE L'ECLAIREMENT DE LA COUCHE DE LAQUE PHOTOSENSIBLE 5, SITUEE SUR UN SUBSTRAT4, CETTE COUCHE EST COMBINEE, AVANT L'ECLAIREMENT, A AU MOINS UNE COUCHE6, TRANSPARENTE A LA LUMIERE, D'UNE EPAISSEUR ET D'UN INDICE DE REFRACTION ADAPTES A LA LONGUEUR D'ONDE DE LA LUMIERE UTILISEE, QUI REGNE DANS LA COUCHE SUPPLEMENTAIRE LORS DE L'ECLAIREMENT. APPLICATION NOTAMMENT AUX CIRCUITS INTEGRES.
FR8005899A 1979-03-23 1980-03-17 Procede pour fabriquer des structures formees de couches de laque photosensible positive sans effets d'interferences nuisibles Pending FR2452118A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792911503 DE2911503A1 (de) 1979-03-23 1979-03-23 Verfahren zur herstellung von strukturen aus positiv-photolackschichten ohne stoerende interferenzeffekte

Publications (1)

Publication Number Publication Date
FR2452118A1 true FR2452118A1 (fr) 1980-10-17

Family

ID=6066260

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8005899A Pending FR2452118A1 (fr) 1979-03-23 1980-03-17 Procede pour fabriquer des structures formees de couches de laque photosensible positive sans effets d'interferences nuisibles

Country Status (4)

Country Link
JP (1) JPS55129342A (fr)
DE (1) DE2911503A1 (fr)
FR (1) FR2452118A1 (fr)
GB (1) GB2046463A (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR840006728A (ko) * 1982-11-01 1984-12-01 오레그 이. 엘버 집적회로 제조방법
JPS6038821A (ja) * 1983-08-12 1985-02-28 Hitachi Ltd エッチング方法
DE69214035T2 (de) * 1991-06-28 1997-04-10 Ibm Reflexionsverminderde Überzüge
DE19852852A1 (de) * 1998-11-11 2000-05-18 Inst Halbleiterphysik Gmbh Lithographieverfahren zur Emitterstrukturierung von Bipolartransistoren
WO2023177535A2 (fr) * 2022-03-16 2023-09-21 Amcor Flexibles North America, Inc. Structures de film présentant des propriétés optiques améliorées

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1622302A1 (de) * 1968-02-01 1970-10-29 Telefunken Patent Verfahren zum photographischen UEbertragen von Strukturen auf Halbleiterkoerper
FR2197235A1 (fr) * 1972-08-23 1974-03-22 Hewlett Packard Co
FR2263605A1 (fr) * 1974-03-05 1975-10-03 Ibm

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1622302A1 (de) * 1968-02-01 1970-10-29 Telefunken Patent Verfahren zum photographischen UEbertragen von Strukturen auf Halbleiterkoerper
FR2197235A1 (fr) * 1972-08-23 1974-03-22 Hewlett Packard Co
FR2263605A1 (fr) * 1974-03-05 1975-10-03 Ibm

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
EXBK/70 *
EXBK/79 *

Also Published As

Publication number Publication date
DE2911503A1 (de) 1980-09-25
GB2046463A (en) 1980-11-12
JPS55129342A (en) 1980-10-07

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