GB201705755D0 - Nanostructure - Google Patents

Nanostructure

Info

Publication number
GB201705755D0
GB201705755D0 GBGB1705755.5A GB201705755A GB201705755D0 GB 201705755 D0 GB201705755 D0 GB 201705755D0 GB 201705755 A GB201705755 A GB 201705755A GB 201705755 D0 GB201705755 D0 GB 201705755D0
Authority
GB
United Kingdom
Prior art keywords
nanostructure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB1705755.5A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Norwegian University of Science and Technology NTNU
Original Assignee
Norwegian University of Science and Technology NTNU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Norwegian University of Science and Technology NTNU filed Critical Norwegian University of Science and Technology NTNU
Priority to GBGB1705755.5A priority Critical patent/GB201705755D0/en
Publication of GB201705755D0 publication Critical patent/GB201705755D0/en
Priority to US16/604,397 priority patent/US11239391B2/en
Priority to CN201880035485.4A priority patent/CN110678990B/en
Priority to KR1020197033252A priority patent/KR20200023273A/en
Priority to JP2020504445A priority patent/JP2020513167A/en
Priority to EP18717339.8A priority patent/EP3610518B1/en
Priority to TW107112312A priority patent/TW201900948A/en
Priority to PCT/EP2018/059205 priority patent/WO2018189205A1/en
Priority to CA3059508A priority patent/CA3059508A1/en
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of group III and group V of the periodic system
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0062Processes for devices with an active region comprising only III-V compounds
    • H01L33/0066Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/04Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
    • H01L33/06Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/12Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a stress relaxation structure, e.g. buffer layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/16Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of group III and group V of the periodic system
    • H01L33/32Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/08Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a plurality of light emitting regions, e.g. laterally discontinuous light emitting layer or photoluminescent region integrated within the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
    • H01L33/24Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
GBGB1705755.5A 2017-04-10 2017-04-10 Nanostructure Ceased GB201705755D0 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
GBGB1705755.5A GB201705755D0 (en) 2017-04-10 2017-04-10 Nanostructure
US16/604,397 US11239391B2 (en) 2017-04-10 2018-04-10 Nanostructure
CN201880035485.4A CN110678990B (en) 2017-04-10 2018-04-10 Nanostructure
KR1020197033252A KR20200023273A (en) 2017-04-10 2018-04-10 Nano structure
JP2020504445A JP2020513167A (en) 2017-04-10 2018-04-10 Nano structure
EP18717339.8A EP3610518B1 (en) 2017-04-10 2018-04-10 Nanostructure
TW107112312A TW201900948A (en) 2017-04-10 2018-04-10 Nanostructure
PCT/EP2018/059205 WO2018189205A1 (en) 2017-04-10 2018-04-10 Nanostructure
CA3059508A CA3059508A1 (en) 2017-04-10 2018-04-10 Nanostructure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB1705755.5A GB201705755D0 (en) 2017-04-10 2017-04-10 Nanostructure

Publications (1)

Publication Number Publication Date
GB201705755D0 true GB201705755D0 (en) 2017-05-24

Family

ID=58744847

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB1705755.5A Ceased GB201705755D0 (en) 2017-04-10 2017-04-10 Nanostructure

Country Status (9)

Country Link
US (1) US11239391B2 (en)
EP (1) EP3610518B1 (en)
JP (1) JP2020513167A (en)
KR (1) KR20200023273A (en)
CN (1) CN110678990B (en)
CA (1) CA3059508A1 (en)
GB (1) GB201705755D0 (en)
TW (1) TW201900948A (en)
WO (1) WO2018189205A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI780167B (en) * 2018-06-26 2022-10-11 晶元光電股份有限公司 Semiconductor substrate and semiconductor device
FR3085535B1 (en) * 2019-04-17 2021-02-12 Hosseini Teherani Ferechteh A method of manufacturing p-type gallium oxide by intrinsic doping, the resulting thin film of gallium oxide and its use
WO2021158608A1 (en) * 2020-02-05 2021-08-12 Bowling Green State University Light-driven transition from insulator to conductor
JP2021141266A (en) * 2020-03-09 2021-09-16 セイコーエプソン株式会社 Light emitting device and projector
US11227801B2 (en) 2020-03-19 2022-01-18 International Business Machines Corporation Formation of contacts for semiconductor devices
AU2021344346A1 (en) * 2020-09-15 2023-04-27 The Regents Of The University Of Michigan Nanostructure-based atomic scale electrochemical reaction catalysis
FR3124024A1 (en) * 2021-06-11 2022-12-16 Aledia Process for manufacturing an optoelectronic device
CN115172512B (en) * 2022-07-22 2023-10-27 上海电机学院 beta-Ga 2 O 3 Base ultraviolet detector and preparation method thereof

Family Cites Families (178)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4213801A (en) 1979-03-26 1980-07-22 Bell Telephone Laboratories, Incorporated Ohmic contact of N-GaAs to electrical conductive substrates by controlled growth of N-GaAs polycrystalline layers
US4611900A (en) 1984-06-01 1986-09-16 Xerox Corporation Apparatus for sensing the presence of toner particles
EP0527258B1 (en) 1991-08-14 1995-10-25 Siemens Aktiengesellschaft Gas sensor array for the detection of individual gas components in a gas mixture
EP0527259B1 (en) 1991-08-14 1995-10-25 Siemens Aktiengesellschaft Gasdetektor with semiconductive galliumoxide
JPH1190225A (en) 1997-09-19 1999-04-06 Kyocera Corp Oxide catalytic material for removing nitrogen oxide and removing method therefor
JP3631157B2 (en) 2001-03-21 2005-03-23 日本電信電話株式会社 Ultraviolet light emitting diode
EP1374309A1 (en) 2001-03-30 2004-01-02 The Regents Of The University Of California Methods of fabricating nanostructures and nanowires and devices fabricated therefrom
JP3823784B2 (en) 2001-09-06 2006-09-20 富士ゼロックス株式会社 Nanowire and manufacturing method thereof, and nanonetwork using the same, manufacturing method of nanonetwork, carbon structure, and electronic device
FR2840452B1 (en) 2002-05-28 2005-10-14 Lumilog PROCESS FOR THE EPITAXIC PRODUCTION OF A GALLIUM NITRIDE FILM SEPARATED FROM ITS SUBSTRATE
JP3679097B2 (en) * 2002-05-31 2005-08-03 株式会社光波 Light emitting element
US7594982B1 (en) 2002-06-22 2009-09-29 Nanosolar, Inc. Nanostructured transparent conducting electrode
US7335908B2 (en) 2002-07-08 2008-02-26 Qunano Ab Nanostructures and methods for manufacturing the same
JP4630986B2 (en) * 2003-02-24 2011-02-09 学校法人早稲田大学 β-Ga2O3-based single crystal growth method
WO2004087564A1 (en) 2003-04-04 2004-10-14 Startskottet 22286 Ab Precisely positioned nanowhiskers and nanowhisker arrays and method for preparing them
JP4754164B2 (en) 2003-08-08 2011-08-24 株式会社光波 Semiconductor layer
US7354850B2 (en) 2004-02-06 2008-04-08 Qunano Ab Directionally controlled growth of nanowhiskers
US7253452B2 (en) * 2004-03-08 2007-08-07 Massachusetts Institute Of Technology Blue light emitting semiconductor nanocrystal materials
US7025665B2 (en) 2004-03-30 2006-04-11 Solaicx, Inc. Method and apparatus for cutting ultra thin silicon wafers
JP4539181B2 (en) 2004-06-07 2010-09-08 住友金属鉱山株式会社 Transparent conductive film, sintered compact target for manufacturing transparent conductive film, transparent conductive substrate, and display device using the same
WO2006000790A1 (en) 2004-06-25 2006-01-05 Btg International Limited Formation of nanowhiskers on a substrate of dissimilar material
KR100533645B1 (en) 2004-09-13 2005-12-06 삼성전기주식회사 Light emitting diode improved in luminous efficiency
GB2418532A (en) 2004-09-28 2006-03-29 Arima Optoelectronic Textured light emitting diode structure with enhanced fill factor
US20070240757A1 (en) 2004-10-15 2007-10-18 The Trustees Of Boston College Solar cells using arrays of optical rectennas
CN101107737B (en) 2004-12-09 2012-03-21 奈米***股份有限公司 Nanowire-based membrane electrode assemblies for fuel cells
US7939218B2 (en) 2004-12-09 2011-05-10 Nanosys, Inc. Nanowire structures comprising carbon
KR100691159B1 (en) * 2005-04-30 2007-03-09 삼성전기주식회사 Method For Manufacturing Gallium Nitride-Based Semiconductor Device
KR100658938B1 (en) * 2005-05-24 2006-12-15 엘지전자 주식회사 Light emitting device with nano-rod and method for fabricating the same
EP1727216B1 (en) * 2005-05-24 2019-04-24 LG Electronics, Inc. Rod type light emitting diode and method for fabricating the same
JP4525500B2 (en) * 2005-07-14 2010-08-18 パナソニック電工株式会社 Semiconductor light emitting element, lighting device using the same, and method for manufacturing semiconductor light emitting element
JP4425194B2 (en) 2005-08-18 2010-03-03 株式会社神戸製鋼所 Deposition method
AU2006318658B2 (en) 2005-11-21 2011-07-28 Nanosys, Inc. Nanowire structures comprising carbon
US7570355B2 (en) 2006-01-27 2009-08-04 Hewlett-Packard Development Company, L.P. Nanowire heterostructures and methods of forming the same
US7643136B2 (en) 2006-02-02 2010-01-05 Optilia Instrument Ab Device for inspection of narrow spaces and objects in narrow spaces
JP4816116B2 (en) 2006-02-08 2011-11-16 住友金属鉱山株式会社 Oxide sintered body for sputtering target, oxide film obtained using the same, and transparent substrate including the same
JP4816137B2 (en) 2006-02-24 2011-11-16 住友金属鉱山株式会社 Transparent conductive film and transparent conductive substrate
CN101443887B (en) * 2006-03-10 2011-04-20 Stc.Unm公司 Pulsed growth of GAN nanowires and applications in group III nitride semiconductor substrate materials and devices
AU2007313096B2 (en) 2006-03-10 2011-11-10 Unm Rainforest Innovations Pulsed growth of GaN nanowires and applications in group III nitride semiconductor substrate materials and devices
FR2904146B1 (en) 2006-07-20 2008-10-17 Commissariat Energie Atomique METHOD FOR MANUFACTURING NANOSTRUCTURE BASED ON INTERCONNECTED NANOWIRES, NANOSTRUCTURE AND USE AS A THERMOELECTRIC CONVERTER
JP4106397B2 (en) 2006-09-14 2008-06-25 株式会社島津製作所 Method for manufacturing light or radiation detector
US7442575B2 (en) 2006-09-29 2008-10-28 Texas Christian University Method of manufacturing semiconductor nanowires
JP2008130877A (en) 2006-11-22 2008-06-05 Sharp Corp Method for fabricating nitride semiconductor light emitting element
WO2008140611A2 (en) 2006-12-18 2008-11-20 The Regents Of The University Of California Nanowire array-based light emitting diodes and lasers
US20080191317A1 (en) 2007-02-13 2008-08-14 International Business Machines Corporation Self-aligned epitaxial growth of semiconductor nanowires
EP2129620A4 (en) 2007-03-28 2012-09-12 Qunano Ab Nanowire circuit architecture
JP2009010012A (en) 2007-06-26 2009-01-15 Panasonic Electric Works Co Ltd Semiconductor light emitting element and manufacturing method thereof, and light emitting device
KR100904588B1 (en) 2007-07-05 2009-06-25 삼성전자주식회사 Method of preparing core/shell type Nanowire, Nanowire prepared therefrom and Display device comprising the same
CN103030381B (en) 2007-07-06 2015-05-27 住友金属矿山株式会社 Oxide sintered body and production method therefor, target, and transparent conductive film and transparent conductive substrate obtained by using the same
US7714317B2 (en) 2007-08-30 2010-05-11 Brookhaven Science Associates, Llc Assembly of ordered carbon shells on semiconducting nanomaterials
JP2009091212A (en) * 2007-10-10 2009-04-30 Nippon Light Metal Co Ltd Gallium oxide single crystal substrate and its manufacture method
US8084337B2 (en) 2007-10-26 2011-12-27 Qunano Ab Growth of III-V compound semiconductor nanowires on silicon substrates
US8273983B2 (en) 2007-12-21 2012-09-25 Hewlett-Packard Development Company, L.P. Photonic device and method of making same using nanowires
US8435676B2 (en) 2008-01-09 2013-05-07 Nanotek Instruments, Inc. Mixed nano-filament electrode materials for lithium ion batteries
US7871653B2 (en) 2008-01-30 2011-01-18 Ocean Duke Corporation Double-stack shrimp tray
US8129763B2 (en) 2008-02-07 2012-03-06 International Business Machines Corporation Metal-oxide-semiconductor device including a multiple-layer energy filter
JP5386747B2 (en) 2008-02-21 2014-01-15 公益財団法人神奈川科学技術アカデミー Semiconductor substrate, semiconductor element, light emitting element, and electronic element
KR101445877B1 (en) 2008-03-24 2014-09-29 삼성전자주식회사 Method for Manufacturing Zinc Oxide Nanowires
TW200952184A (en) 2008-06-03 2009-12-16 Univ Nat Taiwan Structure of mixed type heterojunction thin film solar cells and its manufacturing method
JP2010006670A (en) 2008-06-30 2010-01-14 National Univ Corp Shizuoka Univ Nanowire structure and method for producing the same
KR20110039313A (en) 2008-07-07 2011-04-15 글로 에이비 A nanostructured led
US8735797B2 (en) 2009-12-08 2014-05-27 Zena Technologies, Inc. Nanowire photo-detector grown on a back-side illuminated image sensor
WO2010056064A2 (en) 2008-11-13 2010-05-20 주식회사 엘지화학 Non-aqueous electrolytic solution for a lithium secondary battery, and lithium secondary battery comprising same
KR101071906B1 (en) 2008-11-14 2011-10-11 한국과학기술원 Single Crystalline Co5Ge7 Nanowire, Co5Ge7 Nanowire Structure, and The Fabrication Method Thereof
JP5453045B2 (en) 2008-11-26 2014-03-26 株式会社日立製作所 Substrate on which graphene layer is grown and electronic / optical integrated circuit device using the same
CN101504961B (en) 2008-12-16 2010-08-11 华中科技大学 Surface emission multi-color LED and its making method
US8389387B2 (en) 2009-01-06 2013-03-05 Brookhaven Science Associates, Llc Segmented nanowires displaying locally controllable properties
KR101650310B1 (en) 2009-01-16 2016-08-24 삼성전자주식회사 Light guding member, and device for ground static electricity, image forming apparatus, image reading apparutus having the same
WO2010087853A1 (en) 2009-01-30 2010-08-05 Hewlett-Packard Development Company Photovoltaic structure and solar cell and method of fabrication employing hidden electrode
FR2941688B1 (en) 2009-01-30 2011-04-01 Commissariat Energie Atomique PROCESS FOR FORMING NANO-THREADS
JP5529420B2 (en) * 2009-02-09 2014-06-25 住友電気工業株式会社 Epitaxial wafer, method for producing gallium nitride semiconductor device, gallium nitride semiconductor device, and gallium oxide wafer
KR100995394B1 (en) 2009-02-18 2010-11-19 한국과학기술원 Thin Film Forming Apparatus For Thin Film Solar Cell
WO2010096035A1 (en) 2009-02-23 2010-08-26 Nanosys, Inc. Nanostructured catalyst supports
JP2010208925A (en) 2009-03-12 2010-09-24 Nec Corp Method for producing semiconductor nanowire, and semiconductor device
JP5491065B2 (en) * 2009-04-30 2014-05-14 住友電気工業株式会社 Method for producing wafer product and method for producing gallium nitride based semiconductor optical device
US20120135158A1 (en) 2009-05-26 2012-05-31 Sharp Kabushiki Kaisha Methods and systems for electric field deposition of nanowires and other devices
WO2010141348A1 (en) 2009-05-31 2010-12-09 College Of William And Mary Method for making polymer composites containing graphene sheets
JP5299105B2 (en) 2009-06-16 2013-09-25 ソニー株式会社 Vanadium dioxide nanowire and method for producing the same, and nanowire device using vanadium dioxide nanowire
CN101931507B (en) 2009-06-18 2012-09-05 华为技术有限公司 Codebook generation method, data transmission method and device thereof
US8409366B2 (en) 2009-06-23 2013-04-02 Oki Data Corporation Separation method of nitride semiconductor layer, semiconductor device, manufacturing method thereof, semiconductor wafer, and manufacturing method thereof
WO2011016616A2 (en) 2009-08-03 2011-02-10 인제대학교 산학협력단 Carbonaceous nanocomposite having novel structure and fabrication method thereof
US8507797B2 (en) 2009-08-07 2013-08-13 Guardian Industries Corp. Large area deposition and doping of graphene, and products including the same
US10164135B2 (en) 2009-08-07 2018-12-25 Guardian Glass, LLC Electronic device including graphene-based layer(s), and/or method or making the same
JP2011057474A (en) 2009-09-07 2011-03-24 Univ Of Tokyo Semiconductor substrate, method for producing the semiconductor substrate, substrate for semiconductor growth, method for producing the substrate for semiconductor growth, semiconductor element, light-emitting element, display panel, electronic element, solar cell element, and electronic equipment
US20110081500A1 (en) 2009-10-06 2011-04-07 Tokyo Electron Limited Method of providing stable and adhesive interface between fluorine-based low-k material and metal barrier layer
CN101746961A (en) * 2009-10-19 2010-06-23 鲁东大学 Method for depositing polycrystal Beta-Ga2O3 film on plate glass
CN102326266B (en) 2009-10-20 2015-07-01 松下电器产业株式会社 Light-emitting diode element and method for manufacturing same
CN102326262B (en) 2009-10-21 2015-02-25 松下电器产业株式会社 Solar cell and method for manufacturing same
KR20110057989A (en) 2009-11-25 2011-06-01 삼성전자주식회사 Composite structure of graphene and nanostructure and method of manufacturing the same
CN101710567A (en) 2009-11-27 2010-05-19 晶能光电(江西)有限公司 Gallium nitride-based semiconductor device with composite carbon-based substrate and manufacturing method thereof
KR101736972B1 (en) 2009-12-01 2017-05-19 삼성전자주식회사 Structure of graphene and inorganic material, and electrical device comprising the same
US9306099B2 (en) 2009-12-01 2016-04-05 Samsung Electronics Co., Ltd. Material including graphene and an inorganic material and method of manufacturing the material
CN102301042B (en) 2009-12-04 2014-10-01 松下电器产业株式会社 Substrate, and method for producing same
KR101234180B1 (en) 2009-12-30 2013-02-18 그래핀스퀘어 주식회사 Roll-to-roll doping method of graphene film and doped graphene film
US8212236B2 (en) 2010-01-19 2012-07-03 Eastman Kodak Company II-VI core-shell semiconductor nanowires
US8377729B2 (en) 2010-01-19 2013-02-19 Eastman Kodak Company Forming II-VI core-shell semiconductor nanowires
WO2011090863A1 (en) 2010-01-19 2011-07-28 Eastman Kodak Company Ii-vi core-shell semiconductor nanowires
KR100969127B1 (en) 2010-02-18 2010-07-09 엘지이노텍 주식회사 Light emitting device, method for fabricating the light emitting device and light emitting device package
US20110240099A1 (en) 2010-03-30 2011-10-06 Ellinger Carolyn R Photovoltaic nanowire device
TWI440074B (en) 2010-04-02 2014-06-01 Univ Nat Chiao Tung A method for reducing defects in epitaxially grown on group iii-nitride materials process
EP2557597A4 (en) 2010-04-07 2014-11-26 Shimadzu Corp Radiation detector and method for producing same
CA2800142C (en) 2010-05-24 2018-06-05 Siluria Technologies, Inc. Nanowire catalysts
WO2011155157A1 (en) 2010-06-07 2011-12-15 パナソニック株式会社 Solar cell and method for manufacturing same
CA2802539A1 (en) 2010-06-18 2011-12-22 Glo Ab Nanowire led structure and method for manufacturing the same
KR101781552B1 (en) 2010-06-21 2017-09-27 삼성전자주식회사 graphene substituted with boron and nitrogen and method of fabricationg the same and transistor having the same
WO2011162715A1 (en) 2010-06-24 2011-12-29 Glo Ab Substrate with buffer layer for oriented nanowire growth
JP5988974B2 (en) 2010-08-07 2016-09-07 ティーピーケイ ホールディング カンパニー リミテッド Device component having surface embedded additive and related manufacturing method
CN102376817A (en) 2010-08-11 2012-03-14 王浩 Method for preparing semiconductor photoelectric device
US9478699B2 (en) 2010-08-26 2016-10-25 The Ohio State University Nanoscale emitters with polarization grading
US9190590B2 (en) 2010-09-01 2015-11-17 Sharp Kabushiki Kaisha Light emitting element and production method for same, production method for light-emitting device, illumination device, backlight, display device, and diode
WO2012029381A1 (en) 2010-09-01 2012-03-08 シャープ株式会社 Light emitting element and production method for same, production method for light-emitting device, illumination device, backlight, display device, and diode
KR101636915B1 (en) 2010-09-03 2016-07-07 삼성전자주식회사 Semiconductor compound structure and method of manufacturing the same using graphene or carbon nanotubes, and seciconductor device including the semiconductor compound
KR101691906B1 (en) 2010-09-14 2017-01-02 삼성전자주식회사 Manufacturing method for Nanorod light emitting device
FR2975532B1 (en) 2011-05-18 2013-05-10 Commissariat Energie Atomique ELECTRICAL CONNECTION IN SERIES OF LIGHT EMITTING NANOWIRES
US8901536B2 (en) 2010-09-21 2014-12-02 The United States Of America, As Represented By The Secretary Of The Navy Transistor having graphene base
KR101802374B1 (en) 2010-10-05 2017-11-29 삼성전자주식회사 Transparent electrode comprising doped graphene, process for preparing the same, and display device and solar cell comprising the electrode
KR101217209B1 (en) 2010-10-07 2012-12-31 서울대학교산학협력단 Light emitting device and method for manufacturing the same
US8321961B2 (en) 2010-10-07 2012-11-27 International Business Machines Corporation Production scale fabrication method for high resolution AFM tips
KR101142545B1 (en) 2010-10-25 2012-05-08 서울대학교산학협력단 Solar cell and manufacturing method of the same
CA2813413C (en) 2010-11-12 2018-03-06 Gentium S.P.A. Defibrotide for use in prophylaxis and/or treatment of graft versus host disease (gvhd)
US20120141799A1 (en) 2010-12-03 2012-06-07 Francis Kub Film on Graphene on a Substrate and Method and Devices Therefor
GB201021112D0 (en) 2010-12-13 2011-01-26 Ntnu Technology Transfer As Nanowires
KR20120065792A (en) 2010-12-13 2012-06-21 삼성전자주식회사 Nanosensor and method for mamufacturing the same
KR20120083084A (en) 2011-01-17 2012-07-25 삼성엘이디 주식회사 Nano lod light emitting device and method of manufacturing the same
KR101227600B1 (en) 2011-02-11 2013-01-29 서울대학교산학협력단 Photosensor based on graphene-nanowire hybrid structures and the manufacturing method of the same
US8591990B2 (en) 2011-03-25 2013-11-26 GM Global Technology Operations LLC Microfiber supported metal silicide nanowires
JP2012230969A (en) 2011-04-25 2012-11-22 Sumitomo Electric Ind Ltd GaN-BASED SEMICONDUCTOR DEVICE MANUFACTURING METHOD
EP2704902B1 (en) 2011-05-06 2020-03-25 The Research Foundation for The State University of New York Magnetic graphene-like nanoparticles
WO2012166562A1 (en) 2011-05-27 2012-12-06 University Of North Texas Graphene magnetic tunnel junction spin filters and methods of making
JP2012250868A (en) 2011-06-01 2012-12-20 Sumitomo Electric Ind Ltd Method for growing group iii nitride layer and group iii nitride substrate
WO2012167282A1 (en) 2011-06-02 2012-12-06 Brown University High-efficiency silicon-compatible photodetectors based on ge quantumdots and ge/si hetero-nanowires
KR101305705B1 (en) 2011-07-12 2013-09-09 엘지이노텍 주식회사 Touch panel and method for electrode
US20130020623A1 (en) 2011-07-18 2013-01-24 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method for single gate non-volatile memory device
CN102254969B (en) 2011-08-17 2012-11-14 中国科学院苏州纳米技术与纳米仿生研究所 Nanopillar array-based photoelectric device and manufacturing method thereof
KR101217216B1 (en) 2011-08-31 2012-12-31 서울대학교산학협력단 Electronic device and manufacturing method thereof
US9202867B2 (en) 2011-10-04 2015-12-01 Arizona Board Of Regents Nanocrystals containing CdTe core with CdS and ZnS coatings
JP5777479B2 (en) 2011-10-14 2015-09-09 株式会社タムラ製作所 Method for manufacturing β-Ga2O3-based substrate and method for manufacturing crystal laminated structure
US8440350B1 (en) 2011-11-10 2013-05-14 GM Global Technology Operations LLC Lithium-ion battery electrodes with shape-memory-alloy current collecting substrates
JP5491483B2 (en) 2011-11-15 2014-05-14 株式会社タムラ製作所 Method for growing β-Ga 2 O 3 single crystal
BR112014012795B1 (en) 2011-11-29 2022-04-12 Siluria Technologies, Inc Catalytic material in the form of a pressed, extruded or monolith microsphere and method for the oxidative coupling of methane
KR20130069035A (en) 2011-12-16 2013-06-26 삼성전자주식회사 Process for forming hybrid nanostructure on graphene
JP5795527B2 (en) 2011-12-20 2015-10-14 日本電信電話株式会社 Fabrication method of nanowire
GB201200355D0 (en) * 2012-01-10 2012-02-22 Norwegian Univ Sci & Tech Ntnu Nanowires
US9299560B2 (en) 2012-01-13 2016-03-29 Applied Materials, Inc. Methods for depositing group III-V layers on substrates
WO2013121289A2 (en) 2012-02-14 2013-08-22 Qunano Ab Gallium nitride nanowire based electronics
TW201344749A (en) 2012-04-23 2013-11-01 Nanocrystal Asia Inc Method for production of selective growth masks using underfill dispensing and sintering
KR101908546B1 (en) * 2012-04-27 2018-10-17 엘지이노텍 주식회사 Light emitting device
US20130311363A1 (en) 2012-05-15 2013-11-21 Jonathan E. Ramaci Dynamically re-programmable transaction card
JP2013251439A (en) 2012-06-01 2013-12-12 Tamura Seisakusho Co Ltd Semiconductor stacked structure and semiconductor element
US20140014171A1 (en) 2012-06-15 2014-01-16 Purdue Research Foundation High optical transparent two-dimensional electronic conducting system and process for generating same
GB201211038D0 (en) 2012-06-21 2012-08-01 Norwegian Univ Sci & Tech Ntnu Solar cells
US9401452B2 (en) 2012-09-14 2016-07-26 Palo Alto Research Center Incorporated P-side layers for short wavelength light emitters
FR2997558B1 (en) 2012-10-26 2015-12-18 Aledia OPTOELECTRIC DEVICE AND METHOD FOR MANUFACTURING THE SAME
US10109752B2 (en) 2012-11-26 2018-10-23 Massachusetts Institute Of Technology Nanowire-modified graphene and methods of making and using same
JP5876408B2 (en) 2012-12-14 2016-03-02 日本電信電話株式会社 Fabrication method of nanowire
CN103050498B (en) 2012-12-28 2015-08-26 中山大学 A kind of micro-nano linear array structure ultraviolet avalanche photodetector and preparation method thereof
JP5865271B2 (en) * 2013-01-11 2016-02-17 株式会社タムラ製作所 Crystal laminated structure and light emitting device
CN103105421A (en) * 2013-01-16 2013-05-15 大连理工大学 Nanowire semiconductor gas sensitive material based on GaN-Ga2O3 core-shell structure
US10957816B2 (en) 2013-02-05 2021-03-23 International Business Machines Corporation Thin film wafer transfer and structure for electronic devices
GB201311101D0 (en) 2013-06-21 2013-08-07 Norwegian Univ Sci & Tech Ntnu Semiconducting Films
JP5928657B2 (en) 2013-07-16 2016-06-01 住友金属鉱山株式会社 Oxide semiconductor thin film and thin film transistor
GB2517186A (en) 2013-08-14 2015-02-18 Norwegian University Of Science And Technology Radial P-N junction nanowire solar cells
KR101467118B1 (en) 2013-10-16 2014-12-01 조선대학교산학협력단 METHOD OF SYNTHESIZING β??Ga2O3 NANOWIRES USING SPUTTERING TECHNIQUE
KR101517551B1 (en) 2013-11-14 2015-05-06 포항공과대학교 산학협력단 Method for manufacturing light emitting device and light emitting device manufactured thereby
KR102122362B1 (en) * 2014-02-18 2020-06-12 삼성전자주식회사 Nano-sturucture semiconductor light emitting device
JP6013383B2 (en) 2014-02-28 2016-10-25 株式会社タムラ製作所 Method for producing β-Ga2O3 single crystal substrate
CN103903973B (en) 2014-03-05 2017-03-29 复旦大学 The method that high K dielectric is grown on Graphene using spin coating liquid metal Seed Layer
JP6358329B2 (en) 2014-04-17 2018-07-18 住友金属鉱山株式会社 Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using the same
JP6414210B2 (en) 2014-05-23 2018-10-31 住友金属鉱山株式会社 Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using the same
JP5865440B2 (en) 2014-06-30 2016-02-17 株式会社タムラ製作所 Method for producing β-Ga 2 O 3 single crystal substrate
KR102198694B1 (en) 2014-07-11 2021-01-06 삼성전자주식회사 Semiconductor light emitting device and manufacturing method of the same
KR101646440B1 (en) 2015-01-29 2016-08-05 조선대학교산학협력단 Method of synthesizing Indium doped Ga2O3 nanowire using powder sputtering technique
US9577176B1 (en) 2015-06-18 2017-02-21 Raytheon Bbn Technologies Corp. Josephson junction readout for graphene-based single photon detector
JP6721816B2 (en) * 2015-06-29 2020-07-15 株式会社タムラ製作所 Nitride semiconductor template and UV LED
JP7066610B2 (en) 2015-07-13 2022-05-13 クラヨナノ エーエス A composition comprising a light emitting diode device, a photodetector device, and nanowires or nanopyramids on a graphite substrate.
EA201890168A1 (en) 2015-07-13 2018-08-31 Крайонано Ас NANO WIRES OR NANOPYRAMIDS GROWN ON GRAPHITE SUBSTRATE
KR20170008535A (en) * 2015-07-14 2017-01-24 삼성전자주식회사 Method for manufacturing light emitting diode
CN105826362B (en) * 2016-03-13 2018-08-31 浙江理工大学 A kind of gallium oxide nano-wire array and preparation method thereof
EP3453050B1 (en) * 2016-05-04 2022-06-15 Nanosys, Inc. Light emitting device containing different color leds and method of making an array of such light emitting devices
CN106149058A (en) 2016-06-30 2016-11-23 济南大学 A kind of nanocrystalline for the GaN preparation method of controllable appearance

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