GB1544787A - Masks for x-ray lithography - Google Patents
Masks for x-ray lithographyInfo
- Publication number
- GB1544787A GB1544787A GB1836377A GB1836377A GB1544787A GB 1544787 A GB1544787 A GB 1544787A GB 1836377 A GB1836377 A GB 1836377A GB 1836377 A GB1836377 A GB 1836377A GB 1544787 A GB1544787 A GB 1544787A
- Authority
- GB
- United Kingdom
- Prior art keywords
- masks
- ray lithography
- lithography
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001015 X-ray lithography Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19762626851 DE2626851C3 (en) | 1976-06-15 | 1976-06-15 | Process for the production of masks for X-ray lithography |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1544787A true GB1544787A (en) | 1979-04-25 |
Family
ID=5980611
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1836377A Expired GB1544787A (en) | 1976-06-15 | 1977-05-02 | Masks for x-ray lithography |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS52153673A (en) |
BE (1) | BE855701A (en) |
DE (1) | DE2626851C3 (en) |
FR (1) | FR2355314A1 (en) |
GB (1) | GB1544787A (en) |
IT (1) | IT1083777B (en) |
NL (1) | NL186201C (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3150056A1 (en) * | 1980-12-17 | 1982-07-15 | Westinghouse Electric Corp., 15222 Pittsburgh, Pa. | "MASK FOR USE IN LITHOPRAPHIC PROCESSES" |
GB2121980A (en) * | 1982-06-10 | 1984-01-04 | Standard Telephones Cables Ltd | X-ray masks |
GB2148540A (en) * | 1983-09-26 | 1985-05-30 | Canon Kk | Lithographic mask |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4171489A (en) * | 1978-09-13 | 1979-10-16 | Bell Telephone Laboratories, Incorporated | Radiation mask structure |
DE3338717A1 (en) * | 1983-10-25 | 1985-05-02 | Siemens AG, 1000 Berlin und 8000 München | METHOD FOR PRODUCING A X-RAY MASK WITH METAL CARRIER FILM |
JPS6169133A (en) * | 1985-05-07 | 1986-04-09 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Exposing process of soft x-ray |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1948141A1 (en) * | 1968-09-23 | 1970-04-23 | Polaroid Corp | Anti-reflective coating for optical element of - transparent plastic |
-
1976
- 1976-06-15 DE DE19762626851 patent/DE2626851C3/en not_active Expired
-
1977
- 1977-05-02 GB GB1836377A patent/GB1544787A/en not_active Expired
- 1977-06-08 FR FR7717507A patent/FR2355314A1/en active Granted
- 1977-06-14 IT IT2465877A patent/IT1083777B/en active
- 1977-06-14 NL NL7706552A patent/NL186201C/en not_active IP Right Cessation
- 1977-06-15 BE BE178453A patent/BE855701A/en not_active IP Right Cessation
- 1977-06-15 JP JP7095277A patent/JPS52153673A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3150056A1 (en) * | 1980-12-17 | 1982-07-15 | Westinghouse Electric Corp., 15222 Pittsburgh, Pa. | "MASK FOR USE IN LITHOPRAPHIC PROCESSES" |
GB2121980A (en) * | 1982-06-10 | 1984-01-04 | Standard Telephones Cables Ltd | X-ray masks |
GB2148540A (en) * | 1983-09-26 | 1985-05-30 | Canon Kk | Lithographic mask |
Also Published As
Publication number | Publication date |
---|---|
NL186201C (en) | 1990-10-01 |
DE2626851B2 (en) | 1981-07-02 |
IT1083777B (en) | 1985-05-25 |
FR2355314A1 (en) | 1978-01-13 |
BE855701A (en) | 1977-10-03 |
DE2626851C3 (en) | 1982-03-18 |
JPS52153673A (en) | 1977-12-20 |
NL7706552A (en) | 1977-12-19 |
DE2626851A1 (en) | 1977-12-22 |
FR2355314B1 (en) | 1981-08-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1010578A (en) | Mask structure for x-ray lithography | |
DE3365521D1 (en) | X-ray lithographic mask | |
JPS5480082A (en) | Mask for projecting print | |
ZA762476B (en) | Resist masks | |
GB2013909B (en) | Mask apparatus for fine-line lithography | |
JPS5368226A (en) | Exposure frame | |
GB1539305A (en) | Mask making | |
GB1546533A (en) | Electron beam exposure system | |
JPS5315274A (en) | Mask for vaporrphase deposition | |
JPS5344441A (en) | Material for resist | |
YU39550B (en) | X-ray apparatus | |
JPS5330343A (en) | Exposure device | |
GB1545408A (en) | Radiographic apparatus | |
JPS5369028A (en) | Copying machine exposure system | |
GB1557064A (en) | Masks suitable for use in electron image projectors | |
JPS5352073A (en) | Photomask for ic | |
GB1544787A (en) | Masks for x-ray lithography | |
GB1542521A (en) | X-ray exposure device | |
JPS52121319A (en) | Exposure controller | |
JPS53101439A (en) | Exposure device for photooanddthermosensive copying | |
GB2003059B (en) | Developing devices for radiographic films | |
GB1507752A (en) | X-ray mask | |
JPS5441132A (en) | Mask for xxray exposure | |
HK21078A (en) | Masaging mask | |
JPS5355203A (en) | Mask for exposure |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |