JPS5352073A - Photomask for ic - Google Patents

Photomask for ic

Info

Publication number
JPS5352073A
JPS5352073A JP12698676A JP12698676A JPS5352073A JP S5352073 A JPS5352073 A JP S5352073A JP 12698676 A JP12698676 A JP 12698676A JP 12698676 A JP12698676 A JP 12698676A JP S5352073 A JPS5352073 A JP S5352073A
Authority
JP
Japan
Prior art keywords
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12698676A
Other languages
Japanese (ja)
Inventor
Osamu Nagarekawa
Shiyouichi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Electronics Corp
Original Assignee
Hoya Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Electronics Corp filed Critical Hoya Electronics Corp
Priority to JP12698676A priority Critical patent/JPS5352073A/en
Publication of JPS5352073A publication Critical patent/JPS5352073A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP12698676A 1976-10-22 1976-10-22 Photomask for ic Pending JPS5352073A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12698676A JPS5352073A (en) 1976-10-22 1976-10-22 Photomask for ic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12698676A JPS5352073A (en) 1976-10-22 1976-10-22 Photomask for ic

Publications (1)

Publication Number Publication Date
JPS5352073A true JPS5352073A (en) 1978-05-12

Family

ID=14948813

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12698676A Pending JPS5352073A (en) 1976-10-22 1976-10-22 Photomask for ic

Country Status (1)

Country Link
JP (1) JPS5352073A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5616676A (en) * 1979-07-21 1981-02-17 Hokuriku Denki Kogyo Kk Preparation of minute pattern
JPS5739490U (en) * 1980-08-18 1982-03-03
JPS5741638A (en) * 1980-08-25 1982-03-08 Fujitsu Ltd Photomask for electron beam
JPS57144550A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Blank plate for photomask
JPS57144549A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Photomask
JPS57182741A (en) * 1981-05-07 1982-11-10 Dainippon Printing Co Ltd Photomask blank plate
JPS57182740A (en) * 1981-05-07 1982-11-10 Dainippon Printing Co Ltd Photomask
JPS59181330A (en) * 1983-03-31 1984-10-15 Nitto Electric Ind Co Ltd Exposure processing method
US4696878A (en) * 1985-08-02 1987-09-29 Micronix Corporation Additive process for manufacturing a mask for use in X-ray photolithography and the resulting mask
JPH02103046A (en) * 1988-10-12 1990-04-16 Toshiba Corp Manufacture of mask for producing semiconductor and hard mask blank placing table

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS504315A (en) * 1973-05-18 1975-01-17
JPS5113577A (en) * 1974-06-19 1976-02-03 Western Electric Co
JPS5193875A (en) * 1975-02-15 1976-08-17

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS504315A (en) * 1973-05-18 1975-01-17
JPS5113577A (en) * 1974-06-19 1976-02-03 Western Electric Co
JPS5193875A (en) * 1975-02-15 1976-08-17

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5616676A (en) * 1979-07-21 1981-02-17 Hokuriku Denki Kogyo Kk Preparation of minute pattern
JPS6018870Y2 (en) * 1980-08-18 1985-06-07 株式会社東芝 Plug-in unit storage device
JPS5739490U (en) * 1980-08-18 1982-03-03
JPS5741638A (en) * 1980-08-25 1982-03-08 Fujitsu Ltd Photomask for electron beam
JPS6262336B2 (en) * 1980-08-25 1987-12-25 Fujitsu Ltd
JPS57144549A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Photomask
JPS57144550A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Blank plate for photomask
JPS6322299B2 (en) * 1981-02-28 1988-05-11 Dainippon Printing Co Ltd
JPS6322298B2 (en) * 1981-02-28 1988-05-11 Dainippon Printing Co Ltd
JPS57182740A (en) * 1981-05-07 1982-11-10 Dainippon Printing Co Ltd Photomask
JPS57182741A (en) * 1981-05-07 1982-11-10 Dainippon Printing Co Ltd Photomask blank plate
JPS6322301B2 (en) * 1981-05-07 1988-05-11 Dainippon Printing Co Ltd
JPS6322300B2 (en) * 1981-05-07 1988-05-11 Dainippon Printing Co Ltd
JPS59181330A (en) * 1983-03-31 1984-10-15 Nitto Electric Ind Co Ltd Exposure processing method
US4696878A (en) * 1985-08-02 1987-09-29 Micronix Corporation Additive process for manufacturing a mask for use in X-ray photolithography and the resulting mask
JPH02103046A (en) * 1988-10-12 1990-04-16 Toshiba Corp Manufacture of mask for producing semiconductor and hard mask blank placing table

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