JPS5352073A - Photomask for ic - Google Patents
Photomask for icInfo
- Publication number
- JPS5352073A JPS5352073A JP12698676A JP12698676A JPS5352073A JP S5352073 A JPS5352073 A JP S5352073A JP 12698676 A JP12698676 A JP 12698676A JP 12698676 A JP12698676 A JP 12698676A JP S5352073 A JPS5352073 A JP S5352073A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12698676A JPS5352073A (en) | 1976-10-22 | 1976-10-22 | Photomask for ic |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12698676A JPS5352073A (en) | 1976-10-22 | 1976-10-22 | Photomask for ic |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5352073A true JPS5352073A (en) | 1978-05-12 |
Family
ID=14948813
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12698676A Pending JPS5352073A (en) | 1976-10-22 | 1976-10-22 | Photomask for ic |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5352073A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5616676A (en) * | 1979-07-21 | 1981-02-17 | Hokuriku Denki Kogyo Kk | Preparation of minute pattern |
JPS5739490U (en) * | 1980-08-18 | 1982-03-03 | ||
JPS5741638A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Photomask for electron beam |
JPS57144550A (en) * | 1981-02-28 | 1982-09-07 | Dainippon Printing Co Ltd | Blank plate for photomask |
JPS57144549A (en) * | 1981-02-28 | 1982-09-07 | Dainippon Printing Co Ltd | Photomask |
JPS57182741A (en) * | 1981-05-07 | 1982-11-10 | Dainippon Printing Co Ltd | Photomask blank plate |
JPS57182740A (en) * | 1981-05-07 | 1982-11-10 | Dainippon Printing Co Ltd | Photomask |
JPS59181330A (en) * | 1983-03-31 | 1984-10-15 | Nitto Electric Ind Co Ltd | Exposure processing method |
US4696878A (en) * | 1985-08-02 | 1987-09-29 | Micronix Corporation | Additive process for manufacturing a mask for use in X-ray photolithography and the resulting mask |
JPH02103046A (en) * | 1988-10-12 | 1990-04-16 | Toshiba Corp | Manufacture of mask for producing semiconductor and hard mask blank placing table |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS504315A (en) * | 1973-05-18 | 1975-01-17 | ||
JPS5113577A (en) * | 1974-06-19 | 1976-02-03 | Western Electric Co | |
JPS5193875A (en) * | 1975-02-15 | 1976-08-17 |
-
1976
- 1976-10-22 JP JP12698676A patent/JPS5352073A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS504315A (en) * | 1973-05-18 | 1975-01-17 | ||
JPS5113577A (en) * | 1974-06-19 | 1976-02-03 | Western Electric Co | |
JPS5193875A (en) * | 1975-02-15 | 1976-08-17 |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5616676A (en) * | 1979-07-21 | 1981-02-17 | Hokuriku Denki Kogyo Kk | Preparation of minute pattern |
JPS6018870Y2 (en) * | 1980-08-18 | 1985-06-07 | 株式会社東芝 | Plug-in unit storage device |
JPS5739490U (en) * | 1980-08-18 | 1982-03-03 | ||
JPS5741638A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Photomask for electron beam |
JPS6262336B2 (en) * | 1980-08-25 | 1987-12-25 | Fujitsu Ltd | |
JPS57144549A (en) * | 1981-02-28 | 1982-09-07 | Dainippon Printing Co Ltd | Photomask |
JPS57144550A (en) * | 1981-02-28 | 1982-09-07 | Dainippon Printing Co Ltd | Blank plate for photomask |
JPS6322299B2 (en) * | 1981-02-28 | 1988-05-11 | Dainippon Printing Co Ltd | |
JPS6322298B2 (en) * | 1981-02-28 | 1988-05-11 | Dainippon Printing Co Ltd | |
JPS57182740A (en) * | 1981-05-07 | 1982-11-10 | Dainippon Printing Co Ltd | Photomask |
JPS57182741A (en) * | 1981-05-07 | 1982-11-10 | Dainippon Printing Co Ltd | Photomask blank plate |
JPS6322301B2 (en) * | 1981-05-07 | 1988-05-11 | Dainippon Printing Co Ltd | |
JPS6322300B2 (en) * | 1981-05-07 | 1988-05-11 | Dainippon Printing Co Ltd | |
JPS59181330A (en) * | 1983-03-31 | 1984-10-15 | Nitto Electric Ind Co Ltd | Exposure processing method |
US4696878A (en) * | 1985-08-02 | 1987-09-29 | Micronix Corporation | Additive process for manufacturing a mask for use in X-ray photolithography and the resulting mask |
JPH02103046A (en) * | 1988-10-12 | 1990-04-16 | Toshiba Corp | Manufacture of mask for producing semiconductor and hard mask blank placing table |
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