JPS55129342A - Producing positive type light sensitive resin structure having no interference effect - Google Patents
Producing positive type light sensitive resin structure having no interference effectInfo
- Publication number
- JPS55129342A JPS55129342A JP3734480A JP3734480A JPS55129342A JP S55129342 A JPS55129342 A JP S55129342A JP 3734480 A JP3734480 A JP 3734480A JP 3734480 A JP3734480 A JP 3734480A JP S55129342 A JPS55129342 A JP S55129342A
- Authority
- JP
- Japan
- Prior art keywords
- type light
- light sensitive
- sensitive resin
- positive type
- interference effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19792911503 DE2911503A1 (de) | 1979-03-23 | 1979-03-23 | Verfahren zur herstellung von strukturen aus positiv-photolackschichten ohne stoerende interferenzeffekte |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55129342A true JPS55129342A (en) | 1980-10-07 |
Family
ID=6066260
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3734480A Pending JPS55129342A (en) | 1979-03-23 | 1980-03-24 | Producing positive type light sensitive resin structure having no interference effect |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS55129342A (ja) |
DE (1) | DE2911503A1 (ja) |
FR (1) | FR2452118A1 (ja) |
GB (1) | GB2046463A (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR840006728A (ko) * | 1982-11-01 | 1984-12-01 | 오레그 이. 엘버 | 집적회로 제조방법 |
JPS6038821A (ja) * | 1983-08-12 | 1985-02-28 | Hitachi Ltd | エッチング方法 |
JP2643056B2 (ja) * | 1991-06-28 | 1997-08-20 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 表面反射防止コーティング形成組成物及びその使用 |
DE19852852A1 (de) * | 1998-11-11 | 2000-05-18 | Inst Halbleiterphysik Gmbh | Lithographieverfahren zur Emitterstrukturierung von Bipolartransistoren |
WO2023177535A2 (en) * | 2022-03-16 | 2023-09-21 | Amcor Flexibles North America, Inc. | Film structures having improved optical properties |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1622302A1 (de) * | 1968-02-01 | 1970-10-29 | Telefunken Patent | Verfahren zum photographischen UEbertragen von Strukturen auf Halbleiterkoerper |
US3884698A (en) * | 1972-08-23 | 1975-05-20 | Hewlett Packard Co | Method for achieving uniform exposure in a photosensitive material on a semiconductor wafer |
US3982943A (en) * | 1974-03-05 | 1976-09-28 | Ibm Corporation | Lift-off method of fabricating thin films and a structure utilizable as a lift-off mask |
-
1979
- 1979-03-23 DE DE19792911503 patent/DE2911503A1/de not_active Withdrawn
-
1980
- 1980-03-17 FR FR8005899A patent/FR2452118A1/fr active Pending
- 1980-03-24 JP JP3734480A patent/JPS55129342A/ja active Pending
- 1980-03-24 GB GB8009923A patent/GB2046463A/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
GB2046463A (en) | 1980-11-12 |
DE2911503A1 (de) | 1980-09-25 |
FR2452118A1 (fr) | 1980-10-17 |
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